摘要:
A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.
摘要:
A system for adjusting position of glass plates includes (1) a chain for conveying glass plates into a bending furnace, the chain having (a) alternate links, (b) connecting pins for holding the alternate links together, (c) extension pins extending from some of the connecting pins toward the corresponding glass plates; (2) supporting members fixed to the extension pins, for supporting the glass plates and for guiding the glass plates into the bending furnace; (3) a first image sensor unit for imaging actual positions of the extension pins; (4) a processor for computing a difference between the actual position of each extension pin and a reference position of each extension pin; and (5) a display device for displaying a command to adjust position of each extension pin, based on the difference, to make each extension pin take the reference position, thereby adjusting position of the glass plates.
摘要:
The invention relates to a process for synthesizing an ionic metal complex represented by the general formula (1) or (5). This process includes reacting in an organic solvent a compound (corresponding to ligand of the complex) represented by the general formula (2) or (6) with a halogen-containing compound represented by the general formula (3) or (4), in the presence of a reaction aid containing an element selected from the group consisting of elements of groups 1-4 and 11-14 of the periodic table. It is possible by this process to easily and efficiently synthesize the ionic metal complex, which can be used as a supporting electrolyte for electrochemical devices, a polymerization catalyst of polyolefins and so forth, or a catalyst for organic synthesis.
摘要:
The invention provides an adhesive for bonding together a first substrate made of a polyvinylidene fluoride resin and a second substrate. This adhesive includes an elastic fluorohydrocarbon resin, an acrylic resin, a polyvinylidene fluoride resin, a polyisocyanate, and an organic solvent. This elastic fluorohydrocarbon resin is obtained by graft copolymerization of a fluorine-containing copolymer with a vinylidene fluoride monomer. This copolymer is prepared by copolymerizing at least one first fluorine-containing monomer with at least one unsaturated monomer that has peroxy bond. The adhesive itself is superior in durability, and bond strength between the first and second substrates is also superior.
摘要:
The invention relates to a reflectance reducing silicon dioxide film formed on a glass substrate by the sol-gel process. To make the film minutely rough, at least two sols are respectively prepared from at least one compound selected from the group consisting of silicon alkoxides and silicon acetylacetonates, such that polymers of the sols have different average molecular weights. Then, the at least two sols are mixed with a solvent so as to prepare a coating solution. The coating solution is applied to the glass substrate so as to form a sol film on the glass substrate. The thus coated glass substrate is heated so as to transform the sol film into a gel film. The gel film which is minutely rough is satisfactory in reflectance reduction.
摘要:
The invention relates to heat treatment of a glass plate for strengthening only a peripheral region of the glass plate while annealing the major region. The glass plate is heated to a temperature of 550.degree.-650.degree. C. and placed on a ring-like holder which is maintained at a temperature lower than the temperature of the glass plate by 100.degree. to 600.degree. C. such that the peripheral region of the glass plate makes contact with a ring-like upper surface of the holder. Then glass palte on the ring-like holder is kept in an annealing chamber maintained at a temperature in the range from 50.degree. to 500.degree. C. and not higher than the initial temperature of the ring-like holder. After that the glass plate is allowed to cool down to room temperature. This method is applicable to either flat glass plates or curved glass plates and very suitable for treating glass plates ranging from 1.5 to 3.0 mm in thickness.