公开(公告)号：US20020106580A1

公开(公告)日：2002-08-08

申请号：US09987718

申请日：2001-11-15

发明人： Kazuyuki Nitta ,  Satoshi Shimatani ,  Kazufumi Sato

IPC分类号： G03F007/004 ,  G03F007/26

CPC分类号： G03F7/0045 ,  G03F7/0392

摘要： The invention discloses a photolithographic patterning method of a photoresist layer for the formation of a patterned resist layer on a substrate surface having a fine hole pattern. The inventive method comprises the steps of forming a patterned resist layer by using a specific chemical-amplification positive-working photoresist composition compounded with a di- or polyvinyloxy compound such as cyclohexanedimethonol divinyl ether as a crosslinking agent of the resinous ingredient and subjecting the patterned resist layer on the substrate to a heat treatment for the so-called thermal flow treatment to effect pattern size reduction of the resist pattern.

摘要翻译： 本发明公开了一种用于在具有细孔图案的基板表面上形成图案化抗蚀剂层的光致抗蚀剂层的光刻图案化方法。 本发明的方法包括以下步骤：通过使用与二元或多乙烯基氧基化合物如环己烷二甲基二醇二乙烯醚作为树脂成分的交联剂复合的特定化学扩增正性光致抗蚀剂组合物形成图案化的抗蚀剂层，并对图案化的抗蚀剂 层对基板进行热处理以进行所谓的热流处理，以实现抗蚀剂图案的图案尺寸减小。

公开(公告)号：US20020081529A1

公开(公告)日：2002-06-27

申请号：US09983900

申请日：2001-10-26

发明人： Koji Sonokawa

IPC分类号： G03F007/26

CPC分类号： B41C1/1016 ,  B41C2201/04 ,  B41C2201/06 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/08 ,  B41C2210/16 ,  B41C2210/24 ,  B41C2210/266 ,  G03F7/0752 ,  Y10S430/145 ,  Y10S430/146

摘要： Provided is a plate-making method for producing a waterless lithographic printing plate, wherein the method comprises: (I) an exposing step of imagewise exposure of the precursor with a laser with a controlled condition that a portion of a laser-exposed area in a photo-thermal conversion layer in the precursor remains in the photo-thermal conversion layer of the finished printing plate, and (II) a developing step of removing a silicone rubber layer in the laser-exposed area to form an image on the printing plate. The precursor to be processed comprises (A) a support, (B) an undercoat layer formed by applying onto the support a coating liquid that contains a water-soluble or water-dispersible polymer and water as a solvent, and then drying the coating liquid, (C) a photo-thermal conversion layer which comprises polyurethane and a photo-thermal converting agent; and (D) a silicone rubber layer, laminated in that order.

摘要翻译： 本发明提供一种无水平版印刷版的制版方法，其特征在于，包括：（I）曝光步骤，用激光成像曝光所述前驱体，所述曝光步骤的受光条件为：激光曝光区域的一部分在 前体中的光热转换层保留在成品印版的光热转换层中，（II）在激光曝光区域除去硅橡胶层的显影步骤，以在印版上形成图像。 待处理的前体包括（A）支撑体，（B）通过将包含水溶性或水分散性聚合物和水作为溶剂的涂布液涂覆在载体上形成的底涂层，然后干燥涂布液 ，（C）包含聚氨酯和光热转换剂的光热转换层; 和（D）硅橡胶层，按顺序层压。

公开(公告)号：US20020081528A1

公开(公告)日：2002-06-27

申请号：US10022506

申请日：2001-12-20

发明人： Yoshikazu Miyajima ,  Kazuhito Outuka ,  Keiji Emoto

IPC分类号： G03F007/26 ,  G03F007/00

CPC分类号： G03F7/70758 ,  G03F7/709 ,  H02K3/04 ,  H02K3/47 ,  H02K41/03

摘要： A linear motor increases the space factor of a copper wire with respect to a coil section, increases the current density of a driving current supplied to a coil, and realizes higher speed and lower power consumption of a stage apparatus. In an exposure apparatus for exposing a substrate to a pattern drawn on a master surface, a linear motor with a coil formed by winding a foil-like conductor in a multilayered structure is used for driving a stage which supports a master or substrate, and for damping of the main body structure by cutting off transmission of a reaction force from the stage.

摘要翻译： 线性电动机相对于线圈部分增加铜线的空间因数，增加提供给线圈的驱动电流的电流密度，并实现舞台装置的更高速度和更低的功率消耗。 在将基板曝光于在主表面上绘制的图案的曝光装置中，使用通过以多层结构卷绕箔状导体而形成的线圈的线性电动机来驱动支撑母板或基板的台， 通过切断来自舞台的反作用力的传递来减轻主体结构。

公开(公告)号：US20020048724A1

公开(公告)日：2002-04-25

申请号：US09947764

申请日：2001-09-07

申请人： Shin-Etsu Chemical Co., Ltd.

发明人： Yuji Harada ,  Jun Hatakeyama ,  Jun Watanabe ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Shinji Kishimura ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kentaro Tsutsumi ,  Kazuhiko Maeda

IPC分类号： G03F007/004 ,  G03F007/26 ,  C08J003/28

CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  Y10S430/108 ,  Y10S430/111

摘要： An acrylic resin containing hexafluoroisopropanol units has high transmittance to VUV radiation. A resist composition using the resin as a base polymer has high transparency, substrate adhesion, alkali developability and acid-elimination capability and is suited for lithographic microprocessing.

摘要翻译： 含有六氟异丙醇单元的丙烯酸树脂对VUV辐射具有高透射率。 使用树脂作为基础聚合物的抗蚀剂组合物具有高透明度，底物粘合性，碱显影性和酸消除能力，并且适用于光刻微加工。

公开(公告)号：US20020012873A1

公开(公告)日：2002-01-31

申请号：US09879325

申请日：2001-06-12

发明人： Jae Chang Jung ,  Geun Su Lee ,  Min Ho Jung ,  Ki Ho Baik

IPC分类号： G03F007/38 ,  G03F007/40 ,  G03F007/26 ,  G03F007/038

CPC分类号： G03F7/0045 ,  G03F7/0395 ,  Y10S430/115 ,  Y10S430/117 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

摘要： The present invention relates to a photoresist composition containing a photo radical generator, more specifically, to a photoresist composition which comprises (a) photoresist resin, (b) a photoacid generator, (c) an organic solvent and (d) a photo radical generator. The present photoresist composition reduces or prevents a sloping pattern formation due to a higher concentration of acid in the upper portion of the photoresist relative to the lower portion of the photoresist.

摘要翻译： 本发明涉及含有光自由基发生剂的光致抗蚀剂组合物，更具体地说，涉及光致抗蚀剂组合物，其包含（a）光致抗蚀剂树脂，（b）光酸产生剂，（c）有机溶剂和（d）光自由基发生剂 。 由于光致抗蚀剂上部相对于光致抗蚀剂的下部较高浓度的酸，本发明的光致抗蚀剂组合物减少或防止形成倾斜图案。

公开(公告)号：US20020009675A1

公开(公告)日：2002-01-24

申请号：US09943995

申请日：2001-08-30

发明人： Nanseng Jeng ,  Christophe Pierrat

IPC分类号： G03F007/26

CPC分类号： G03F1/26 ,  G03F1/29 ,  G03F1/32 ,  G03F7/2022 ,  H01L21/0274 ,  H01L21/31144 ,  H01L21/76813 ,  H01L2221/1021

摘要： A method for forming a photomask including applying photoresist to a semiconductor substrate, exposing a first area of the photoresist to a first dosage of radiation, and exposing a second area of the photoresist to a second dosage of radiation. The first and second areas may be concurrently exposed. First and second regions of the photoresist are then removed to form first and second openings that have different depths in the photoresist. Such removal may be effected by developing the first and second areas of the photoresist. One of the openings may extend down to an insulating layer formed on the semiconductor substrate. A contact and/or trench etch may be performed to remove a portion of the insulating layer. Conductive material may then be deposited in the opening so formed to form a contact, a via, or another electrically conductive element that communicates with a structure underlying the insulating layer.

摘要翻译： 一种用于形成光掩模的方法，包括将光致抗蚀剂施加到半导体衬底，将所述光致抗蚀剂的第一区域暴露于第一剂量的辐射，以及将所述光致抗蚀剂的第二区域暴露于第二剂量的辐射。 第一和第二区域可以同时暴露。 然后去除光致抗蚀剂的第一和第二区域以形成在光致抗蚀剂中具有不同深度的第一和第二开口。 可以通过显影光致抗蚀剂的第一和第二区域来实现这种去除。 一个开口可以向下延伸到形成在半导体衬底上的绝缘层。 可以执行接触和/或沟槽蚀刻以去除绝缘层的一部分。 然后可以将导电材料沉积在如此形成的开口中以形成与绝缘层下方的结构连通的接触件，通孔或另一导电元件。

公开(公告)号：US20020006585A1

公开(公告)日：2002-01-17

申请号：US09886463

申请日：2001-06-22

发明人： Cha-Won Koh ,  Cheol-Kyu Bok

IPC分类号： G03F007/26

CPC分类号： G03F7/40 ,  G03F7/405

摘要： A method is disclosed for forming fine photoresist patterns on semiconductor devices using a modified, two-step dry develop process using a fluorine-containing gas to produce hydrophobic SiOx passivation layers on the sidewalls of the photoresist patterns. These passivation layers increase the structural stability of the fine photoresist patterns and prevent moisture within an air from cohering on the photoresist patterns when the semiconductor substrate is subsequently exposed to the air, Accordingly, the present invention improves the processing margins for very high aspect ratio photoresist patterns resulting in reduced rework and increased yield on very highly integrated semiconductor devices.

摘要翻译： 公开了一种用于在半导体器件上形成精细光致抗蚀剂图案的方法，其使用使用含氟气体的改进的两步干式显影方法在光致抗蚀剂图案的侧壁上产生疏水性SiO x钝化层。 这些钝化层增加了精细光致抗蚀剂图案的结构稳定性，并且当半导体衬底随后暴露于空气时，防止空气中的水分粘附在光致抗蚀剂图案上。因此，本发明改进了非常高的纵横比光致抗蚀剂的加工边缘 图案导致在非常高度集成的半导体器件上的返工减少和产量增加。

公开(公告)号：US20020004182A1

公开(公告)日：2002-01-10

申请号：US09846679

申请日：2001-05-01

发明人： Richard J. McReynolds

IPC分类号： G03F007/26

CPC分类号： B81C1/00428 ,  G03F7/2024 ,  G03F7/40

摘要： Method of fabricating microstructures on a substrate. The method comprises providing a substrate layer having a first surface with a resist layer. First selected regions of the resist layer are exposed to an environment that renders the resist layer more or less soluble in a developer solution. The resist layer is then developed in the developer solution to expose selected regions of the substrate surface. Second selected regions of the resist layer are then exposed to an environment that renders the resist layer more or less soluble in the developer solution by aligning exposure of the second selected regions to the first selected regions. The first selected regions of the substrate surface are etched. Second selected regions of the resist layer are then developed to expose the second selected regions of the substrate surface

摘要翻译： 在基板上制造微结构的方法。 该方法包括提供具有抗蚀剂层的具有第一表面的基底层。 抗蚀剂层的第一选择区域暴露于使抗蚀剂层或多或少可溶于显影剂溶液的环境中。 然后将抗蚀剂层在显影剂溶液中显影以暴露基底表面的选定区域。 然后将抗蚀剂层的第二选择区域暴露于使得抗蚀剂层或多或少可溶于显影剂溶液中的环境，通过将第二选定区域的曝光对准到第一选定区域。 蚀刻基板表面的第一选定区域。 然后显影抗蚀剂层的第二选定区域以暴露衬底表面的第二选定区域

公开(公告)号：US20010044078A1

公开(公告)日：2001-11-22

申请号：US09832893

申请日：2001-04-12

申请人： TDK CORPORATION

发明人： Hiroaki Takahata ,  Hisaji Oyake

IPC分类号： G03F007/26 ,  G03C005/56 ,  G03F007/20

CPC分类号： G03F7/38 ,  G03F7/0015 ,  G03F7/168

摘要： An optical disk master having a protrusion/depression pattern on its surface is prepared by applying a photoresist layer on a substrate, exposing the photoresist layer to radiation to form a latent image of the protrusion/depression pattern, and developing the latent image. The step of treating the photoresist layer with a surfactant is included prior to the exposing step or between the exposing and developing steps. An optical disk master having a finer pattern can be prepared at a low cost while minimizing any additional burden on the manufacturing system.

摘要翻译： 通过在基板上施加光致抗蚀剂层，将光致抗蚀剂层暴露于辐射以形成突起/凹陷图案的潜像并显影潜像来制备在其表面上具有突起/凹陷图案的光盘母盘。 在暴露步骤之前或在曝光和显影步骤之间包括用表面活性剂处理光致抗蚀剂层的步骤。 可以以低成本准备具有更精细图案的光盘主机，同时最小化制造系统的任何额外负担。

公开(公告)号：US20010038964A1

公开(公告)日：2001-11-08

申请号：US09372635

申请日：1999-08-11

申请人： James W. Thackeray

发明人： JAMES W. THACKERAY ,  ANGELO A. LAMOLA

IPC分类号： G03C001/52 ,  G03F007/26

CPC分类号： G03F7/0382 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0226 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/40

摘要： The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding a polar compound to a radiation sensitive composition and applying a layer of the composition to a substrate; exposing the composition layer to activating radiation whereby a latent image is generated comprising a distribution of acid moieties complexed with the polar compound; and treating the exposed composition layer to provide an activating amount of acid.

摘要翻译： 本发明提供了辐射敏感组合物和方法，其包括用于提供增强分辨率的浮雕图像的新型装置。 在一个方面，本发明提供了一种控制光生酸扩散的方法，包括将极性化合物加入到辐射敏感组合物中，并将该组合物的一层施加到基底上; 将组合物层暴露于激活辐射，由此产生包含与极性化合物络合的酸部分的分布的潜像; 并处理暴露的组合物层以提供活化量的酸。