Organic luminescence device
    31.
    发明授权
    Organic luminescence device 失效
    有机发光装置

    公开(公告)号:US06740430B2

    公开(公告)日:2004-05-25

    申请号:US10033962

    申请日:2002-01-03

    Abstract: An organic luminescence device is constituted by an organic luminescence lamination structure comprising a pair of an anode and a cathode, and at least one organic compound layer disposed between the anode and the cathode, a hermetic sealing housing enclosing therein the organic luminescence lamination structure and blocking external air, and a drying agent disposed within the hermetic sealing housing. The drying agent comprises a compound represented by the following formula (1): R—NCO  (1), wherein R denotes a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted styryl group, a substituted or unsubstituted acyl group, or a substituted or unsubstituted heterocyclic group. The drying agent comprises the compound of the formula (1) in a polymerized form.

    Abstract translation: 有机发光装置由包括一对阳极和阴极的有机发光层叠结构和设置在阳极和阴极之间的至少一个有机化合物层构成,气密密封壳体包围有机发光层叠结构和封闭 外部空气和设置在气密密封壳体内的干燥剂。 干燥剂包含由下式(1)表示的化合物:其中R表示取代或未取代的烯基,取代或未取代的芳基,取代或未取代的苯乙烯基,取代或未取代的酰基,或取代或未取代的酰基, 未取代的杂环基。 干燥剂包含聚合形式的式(1)化合物。

    Semiconductor manufacturing apparatus and manufacturing method for thin film semiconductor device
    32.
    发明授权
    Semiconductor manufacturing apparatus and manufacturing method for thin film semiconductor device 失效
    半导体制造装置及薄膜半导体装置的制造方法

    公开(公告)号:US06657154B1

    公开(公告)日:2003-12-02

    申请号:US08866331

    申请日:1997-05-30

    Abstract: In a manufacturing technology for forming a thin film transistor comprising a laser irradiation step, objects of the present invention are to obtain a high performance and multifunction semiconductor manufacturing apparatus and thin film transistor manufacturing method. A silicon thin film 201 is formed on a glass substrate 202, and laser 203 is irradiated onto this thin film 201 whereby a re-crystallization film is obtained. This re-crystallization film undergoes a hydrogen plasma processing so that dangling-bonds of silicon are terminated. Moreover, a step for forming a silicon dioxide film 205 on the re-crystallization film is included. These steps are performed under the conditions that the glass substrate 202 is not exposed to the air and a processing temperature is 350° C. or less.

    Abstract translation: 在用于形成包括激光照射步骤的薄膜晶体管的制造技术中,本发明的目的是获得高性能和多功能半导体制造装置和薄膜晶体管制造方法。 在玻璃基板202上形成硅薄膜201,将激光203照射在该薄膜201上,由此得到再结晶膜。 该再结晶膜经受氢等离子体处理,以使硅的悬挂键终止。 此外,包括在再结晶膜上形成二氧化硅膜205的步骤。 这些步骤是在玻璃基板202不暴露于空气和处理温度为350℃以下的条件下进行的。

    Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film
    34.
    发明授权
    Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film 有权
    氧化硅膜,形成氧化硅膜的方法和用于沉积氧化硅膜的装置

    公开(公告)号:US06444327B1

    公开(公告)日:2002-09-03

    申请号:US09556427

    申请日:2000-04-24

    CPC classification number: C23C16/5096 C23C16/402

    Abstract: A silicon oxide film has a ratio of A1 to A2 which is not higher than 0.21, where A1 is a first peak integrated intensity of a first peak belonging to Si—OH and appearing in the vicinity of a wave-number of 970 cm−1, and A2 is a second peak integrated intensity of a second peak belonging to O—Si—O and appearing in the vicinity of a wave-number 820 cm−1, and each of the first and second peak integrated intensities is defined as a product of peak width at half height and a peak height of a Raman spectrum obtained by a Raman scattering spectroscopic analysis of the silicon oxide film. The silicon oxide film is deposited under a condition that a ratio of a first flow rate Fo of oxygen gas to a second flow rate Fsi of a silicon source gas is not lower than 20.

    Abstract translation: 氧化硅膜的Al与A2的比率不高于0.21,其中A1是属于Si-OH的第一峰的第一峰积分强度,并且出现在970cm -1的波数附近 A2是属于O-Si-O的第二峰的第二峰积分强度,出现在波数820cm -1附近,第一和第二峰积分强度中的每一个被定义为产物 通过氧化硅膜的拉曼散射光谱分析获得的半高峰宽度和拉曼光谱的峰高。 在氧气的第一流量Fo与硅源气体的第二流量Fsi的比率不低于20的条件下沉积氧化硅膜。

    Method and apparatus for irradiation of a pulse laser beam
    35.
    发明授权
    Method and apparatus for irradiation of a pulse laser beam 有权
    用于照射脉冲激光束的方法和装置

    公开(公告)号:US06372039B1

    公开(公告)日:2002-04-16

    申请号:US09273489

    申请日:1999-03-22

    Abstract: A method and device for irradiating a pulse laser beam having a linear shape and a rectangular shape beam spot onto a non-single crystal semiconductor thin film. The method includes scanning the pulse laser beam so that previous and next beam spots are partially overlapped. The laser beam has a profile which includes: a first beam profile region having a first energy density which is lower than a micro-crystallization threshold value Ea of an amorphous semiconductor for forming a polycrystallization region; a second beam profile region having a second energy density which is not lower than the micro-crystallization threshold value Ea and is lower than a micro-crystallization threshold value Ep of a polycrystalline semiconductor for forming a first micro-polycrystallization region from an amorphous semiconductor region; and a third beam profile region having a third energy density which is not lower than the micro-crystallization threshold value Ep for forming a second micro-polycrystallization region from a polycrystalline semiconductor region.

    Abstract translation: 一种用于将具有线性形状和矩形形状的光斑的脉冲激光束照射到非单晶半导体薄膜上的方法和装置。 该方法包括扫描脉冲激光束,使得前一个和下一个光束点部分重叠。 激光束具有轮廓,该轮廓包括:具有低于用于形成多晶化区域的非晶半导体的微结晶阈值Ea的第一能量密度的第一光束轮廓区域; 第二光束轮廓区域,其具有不低于微结晶阈值Ea的第二能量密度,并且低于用于从非晶半导体区域形成第一微多晶结晶区域的多晶半导体的微结晶阈值Ep ; 以及具有不低于用于形成来自多晶半导体区域的第二微多晶结晶区域的微结晶阈值Ep的第三能量密度的第三光束轮廓区域。

    Thin film transistor
    36.
    发明授权
    Thin film transistor 失效
    薄膜晶体管

    公开(公告)号:US05998838A

    公开(公告)日:1999-12-07

    申请号:US33609

    申请日:1998-03-03

    Abstract: In a thin film transistor, a first insulating film on a silicon layer formed in an island on a substrate is smaller in thickness than the silicon layer so that the stepped island edges is gentle in slope to facilitate covering the island with a second insulating film. This reduces occurrence of gate leak considerably. Since the peripheral region of the stepped island is smaller in thickness than the central region above the channel, it is possible to minimize occurrence of gate electrode breakage. The silicon layer contains two or more inert gas atoms, and the atoms smaller in mass number (e.g., He) are contained in and near an interface with a silicon active layer while the atoms larger in mass number (e.g., Ar) than those smaller in mass number are contained in and near a second interface with a gate electrode.

    Abstract translation: 在薄膜晶体管中,形成在基板上的岛上的硅层上的第一绝缘膜的厚度比硅层的厚度小,使得台阶状的岛边缘倾斜平缓以便于用第二绝缘膜覆盖岛。 这可以大大减少闸门泄漏的发生。 由于阶梯状岛的周边区域的厚度比通道上方的中心区域的厚度小,所以能够最小化栅电极断裂的发生。 硅层含有两个或更多个惰性气体原子,质量数较小的原子(例如,He)包含在与硅有源层的界面中和附近,而质量数(例如Ar)的原子比较小 质量数量被包含在与栅电极的第二界面中和附近。

    Method of producing a catalytic converter
    38.
    发明授权
    Method of producing a catalytic converter 失效
    生产催化转化器的方法

    公开(公告)号:US5555621A

    公开(公告)日:1996-09-17

    申请号:US270827

    申请日:1994-07-05

    Abstract: A method of making a catalytic converter for an automotive internal combustion engine comprises a cylindrical honeycomb catalyst carrier made of a ceramic and carrying a catalytic material. The catalyst carrier is encased within a cylindrical container upon being axially supported at its opposite end faces between oppositely disposed annular metal caps through cushioning materials. The metal caps are fixedly secured to the inner peripheral surface of the container by plug welding. In production of the catalytic converter, the plug welding is made in a state in which the metal caps are being biased to the catalyst carrier at a predetermined pressure by a pair of pressing jigs which respectively abut the metal caps.

    Abstract translation: 制造用于汽车内燃机的催化转化器的方法包括由陶瓷制成并承载催化材料的圆柱形蜂窝催化剂载体。 当催化剂载体通过缓冲材料轴向地支撑在相对设置的环形金属盖之间的相对端面处时,将催化剂载体封装在圆柱形容器内。 金属盖通过插头焊接固定在容器的内周面上。 在催化转化器的制造中,通过一对分别抵靠金属盖的加压夹具,以预定的压力将金属盖偏压到催化剂载体的状态下进行塞子焊接。

    Ceiling material for vehicles and production process thereof
    39.
    发明授权
    Ceiling material for vehicles and production process thereof 失效
    车辆天花板材及其生产工艺

    公开(公告)号:US5494737A

    公开(公告)日:1996-02-27

    申请号:US171439

    申请日:1993-12-22

    Abstract: A ceiling material for vehicles, said ceiling material comprises:a core material (11) composed of a resin foamed article;a protective layer (12) comprising a thermoplastic resin blended with fibers in a range of not less than 40% and not more than 80% in volume content;said protective layer (12) being provided on at least one surface of the core material (11);and a thin sheet-shaped surface material (14) provided on the surface of the protective layer (12).A process of producing ceiling materials for vehicles, which comprises the steps of:a material sheet of a protective layer comprising a thermoplastic resin blended with fibers in a range of not less than 40% and not more than 80% in volume content being heated to not less than a glass transition point of the thermoplastic resin;said material sheet being overlaid with a core material sheet composed of a resin foamed article;a surface material being on the core material sheet;and pressuring and shaping said protective layer, said core material sheet, and said surface material which have been overlaid using a molding mold.

    Abstract translation: 一种用于车辆的天花板材料,所述天花板材料包括:由树脂发泡制品构成的芯材料(11); 保护层(12),其包含与纤维混合的热塑性树脂,所述纤维的体积含量为不小于40%且不大于80%的范围; 所述保护层(12)设置在所述芯材料(11)的至少一个表面上; 以及设置在保护层(12)的表面上的薄片状表面材料(14)。 一种生产车辆用顶棚材料的方法,包括以下步骤:将包含热塑性树脂的保护层的材料片与不同于40重量%且不大于80体积%的纤维混合加热至 不低于热塑性树脂的玻璃化转变点; 所述材料片与由树脂发泡制品构成的芯材片材重叠; 表面材料在芯材片上; 并且使用模制模具将所述保护层,所述芯材片和所述表面材料加压和成型。

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