公开(公告)号：US07997890B2

公开(公告)日：2011-08-16

申请号：US11905036

申请日：2007-09-27

Applicant: Babak Heidari ,  Marc Beck

Inventor： Babak Heidari ,  Marc Beck

IPC: B29C59/00 ,  B28B17/00 ,  B29B13/08

CPC classification number: G03F7/0002 ,  B29C35/0888 ,  B29C43/003 ,  B29C43/021 ,  B29C43/10 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2043/3647 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00

Abstract: Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114;116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. The apparatus further includes a heater device having a surface facing said spacing, for heating either fluid layer (14).

Abstract translation: 用于将图案从具有结构化表面的模板（10）传送到承载可辐射聚合流体（14）的表面层的基底（12）的装置和方法。 该设备包括具有相对表面（104; 105）的第一主要部分（101）和第二主要部分（102），用于调节所述主要部分之间的间距（115），用于支撑所述模板的支撑装置（106） 在与所述结构化表面相对于所述表面层的所述间隔中相互平行接合的衬底，设计成将辐射发射到所述间隔中的辐射源（110）。 空腔（115）具有第一壁，该第一壁包括被设计为接合所述模板或基底的柔性膜（113），并且提供装置（114; 116），用于将可调节的超压施加到存在于所述空腔中的介质，由此均匀分布 在基板和模板之间的整个接触表面上获得力。 该装置还包括具有面向所述间隔的表面的加热器装置，用于加热流体层（14）。

公开(公告)号：US20080229941A1

公开(公告)日：2008-09-25

申请号：US11808890

申请日：2007-06-13

Applicant: Babak Heidari

Inventor： Babak Heidari

IPC: B31F1/20

CPC classification number: G03F7/0002 ,  B29C59/04 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00

Abstract: An apparatus and a method in connection with the lithography of structures on a micro or nanometer scale. A nano-imprinting apparatus according to an embodiment of the invention comprises two rotatably mounted rollers for transferring a pattern of micro or nanometer size to the substrate to be patterned. A first rotatably mounted roller has a patterned circumferential surface for transferring a pattern from the first rotatably mounted roller to a deformable substrate by contacting the patterned surface with the substrate. A second rotatably mounted roller has a principally smooth circumferential surface which faces the patterned surface of the first rotatably mounted roller. Furthermore, the second rotatably mounted roller is rotatably coupled with the first rotatably mounted roller for synchronized rotation of the first and second rollers. The substrate is movable between the first and second rollers such that, when these rollers rotate with respect to each other, the patterned surface of the first rotatably mounted roller comes into contact with the substrate whereby this pattern is transferred from the patterned surface to the substrate.

Abstract translation: 与微观或纳米尺度的结构光刻相关的装置和方法。 根据本发明的实施例的纳米压印装置包括两个可旋转地安装的辊，用于将微米或纳米尺寸的图案转印到待图案化的基底上。 第一可旋转地安装的辊具有图案化的圆周表面，用于通过使图案化表面与基底接触将图案从第一可旋转地安装的辊转移到可变形基底。 第二可旋转地安装的辊具有面向第一可旋转地安装的辊的图案化表面的主要平滑的圆周表面。 此外，第二可旋转地安装的辊与第一可旋转地安装的辊可旋转地联接，用于第一和第二辊的同步旋转。 衬底可以在第一和第二辊之间移动，使得当这些辊相对于彼此旋转时，第一可旋转地安装的辊的图案化表面与衬底接触，由此该图案从图案化表面转移到衬底 。

公开(公告)号：US07195734B2

公开(公告)日：2007-03-27

申请号：US10149072

申请日：2000-12-04

Applicant: Babak Heidari

Inventor： Babak Heidari

IPC: B28B1/10

CPC classification number: B82Y10/00 ,  B41M1/06 ,  B82Y40/00 ,  G03F7/0002

Abstract: Device in connection with the lithography of structures of nanometer size, which device comprises a first main part (1) with a first principally plane surface (2a) and a second main part (3) with a second principally plane surface (9a), said first surface and second surface being opposite to one another and being arranged in principle parallel in relation to one another, with an adjustable interval between them, and said first and second surface being arranged to form a support for a substrate (5) and a template (10) respectively, or vice-versa. According to the invention, said second main part (3) also comprises a cavity (6) for a medium, and means for adjusting a pressure of said medium, a wall of said cavity consisting of a flexible membrane (9), of which one side, which side faces away from the cavity (6), forms said second surface (9a). The invention also relates to a method that utilizes the device.

Abstract translation: 与纳米尺寸结构的平版印刷有关的装置，该装置包括具有第一主要平面表面（2a）的第一主要部分（1）和具有第二主要平面（9a）的第二主要部分（3） ，所述第一表面和第二表面彼此相对并且原则上彼此平行地布置，在它们之间具有可调节的间隔，并且所述第一和第二表面被布置成形成用于基底（5）和 一个模板（10），反之亦然。 根据本发明，所述第二主要部分（3）还包括用于介质的空腔（6）和用于调节所述介质的压力的装置，所述空腔的壁由柔性膜（9）组成，其中一个 所述侧面远离所述空腔（6），形成所述第二表面（9a）。 本发明还涉及利用该装置的方法。

公开(公告)号：US20070018362A1

公开(公告)日：2007-01-25

申请号：US10581497

申请日：2004-11-03

Applicant: Babak Heidari ,  Marc Beck

Inventor： Babak Heidari ,  Marc Beck

IPC: B29C35/08 ,  B29C45/12 ,  B29C43/10

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/2012 ,  H05K3/0014 ,  H05K3/0023 ,  H05K3/107 ,  H05K2201/0108 ,  H05K2203/0108

Abstract: Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104; 105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114; 116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template.

Abstract translation: 用于将图案从具有结构化表面的模板（10）传送到承载可辐射聚合流体（14）的表面层的基底（12）的装置和方法。 该设备包括具有相对表面（104; 105）的第一主要部分（101）和第二主要部分（102），用于调节所述主要部分之间的间距（115），用于支撑所述模板的支撑装置（106） 在与所述结构化表面相对于所述表面层的所述间隔中相互平行接合的衬底，设计成将辐射发射到所述间隔中的辐射源（110）。 空腔（115）具有第一壁，该第一壁包括被设计为接合所述模板或基底的柔性膜（113），并且提供装置（114; 116），用于将可调节的超压施加到存在于所述空腔中的介质，由此均匀分布 在基板和模板之间的整个接触表面上获得力。

公开(公告)号：US20060279025A1

公开(公告)日：2006-12-14

申请号：US11268574

申请日：2005-11-08

Applicant: Babak Heidari ,  Anette Lofstrand ,  Erik Bolmsjo ,  Erik Theander ,  Marc Beck

Inventor： Babak Heidari ,  Anette Lofstrand ,  Erik Bolmsjo ,  Erik Theander ,  Marc Beck

IPC: B29C59/02 ,  B29C35/08

CPC classification number: B29C33/3857 ,  B29C35/0888 ,  B29C59/022 ,  B29C59/026 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: The invention relates to a two-step process for transferring a pattern from a template (1) to a target surface of a substrate, by creating an intermediate flexible polymer stamp (5) from the template in a primary step, and then using the polymer stamp to make an imprint in a radiation-sensitive moldable layer on the target surface in a secondary step. In the secondary step, the process steps of pressing the polymer stamp and the substrate against each other, UV exposure of the moldable layer through the polymer stamp, and postbaking of the radiated moldable layer, are all performed at a control constant temperature, in order to eliminate damages to the pattern created in the moldable layer caused by thermal expansion effects.

Abstract translation: 本发明涉及通过在初级步骤中从模板中生成中间柔性聚合物印模（5），然后使用聚合物（2），将图案从模板（1）转移到基材的目标表面的两步法 在第二步骤中对目标表面上的辐射敏感的可成型层进行印记。 在第二步骤中，将聚合物印模和基板彼此挤压，通过聚合物印模的可模制层的UV曝光和辐射的可模塑层的后烘烤的工艺步骤全部按照控制恒温进行 以消除由热膨胀效应引起的在可模塑层中产生的图案的损坏。

公开(公告)号：US06923930B2

公开(公告)日：2005-08-02

申请号：US10181487

申请日：2001-01-19

Applicant: Torbjörn Ling ,  Lars Montelius ,  Babak Heidari

Inventor： Torbjörn Ling ,  Lars Montelius ,  Babak Heidari

IPC: G03F7/00 ,  B29C33/66 ,  B81C1/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S977/887

Abstract: A metal mold for use in a nano-imprinting process comprises a firmly adhering monomolecular non-sticking layer. The layer was obtained by subjecting the mold to a reaction with a fluoroalkyl compound having a mercapto group. As a result of said reaction, the layer comprises an organic sulfide of said metal.

Abstract translation: 用于纳米压印方法的金属模具包括牢固粘附的单分子不粘层。 通过使模具与具有巯基的氟烷基化合物反应来获得该层。 作为所述反应的结果，该层包含所述金属的有机硫化物。

公开(公告)号：US07972553B2

公开(公告)日：2011-07-05

申请号：US11579540

申请日：2004-11-25

Applicant: Marc Beck ,  Babak Heidari ,  Erik Bolmsjö ,  Erik Theander

Inventor： Marc Beck ,  Babak Heidari ,  Erik Bolmsjö ,  Erik Theander

IPC: B29C35/02 ,  B29C35/08

CPC classification number: G03F7/0002 ,  B29C35/0888 ,  B29C43/003 ,  B29C43/021 ,  B29C43/10 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2043/3647 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00

Abstract: Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tp by means of a heater device (20); and while maintaining said temperature Tp, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and—postbaking the layer.

Abstract translation: 用于将图案从具有结构化表面（11）的模板（10）转移到承载设计为5的材料的表面层（14）的基底（12）的方法，其在暴露于辐射时固化，包括：布置所述模板和基底 在压印装置中相互平行，所述结构化表面面向所述表面层; 通过加热器装置（20）将模板和衬底加热至温度Tp; 并且在保持所述温度Tp的同时，执行以下步骤：将模板压向基板以将所述图案压印到所述层中; 将所述层暴露于辐射（19）以固化该层，并且对该层进行后烘烤。

公开(公告)号：US20080138460A1

公开(公告)日：2008-06-12

申请号：US12007750

申请日：2008-01-15

Applicant: Babak Heidari ,  Marc Beck

Inventor： Babak Heidari ,  Marc Beck

IPC: B28B1/00

CPC classification number: B81C1/0046 ,  B29C33/60 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An improved method for nanoimprint lithography and more specifically for providing a nano-scale pattern on a substrate is disclosed. According to the improvement, a mould (100) and a substrate (115) are provided wherein the substrate (115) is provided with a plurality of coating layers (120, 125, 130) before pressing the mould (100) and substrate (115) together for transferring a pattern from the mould (100) to the substrate (115). According to the invention, the substrate is provided with an uppermost layer (130) having a pure anti-adhesive function.

Abstract translation: 公开了一种用于纳米压印光刻的改进方法，并且更具体地用于在衬底上提供纳米级图案。 根据改进，提供了一种模具（100）和基板（115），其中在压制模具（100）和基板（115）之前，基板（115）设置有多个涂层（120,125,130） ）一起用于将图案从模具（100）传送到基板（115）。 根据本发明，衬底设置有具有纯粹的抗粘附功能的最上层（130）。

公开(公告)号：US20060040058A1

公开(公告)日：2006-02-23

申请号：US10992322

申请日：2004-11-19

Applicant: Babak Heidari ,  Marc Beck

Inventor： Babak Heidari ,  Marc Beck

IPC: B05D3/12

CPC classification number: B81C1/0046 ,  B29C33/60 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An improved method for nanoimprint lithography and more specifically for providing a nano-scale pattern on a substrate is disclosed. According to the improvement, a mould (100) and a substrate (115) are provided wherein the substrate (115) is provided with a plurality of coating layers (120, 125, 130) before pressing the mould (100) and substrate (115) together for transferring a pattern from the mould (100) to the substrate (115). According to the invention, the substrate is provided with an uppermost layer (130) having a pure anti-adhesive function.

Abstract translation: 公开了一种用于纳米压印光刻的改进方法，并且更具体地用于在衬底上提供纳米级图案。 根据改进，提供了一种模具（100）和基板（115），其中在压制模具（100）和基板（115）之前，基板（115）设置有多个涂层（120,125,130） ）一起用于将图案从模具（100）传送到基板（115）。 根据本发明，衬底设置有具有纯粹的抗粘附功能的最上层（130）。

公开(公告)号：US20050039618A1

公开(公告)日：2005-02-24

申请号：US10482710

申请日：2002-07-04

Applicant: Babak Heidari ,  Torbjorn Ling

Inventor： Babak Heidari ,  Torbjorn Ling

IPC: B82B1/00 ,  B29C59/00 ,  B41C3/06 ,  B41M1/04 ,  B41M1/06 ,  B81C99/00 ,  G03F7/00 ,  H01L21/027 ,  B41M1/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017

Abstract: A stamp for use in transferring a pattern in nano-scale has a monomolecular antisticking layer. The anti-sticking layer comprises molecular chains, which are covalently bound to the surface of the stamp and which each comprise at least one fluorine-containing group. Each molecular chain contains a group Q, which comprises a bond which is weaker than the other bonds in the molecular chain as well as the covalent bond that binds the molecular chain to the surface of the stamp. Splitting of said bond in the group Q creates a group Q1, which is attached to the part of the molecular chain being left on the surface of the stamp and which is capable of reacting with a fluorine-containing compound to restore the antisticking layer. In a method of manufacturing a stamp for use in transferring a pattern in nanoscale, the stamp is provided with the above-mentioned molecular chain. In a method of repairing a damaged antisticking layer of the above-mentioned stamp, the stamp is treated with a repairing reagent, which has a coupling end, which is capable of reacting with the group Q1, and a fluorine-containing group located at the other end of the repairing reagent.

Abstract translation: 用于转印纳米级图案的印花具有单分子抗粘层。 防粘层包括分子链，其共价结合到印模的表面，并且每个包含至少一个含氟基团。 每个分子链包含基团Q，其包含弱于分子链中的其它键的键以及将分子链结合到印模表面的共价键。 分组Q中的所述键形成组Q1，其连接到分子链的部分留在印模的表面上，并且能够与含氟化合物反应以还原防粘层。 在制造用于以纳米级转印图案的印模的方法中，印模具有上述分子链。 在修复上述印模的损伤抗粘层的方法中，用能够与基团Q1反应的具有偶合端的修复试剂和位于所述印模的含氟基团的修饰试剂进行处理 修复试剂的另一端。