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公开(公告)号：US11686956B2
公开(公告)日：2023-06-27
申请号：US16622497
申请日：2018-06-13
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Yuu Takiguchi , Kazuyoshi Hirose , Yoshitaka Kurosaka , Takahiro Sugiyama , Yoshiro Nomoto , Soh Uenoyama
CPC classification number: G02F1/015 , H01S5/0085 , H01S5/06821 , G02F1/0154
Abstract: The present embodiment relates to a light-emitting device that enables reduction in attenuation or diffraction effect caused by a semiconductor light-emitting device with respect to modulated light outputted from a spatial light modulator, and the light-emitting device includes the semiconductor light-emitting device that outputs light from a light output surface and the reflection type spatial light modulator that modulates the light. The spatial light modulator includes a light input/output surface having the area larger than the area of a light input surface of the semiconductor light-emitting device, modulates light taken through a region facing the light output surface of the semiconductor light-emitting device in the light input/output surface, and outputs the modulated light from another region of the light input/output surface to a space other than the light input surface of the semiconductor light-emitting device.
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32.发明授权公开(公告)号：US11646546B2
公开(公告)日：2023-05-09
申请号：US16433127
申请日：2019-06-06
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Takahiro Sugiyama , Yuu Takiguchi , Yoshitaka Kurosaka , Kazuyoshi Hirose , Yoshiro Nomoto , Soh Uenoyama
CPC classification number: H01S5/11 , H01S5/04256 , H01S5/42 , H01S5/026 , H01S5/0425 , H01S5/04254 , H01S5/1835 , H01S5/34313 , H01S5/34353 , H01S5/423 , H01S2301/16 , H01S2301/18 , H01S2301/20
Abstract: The present embodiment relates to a single semiconductor light-emitting element including a plurality of light-emitting portions each of which is capable of generating light of a desired beam projection pattern and a method for manufacturing the semiconductor light-emitting element. In the semiconductor light-emitting element, an active layer and a phase modulation layer are formed on a common substrate layer, and the phase modulation layer includes at least a plurality of phase modulation regions arranged along the common substrate layer. The plurality of phase modulation regions are obtained by separating the phase modulation layer into a plurality of places after manufacturing the phase modulation layer, and as a result, the semiconductor light-emitting element provided with a plurality of light-emitting portions that have been accurately aligned can be obtained through a simple manufacturing process as compared with the related art.
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公开(公告)号：US11637409B2
公开(公告)日：2023-04-25
申请号：US16432198
申请日：2019-06-05
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Takahiro Sugiyama , Yuu Takiguchi , Yoshitaka Kurosaka , Kazuyoshi Hirose , Yoshiro Nomoto , Soh Uenoyama
Abstract: A semiconductor light-emitting module according to the present embodiment includes a plurality of semiconductor light-emitting elements each outputting light of a desired beam projection pattern; and a support substrate holding the plurality of semiconductor light-emitting elements. Each of the plurality of semiconductor light-emitting elements includes a phase modulation layer configured to form a target beam projection pattern in a target beam projection region. The plurality of semiconductor light-emitting elements include first and second semiconductor light-emitting elements that are different in terms of at least any of a beam projection direction, the target beam projection pattern, and a light emission wavelength.
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公开(公告)号：US11567732B2
公开(公告)日：2023-01-31
申请号：US16603906
申请日：2018-03-26
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Hiroto Sakai , Taro Ando , Haruyoshi Toyoda , Yoshiyuki Ohtake , Yuu Takiguchi , Tomoko Hyodo
Abstract: A pseudo speckle pattern generation apparatus includes a light source, a beam expander, and a spatial light modulator. The spatial light modulator has an intensity modulation distribution based on a pseudo speckle pattern calculated from a pseudo random number pattern and a correlation function, receives light output from the light source and increased in beam diameter by the beam expander, spatially modulates the received light according to the modulation distribution, and outputs modulated light.
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公开(公告)号：US10576580B2
公开(公告)日：2020-03-03
申请号：US15509265
申请日：2015-08-26
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Yuu Takiguchi
IPC: B23K26/064 , B23K26/073 , G02F1/01 , G02F1/13
Abstract: A light irradiation apparatus includes a light source, a dispersive element, a spatial light modulator, and a focusing element. The dispersive element disperses pulsed light output from the light source and outputs the light. The dispersive element includes, for example. The spatial light modulator modulates a phase spectrum or an intensity spectrum of the light output from the dispersive element and outputs the light. The focusing element receives the light output from the spatial light modulator in a dispersing state, and focuses the light on a common region (focusing region) in a surface or an inside of an object.
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Patent Agency Ranking
36.发明申请公开(公告)号：US20180161923A1
公开(公告)日：2018-06-14
申请号：US15857279
申请日：2017-12-28
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Naoya Matsumoto , Yuu Takiguchi , Taro Ando , Yoshiyuki Ohtake , Takashi Inoue , Tomoko Otsu , Haruyoshi Toyoda
IPC: B23K26/064 , B23K26/06 , B23K26/03
CPC classification number: B23K26/064 , B23K26/032 , B23K26/0608 , G02F2203/12 , G02F2203/18 , G02F2203/50
Abstract: In the control of light condensing irradiation of laser light using a spatial light modulator, the number of wavelengths of the laser light, a value of each wavelength, and incident conditions of the laser light are acquired (step S101), the number of light condensing points, and a light condensing position, a wavelength, and a light condensing intensity on each light condensing point are set (S104), and a light condensing control pattern to be provided for the laser light is set for each light condensing point (S107). Then, a modulation pattern to be presented in the spatial light modulator is designed in consideration of the light condensing control pattern (S108). Further, in the design of a modulation pattern, a design method focusing on an effect by a phase value of one pixel is used, and when evaluating a light condensing state on the light condensing point, a propagation function to which a phase pattern opposite to the light condensing control pattern is added is used. Thereby, a light modulation control method, a program, a device, and a laser light irradiation device, which are capable of preferably achieving light condensing control of laser light are achieved.
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公开(公告)号：US09748737B2
公开(公告)日：2017-08-29
申请号：US14772826
申请日：2014-03-07
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Yuu Takiguchi , Yoshiro Nomoto
CPC classification number: H01S5/105 , H01S5/0071 , H01S5/187 , H01S5/4075 , H01S5/42 , H01S2301/18 , H01S2301/20
Abstract: A laser element includes a photonic crystal layer on which laser light is incident. The photonic crystal layer includes a base layer formed of a first refractive index medium; and a plurality of different refractive index regions formed of a second refractive index medium having a refractive index different from that of the first refractive index medium and disposed in the base layer. The plurality of different refractive index regions includes a first different refractive index region of which a planar shape is an approximate circle, an approximate square, or an approximate polygon having a rotational symmetry of 90° and a first area perpendicular to a thickness direction; and a second different refractive index region having a second area perpendicular to a thickness direction.
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公开(公告)号：US09519127B2
公开(公告)日：2016-12-13
申请号：US14394148
申请日：2013-04-18
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Naoya Matsumoto , Takashi Inoue , Yuu Takiguchi
CPC classification number: G02B17/0896 , G02B3/0081 , G02B5/32 , G02B15/00 , G02B21/002 , G02B27/0025
Abstract: A zoom lens includes a first lens unit including one of an SLM or a VFL, a second lens unit being optically coupled between the first lens unit and a focal plane and including one of an SLM or a VFL, and a control unit controlling focal lengths of the first and second lens units. A distance between the first lens unit and the second lens unit and a distance between the second lens unit and the focal plane are invariable. The control unit changes a magnification ratio of the zoom lens by changing the focal lengths of the first and second lens units.
Abstract translation: 变焦镜头包括包括SLM或VFL之一的第一透镜单元，光学耦合在第一透镜单元和焦平面之间并包括SLM或VFL之一的第二透镜单元和控制焦距的控制单元 的第一和第二透镜单元。 第一透镜单元和第二透镜单元之间的距离和第二透镜单元与焦平面之间的距离是不变的。 控制单元通过改变第一和第二透镜单元的焦距来改变变焦镜头的放大率。
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公开(公告)号：US09442295B2
公开(公告)日：2016-09-13
申请号：US14395148
申请日：2013-04-18
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Naoya Matsumoto , Takashi Inoue , Yuu Takiguchi
CPC classification number: G02B27/0927 , G02B21/16 , G02B26/06 , G02B27/0938 , G02F1/19 , G02F2203/50
Abstract: A beam shaping device includes a first phase modulation unit including a phase-modulation type SLM, and displaying a first phase pattern for modulating a phase of input light, a second phase modulation unit including a phase-modulation type SLM, being optically coupled to the first phase modulation unit, and displaying a second phase pattern for further modulating a phase of light phase-modulated by the first phase modulation unit, and a control unit providing the first and second phase patterns to the first and second phase modulation units, respectively. The first and second phase patterns are phase patterns for approximating an intensity distribution and a phase distribution of light output from the second phase modulation unit, to predetermined distributions.
Abstract translation: 光束整形装置包括：第一相位调制单元，包括相位调制型SLM，并显示用于调制输入光相位的第一相位图案;第二相位调制单元，包括相位调制型SLM，光学耦合到 第一相位调制单元，以及显示第二相位图案，用于进一步调制由第一相位调制单元相位调制的光的相位;以及控制单元，分别将第一和第二相位图案提供给第一和第二相位调制单元。 第一和第二相位图案是用于近似从第二相位调制单元输出的光的强度分布和相位分布到预定分布的相位图。
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公开(公告)号：US20150131142A1
公开(公告)日：2015-05-14
申请号：US14395167
申请日：2013-04-18
Applicant: HAMAMATSU PHOTONICS K.K.
Inventor： Naoya Matsumoto , Takashi Inoue , Yuu Takiguchi
CPC classification number: G02F1/29 , G02B21/16 , G02B26/06 , G02B26/0825 , G02B26/0875 , G02B27/0927 , G02B27/0938 , G02B27/56 , G02F2001/294
Abstract: A beam expander includes a first lens unit including one of an SLM or a VFL, a second lens unit being optically coupled to the first lens unit and including one of an SLM or a VFL, and a control unit controlling focal lengths of the first and second lens units. A distance between the first and second lens units is invariable. The control unit controls the focal lengths of the first and second lens units such that a light diameter D1 of light input to the first lens unit and a light diameter D2 of light output from the second lens unit are different from each other.
Abstract translation: 光束扩展器包括：包括SLM或VFL之一的第一透镜单元，光学耦合到第一透镜单元并且包括SLM或VFL中的一个的第二透镜单元，以及控制单元，其控制第一和 第二透镜单元。 第一和第二透镜单元之间的距离是不变的。 控制单元控制第一和第二透镜单元的焦距，使得输入到第一透镜单元的光的光直径D1和从第二透镜单元输出的光的光直径D2彼此不同。
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