Nano/micro-patterned optical device and fabrication method thereof
    31.
    发明授权
    Nano/micro-patterned optical device and fabrication method thereof 有权
    纳米/微图案光学器件及其制造方法

    公开(公告)号:US08224142B2

    公开(公告)日:2012-07-17

    申请号:US12533579

    申请日:2009-07-31

    CPC classification number: G02B6/2934 G02B6/107

    Abstract: A nano/micro-patterned optical device includes a soft film substrate and nano/micro thin wires. A surface of the soft film substrate includes a nano/micro-pattern formed through a lithography process, and the nano/micro-pattern includes a plurality of depressed grooves. The nano/micro thin wires are placed in the depressed grooves, and used to form a plurality of optical waveguides, in which the optical waveguides include at least one optical coupling region, and the optical coupling region is located on a joining position of the optical waveguides. A fabrication method of the nano/micro-patterned optical device is also provided.

    Abstract translation: 纳米/微图案光学器件包括软膜衬底和纳米/微细线。 软膜基板的表面包括通过光刻工艺形成的纳米/微图案,并且纳米/微图案包括多个凹槽。 纳米/微细线被放置在凹槽中,用于形成多个光波导,其中光波导包括至少一个光耦合区域,并且光耦合区域位于光学波导的接合位置 波导。 还提供了纳米/微图案化光学器件的制造方法。

    MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY
    32.
    发明申请
    MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY 有权
    光刻技术的材料与方法

    公开(公告)号:US20120009524A1

    公开(公告)日:2012-01-12

    申请号:US13238335

    申请日:2011-09-21

    Abstract: A photosensitive material for use in semiconductor manufacture comprises a copolymer that includes a plurality of photoresist chains and a plurality of hydrophobic chains, each hydrophobic chain attached to the end of one of the photoresist chains. The copolymer in response to externally applied energy will self-assemble to a photoresist layer and a hydrophobic layer.

    Abstract translation: 用于半导体制造的感光材料包括共聚物,其包括多个光致抗蚀剂链和多个疏水链,每个疏水链连接到一个光致抗蚀剂链的末端。 响应于外部施加的能量的共聚物将自组装到光致抗蚀剂层和疏水层。

    Double patterning strategy for contact hole and trench in photolithography
    33.
    发明授权
    Double patterning strategy for contact hole and trench in photolithography 有权
    光刻中接触孔和沟槽的双重图案化策略

    公开(公告)号:US08048616B2

    公开(公告)日:2011-11-01

    申请号:US12047086

    申请日:2008-03-12

    CPC classification number: H01L21/0271 H01L21/31144

    Abstract: A method of lithography patterning includes forming a first resist pattern on a substrate, the first resist pattern including a plurality of openings therein on the substrate; forming a second resist pattern on the substrate and within the plurality of openings of the first resist pattern, the second resist pattern including at least one opening therein on the substrate; and removing the first resist pattern to uncover the substrate underlying the first resist pattern.

    Abstract translation: 光刻图案的方法包括在基板上形成第一抗蚀剂图案,第一抗蚀剂图案在基板上包括多个开口; 在所述基板上和所述第一抗蚀剂图案的所述多个开口内形成第二抗蚀剂图案,所述第二抗蚀剂图案在所述基板上包括至少一个开口; 以及去除第一抗蚀剂图案以露出第一抗蚀剂图案下方的基板。

    Method for forming dual damascene interconnect structure
    35.
    发明申请
    Method for forming dual damascene interconnect structure 审中-公开
    双镶嵌互连结构的形成方法

    公开(公告)号:US20050170638A1

    公开(公告)日:2005-08-04

    申请号:US10768217

    申请日:2004-01-30

    CPC classification number: H01L21/76808

    Abstract: A method for forming dual damascene structures within a semiconductor device utilizes a plug material that is soluble in alkaline developers such as 2.38 wt % TMAH. The plug material is introduced into openings initially formed in a dielectric film and extends up to at least the top surface of the dielectric film. The plug material is polymeric in nature and is baked to cross link the polymeric material. The dielectric layer with openings filled with the cross-linked plugged material is patterned and etched to produce dual damascene openings.

    Abstract translation: 在半导体器件内形成双镶嵌结构的方法利用了可溶于碱性显影剂例如2.38wt%TMAH的塞子材料。 将插塞材料引入初始形成在电介质膜中的开口中,并延伸到至少绝缘膜的顶表面。 塞子材料本质上是聚合物,并且被烘烤以交联聚合材料。 具有填充有交联的堵塞材料的开口的电介质层被图案化和蚀刻以产生双镶嵌开口。

    Water soluble negative tone photoresist
    36.
    发明申请
    Water soluble negative tone photoresist 失效
    水溶性负色光致抗蚀剂

    公开(公告)号:US20050106493A1

    公开(公告)日:2005-05-19

    申请号:US10714998

    申请日:2003-11-17

    CPC classification number: G03F7/40 G03F7/0035 G03F7/038

    Abstract: A method is described for reducing the space width of holes in a first resist pattern and simultaneously removing unwanted holes to change the pattern density in the resulting second pattern. This technique provides holes with a uniform space width as small as 100 nm or less that is independent of pattern density in the second pattern. A positive resist is patterned to form holes with a first pattern density and first space width. A water soluble negative resist is coated over the first resist and selectively exposed to form a second patterned layer consisting of water insoluble plugs in unwanted holes in the first pattern and a thin water insoluble layer on the first resist pattern in unexposed portions. The plugs may form dense and isolated hole arrays while the thin insoluble layer reduces space width to the same extent in remaining holes in the second pattern.

    Abstract translation: 描述了一种用于减小第一抗蚀剂图案中的孔的空间宽度并同时去除不需要的孔以改变所得第二图案中的图案密度的方法。 该技术提供具有小于100nm或更小的均匀空间宽度的孔,其与第二图案中的图案密度无关。 图案化正性抗蚀剂以形成具有第一图案密度和第一空间宽度的孔。 将水溶性负性抗蚀剂涂覆在第一抗蚀剂上并选择性地暴露以形成第二图案层,该第二图案层由第一图案中不想要的孔中的水不溶性塞子和未曝光部分中的第一抗蚀剂图案上的薄水不溶性层组成。 塞子可以形成致密和隔离的孔阵列,而薄不溶层在第二图案中的剩余孔中减小相同程度的空间宽度。

    Catalytic compositions for the preparation of poly(butylene
terephthalate)
    38.
    发明授权
    Catalytic compositions for the preparation of poly(butylene terephthalate) 失效
    用于制备聚对苯二甲酸丁二醇酯的催化组合物

    公开(公告)号:US5516879A

    公开(公告)日:1996-05-14

    申请号:US413025

    申请日:1995-03-28

    CPC classification number: C08G63/82

    Abstract: A catalyst composition for use in the preparation of poly(butylene terephthalate) from dimethyl terephthalate, comprising: (a) a titanium compound primary catalyst, from about 0.01 PHR to about 1 PHR; and (b) an alkali metal phosphate or alkali metal phosphite co-catalyst, from about 0.001 PHR to about 1 PHR; wherein PHR represents parts of the primary catalyst or the co-catalyst per one hundred parts, by weight, of dimethyl terephthalate. Preferred titanium compounds include tetrabutyl titanate or tetra(isopropyl) titanate; the alkali metal phosphate can be a phosphate salt containing one, two, or three metal groups; and the alkali metal phosphite can be a phosphite salt containing one or two metal groups. With this catalyst composition, the transesterification rate was increased by 10 percent or more. Furthermore, the reaction product poly(butylene terephthalate) shows an increased intrinsic viscosity over those without the co-catalyst, indicating a greater degree of polymerization.

    Abstract translation: 一种用于从对苯二甲酸二甲酯制备聚(对苯二甲酸丁二醇酯)的催化剂组合物,包括:(a)钛化合物一次催化剂,约0.01PHR至约1PHR; 和(b)约0.001PHR至约1PHR的碱金属磷酸盐或碱金属亚磷酸盐助催化剂; 其中PHR代表每100重量份对苯二甲酸二甲酯的主要催化剂或助催化剂的部分。 优选的钛化合物包括钛酸四丁酯或钛酸四(异丙基)酯; 碱金属磷酸盐可以是含有一个,两个或三个金属基团的磷酸盐; 碱金属亚磷酸盐可以是含有一个或两个金属基团的亚磷酸盐。 使用该催化剂组合物,酯交换率提高10%以上。 此外,反应产物聚(对苯二甲酸丁二醇酯)显示出比不含助催化剂的反应产物增加的特性粘度,表明聚合度更高。

    Improved metallic soaps of fatty acids for use as photolyzing agents for
photodegradable polymer films
    39.
    发明授权
    Improved metallic soaps of fatty acids for use as photolyzing agents for photodegradable polymer films 失效
    改进的脂肪酸金属皂用作可光降解聚合物膜的光解剂

    公开(公告)号:US5434277A

    公开(公告)日:1995-07-18

    申请号:US22962

    申请日:1993-04-02

    CPC classification number: C07C51/412

    Abstract: A method for the preparation of metallic salts of fatty acids comprising the steps of: (a) reacting alkali hydroxide with a fatty acid in a saponification reaction to form an alkali soap; (b) reacting the alkali soap with an aqueous metallic salt solution in a double decomposition reaction to cause the production of metallic fatty acid salt; (c) performing at least one cycle of an alternating alkalinization-acidization reaction by adding an aqueous alkali hydroxide solution to the metallic fatty acid salt to raise the solution pH, followed by adding an acidic aqueous salt solution contain the same metal ions to lower the solution pH. High purity metallic salts of fatty acids can be obtained without a solvent washing step and the metallic fatty acid salts prepared from this invention can be effectively used as photolyzing agent to initiate and/or accelerate the photo-degradation of plastics.

    Abstract translation: 一种制备脂肪酸金属盐的方法,包括以下步骤:(a)在皂化反应中使碱金属氢氧化物与脂肪酸反应形成碱性皂; (b)在双重分解反应中使碱性皂与金属盐水溶液反应,以产生金属脂肪酸盐; (c)通过向金属脂肪酸盐中加入碱金属氢氧化物水溶液进行交替碱化 - 酸化反应的至少一个循环以提高溶液的pH,然后加入含有相同金属离子的酸性盐水溶液以降低 溶液pH值。 不用溶剂洗涤步骤即可获得高纯度的脂肪酸金属盐,并且由本发明制备的金属脂肪酸盐可有效地用作光引发剂以引发和/或加速塑料的光降解。

    Thermal probe
    40.
    发明授权
    Thermal probe 有权
    热探头

    公开(公告)号:US08595861B2

    公开(公告)日:2013-11-26

    申请号:US13475806

    申请日:2012-05-18

    CPC classification number: G01Q60/58 Y10S977/867

    Abstract: A thermal probe includes a support element, a conductive pattern and a tip. The conductive pattern is disposed at the support element and has plural bending portions. The tip has a base and a pinpoint. The base has a first surface and a second surface which is opposite to the first surface. The pinpoint is disposed at the first surface. The second surface is connected with the conductive pattern. The bending portions are contacted with the first surface. The tip of the thermal probe is replaceable, and the user can choose the optimum combination of the tip, conductive pattern and support element according to their needs.

    Abstract translation: 热探针包括支撑元件,导电图案和尖端。 导电图案设置在支撑元件处并且具有多个弯曲部分。 尖端具有基部和精确点。 底座具有与第一表面相对的第一表面和第二表面。 精确位置设置在第一表面。 第二表面与导电图案连接。 弯曲部分与第一表面接触。 热敏探头的尖端是可更换的,用户可以根据需要选择尖端,导电图案和支撑元件的最佳组合。

Patent Agency Ranking