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    HOLDING JIG, MEASUREMENT DEVICE AND HOLDING DEVICE USING THE SAME
    33.
    发明申请
    HOLDING JIG, MEASUREMENT DEVICE AND HOLDING DEVICE USING THE SAME 有权
    保持夹具，测量装置和使用其的保持装置

    公开(公告)号：US20100244345A1

    公开(公告)日：2010-09-30

    申请号：US12722023

    申请日：2010-03-11

    Applicant: Toshihiro HIRAKAWA ,  Satoshi Sakashita ,  Shinji Ishida ,  Hiroyuki Nagaoka

    Inventor： Toshihiro HIRAKAWA ,  Satoshi Sakashita ,  Shinji Ishida ,  Hiroyuki Nagaoka

    IPC: B25B11/00 ,  G01L7/00

    CPC classification number: B25B1/18 ,  B25B1/20 ,  B25B1/241 ,  B25B1/2415 ,  B25B1/2473 ,  B25B5/08 ,  B25B5/087 ,  B25B5/147 ,  B25B5/163

    Abstract: A holding jig includes, in a case where a tilt angle with respect to a plane as a holding surface of a holding target is defined as a holding tilt angle: a first holding portion having a holding tilt face with the holding tilt angle; a second holding portion connected to the first holding portion so as to slide toward the holding tilt face along a plane substantially parallel to the holding surface; and an elastic holding portion provided at a position of the second holding portion facing the holding tilt face and elastically deformed toward the holding surface by the holding tilt face while abutting on the holding tilt face, when the second holding portion slides toward the holding tilt face, to press and hold the holding target.

    Abstract translation: 保持夹具包括在相对于作为保持目标的保持表面的平面的倾斜角被定义为保持倾斜角度的情况下：具有保持倾斜面的第一保持部分具有保持倾斜角; 第二保持部，其连接到所述第一保持部，以沿着与所述保持面大致平行的平面朝向所述保持倾斜面滑动; 以及弹性保持部，其设置在所述第二保持部的与所述保持倾斜面对置的位置，并且当所述第二保持部朝向所述保持倾斜面滑动时，由所述保持倾斜面朝向所述保持面弹性变形 ，按住持有目标。

    Tube clamp device and tube connection device
    34.
    发明申请
    Tube clamp device and tube connection device 有权
    管夹装置和管连接装置

    公开(公告)号：US20060145105A1

    公开(公告)日：2006-07-06

    申请号：US10562829

    申请日：2004-06-02

    Applicant: Shinji Ishida ,  Satoshi Yamanushi

    Inventor： Shinji Ishida ,  Satoshi Yamanushi

    IPC: F16K7/04

    CPC classification number: B29C65/7802 ,  A61M1/14 ,  A61M39/146 ,  B29C65/2046 ,  B29C65/2076 ,  B29C65/7841 ,  B29C66/1142 ,  B29C66/5221 ,  B29C66/71 ,  B29C66/7373 ,  B29C66/8167 ,  B29C66/818 ,  B29C66/857 ,  B29C66/91213 ,  B29C66/91231 ,  B29C66/91421 ,  B29C66/91431 ,  B29C66/91651 ,  B29C66/961 ,  B29L2023/007 ,  B29K2027/06

    Abstract: A tube clamp apparatus and a tube connecting apparatus having high durability and improved operability when an operator locks these apparatuses are provided. A tube connecting apparatus comprises a first clamp and a second clamp, each pressing to hold two flexible tubes 8, 9. The tubes are placed at a lower jaw portion of the second clamp and pressed to a flat state by pressing force applied thereto a direction of an arrow A. A hook section 310 having hook portions divided into plural pieces is set up at an upper jaw portion of the second clamp, and the hook portion B 312 is made of a POM elastic member having, on one side thereof, a protruded portion 314 protruded from other adjacent hook portions. When pressing force is applied to the upper jaw portion, the hook portion B 312 protruded from the other adjacent hook portions is elastically deformed and engaged with a POM-made roller B 317 to prevent back-tracking of the hook section 310.

    Abstract translation: 提供了当操作者锁定这些装置时，具有高耐用性和改进的可操作性的管夹装置和管连接装置。 管连接装置包括第一夹具和第二夹具，每个夹持件夹持两个柔性管8,9。 管被放置在第二夹具的下颚部，并且通过施加到箭头A的方向的按压力而被压到平坦状态。具有分成多个部分的钩部的钩部310被设置在上颚部 并且钩部B 312由POM弹性构件制成，其一侧具有从其它相邻的钩部突出的突出部314。 当对上颚部施加按压力时，从其他相邻的钩部突出的钩部B 312弹性变形并与POM制造的辊B 317接合，以防止钩部310的反向跟踪。

    Flow control valve for engine cooling water
    35.
    发明申请
    Flow control valve for engine cooling water 审中-公开
    发动机冷却水流量控制阀

    公开(公告)号：US20060005789A1

    公开(公告)日：2006-01-12

    申请号：US11178482

    申请日：2005-07-12

    Applicant: Yuichiro Miura ,  Shinji Ishida ,  Akira Furukawa ,  Douji Imai

    Inventor： Yuichiro Miura ,  Shinji Ishida ,  Akira Furukawa ,  Douji Imai

    IPC: F01P7/14

    CPC classification number: F01P7/16 ,  F01P2007/146 ,  F01P2070/08

    Abstract: A flow control valve comprises a first valve for controlling a radiator flow amount and a second valve for controlling a bypass flow amount. Pressure adjusting passages are respectively provided for the first and second valves for communicating spaces formed at both sides of the respective valves to equalize fluid pressures at both sides, so that a pressure load in an axial direction to the respective valves can be eliminated. As a result, a driving force of an actuator of the flow control valve for directly or indirectly driving the first and second valves can be reduced.

    Abstract translation: 流量控制阀包括用于控制散热器流量的第一阀和用于控制旁路流量的第二阀。 分别设置用于第一和第二阀的压力调节通道，用于形成在各个阀的两侧的连通空间，以均衡两侧的流体压力，从而可以消除在各个阀的轴向上的压力负荷。 结果，可以减少用于直接或间接驱动第一和第二阀的流量控制阀的致动器的驱动力。

    Photomask used for projection exposure with phase shifted auxiliary pattern
    38.
    发明授权
    Photomask used for projection exposure with phase shifted auxiliary pattern 失效
    用于具有相移辅助图案的投影曝光的光掩模

    公开(公告)号：US6004699A

    公开(公告)日：1999-12-21

    申请号：US31107

    申请日：1998-02-26

    Applicant: Tadao Yasuzato ,  Shinji Ishida

    Inventor： Tadao Yasuzato ,  Shinji Ishida

    IPC: G03F1/29 ,  G03F1/32 ,  G03F1/36 ,  G03F1/68 ,  G03F1/70 ,  G03F9/00

    CPC classification number: G03F1/30 ,  G03F1/36 ,  G03F1/32

    Abstract: A photomask used for a projection exposure equipment comprises a transparent substrate and a light intercepting film provided on the transparent substrate. The transparent substrate comprises a main pattern region and an auxiliary pattern region provided in a periphery of the main pattern region. The auxiliary pattern region is etched to a depth at which a phase difference arises between light transmitted through the main pattern and light transmitted through the auxiliary pattern. The phase difference is of substantially an integral number of times as large as 360 degrees, wherein the integral number is one selected from the group consisting of integral numbers of one or more and integral numbers of minus one or less. The light intercepting film comprises openings on the main pattern region and the auxiliary pattern region.

    Abstract translation: 用于投影曝光设备的光掩模包括透明基板和设置在透明基板上的遮光膜。 透明基板包括主图案区域和设置在主图案区域的周边的辅助图案区域。 辅助图案区域被蚀刻到通过主图案传输的光和透过辅助图案的光之间产生相位差的深度。 相位差基本上是360度的整数倍，其中整数是从由一个或多个和整数减去1或更小的整数数组中选出的一个。 遮光膜包括主图案区域和辅助图案区域上的开口。

    Non-volatile semiconductor memory having a memory cell array divided into memory cell groups
    39.
    发明授权
    Non-volatile semiconductor memory having a memory cell array divided into memory cell groups 失效
    具有分为存储单元组的存储单元阵列的非易失性半导体存储器

    公开(公告)号：US5774398A

    公开(公告)日：1998-06-30

    申请号：US755410

    申请日：1996-11-22

    Applicant: Shinji Ishida

    Inventor： Shinji Ishida

    IPC: G11C17/00 ,  G11C16/06 ,  G11C16/08 ,  H01L21/8247 ,  H01L27/115 ,  G11C11/34

    CPC classification number: G11C16/08

    Abstract: Digit lines 31 to 34 and word lines 35 to 38 are provided. NMOS transistors 1 to 4 serving as Y selectors, a memory cell divided into two memory cell groups 25 and 26, a write circuit 21, a sense amplifier 22, a Y decoder 23, an X decoder 24, and a selector for selecting the memory cell groups 25 and 26 are provided in correspondence to the digit and word lines. The selector includes a PMOS transistor 27 and NMOS transistors 28 to 30. The memory cell group 25 is selected when a most significant address bit signal 101 is inputted as "0" level signal, and the memory cell group 26 is selected when the signal 101 is inputted as "1" level signal.

    Abstract translation: 提供数字线31至34和字线35至38。 用作Y选择器的NMOS晶体管1至4，分成两个存储单元组25和26的存储器单元，写入电路21，读出放大器22，Y解码器23，X解码器24和用于选择存储器的选择器 对应于数字和字线提供单元组25和26。 选择器包括PMOS晶体管27和NMOS晶体管28至30.当最高有效地址位信号101被输入为“0”电平信号时，选择存储单元组25，并且当信号101 被输入为“1”电平信号。

    Photo mask and fabrication process therefor
    40.
    发明授权
    Photo mask and fabrication process therefor 失效
    照片面具及其制作工艺

    公开(公告)号：US5750290A

    公开(公告)日：1998-05-12

    申请号：US634983

    申请日：1996-04-19

    Applicant: Tadao Yasuzato ,  Shinji Ishida

    Inventor： Tadao Yasuzato ,  Shinji Ishida

    IPC: G03F1/32 ,  G03F1/46 ,  G03F1/54 ,  G03F1/68 ,  G03F1/80 ,  G03F7/26 ,  H01L21/027 ,  G03F9/00

    CPC classification number: G03F1/32 ,  G03F1/46 ,  G03F1/54 ,  G03F1/80 ,  G03F7/265

    Abstract: After forming a light shielding layer 2 of ruthenium in a thickness of 70 nm and a reflection preventing layer 3 of a ruthenium oxide in thickness of 30 nm, and a photosensitive resin layer, a sililated layer is formed by electron beam lithography and sililation. Etching is performed for the photosensitive resin layer, and the reflection preventing layer and the light shielding layer are dry etched using oxygen gas with taking the sililated layer as a mask. By this, dimensional precision of a pattern of a photo mask can be improved.

    Abstract translation: 在形成厚度为70nm的钌的遮光层2和厚度为30nm的氧化钌的防反射层3和感光性树脂层之后，通过电子束光刻和硅烷化形成硅烷化层。 对感光性树脂层进行蚀刻，使用氧化硅对防反射层和遮光层进行干法蚀刻，以硅胶层为掩模。 由此，可以提高光掩模图案的尺寸精度。

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