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    NOVEL COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    31.
    发明申请
    NOVEL COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    新型化合物，酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US20090162787A1

    公开(公告)日：2009-06-25

    申请号：US12327549

    申请日：2008-12-03

    Applicant: Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

    Inventor： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Yoshitaka Komuro ,  Keita Ishiduka ,  Akiya Kawaue ,  Kyoko Ohshita

    IPC: G03F7/029 ,  G03F7/031 ,  G03F7/20 ,  C07C309/84

    CPC classification number: C07C381/12 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106

    Abstract: There are provided a compound represented by a general formula (b1-1) shown below suitable as an acid generator for a resist composition, a compound represented by a general formula (I) shown below suitable as a precursor for the compound represented by the general formula (b1-1), an acid generator, a resist composition, and a method of forming a resist pattern. [Chemical Formula 1] X-Q1-Y1—SO3−M+  (I) X-Q1-Y1—SO3−A+  (b1-1) (wherein, Q1 represents a bivalent linking group or a single bond; Y1 represents an alkylene group which may contain a substituent group or a fluorinated alkylene group which may contain a substituent group; X represents an aromatic cyclic group of 5 to 30 carbon atoms which contains a fluorine atom and may contain a substituent group; M+ represents an alkali metal ion; and A+ represents an organic cation.)

    Abstract translation: 提供由下述通式（b1-1）表示的化合物，其适合作为抗蚀剂组合物的酸产生剂，由下述通式（I）表示的化合物适合作为由通式 式（b1-1），酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。 <？in-line-formula description =“In-line Formulas”end =“lead”？> [化学式1] <？in-line-formula description =“In-line formula”end =“tail”？> ？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-M +（I）<？in-line-formula description =“In-line Formulas”end = “tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> X-Q1-Y1-SO3-A +（b1-1）<？in-line-formula description = “其中，Q1表示二价连接基团或单键，Y1表示可以含有取代基的亚烷基或可以含有取代基的氟化亚烷基”。 X表示含有氟原子且含有取代基的5〜30个碳原子的芳香族环状基团，M +表示碱金属离子，A +表示有机阳离子。

    Resist composition, method of forming resist pattern, novel compound, and acid generator
    32.
    发明授权
    Resist composition, method of forming resist pattern, novel compound, and acid generator 有权
    抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂

    公开(公告)号：US08808959B2

    公开(公告)日：2014-08-19

    申请号：US12591152

    申请日：2009-11-10

    Applicant: Hideo Hada ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

    Inventor： Hideo Hada ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

    IPC: G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC classification number: G03F7/027 ,  C07C309/12 ,  C07C311/46 ,  C07C311/48 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/30 ,  Y10S430/111 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

    Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R1″-R3″ represents an aryl group or an alkyl group, provided that at least one of R1″-R3″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1″-R3″ may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(═O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).

    Abstract translation: 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中具有改变的溶解性的碱成分（A）和包含（b1-1）表示的化合物的酸产生剂成分（B），由（b1- 1'）和/或（b1-1“）表示的化合物（R1”-R3“表示芳基或烷基，条件是R1”-R3“中的至少一个表示被 由（b1-1-0）表示的基团和R1“-R3”中的两个可以相互键合形成与硫原子的环; X表示C3-C30烃基; Q1表示含羰基的二价 连接基团; X10表示C1-C30烃基; Q3表示单键或二价连接基团; Y10表示-C（= O） - 或-SO2-; Y11表示C1-C10烷基或氟化烷基 ：Q2表示单键或亚烷基; W表示C2-C10亚烷基）。

    Resist composition and method of forming resist pattern
    35.
    发明授权
    Resist composition and method of forming resist pattern 有权
    抗蚀剂图案的抗蚀剂组成和方法

    公开(公告)号：US08252509B2

    公开(公告)日：2012-08-28

    申请号：US12861474

    申请日：2010-08-23

    Applicant: Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Hiroaki Shimizu ,  Naoto Motoike

    Inventor： Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Hiroaki Shimizu ,  Naoto Motoike

    IPC: G03F7/004 ,  G03F7/028 ,  G03F7/039 ,  G03F7/26

    CPC classification number: C08F20/18 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    Abstract: A resist composition including a base material component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid generator component (B) that generates acid upon exposure, and an nitrogen-containing organic compound (D), wherein the nitrogen-containing organic compound (D) includes a compound represented by general formula (d1) shown below: wherein R20 represents a methylene group, an ethylene group, an oxygen atom or —C(CH3)2—; R21 represents a hydrogen atom or an organic group; and R22 represents an alkoxy group, an alkoxycarbonyloxy group, a hydroxyl group, a halogen atom, —C(═O)—O—R23, —C(═O)—NH—R23 or a carboxyl group, wherein R23 represents a linear or branched alkyl group of 1 to 15 carbon atoms, an unsaturated hydrocarbon group, an aliphatic cyclic group, or an aromatic hydrocarbon group, and a represents an integer of 0 to 2.

    Abstract translation: 一种抗蚀剂组合物，其包含在酸作用下在碱显影液中溶解度变化的基材成分（A），曝光时产生酸的酸产生剂成分（B）和含氮有机化合物（D）， 其中所述含氮有机化合物（D）包括由下述通式（d1）表示的化合物：其中R 20表示亚甲基，亚乙基，氧原子或-C（CH 3）2 - ; R 21表示氢原子或有机基团; R 22表示烷氧基，烷氧基羰基氧基，羟基，卤素原子，-C（= O）-O-R 23，-C（= O）-NH-R 23或羧基，其中R 23表示直链状 或具有1至15个碳原子的支链烷基，不饱和烃基，脂族环基或芳族烃基，并且表示0至2的整数。

    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND
    36.
    发明申请
    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND 有权
    耐蚀组合物，形成耐蚀图案的方法，聚合物和化合物

    公开(公告)号：US20120135347A1

    公开(公告)日：2012-05-31

    申请号：US13305545

    申请日：2011-11-28

    Applicant: Yoshiyuki UTSUMI ,  Takehiro SESHIMO ,  Tomoyuki HIRANO ,  Daichi TAKAKI ,  Junichi TSUCHIYA

    Inventor： Yoshiyuki UTSUMI ,  Takehiro SESHIMO ,  Tomoyuki HIRANO ,  Daichi TAKAKI ,  Junichi TSUCHIYA

    IPC: G03F7/20 ,  C08F18/12 ,  C07D307/00 ,  G03F7/004

    CPC classification number: C07D307/00 ,  C08F2220/285 ,  G03F7/0392 ,  G03F7/0397

    Abstract: There are provided a resist composition, a method of forming a resist pattern using the resist composition, a novel polymeric compound and a compound useful as a monomer for the polymeric compound, the resist composition including a base component (A) that exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a resin component (A0) including a structural unit (a0) represented by general formula (a0) shown below [wherein A represents a divalent linking group; and R1 represents a hydrogen atom or a hydrocarbon group of 1 to 6 carbon atoms which may have a substituent.]

    Abstract translation: 提供抗蚀剂组合物，使用抗蚀剂组合物形成抗蚀剂图案的方法，新颖的聚合化合物和可用作聚合物的单体的化合物，抗蚀剂组合物包含在 在酸和酸产生剂组分（B）的作用下的显影溶液，其在曝光时产生酸，其中所述基础组分（A）含有包含由所示通式（a0）表示的结构单元（a0）的树脂组分（A0） [其中A表示二价连接基团; R 1表示氢原子或可以具有取代基的碳原子数为1〜6的烃基。

    Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern
    39.
    发明授权
    Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern 失效
    化合物，其制造方法，酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US07745097B2

    公开(公告)日：2010-06-29

    申请号：US12174293

    申请日：2008-07-16

    Applicant: Hideo Hada ,  Takeshi Iwai ,  Takehiro Seshimo ,  Akiya Kawaue ,  Keita Ishiduka

    Inventor： Hideo Hada ,  Takeshi Iwai ,  Takehiro Seshimo ,  Akiya Kawaue ,  Keita Ishiduka

    IPC: G03F7/004 ,  G03F7/30

    CPC classification number: C07D335/02 ,  C07C309/04 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

    Abstract: There are provided a novel compound represented by a general formula (b1-1) shown below, which is useful as an acid generator for a resist composition and a manufacturing method thereof, a compound useful as a precursor of the novel compound and a manufacturing method thereof, an acid generator, a resist composition and a method of forming a resist pattern. (wherein, R1 represents an aryl group or alkyl group which may contain a substituent group; R3 represents a hydrogen atom or an alkyl group; n1 represents an integer of 0 or 1, and in the case that n1 is 1, R1 and R3 may mutually be bonded to form a ring with a 3- to 7-membered ring structure together with the carbon atom with which R1 is bonded and the carbon atom with which R3 is bonded; A represents a bivalent group which forms a ring with 3- to 7-membered ring structure together with the sulfur atom with which A is bonded, and the ring may contain a substituent group; R2 represents an aromatic group which may contain a substituent group, a linear or branched alkyl group of 1 to 10 carbon atoms which may contain a substituent group, or a linear or branched alkenyl group of 2 to 10 carbon atoms which may contain a substituent group; n represents an integer of 0 or 1; and Y1 represents an alkylene group of 1 to 4 carbon atoms in which hydrogen atoms may be substituted with fluorine atoms.).

    Abstract translation: 提供了由下述通式（b1-1）表示的新化合物，其可用作抗蚀剂组合物的酸产生剂及其制备方法，可用作新化合物的前体的化合物和制备方法 酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。 （其中，R1表示可以含有取代基的芳基或烷基，R3表示氢原子或烷基，n1表示0或1的整数，在n1为1的情况下，R 1和R 3可以 相互键合形成具有3〜7元环结构的环以及与R 1键合的碳原子和与R3结合的碳原子; A表示与3-至 7元环结构与A键合的硫原子一起形成，环可含有取代基; R2表示可含有取代基的芳香族基团，碳原子数1〜10的直链或支链烷基， 可以含有取代基，或可以含有取代基的2〜10个碳原子的直链或支链烯基; n表示0或1的整数; Y1表示碳原子数为1〜4的亚烷基，其中氢 原子可以被氟取代 oms）。

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