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公开(公告)号：US07248340B2
公开(公告)日：2007-07-24
申请号：US10874690
申请日：2004-06-24
Applicant: Erik Leonardus Ham , Robert Gabriël Maria Lansbergen , Ellart Alexander Meijer , Hendricus Johannes Maria Meijer , Hans Meiling , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Gert-Jan Heerens
Inventor： Erik Leonardus Ham , Robert Gabriël Maria Lansbergen , Ellart Alexander Meijer , Hendricus Johannes Maria Meijer , Hans Meiling , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Gert-Jan Heerens
CPC classification number: G03B27/52 , G03F7/70741
Abstract: A transport box for transporting a lithographic patterning device and a lithographic apparatus adapted to cooperate with the transport box are presented. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also includes a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box.
Abstract translation: 提出了用于传送平版印刷图案形成装置的传送箱和适于与传送箱配合的光刻设备。 输送箱设置有具有用于存储图案形成装置的存储位置的内部空间和用于传送图案形成装置的开口的容器部分。 该箱还包括用于封闭开口的封闭部分，以及用于将气体从箱体内部空间排出和/或送入箱体的内部空间的通道系统。
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公开(公告)号：US07199858B2
公开(公告)日：2007-04-03
申请号：US10705804
申请日：2003-11-12
Applicant: Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
Inventor： Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
Abstract translation: 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。
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公开(公告)号：US07151589B2
公开(公告)日：2006-12-19
申请号：US10972755
申请日：2004-10-26
Applicant: Erik Leonardus Ham , Gert-Jan Heerens , Robert Gabriël Maria Lansbergen , Ellard Alexander Meijer , Hendricus Johannes Maria Meijer , Hans Meiling , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors
Inventor： Erik Leonardus Ham , Gert-Jan Heerens , Robert Gabriël Maria Lansbergen , Ellard Alexander Meijer , Hendricus Johannes Maria Meijer , Hans Meiling , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors
CPC classification number: G03B27/52 , G03F7/70741
Abstract: According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.
Abstract translation: 根据实施例，用于传送平版印刷图案形成装置的盒被布置成与光刻设备配合。 运输箱可以设置有具有内部空间的容器部分，该内部空间具有用于存储图案形成装置的存储位置和用于图案形成装置的传送的开口。 在将图案形成装置从内部空间传送到装置之前，内部空间被加压。 箱子还可以包括用于关闭开口的封闭部分和/或用于将气体从箱体的内部空间排出和/或进气的通道系统。 其他实施例包括包括和/或配置为与这种盒配合的光刻设备。
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34.发明授权公开(公告)号：US07119886B2
公开(公告)日：2006-10-10
申请号：US10833340
申请日：2004-04-28
Applicant: Martinus Hendrikus Antonius Leenders , Hendricus Johannes Maria Meijer , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Theo Anjes Maria Ruijl
Inventor： Martinus Hendrikus Antonius Leenders , Hendricus Johannes Maria Meijer , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Theo Anjes Maria Ruijl
CPC classification number: G03F7/70258 , G03F7/7085
Abstract: In a lithographic projection apparatus, a measuring system configured to measure the position of the projection system relative to a reference frame includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table position. An angular encoder which sends light from a target down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system about its optical axis.
Abstract translation: 在光刻投影设备中，被配置为测量投影系统相对于参考框架的位置的测量系统包括相对于测量衬底台位置的测量系统的对应传感器刚性地安装的传感器。 使用角度编码器，其从目标向下发射具有相对于倾斜的灵敏度的两个光路的光，以测量投影系统绕其光轴的旋转。
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公开(公告)号：US20140071420A1
公开(公告)日：2014-03-13
申请号：US13903885
申请日：2013-05-28
Applicant: Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
Inventor： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162
Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
Abstract translation: 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF2的双组分最终光学元件。
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Patent Agency Ranking
公开(公告)号：US20130250270A1
公开(公告)日：2013-09-26
申请号：US13615190
申请日：2012-09-13
Applicant: Joeri LOF , Erik Theodorus Maria BIJLAART , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Antonius Theodorus Anna Maria DERKSEN
Inventor： Joeri LOF , Erik Theodorus Maria BIJLAART , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Antonius Theodorus Anna Maria DERKSEN
IPC: G03F7/20
CPC classification number: G03F7/70858 , G03F7/70341 , G03F7/70716 , G03F7/70775 , G03F7/7085
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Abstract translation: 公开了一种光刻投影装置，其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体，以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
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公开(公告)号：US08344341B2
公开(公告)日：2013-01-01
申请号：US12853030
申请日：2010-08-09
Applicant: Joeri Lof , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
Inventor： Joeri Lof , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7003 , G03F9/7034 , G03F9/7088
Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
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公开(公告)号：US20110170077A1
公开(公告)日：2011-07-14
申请号：US12850472
申请日：2010-08-04
Applicant: Joeri LOF , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
Inventor： Joeri LOF , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC: G03B27/52
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
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39.发明申请Lithographic Apparatus and Method of Manufacturing an Electrostatic Clamp for a Lithographic Apparatus 有权平版印刷设备和制造用于平版印刷设备的静电夹具的方法公开(公告)号：US20110126406A1
公开(公告)日：2011-06-02
申请号：US13020399
申请日：2011-02-03
Applicant: Hubert Adriaan VAN MIERLO , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
Inventor： Hubert Adriaan VAN MIERLO , Erik Leonardus Ham , Hendricus Johannes Maria Meijer , Hendrik Antony Johannes Neerhof , Joost Jeroen Ottens , Johannes Adrianus Petrus Leijtens , Marco Le Kluse , Jan Hopman , Johannes Hubertus Josephina Moors
IPC: H01B13/00
CPC classification number: H01L21/6831 , G03F7/70708 , Y10T29/49117
Abstract: The invention relates to a method of manufacturing an electrostatic clamp configured to electrostatically clamp an article to an article support in a lithographic apparatus. The method includes providing a first layer of material, etching a recess in the first layer of material, and disposing an electrode in the recess of the first layer of material.
Abstract translation: 本发明涉及一种制造静电夹具的方法，所述静电夹具被配置为将制品静电地夹持在光刻设备中的制品支撑件上。 该方法包括提供第一层材料，蚀刻第一层材料中的凹槽，以及将电极设置在第一层材料的凹槽中。
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公开(公告)号：US20110027721A1
公开(公告)日：2011-02-03
申请号：US12853030
申请日：2010-08-09
Applicant: JOERI LOF , JOANNES THEODOOR DE SMIT , ROELOF AEILKO SIEBRAND RITSEMA , KLAUS SIMON , THEODORUS MARINUS MODDERMAN , JOHANNES CATHARINUS HUBERTUS MULKENS , HENDRICUS JOHANNES MARIA MEIJER , ERIK ROELOF LOOPSTRA
Inventor： JOERI LOF , JOANNES THEODOOR DE SMIT , ROELOF AEILKO SIEBRAND RITSEMA , KLAUS SIMON , THEODORUS MARINUS MODDERMAN , JOHANNES CATHARINUS HUBERTUS MULKENS , HENDRICUS JOHANNES MARIA MEIJER , ERIK ROELOF LOOPSTRA
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7003 , G03F9/7034 , G03F9/7088
Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
Abstract translation: 在测量站产生衬底表面的图。 然后将衬底移动到投影透镜和衬底之间的空间被液体填充到的位置。 然后使用例如透射图像传感器对衬底进行对准，并且使用先前的映射可以准确地暴露衬底。 因此，映射不会发生在液体环境中。
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