Abstract:
A device for compensating a semiconductor memory defect, suitable for use in a semiconductor memory, is provided. The device includes a memory array, having at least a defectless sub-memory region, the memory array being coupled to an address decoder circuit and a sensing circuit for storing data. A selection circuit is coupled to a control unit and outputs a selection signal to the control unit. A first input address buffer is coupled to the control unit and the address decoder circuit, and outputs an address signal to the address decoder circuit in response to the selection signal for selecting the defectless sub-memory region to store data. A method for compensating a semiconductor memory defect is also provided, including determining whether the memory region of the semiconductor memory has a defect; and replacing the memory region with the defectless sub-memory region to store data when the semiconductor memory is defective.
Abstract:
A circuit board contained in a circuit board holder forms a server blade that fits into a bay of a server blade enclosure. The circuit board permits standard electrical components to fit within the cross-sectional width of the server blade. The server blade in cross section may be generally triangular, L-shaped or another type of polygon that permits placement of tall components that otherwise would not fit in a generally rectangular server blade.
Abstract:
A mist sprayer includes a base, a pump, a pressure storage member, a circuit board, a mounting tube, an injection unit, a decorative shade, a mounting seat, a guide unit, a bottle, and a plug. Thus, the liquid is mixed with and atomized by the pressurized gas and the misted gas hits the striking face of the guide unit to multiple misted molecules, thereby enhancing and optimizing the atomized effect of the liquid.
Abstract:
A split-gate flash memory cell having improved programming and erasing speed with a tilted trench source, and also a method of forming the same are provided. This is accomplished by forming two floating gates and their respective control gates sharing a common source region. A trench is formed in the source region and the walls are sloped to have a tilt. A source implant is performed at a tilt angle and the trench is lined with a gate oxide layer. Subsequently, a lateral diffusion of the source implant is performed followed by thermal cycling. The lateral enlargement of the diffused source is found to increase the coupling ratio of the split-gate flash memory cell substantially.
Abstract:
The present invention is directed to a coating composition particularly useful as a clear coating applied over a pigmented base coating, wherein the clear coating has improved resistance to marring and to acid etching when exposed to natural weathering conditions. The clear coating is particularly useful as an automotive OEM clear coating or as a refinish clear coating. The coating has two components. Component A of the coating composition includes a melamine and an acrylosilane polymer of a polymerized monomers mixture, which includes an alkyl methacrylate, an alkyl acrylate, cycloaliphatic alkyl methacrylate, cycloaliphatic alkyl acrylate, styrene or any mixture of these monomers; hydroxy alkyl methacrylate, hydroxy alkyl acrylate or any mixtures of these monomers; and a mono-ethylenically unsaturated silane monomer. Component B of the composition includes an organic polyisocyanate as a crosslinking agent.
Abstract:
A stable, high-value polysilicon resistor is achieved by using a silicide layer that prevents diffusion of hydrogen into the resistor. The resistor can also be integrated into a salicide process for making FETs without increasing process complexity. A polysilicon layer with a cap oxide is patterned to form FET gate electrodes and the polysilicon resistor. The lightly doped source/drains, insulating sidewall spacers, and source/drain contacts are formed for the FETs. The cap oxide is patterned to expose one end of the resistor, and the cap oxide is removed from the gate electrodes. A refractory metal is deposited and annealed to form the salicide FETs and concurrently to form a silicide on the end of the resistor. The unreacted metal is etched. An interlevel dielectric layer is deposited and contact holes with metal plugs are formed to both ends of the resistor. A metal is deposited to form the first level of metal interconnections, which also provides contacts to both ends of the resistor. The metal is also patterned to form a metal shield over the resistor to prevent hydrogen diffusion into the resistor. In this invention the spacing between the metal portions contacting the ends of the resistor is aligned over the silicide on the resistor to provide 100% shielding from hydrogen diffusion into the resistor.
Abstract:
A case for an eyewear device includes a body defining an opening leading to a storage chamber that is sized for retaining the eyewear device. A cover depends from the body and is movable between an open position, in which the opening is exposed, and a closed position, in which the opening is covered by the cover. A battery is mounted to the body for charging the eyewear device. A detector is positioned on either the body or the cover for detecting when the cover is in the open position or the closed position. A display displays a charge state of the battery when the cover is in the open position.
Abstract:
A polymer matrix composite containing graphene sheets homogeneously dispersed in a polymer matrix wherein the polymer matrix composite exhibits a percolation threshold from 0.0001% to 0.1% by volume of graphene sheets to form a 3D network of interconnected graphene sheets or network of electron-conducting pathways.
Abstract:
A process for producing a highly oriented graphene oxide (GO) film, comprising: (a) preparing either a GO dispersion having GO sheets dispersed in a fluid medium or a GO gel having GO molecules dissolved in a fluid medium; (b) dispensing the GO dispersion or gel onto a surface of an application roller rotating in a first direction to form an applicator layer of GO and transferring the applicator layer to a surface of a supporting film driven in a second direction opposite to the first direction to form a wet layer of GO on the supporting film; and (c) removing said fluid medium from the wet layer of GO to form a dried layer of GO having an inter-planar spacing d002 of 0.4 nm to 1.2 nm and an oxygen content no less than 5% by weight. This dried GO layer may be heat-treated to produce a graphitic film.
Abstract:
A process for producing a transparent conductive film, comprising (a) providing a graphene oxide gel; (b) dispersing metal nanowires in the graphene oxide gel to form a suspension; (c) dispensing and depositing the suspension onto a substrate; and (d) removing the liquid medium to form the film. The film is composed of metal nanowires and graphene oxide with a metal nanowire-to-graphene oxide weight ratio from 1/99 to 99/1, wherein the metal nanowires contain no surface-borne metal oxide or metal compound and the film exhibits an optical transparence no less than 80% and sheet resistance no higher than 300 ohm/square. This film can be used as a transparent conductive electrode in an electro-optic device, such as a photovoltaic or solar cell, light-emitting diode, photo-detector, touch screen, electro-wetting display, liquid crystal display, plasma display, LED display, a TV screen, a computer screen, or a mobile phone screen.