Abstract:
An organic luminescence device is constituted by an organic luminescence lamination structure comprising a pair of an anode and a cathode, and at least one organic compound layer disposed between the anode and the cathode, a hermetic sealing housing enclosing therein the organic luminescence lamination structure and blocking external air, and a drying agent disposed within the hermetic sealing housing. The drying agent comprises a compound represented by the following formula (1): R—NCO (1), wherein R denotes a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted styryl group, a substituted or unsubstituted acyl group, or a substituted or unsubstituted heterocyclic group. The drying agent comprises the compound of the formula (1) in a polymerized form.
Abstract:
In a manufacturing technology for forming a thin film transistor comprising a laser irradiation step, objects of the present invention are to obtain a high performance and multifunction semiconductor manufacturing apparatus and thin film transistor manufacturing method. A silicon thin film 201 is formed on a glass substrate 202, and laser 203 is irradiated onto this thin film 201 whereby a re-crystallization film is obtained. This re-crystallization film undergoes a hydrogen plasma processing so that dangling-bonds of silicon are terminated. Moreover, a step for forming a silicon dioxide film 205 on the re-crystallization film is included. These steps are performed under the conditions that the glass substrate 202 is not exposed to the air and a processing temperature is 350° C. or less.
Abstract:
An organic luminescent element includes a substrate, an anode, a cathode, at least one organic material layer interposed between the anode and the cathode, and a sealing film containing a ferroelectric material provided on the anode or the cathode on the organic material layer. Preferably, the organic luminescent element further includes a counter electrode provided on the sealing film. Preferably, the substrate is transparent, and the anode is composed of indium tin oxide.
Abstract:
A silicon oxide film has a ratio of A1 to A2 which is not higher than 0.21, where A1 is a first peak integrated intensity of a first peak belonging to Si—OH and appearing in the vicinity of a wave-number of 970 cm−1, and A2 is a second peak integrated intensity of a second peak belonging to O—Si—O and appearing in the vicinity of a wave-number 820 cm−1, and each of the first and second peak integrated intensities is defined as a product of peak width at half height and a peak height of a Raman spectrum obtained by a Raman scattering spectroscopic analysis of the silicon oxide film. The silicon oxide film is deposited under a condition that a ratio of a first flow rate Fo of oxygen gas to a second flow rate Fsi of a silicon source gas is not lower than 20.
Abstract:
A method and device for irradiating a pulse laser beam having a linear shape and a rectangular shape beam spot onto a non-single crystal semiconductor thin film. The method includes scanning the pulse laser beam so that previous and next beam spots are partially overlapped. The laser beam has a profile which includes: a first beam profile region having a first energy density which is lower than a micro-crystallization threshold value Ea of an amorphous semiconductor for forming a polycrystallization region; a second beam profile region having a second energy density which is not lower than the micro-crystallization threshold value Ea and is lower than a micro-crystallization threshold value Ep of a polycrystalline semiconductor for forming a first micro-polycrystallization region from an amorphous semiconductor region; and a third beam profile region having a third energy density which is not lower than the micro-crystallization threshold value Ep for forming a second micro-polycrystallization region from a polycrystalline semiconductor region.
Abstract:
In a thin film transistor, a first insulating film on a silicon layer formed in an island on a substrate is smaller in thickness than the silicon layer so that the stepped island edges is gentle in slope to facilitate covering the island with a second insulating film. This reduces occurrence of gate leak considerably. Since the peripheral region of the stepped island is smaller in thickness than the central region above the channel, it is possible to minimize occurrence of gate electrode breakage. The silicon layer contains two or more inert gas atoms, and the atoms smaller in mass number (e.g., He) are contained in and near an interface with a silicon active layer while the atoms larger in mass number (e.g., Ar) than those smaller in mass number are contained in and near a second interface with a gate electrode.
Abstract:
A process for the production of yogurt powder possessing an immunological activity, in which yogurt is heated at 60.degree. to 100.degree. C. and it is provided with an alkaline agent to adjust the yogurt to pH 7.0 to 96, and thereafter dried to a powder. Before powdering, the yogurt may be subjected either to the addition of a non-ionic surfactant or to high pressure homogenizing treatment. Yogurt retaining immunological activity can be used effectively as food and feed.
Abstract:
A method of making a catalytic converter for an automotive internal combustion engine comprises a cylindrical honeycomb catalyst carrier made of a ceramic and carrying a catalytic material. The catalyst carrier is encased within a cylindrical container upon being axially supported at its opposite end faces between oppositely disposed annular metal caps through cushioning materials. The metal caps are fixedly secured to the inner peripheral surface of the container by plug welding. In production of the catalytic converter, the plug welding is made in a state in which the metal caps are being biased to the catalyst carrier at a predetermined pressure by a pair of pressing jigs which respectively abut the metal caps.
Abstract:
A ceiling material for vehicles, said ceiling material comprises:a core material (11) composed of a resin foamed article;a protective layer (12) comprising a thermoplastic resin blended with fibers in a range of not less than 40% and not more than 80% in volume content;said protective layer (12) being provided on at least one surface of the core material (11);and a thin sheet-shaped surface material (14) provided on the surface of the protective layer (12).A process of producing ceiling materials for vehicles, which comprises the steps of:a material sheet of a protective layer comprising a thermoplastic resin blended with fibers in a range of not less than 40% and not more than 80% in volume content being heated to not less than a glass transition point of the thermoplastic resin;said material sheet being overlaid with a core material sheet composed of a resin foamed article;a surface material being on the core material sheet;and pressuring and shaping said protective layer, said core material sheet, and said surface material which have been overlaid using a molding mold.
Abstract:
An image forming apparatus which uses a liquid developer to produce a visible image from an image carrier is provided with a movable cleaning unit. This movable cleaning unit is moved in and out of contact with the image carrier. A tank stores the liquid developer which is fed to both the developing unit and to the cleaning unit and is provided with a mechanism for feeding the developing unit and the cleaning unit with the liquid developer which is so stored.