POWER EMULATION AND ESTIMATION
    301.
    发明申请

    公开(公告)号:US20240427974A1

    公开(公告)日:2024-12-26

    申请号:US18749348

    申请日:2024-06-20

    Inventor: Leon Zlotnik

    Abstract: An example method for power emulation and estimation includes estimating a functional power consumption value associated with a memory system by determining: a scan-based power estimation, scan-based power measurement, a calibration factor from correlating the scan-based power estimation to the scan-based power measurement and a correlated functional power using the calibration factor. The calibration factor can be applied to a functional power estimation in order to achieve better accuracy.

    BOOTLOADER FAILURE ANALYSIS OF MEMORY SYSTEM

    公开(公告)号:US20240427657A1

    公开(公告)日:2024-12-26

    申请号:US18742798

    申请日:2024-06-13

    Abstract: Various embodiments described herein provide for bootloader failure analysis of a memory system using information regarding a failure of the bootloader, where the information is stored on the memory sub-system in response to detection of (e.g., stored at the time of) the failure. In particular, the stored information can comprise data that would be lost or otherwise inaccessible for subsequent diagnostic (e.g., debug) purposes, such as by a manufacturer of the memory sub-system. According to some embodiments, a memory sub-system is configured to save information regarding a failure of a bootloader, to one or more designated memory devices of the memory sub-system, such that diagnostic firmware (e.g., debug firmware) subsequently loaded and executed on the memory sub-system (e.g., by a manufacturer) can make use of the stored information to perform one or more diagnostic functions (e.g., debug functions) on the memory sub-system.

    MEMORY CONTROLLER FOR MANAGING RAID INFORMATION

    公开(公告)号:US20240427526A1

    公开(公告)日:2024-12-26

    申请号:US18830096

    申请日:2024-09-10

    Abstract: A memory controller can include a front end portion configured to interface with a host, a central controller portion configured to manage data, a back end portion configured to interface with memory devices. The memory controller can include interface management circuitry coupled to a cache and a memory device. The memory controller can receive, by the interface management controller, a first signal indicative of data associated with a memory access request from a host. The memory controller can transmit a second signal indicative of the data to cache the data in a first location in the cache. The memory controller can transmit a third signal indicative of the data to cache the data in a second location in the cache.

    METHODS FOR DEPOSITING SILICON FILMS BY ATOMIC LAYER DEPOSITION

    公开(公告)号:US20240425983A1

    公开(公告)日:2024-12-26

    申请号:US18680975

    申请日:2024-05-31

    Abstract: Methods, systems, and devices for methods for depositing silicon films by atomic layer deposition are described. For instance, a device may expose a base material (e.g., multiple stacks of materials) to a first precursor to form a silicon compound on the base material, the first precursor including a silicon amidinate. The device may react a second precursor with the silicon compound and may form a layer of silicon on the base material based on exposing the base material to the first precursor and reacting the second precursor with the silicon compound.

    Microelectronic devices including slot structures and additional slot structures

    公开(公告)号:US12178041B2

    公开(公告)日:2024-12-24

    申请号:US18152647

    申请日:2023-01-10

    Abstract: A microelectronic device comprises a stack structure comprising a vertically alternating sequence of conductive structures and insulative structures arranged in tiers, the stack structure divided into block structures separated from one another by slot structures, a staircase structure within the stack structure having steps comprising horizontal edges of the tiers, conductive contact structures in contact with the steps of the staircase structure, support pillar structures extending through the stack structure, and additional slot structures extending partially through the stack structure within one of the block structures, one of the additional slot structures extending between horizontally neighboring support pillar structures and closer to one of the horizontally neighboring support pillar structures than to an additional one of the horizontally neighboring support pillar structures. Related microelectronic devices, memory devices, and electronic systems are also described.

    Semiconductor device assembly with sacrificial pillars and methods of manufacturing sacrificial pillars

    公开(公告)号:US12176312B2

    公开(公告)日:2024-12-24

    申请号:US18402426

    申请日:2024-01-02

    Inventor: Chao Wen Wang

    Abstract: Sacrificial pillars for a semiconductor device assembly, and associated methods and systems are disclosed. In one embodiment, a region of a semiconductor die may be identified to include sacrificial pillars that are not connected to bond pads of the semiconductor die, in addition to live conductive pillars connected to the bond pads. The region with the sacrificial pillars, when disposed in proximity to the live conductive pillars, may prevent an areal density of the live conductive pillars from experiencing an abrupt change that may result in intolerable variations in heights of the live conductive pillars. As such, the sacrificial pillars may improve a coplanarity of the live conductive pillars by reducing variations in the heights of the live conductive pillars. Thereafter, the sacrificial pillars may be removed from the semiconductor die.

    Memory device including support structures

    公开(公告)号:US12176300B2

    公开(公告)日:2024-12-24

    申请号:US18209231

    申请日:2023-06-13

    Abstract: Some embodiments include apparatuses and methods of forming the apparatuses. One of the apparatuses includes tiers of respective memory cells and control gates, the tier located one over another over a substrate, the control gates including a control gate closest to the substrate, the control gates including respective portions forming a staircase structure; conductive contacts contacting the control gates at a location of the staircase structure, the conductive contacts including a conductive contact contacting the control gate; a dielectric structure located on sidewalls of the control gates; and support structures adjacent the conductive contacts and having lengths extending vertically from the substrate, the support structures including a support structure closest to the conductive contact, the support structure located at a distance from an edge of the dielectric structure, wherein a ratio of a width of the support structure over the distance is ranging from 1.6 to 2.0.

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