公开(公告)号：US07137336B2

公开(公告)日：2006-11-21

申请号：US10482710

申请日：2002-07-04

申请人： Babak Heidari ,  Torbjörn Ling

发明人： Babak Heidari ,  Torbjörn Ling

IPC分类号： B41K1/38

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017

摘要： A stamp for use in transferring a pattern in nano-scale has a monomolecular antisticking layer. The anti-sticking layer comprises molecular chains, which are covalently bound to the surface of the stamp and which each comprise at least one fluorine-containing group. Each molecular chain contains a group Q, which comprises a bond which is weaker than the other bonds in the molecular chain as well as the covalent bond that binds the molecular chain to the surface of the stamp. Splitting of said bond in the group Q creates a group Q1, which is attached to the part of the molecular chain being left on the surface of the stamp and which is capable of reacting with a fluorine-containing compound to restore the antisticking layer. In a method of manufacturing a stamp for use in transferring a pattern in nanoscale, the stamp is provided with the above-mentioned molecular chain. In a method of repairing a damaged antisticking layer of the above-mentioned stamp, the stamp is treated with a repairing reagent, which has a coupling end, which is capable of reacting with the group Q1, and a fluorine-containing group located at the other end of the repairing reagent.

摘要翻译： 用于转印纳米级图案的印花具有单分子抗粘层。 防粘层包括分子链，其共价结合到印模的表面，并且每个包含至少一个含氟基团。 每个分子链包含基团Q，其包含弱于分子链中的其它键的键以及将分子链结合到印模表面的共价键。 分组Q中的所述键形成组Q1，其连接到分子链的部分留在印模的表面上，并且能够与含氟化合物反应以还原防粘层。 在制造用于以纳米级转印图案的印模的方法中，印模具有上述分子链。 在修复上述印模的损伤抗粘层的方法中，用能够与基团Q1反应的具有偶合端的修复试剂和位于所述印模的含氟基团的修饰试剂进行处理 修复试剂的另一端。

公开(公告)号：US07041228B2

公开(公告)日：2006-05-09

申请号：US10258027

申请日：2001-04-10

申请人： Babak Heidari

发明人： Babak Heidari

IPC分类号： B44C1/22

CPC分类号： H01L21/0331 ,  G03F7/095 ,  Y10T428/24942

摘要： A substrate comprising at least a first and a second coating layer on one surface of the substrate is for nanoimprint lithography, the first coating layer has a positive resist and the second coating layer has a negative resist. A process in connection with nanoimprint lithography on the substrate impresses a pattern of nanometer size in a first stage into the second coating layer by a template, following which the first coating layer, in a second stage, is exposed to a chiefly isotropic developing method on surfaces thereof that have been exposed in connection with the first stage, a method for developing and material for the first and second coating layers being selected so that the first coating layer is developed more quickly than the second coating layer, so that an undercut profile is obtained in the coating layers.

摘要翻译： 在衬底的一个表面上至少包括第一和第二涂层的衬底用于纳米压印光刻，第一涂层具有正光刻胶，第二涂层具有负光刻胶。 与衬底上的纳米压印光刻有关的工艺通过模板在第一阶段中将纳米尺寸的图案印刷到第二涂层中，随后在第二阶段中将第一涂层暴露于主要各向同性显影方法 已经暴露于第一阶段的表面，用于显影的方法和用于第一和第二涂层的材料被选择为使得第一涂层比第二涂层更快地显影，使得底切轮廓是 在涂层中获得。

公开(公告)号：US07022465B2

公开(公告)日：2006-04-04

申请号：US10296326

申请日：2001-04-10

申请人： Babak Heidari

发明人： Babak Heidari

IPC分类号： G03F7/00

CPC分类号： B82Y10/00 ,  B41C2210/04 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  G11B7/261

摘要： Method in connection with the production of a template, preferably for nanoimprint lithography, which template comprises a flat plate (1) of a first material and a three-dimensional structure (6, 8) of a second material, arranged on the plate, said second material introductory being applied on said plate, in the method, to form the structure. The second material is thereafter fixed to the plate the second material is thereafter fixed to the plate of the first material, by heat treatment (Q) at at least 100° C., for the production of the template. A template is produced by use of the method.

摘要翻译： 关于生产模板，优选用于纳米压印光刻的方法，该模板包括布置在板上的第一材料的平板（1）和第二材料的三维结构（6,8），所述第三材料的平板 在该方法中，在所述板上施加第二材料介绍以形成所述结构。 然后将第二材料固定到板上，然后通过在至少100℃下的热处理（Q）将第二材料固定到第一材料的板上，以制备模板。 使用该方法生成模板。

公开(公告)号：US20050274693A1

公开(公告)日：2005-12-15

申请号：US11123087

申请日：2005-05-06

申请人： Babak Heidari ,  Marc Beck

发明人： Babak Heidari ,  Marc Beck

IPC分类号： B29C43/02 ,  B29C43/10 ,  B81C99/00 ,  G03F1/00 ,  G03F7/00 ,  G03F7/20 ,  H01L21/00

CPC分类号： G03F7/0002 ,  B29C35/0888 ,  B29C43/003 ,  B29C43/021 ,  B29C43/10 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2043/3647 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00

摘要： Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114;116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. The apparatus further includes a heater device having a surface facing said spacing, for heating either fluid layer (14).

摘要翻译： 用于将图案从具有结构化表面的模板（10）传送到承载可辐射聚合流体（14）的表面层的基底（12）的装置和方法。 该设备包括具有相对表面（104; 105）的第一主要部分（101）和第二主要部分（102），用于调节所述主要部分之间的间距（115），用于支撑所述模板的支撑装置（106） 在与所述结构化表面相对于所述表面层的所述间隔中相互平行接合的衬底，设计成将辐射发射到所述间隔中的辐射源（110）。 空腔（115）具有第一壁，该第一壁包括被设计为接合所述模板或基底的柔性膜（113），并且提供装置（114; 116），用于将可调节的超压施加到存在于所述空腔中的介质，由此均匀分布 在基板和模板之间的整个接触表面上获得力。 该装置还包括具有面向所述间隔的表面的加热器装置，用于加热流体层（14）。