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77 条记录 (耗时 0.036 秒)

    Method of producing polishing pad
    33.
    发明授权
    Method of producing polishing pad 有权
    抛光垫的生产方法

    公开(公告)号：US07972396B2

    公开(公告)日：2011-07-05

    申请号：US11859928

    申请日：2007-09-24

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Yung-Chang Hung

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Yung-Chang Hung

    IPC分类号： B24D3/34

    CPC分类号： B24D13/147 ,  B24B37/30 ,  B24D11/001

    摘要： The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate, wherein the fibers comprise a core and a cladding surrounding the core, and the cladding comprises a hydrophobic polymer; (b) impregnating the surface of the base material with an elastomer solution; (c) coagulating the elastomer impregnated in the surface of the base material to mold the elastomer and to form a plurality of first continuous pores between the elastomer, and between the elastomer and the fibers; (d) planarizing the surface of the base material; (e) impregnating the surface of the base material and elastomer obtained in the step (d) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.

    摘要翻译： 本发明涉及一种制造抛光垫的方法，包括以下步骤：（a）提供包含多根纤维的基材; 所述基材具有用于抛光基底的表面，其中所述纤维包括芯和围绕所述芯的包层，并且所述包层包含疏水性聚合物; （b）用弹性体溶液浸渍基材的表面; （c）凝固浸渍在基材表面的弹性体以模制弹性体并在弹性体之间以及弹性体和纤维之间形成多个第一连续孔; （d）使基材的表面平坦化; （e）用条件聚合物溶液浸渍在步骤（d）中获得的基材和弹性体的表面; 和（e）固化浸渍在基材表面和弹性体表面的状态聚合物，并将状态聚合物部分地填充到第一连续孔中以形成多个第二连续孔。

    Method for Manufacturing Polishing Pad and Polishing Pad
    34.
    发明申请
    Method for Manufacturing Polishing Pad and Polishing Pad 有权
    抛光垫和抛光垫的制造方法

    公开(公告)号：US20110070814A1

    公开(公告)日：2011-03-24

    申请号：US12887363

    申请日：2010-09-21

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Yung-Chang Hung ,  Lyang-Gung Wang

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Yung-Chang Hung ,  Lyang-Gung Wang

    IPC分类号： B24D3/28 ,  B24D11/00

    CPC分类号： B24B37/24

    摘要： The present invention relates to a method for manufacturing a polishing pad. The method of the invention includes the steps of forming a polishing layer from a polyurethane solution has a solid content more than about 90 wt % and drying the polyurethane solution at a temperature from about 130° C. to about 170° C. The invention also provides a polishing pad manufactured by the method mentioned above. The defect of scraping the surface of the substrate to be polished due to polishing particles remaining is avoided when applying the polishing pad according to the invention, and the flatness of the substrate to be polished is raised and the defective rate is eliminated also.

    摘要翻译： 本发明涉及一种抛光垫的制造方法。 本发明的方法包括从聚氨酯溶液形成抛光层的步骤，其固体含量大于约90重量％，并在约130℃至约170℃的温度下干燥聚氨酯溶液。本发明还 提供通过上述方法制造的抛光垫。 当应用根据本发明的抛光垫时，避免了由于抛光颗粒残留而刮擦待抛光的基板的表面的缺陷，并且抛光的基板的平坦度提高并且不良率也被消除。

    POLISHING PAD AND METHOD FOR MAKING THE SAME
    36.
    发明申请
    POLISHING PAD AND METHOD FOR MAKING THE SAME 审中-公开
    抛光垫及其制造方法

    公开(公告)号：US20090258578A1

    公开(公告)日：2009-10-15

    申请号：US12208520

    申请日：2008-09-11

    申请人： Chung-Chih Feng ,  Chun-Ta Wang ,  Yung-Chang Hung ,  I-Peng Yao

    发明人： Chung-Chih Feng ,  Chun-Ta Wang ,  Yung-Chang Hung ,  I-Peng Yao

    IPC分类号： B24D11/00

    CPC分类号： B24B37/24 ,  B24B37/22 ,  B24D18/00

    摘要： The present invention relates to a polishing pad and method for making the same. In the invention, a liquid-state polymer material is directly formed on the surface of a base material, and then the liquid-state polymer material is solidified to form a flat grinding layer. Whereby, the polishing pad has high unity and flatness. The grinding layer has attenuated structures and a plurality of holes, thus increasing the storage ability of polishing particles distributed in a polishing liquid. In addition, the polishing pad has high compression ratio, so the polishing pad can compactly contact a polishing workpiece, and will not scratch the surface of the polishing workpiece scratched. Therefore, the polishing effect and quality will be improved.

    摘要翻译： 抛光垫及其制造方法技术领域本发明涉及抛光垫及其制造方法。 在本发明中，在基材的表面上直接形成液态聚合物材料，然后使液态聚合物材料固化，形成平坦的研磨层。 因此，抛光垫具有高的一体性和平坦度。 研磨层具有衰减结构和多个孔，从而增加了分布在抛光液中的抛光颗粒的储存能力。 此外，抛光垫具有高压缩比，因此抛光垫可以紧密接触抛光工件，并且不会刮擦抛光工件的表面划伤。 因此，抛光效果和质量将得到提高。

    Polishing pad having hollow fibers and the method for making the same
    38.
    发明申请
    Polishing pad having hollow fibers and the method for making the same 审中-公开
    具有中空纤维的抛光垫及其制造方法

    公开(公告)号：US20080064310A1

    公开(公告)日：2008-03-13

    申请号：US11517255

    申请日：2006-09-08

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Chao-Yuan Tsai

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Chao-Yuan Tsai

    IPC分类号： B24D11/00

    CPC分类号： B24B37/24 ,  B24D11/02

    摘要： The invention relates to a polishing pad having hollow fibers and a method for making the same. The polishing pad comprises a body and a plurality of hollow fibers. The body has a polishing surface. The hollow fibers are located within the body and have an opening on the polishing surface, wherein the hollow area of the section of each hollow fiber is larger than the sectional area of polishing particles in a polishing slurry. Therefore, the polishing slurry and polishing particles achieve a thorough circulation on the polishing pad via the hollow fibers.

    摘要翻译： 本发明涉及一种具有中空纤维的抛光垫及其制造方法。 抛光垫包括主体和多个中空纤维。 身体有一个抛光表面。 中空纤维位于主体内并且在抛光表面上具有开口，其中每个中空纤维的截面的中空区域大于抛光浆料中抛光颗粒的截面面积。 因此，抛光浆料和抛光颗粒通过中空纤维在抛光垫上实现彻底的循环。

    Polishing pad having surface texture
    39.
    发明申请
    Polishing pad having surface texture 审中-公开
    具有表面纹理的抛光垫

    公开(公告)号：US20080003935A1

    公开(公告)日：2008-01-03

    申请号：US11478605

    申请日：2006-07-03

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Chen-Hsiang Chao ,  Kun-Cheng Sung

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Chen-Hsiang Chao ,  Kun-Cheng Sung

    IPC分类号： B24D11/00

    CPC分类号： B24B37/26

    摘要： The present invention relates to a polishing pad having a surface texture. The surface texture is disposed on the polishing surface of the polishing pad. The surface texture comprises at least one first groove, at least one second groove, and a plurality of holes. The second groove extends from a central portion of the polishing pad to the edge of the polishing pad, and the first groove(s) is intersected with the second groove(s) to form a plurality of intersection points. The holes are disposed at the intersection points, and the depth of the holes is larger than that of the first groove. Thus, the second groove(s) enables impurities suspended in the polishing slurry to be quickly removed from the polishing pad, and the holes can store the polishing slurry to delay the polishing particles in the polishing slurry from departing from the polishing pad.

    摘要翻译： 本发明涉及具有表面纹理的抛光垫。 表面纹理设置在抛光垫的抛光表面上。 表面纹理包括至少一个第一凹槽，至少一个第二凹槽和多个孔。 第二凹槽从抛光垫的中心部分延伸到抛光垫的边缘，并且第一凹槽与第二凹槽相交以形成多个交点。 孔设置在交点处，孔的深度大于第一槽的深度。 因此，第二凹槽使得悬浮在抛光浆料中的杂质能够快速地从抛光垫移除，并且孔可以存储抛光浆料以延迟抛光浆料中的抛光颗粒从抛光垫离开。

    Sheet for mounting polishing workpiece and method for making the same
    40.
    发明申请
    Sheet for mounting polishing workpiece and method for making the same 审中-公开

    公开(公告)号：US20080003927A1

    公开(公告)日：2008-01-03

    申请号：US11797714

    申请日：2007-05-07

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Chen-Hsiang Chao

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Chen-Hsiang Chao

    IPC分类号： B24B1/00

    CPC分类号： B24B37/30 ,  B24B41/068

    摘要： The present invention relates to a sheet for mounting a polishing workpiece. The sheet comprises a substrate, a surface layer and a slightly rough layer. The substrate has a surface. The surface layer is located on the surface of the substrate, with no hole structure existing in the interior thereof, and has a surface. The slightly rough layer is located on the surface of the surface layer to carry and mount the polishing workpiece, with no hole structure existing in the interior thereof. Accordingly, when the polishing workpiece contacts the slightly rough layer, the air therebetween is easily vented out via the slightly rough layer, without the phenomenon of air wrapping, which increases the adsorption force between the polishing workpiece and the sheet.