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公开(公告)号：US09581916B2
公开(公告)日：2017-02-28
申请号：US14942679
申请日：2015-11-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
CPC classification number: G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
Abstract: A substrate handling system for an apparatus, the substrate handling system including a substrate table constructed to hold a substrate, a surrounding structure configured to surround the substrate, a sensor configured to determine a thickness of the substrate, and a control system configured to configure the apparatus responsive to a determination that the determined thickness is outside a thickness range associated with the surrounding structure.
Abstract translation: 一种用于装置的基板处理系统，所述基板处理系统包括构造成保持基板的基板台，构造成围绕所述基板的周围结构，被配置为确定所述基板的厚度的传感器以及被配置为 响应于确定所确定的厚度在与周围结构相关联的厚度范围之外的装置。
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32.发明申请SUBSTRATE TABLE, A LITHOGRAPHIC APPARATUS AND A METHOD FOR MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS 审中-公开基板表，平面设备和使用平面设备制造设备的方法公开(公告)号：US20170052459A1
公开(公告)日：2017-02-23
申请号：US15344994
申请日：2016-11-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Takeshi KANEKO , Joost Jeroen Ottens , Raymond Wilhelmus Louis Lafarre
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70775
Abstract: A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.
Abstract translation: 一种用于光刻设备的工作台，具有位于工作台上的编码器板的工作台，编码器板和工作台的顶表面之间的间隙，位于编码器板相对于工作台周边的径向内侧的间隙，以及 一种在间隙表面上具有开口以从间隙提取液体的流体提取系统。
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公开(公告)号：US11630399B2
公开(公告)日：2023-04-18
申请号：US17698100
申请日：2022-03-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Ten Kate , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Robbert Jan Voogd , Giovanni Francisco Nino , Marinus Jan Remie , Johannes Henricus Wilhelmus Jacobs , Thibault Simon Mathieu Laurent , Johan Gertrudis Cornelis Kunnen
IPC: G03F7/20
Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US11385553B2
公开(公告)日：2022-07-12
申请号：US17306670
申请日：2021-05-03
Applicant: ASML Netherlands B.V.
Inventor： Zili Zhou , Nitesh Pandey , Olger Victor Zwier , Patrick Warnaar , Maurits Van Der Schaar , Elliott Gerard McNamara , Arie Jeffrey Den Boef , Paul Christiaan Hinnen , Murat Bozkurt , Joost Jeroen Ottens , Kaustuve Bhattacharyya , Michael Kubis
IPC: G03F7/20 , G01N21/47 , G01N21/95 , G01N21/956 , G03F9/00
Abstract: A method of measuring overlay uses a plurality of asymmetry measurements from locations (LOI) on a pair of sub-targets (1032, 1034) formed on a substrate (W). For each sub-target, the plurality of asymmetry measurements are fitted to at least one expected relationship (1502, 1504) between asymmetry and overlay, based on a known bias variation deigned into the sub-targets. Continuous bias variation in one example is provided by varying the pitch of top and bottom gratings (P1/P2). Bias variations between the sub-targets of the pair are equal and opposite (P2/P1). Overlay (OV) is calculated based on a relative shift (xs) between the fitted relationships for the two sub-targets. The step of fitting asymmetry measurements to at least one expected relationship includes wholly or partially discounting measurements (1506, 1508, 1510) that deviate from the expected relationship and/or fall outside a particular segment of the fitted relationship.
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公开(公告)号：US11275316B2
公开(公告)日：2022-03-15
申请号：US17004916
申请日：2020-08-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens
IPC: G03F7/20
Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
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Patent Agency Ranking
公开(公告)号：US11209738B2
公开(公告)日：2021-12-28
申请号：US17012657
申请日：2020-09-04
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
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公开(公告)号：US10768536B2
公开(公告)日：2020-09-08
申请号：US16188216
申请日：2018-11-12
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
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公开(公告)号：US10761433B2
公开(公告)日：2020-09-01
申请号：US16290299
申请日：2019-03-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens
IPC: G03F7/20
Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
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公开(公告)号：US09696638B2
公开(公告)日：2017-07-04
申请号：US14965467
申请日：2015-12-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Engelbertus Antonius Fransiscus Van Der Pasch , Joost Jeroen Ottens , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , William Peter Van Drent , Frank Staals , Lukasz Jerzy Macht , Erik Willem Bogaart
CPC classification number: G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
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公开(公告)号：US09229340B2
公开(公告)日：2016-01-05
申请号：US14036991
申请日：2013-09-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Engelbertus Antonius Fransiscus Van Der Pasch , Joost Jeroen Ottens , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , William Peter Van Drent , Frank Staals , Lukasz Jerzy Macht , Erik Willem Bogaart
CPC classification number: G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
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