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公开(公告)号：US20220082943A1
公开(公告)日：2022-03-17
申请号：US17419360
申请日：2019-12-12
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: A method for determining a component of optical characteristic of a patterning process. The method includes obtaining (i) a plurality of desired features, (ii) a plurality of simulated features based on the plurality of desired features and an optical characteristic of a patterning apparatus, and (iii) a performance metric (e.g., EPE) related to a desired feature of the plurality of desired features and an associated simulated feature of the plurality of simulated features; determining a set of optical sensitivities of the patterning process by computing a change in value of the performance metric based on a change in value of the optical characteristic; and identifying, based on the set of optical sensitivities, a set of components (e.g., principal components) of the optical characteristic that include dominant contributors in changing the value of the performance metric.
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342.发明申请公开(公告)号：US20220075264A1
公开(公告)日：2022-03-10
申请号：US17524816
申请日：2021-11-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Stef Marten Johan JANSSENS , Koen CUYPERS , Rogier Hendrikus Magdalena CORTIE , Sudhir SRIVASTAVA , Theodorus Johannes Antonius RENCKENS , Jeroen Gerard GOSEN , Erik Henricus Egidius Catharina EUMMELEN , Hendrikus Johannes SCHELLENS , Adrianus Marinus Wouter HEEREN , Bo LENSSEN
Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.
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公开(公告)号：US11269262B2
公开(公告)日：2022-03-08
申请号：US17049719
申请日：2019-04-04
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Joep Sander De Beer , Cornelius Adrianus Lambertus De Hoon , Jeroen Pieter Starreveld , Martinus Van Duijnhoven , Maurice Willem Jozef Etiënne Wijckmans
IPC: G03F7/20
Abstract: A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.
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公开(公告)号：US11237484B2
公开(公告)日：2022-02-01
申请号：US16875012
申请日：2020-05-15
Applicant: ASML Netherlands B.V.
Inventor： Ferry Zijp
IPC: H01L21/027 , G03F7/20 , G01N21/956
Abstract: A metrology tool, an aplanatic singlet lens, and a method of designing an aplanatic singlet lens are provided. The metrology tool is for determining a characteristic of a structure on a substrate. The metrology tool comprises an optical detection system for detecting radiation over a wavelength range. The optical detection system comprises an aplanatic singlet lens for focusing the radiation on to a detector. The aplanatic singlet lens has a n aplanatic wavelength which is within the wavelength range.
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345.发明授权公开(公告)号：US11235388B2
公开(公告)日：2022-02-01
申请号：US17138480
申请日：2020-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC: B22F7/06 , G03F7/20 , B23K26/354 , B23K26/342 , B22F10/20 , B22F10/00 , B23Q3/18 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00
Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
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Patent Agency Ranking
公开(公告)号：US20220026809A1
公开(公告)日：2022-01-27
申请号：US17291513
申请日：2019-10-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Emil Peter SCHMITT-WEAVER , Kaustuve BHATTACHARYYA , Martin KERS
Abstract: A method of determining a parameter of a lithographic apparatus, wherein the method includes providing first height variation data of a first substrate, providing first performance data of a first substrate, and determining a model based on the first height variation data and the first performance data. The method further includes obtaining second height variation data of a second substrate, inputting the second height variation data to the model, and determining second performance data of the second substrate by running the model. Based on the second performance data, the method determines a parameter of the apparatus.
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公开(公告)号：US11231653B2
公开(公告)日：2022-01-25
申请号：US17186117
申请日：2021-02-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Johannes Cornelis Paulus Melman , Han Henricus Aldegonda Lempens , Miao Yu , Cornelius Maria Rops , Ruud Olieslagers , Artunç Ulucan , Theodorus Wilhelmus Polet , Patrick Johannes Wilhelmus Spruytenburg
IPC: G03F7/20 , H01L21/027
Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
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公开(公告)号：US11223181B2
公开(公告)日：2022-01-11
申请号：US16543964
申请日：2019-08-19
Applicant: ASML Netherlands B.V.
IPC: H01S3/109 , G01N21/956 , G03F7/20 , G02F1/35
Abstract: Methods and corresponding apparatus operable to cause an interaction between a drive radiation beam and a medium for generation of emitted radiation by high harmonic generation, the arrangement comprising: an interaction region positioned at an interaction plane and configured to receive the medium; a beam block positioned upstream of the interaction plane at a beam block plane and configured to partially block the drive radiation beam; a beam shaper positioned upstream of the beam block plane at an object plane and configured to control a spatial distribution of the drive radiation beam; and at least one lens positioned upstream of the interaction plane and downstream of the beam block plane, wherein the lens being positioned such that an image of the spatial distribution of the drive radiation beam is formed at the interaction plane.
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公开(公告)号：US20220005665A1
公开(公告)日：2022-01-06
申请号：US17373766
申请日：2021-07-12
Applicant: ASML Netherlands B.V.
Inventor： Weiming REN , Xuedong LIU , Xuerang HU , Zhong-wei CHEN
IPC: H01J37/145
Abstract: The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unchanged when changing currents thereof, and thereby enabling the pre-beamlet-forming mechanism to cut off electrons not in use as much as possible. In this way, the multi-beam apparatus can observe a sample with high resolution and high throughput, and is competent as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry.
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公开(公告)号：US11216938B2
公开(公告)日：2022-01-04
申请号：US16554110
申请日：2019-08-28
Applicant: ASML Netherlands B.V.
Inventor： Lingling Pu , Wei Fang , Nan Zhao , Wentian Zhou , Teng Wang , Ming Xu
Abstract: Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.
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