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52 条记录 (耗时 0.061 秒)

    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
    34.
    发明申请
    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR 有权
    抗蚀剂组合物，形成抗蚀剂图案，新型化合物和酸产生剂的方法

    公开(公告)号：US20120301829A1

    公开(公告)日：2012-11-29

    申请号：US13478390

    申请日：2012-05-23

    申请人： Akiya Kawaue ,  Yoshiyuki Utsumi

    发明人： Akiya Kawaue ,  Yoshiyuki Utsumi

    IPC分类号： C07D497/18 ,  G03F7/20 ,  G03F7/027

    CPC分类号： C07D497/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/325

    摘要： A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) comprising an acid generator (B1) composed of a compound represented by general formula (b1-1) shown below [wherein, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, provided that a ring skelton of the cyclic group contains an —SO2— bond or an —O—SO2— bond, and at least one carbon atom which is not adjacent to the —SO2— bond or the —O—SO2— bond has an oxygen atom as a substituent; Q1 represents a divalent linking group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; and A+ represents an organic cation]. [Chemical Formula 1] X-Q1-Y1—SO3⊖A⊕  (b1-1)

    摘要翻译： 一种抗蚀剂组合物，其包含在酸作用下在显影液中显示改变的溶解度的碱成分（A）和曝光时产生酸的酸发生剂组分（B），所述酸产生剂组分（B）包含酸产生剂 B1），其由下述通式（b1-1）表示的化合物[其中，X表示可以具有取代基的3〜30个碳原子的环状基团，条件是环状基团的环状骨架包含-SO 2 - 键或-O-SO2-键，并且与-SO 2 - 键或-O-SO 2 - 键不相邻的至少一个碳原子具有氧原子作为取代基; Q1表示二价连接基团或单键; Y1表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; A +表示有机阳离子]。 [化学式1] X-Q1-Y1-SO3⊖A⊕（b1-1）

    Resist composition, method of forming resist pattern, and novel compound and acid generator
    35.
    发明授权
    Resist composition, method of forming resist pattern, and novel compound and acid generator 有权
    抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂

    公开(公告)号：US08247160B2

    公开(公告)日：2012-08-21

    申请号：US12501981

    申请日：2009-07-13

    申请人： Yoshiyuki Utsumi ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

    发明人： Yoshiyuki Utsumi ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Tsuyoshi Nakamura

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  C07C309/65

    CPC分类号： C07C381/12 ,  C07C309/12 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A resist composition including a base component that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator consisting of a compound represented by general formula (b1). In formula (b1), Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms, X represents an aliphatic cyclic group of 3 to 30 carbon atoms, R11′ to R13′ each represents an aryl group or alkyl group, provided that at least one of R11′ to R13′ is an aryl group having a substituent represented by general formula (b1-0), and two alkyl groups among R11′ to R13′ may be bonded to each other to form a ring with the sulfur atom in the formula. In formula (b1-0), R52 represents a chain-like or cyclic hydrocarbon group, and f and g each represents 0 or 1.

    摘要翻译： 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中表现出改变的溶解度的碱成分和由通式（b1）表示的化合物组成的酸发生剂。 在式（b1）中，Y1表示1〜4个碳原子的氟化亚烷基，X表示3〜30个碳原子的脂肪族环状基团，R 11'〜R 13'表示芳基或烷基， R11'〜R13'中的一个为具有通式（b1-0）所示取代基的芳基，R11'至R13'中的两个烷基可以彼此键合形成环中的硫原子 式。 在式（b1-0）中，R 52表示链状或环状烃基，f和g各自表示0或1。

    Positive resist composition and method of forming resist pattern
    37.
    发明授权
    Positive resist composition and method of forming resist pattern 有权
    正型抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US08211616B2

    公开(公告)日：2012-07-03

    申请号：US12500528

    申请日：2009-07-09

    申请人： Hiroaki Shimizu ,  Tsuyoshi Nakamura ,  Yoshiyuki Utsumi ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Akiya Kawaue

    发明人： Hiroaki Shimizu ,  Tsuyoshi Nakamura ,  Yoshiyuki Utsumi ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Akiya Kawaue

    IPC分类号： G03F7/039 ,  G03F7/20

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/2041

    摘要： A positive resist composition including a resin component (A) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, a C1-C5 alkyl group or a C1-C5 halogenated alkyl group; R1 represents a C3 or more branched alkyl group; and each of R2 and R3 independently represents an alkyl group, wherein R2 and R3 may be mutually bonded to form a polycyclic group) and/or general formula (a0-2) (R is the same as defined above; R8 represents a divalent linking group that contains no halogen atom; and R7 represents an acid dissociable, dissolution inhibiting group), and an acid generator (B1) consisting of a compound represented by general formula (b1) (Y1 represents a C1-C4 fluorinated alkylene group which may have a substituent; X represents a C3-C30 aliphatic cyclic group which may have a substituent; and A+ represents an organic cation).

    摘要翻译： 一种正型抗蚀剂组合物，其包含具有由通式（a0-1）表示的结构单元（a0）的树脂组分（A）（R表示氢原子，C1-C5烷基或C1-C5卤代烷基; R1 表示C3或更多支链烷基; R2和R3各自独立地表示烷基，其中R2和R3可以相互键合形成多环基）和/或通式（a0-2）（R相同） R8表示不含卤原子的二价连接基团，R7表示酸解离性溶解抑制基团）和由通式（b1）表示的化合物（Y1）表示的酸产生剂（B1） 可以具有取代基的C1-C4氟化亚烷基; X表示可具有取代基的C 3 -C 30脂族环基; A +表示有机阳离子。

    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    40.
    发明申请
    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    正电阻组合物和形成电阻图案的方法

    公开(公告)号：US20100086873A1

    公开(公告)日：2010-04-08

    申请号：US12573686

    申请日：2009-10-05

    申请人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takahiro Dazai ,  Tomoyuki Hirano ,  Fumitake Kaneko ,  Kotaro Endo

    发明人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takahiro Dazai ,  Tomoyuki Hirano ,  Fumitake Kaneko ,  Kotaro Endo

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/123

    摘要： A positive resist composition including: a base component (A) which includes a polymeric compound (A1) containing a structural unit (a0) represented by the general formula (a0-1) and a structural unit (a1) derived from an acrylate ester having an acid dissociable, dissolution inhibiting group; and an acid generator component (B) which includes an acid generator (B1) containing an anion moiety represented by the general formula (I): (in the formula (a0-1), R1 represents a hydrogen atom, a lower alkyl group of 1 to 5 carbon atoms or a halogenated lower alkyl group of 1 to 5 carbon atoms; R2 represents a bivalent linking group; and R3 represents a cyclic group containing —SO2— within the ring skeleton. In the formula (I), X represents a cyclic group of 3 to 30 carbon atoms, Q1 represents a bivalent linking group containing an oxygen atom; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms).

    摘要翻译： 一种正型抗蚀剂组合物，其包含：包含含有由通式（a0-1）表示的结构单元（a0）的聚合化合物（A1）和由具有由通式（a0-1）表示的结构单元（a0））的结构单元（a1）的基础组分（A） 酸解离，溶解抑制组; 和含有由通式（I）表示的阴离子部分的酸发生剂（B1）的酸产生剂成分（B）：（式（a0-1）中，R 1表示氢原子，低级烷基 1〜5个碳原子的卤代低级烷基或1〜5个碳原子的卤代低级烷基; R2表示二价连接基团; R3表示环状骨架中含有-SO2-的环状基团，式（I）中，X表示 3〜30个碳原子的环状基团，Q1表示含有氧原子的二价连接基团，Y1表示碳原子数1〜4的亚烷基或碳原子数1〜4的氟化亚烷基。