Abstract:
A duoplasmatron ion source is modified to provide a large plasma surface with a uniform density at a target cathode. The target cathode and the acceleration and deceleration electrodes are gridded or multi-apertured and are spaced in close proximity each to the others with the apertures being in alignment. With such an arrangement, it is possible to extract multi-ampere bright ion beams at energies of tens of KeV. Conversion of the ion beam to a neutral particle beam can be readily accomplished by addition of a gas cell.
Abstract:
Certain configurations of plasma discharge chambers and plasma ionization sources comprising a plasma discharge chamber are described. In some examples, the discharge chamber comprises a conductive area and is configured to sustain a plasma discharge within the discharge chamber. In other examples, the discharge chamber comprises at least one inlet configured to receive a plasma gas and at least one outlet configured to provide ionized analyte from the discharge chamber. Systems and methods using the discharge chambers are also described.
Abstract:
Vertical field emission devices are described with very small cathode to anode separations. Preferred cathodes have sharp edge emitters extending, outward perpendicular to the surface of the underlying substrate. These sharp edge emitters are produced within planar photolithography by coating sacrificial conformal walls and anisotropic etching. Microencapsulation is used to produce a sealed cavity at low pressure which includes the space between the anode and cathode. The field emission components can be adapted for the production of light emitting, field emission diodes. The individual cathode emitters can be integrated with solid state components on the substrate with each cathode being independently addressable. Arrays of closely packed light emitting, field emission diodes of the present invention are particularly suitable for use in displays. These displays would be useful for flat-panel computer displays and high definition television.
Abstract:
A plasma generating device, and in particular a duoplasmatron ion gun, is disclosed that is air cooled, high vacuum compatible and hence very clean with a stable ion current output. The device is mounted to a standard type flange held at ground potential without the necessity of subsequent high voltage isolation. Cooling is achieved with cooling fins and a fan inside a housing in which the duoplasmatron is mounted. A mounting structure includes a vacuum tight ceramic ring brazed between the mounting flange and the gun body. The ceramic ring is located with respect to high permeability magnetic components and a magnetic coil to facilitate a magnetic field for focusing the plasma, allowing the coil to be referenced to ground potential while the gun is maintained at high voltage. A ceramic chamber containing ceramic pellets is located in the plasma-forming gas inlet duct to prevent high voltage electrical discharge in the gas duct. A piezoelectric valve operated by a pressure sensor maintains accurate gas flow and ion output.
Abstract:
The ion source comprises a primary plasma generator constituted by a hot cathode and an anode, between which an arc is produced, and by an intermediate electrode enclosing the arc in proximity to an extraction orifice pierced in the anode. Magnetic field creating means are provided between the intermediate electrode and the extraction orifice, which has a relative small crosssection so that the pressure of the gases occurring inside the primary plasma generator is independent of the pressure existing downstream of the extraction orifice. This pressure downstream of extraction orifice is less than the pressure inside the primary plasma generator. On the downstream side there is an extraction electrode. A fifth electrode is arranged downstream of the extraction orifice of the anode and upstream of the extraction electrode and means are provided for applying to this fifth electrode a positive potential with respect to that of the anode and of adjustable value, which is small in absolute value with respect to the potential of the extraction electrode.