公开(公告)号：US20090246966A1

公开(公告)日：2009-10-01

申请号：US12217782

申请日：2008-07-09

Applicant: Nam-Myun Cho ,  Myeong-Cheol Kim ,  Shi-Yong Yi ,  Young-Hoon Song ,  Young-Ju Park

Inventor： Nam-Myun Cho ,  Myeong-Cheol Kim ,  Shi-Yong Yi ,  Young-Hoon Song ,  Young-Ju Park

IPC: H01L21/308

CPC classification number: H01L21/02118 ,  H01L21/02282 ,  H01L21/0337 ,  H01L21/3086 ,  H01L21/31058 ,  H01L21/312 ,  H01L21/32139 ,  H01L27/105 ,  H01L27/1052

Abstract: For integrated circuit fabrication, at least one spacer support structure is formed in a first area over a semiconductor substrate, and a mask material is deposited on exposed surfaces of the spacer support structure and on a second area over the semiconductor substrate. A masking structure is formed on a portion of the mask material in the second area, and the mask material is patterned to form spacers on sidewalls of the spacer support structure and to form a mask pattern under the masking structure. The spacer support structure and the masking structure are comprised of respective high carbon content materials that have been spin-coated and have substantially a same etch selectivity.

Abstract translation: 对于集成电路制造，在半导体衬底上的第一区域中形成至少一个间隔件支撑结构，并且掩模材料沉积在间隔件支撑结构的暴露表面上并在半导体衬底上的第二区域上。 在第二区域中的掩模材料的一部分上形成掩模结构，并且掩模材料被图案化以在间隔物支撑结构的侧壁上形成间隔物，并在掩模结构下方形成掩模图案。 间隔物支撑结构和掩蔽结构由已经旋涂并具有基本上相同蚀刻选择性的相应的高碳含量材料构成。

公开(公告)号：US20060115772A1

公开(公告)日：2006-06-01

申请号：US11282368

申请日：2005-11-18

Applicant: Jung-Hwan Hah ,  Yool Kang ,  Man-Hyoung Ryoo ,  Shi-Yong Yi ,  Sang-Gyun Woo

Inventor： Jung-Hwan Hah ,  Yool Kang ,  Man-Hyoung Ryoo ,  Shi-Yong Yi ,  Sang-Gyun Woo

IPC: G03C5/00

CPC classification number: G03F7/091 ,  C08G61/02

Abstract: The present invention provides polymeric films including polymers having an sp3 carbon main frame including a tetrahedral center atom. Methods of forming the same, hard marks including the same and methods of forming fine patterns using the same are also provided.

Abstract translation: 本发明提供了聚合物膜，其包括具有包含四面体中心原子的sp 3 O 3碳主框的聚合物。 还提供了形成它们的方法，包括其的硬标记和使用其形成精细图案的方法。

公开(公告)号：US20050176607A1

公开(公告)日：2005-08-11

申请号：US11049751

申请日：2005-02-04

Applicant: Seung-Hyun Ahn ,  Eun-Mi Bae ,  Baik-Soon Choi ,  Sang-Mun Chon ,  Dae-Joung Kim ,  Kwang-Sub Yoon ,  Sang-Kyu Park ,  Jae-Ho Kim ,  Shi-Yong Yi ,  Kyoung-Mi Kim ,  Yeu-Young Youn

Inventor： Seung-Hyun Ahn ,  Eun-Mi Bae ,  Baik-Soon Choi ,  Sang-Mun Chon ,  Dae-Joung Kim ,  Kwang-Sub Yoon ,  Sang-Kyu Park ,  Jae-Ho Kim ,  Shi-Yong Yi ,  Kyoung-Mi Kim ,  Yeu-Young Youn

IPC: G03F7/42 ,  C09D9/00 ,  C09D9/04 ,  C11D1/00 ,  C11D7/26 ,  C11D11/00 ,  G03F7/38 ,  H01L21/027 ,  H01L21/304

CPC classification number: C11D7/266 ,  C11D11/0047

Abstract: A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.

Abstract translation: 较薄的组合物包括丙二醇醚乙酸酯，2-羟基-2-甲基丙酸甲酯和酯化合物如乳酸乙酯，3-乙氧基丙酸乙酯或它们的混合物。