公开(公告)号：US20130306239A1

公开(公告)日：2013-11-21

申请号：US13950040

申请日：2013-07-24

申请人： Leonard J. Sharpless ,  Keith Comendant

发明人： Leonard J. Sharpless ,  Keith Comendant

IPC分类号： H01L21/465 ,  C03C15/00 ,  C03C17/00 ,  H01L21/4763

CPC分类号： H01L21/465 ,  C03C15/00 ,  C03C17/001 ,  H01J37/321 ,  H01J37/32522 ,  H01L21/4763 ,  H01L21/67109

摘要： A plasma processing system for processing a substrate is described. The plasma processing system includes a bottom piece including a chuck configured for holding the substrate. The plasma processing system also includes an induction coil configured to generate an electromagnetic field in order to create a plasma for processing the substrate; and an optimized top piece coupled to the bottom piece, the top piece further configured for a heating and cooling system. Wherein, the heating and cooling system is substantially shielded from the electromagnetic field by the optimized top piece, and the optimized top piece can substantially be handled by a single person.

摘要翻译： 描述了一种用于处理衬底的等离子体处理系统。 等离子体处理系统包括底部件，其包括配置为保持基板的卡盘。 等离子体处理系统还包括被配置为产生电磁场以产生用于处理衬底的等离子体的感应线圈; 以及联接到所述底部件的优化的顶部件，所述顶部件还构造成用于加热和冷却系统。 其中，加热和冷却系统通过优化的顶部部件基本上与电磁场屏蔽，并且优化的顶部部件可以基本上由单个人操作。

公开(公告)号：US08461674B2

公开(公告)日：2013-06-11

申请号：US13238396

申请日：2011-09-21

申请人： Keith William Gaff ,  Keith Comendant ,  Anthony Ricci

发明人： Keith William Gaff ,  Keith Comendant ,  Anthony Ricci

IPC分类号： H01L23/48 ,  H01L23/52

CPC分类号： F25B21/04 ,  H01L21/0201 ,  H01L21/67109 ,  H01L21/67248 ,  H01L21/6831 ,  H01L35/34 ,  Y10T29/49083 ,  Y10T29/49165

摘要： A thermal plate for a substrate support assembly in a semiconductor plasma processing apparatus, comprises multiple independently controllable planar thermal zones arranged in a scalable multiplexing layout, and electronics to independently control and power the planar heater zones. Each planar thermal zone uses at least one Peltier device as a thermoelectric element. A substrate support assembly in which the thermal plate is incorporated includes an electrostatic clamping electrode layer and a temperature controlled base plate. Methods for manufacturing the thermal plate include bonding together ceramic or polymer sheets having planar thermal zones, positive, negative and common lines and vias.

摘要翻译： 一种用于半导体等离子体处理装置中的衬底支撑组件的热板，包括以可伸缩复用布局布置的多个可独立控制的平面热区，以及用于独立地控制和供电平面加热器区的电子装置。 每个平面热区使用至少一个珀耳帖装置作为热电元件。 其中结合热板的基板支撑组件包括静电夹持电极层和温度控制的基板。 用于制造热板的方法包括将具有平面热区域，正，负和公共线路和通孔的陶瓷或聚合物片材结合在一起。

公开(公告)号：US08269510B2

公开(公告)日：2012-09-18

申请号：US12240291

申请日：2008-09-29

申请人： Jaehyun Kim ,  Arthur H. Sato ,  Keith Comendant ,  Qing Liu ,  Feiyang Wu

发明人： Jaehyun Kim ,  Arthur H. Sato ,  Keith Comendant ,  Qing Liu ,  Feiyang Wu

IPC分类号： G01R27/26

CPC分类号： G01N27/04 ,  G01R27/2623 ,  Y10T29/49117

摘要： A chamber formed from an electrically conductive material is connected to a ground potential. A hot electrode formed from an electrically conductive material is disposed within the chamber in a substantially horizontal orientation and is physically separated from the chamber. The hot electrode includes a top surface defined to support a part to be measured. A radiofrequency (RF) transmission rod is connected to extend from a bottom surface of the hot electrode through an opening in a bottom of the chamber and be physically separated from the chamber. The RF transmission rod is defined to transmit RF power from a conductor plate in an electrical components housing to the hot electrode. An upper electrode formed from an electrically conductive material is disposed within the chamber in a substantially horizontal orientation. The upper electrode is electrically connected to the chamber and is defined to be movable in a vertical direction.

摘要翻译： 由导电材料形成的腔室连接到地电位。 由导电材料形成的热电极以大致水平的方向设置在腔室内，并且与腔室物理分离。 热电极包括限定为支撑要测量的部分的顶表面。 射频（RF）传输杆被连接以从热电极的底表面延伸通过腔室的底部中的一个开口，并与腔室物理分离。 RF传输杆被定义为将RF功率从电气部件壳体中的导体板传递到热电极。 由导电材料形成的上电极以大致水平的方向设置在腔室内。 上电极电连接到腔室并被限定为可在垂直方向上移动。

公开(公告)号：US20110140715A1

公开(公告)日：2011-06-16

申请号：US13030015

申请日：2011-02-17

申请人： Jaehyun Kim ,  Arthur H. Sato ,  Keith Comendant ,  Qing Liu ,  Feiyang Wu

发明人： Jaehyun Kim ,  Arthur H. Sato ,  Keith Comendant ,  Qing Liu ,  Feiyang Wu

IPC分类号： G01R35/00

CPC分类号： G01R27/2641 ,  G01R27/2694 ,  G01R35/005

摘要： A method is disclosed for calibrating a capacitance of an apparatus for measuring dielectric properties of a part. The apparatus includes an electrically grounded chamber, a lower electrode disposed within the chamber and connected to a radiofrequency (RF) transmission rod, an electrically grounded upper electrode disposed within the chamber above the lower electrode, and a variable capacitor connected to control transmission of RF power through the RF transmission rod to the lower electrode. A method is also disclosed for determining a capacitance of a part through use of the apparatus. A method is also disclosed for determining a dielectric constant of a part through use of the apparatus. A method is also disclosed for determining a loss tangent of a part through use of the apparatus.

摘要翻译： 公开了一种用于校准用于测量零件的介电特性的装置的电容的方法。 该设备包括电接地室，设置在室内的下电极并连接到射频（RF）传输杆，设置在下电极上方的室内的电接地上电极，以及连接到控制RF 通过RF传输杆向下电极供电。 还公开了一种通过使用该装置来确定零件的电容的方法。 还公开了一种通过使用该装置来确定部件的介电常数的方法。 还公开了一种通过使用该装置来确定零件的损耗角正切的方法。

公开(公告)号：US20110075313A1

公开(公告)日：2011-03-31

申请号：US12570263

申请日：2009-09-30

申请人： Keith Comendant

发明人： Keith Comendant

IPC分类号： H02H1/00

CPC分类号： H01L21/67069

摘要： A dielectric arrestor insert for use in a chamber wafer processing system having a gas input line, an arrestor housing and a wafer processing space. The input line is able to provide gas to the arrestor housing. The arrestor housing is able to house the dielectric arrestor insert. The dielectric arrestor insert comprises a gas entry portion, a non-linear channel and a gas exit portion. The gas entry portion is arranged to receive the gas from the input line. The non-linear channel is arranged to deliver the gas from the gas entry portion to the gas exit portion. The gas exit portion is arranged to deliver the gas from the non-linear channel to the wafer processing space.

摘要翻译： 一种用于具有气体输入管线，避雷器壳体和晶片处理空间的室晶片处理系统中的介电抑制器插入件。 输入线能够向避雷器壳体提供气体。 避雷器壳体能够容纳介电避雷器插入物。 介电抑制器插件包括气体入口部分，非线性通道和气体出口部分。 气体入口部分被布置成从输入管线接收气体。 非线性通道布置成将气体从气体入口部分输送到气体出口部分。 气体出口部分布置成将气体从非线性通道输送到晶片处理空间。

公开(公告)号：US20090091340A1

公开(公告)日：2009-04-09

申请号：US12240291

申请日：2008-09-29

申请人： Jaehyun Kim ,  Arthur H. Sato ,  Keith Comendant ,  Qing Liu ,  Feiyang Wu

发明人： Jaehyun Kim ,  Arthur H. Sato ,  Keith Comendant ,  Qing Liu ,  Feiyang Wu

IPC分类号： G01R27/08

CPC分类号： G01N27/04 ,  G01R27/2623 ,  Y10T29/49117

摘要： A chamber formed from an electrically conductive material is connected to a ground potential. A hot electrode formed from an electrically conductive material is disposed within the chamber in a substantially horizontal orientation and is physically separated from the chamber. The hot electrode includes a top surface defined to support a part to be measured. A radiofrequency (RF) transmission rod is connected to extend from a bottom surface of the hot electrode through an opening in a bottom of the chamber and be physically separated from the chamber. The RF transmission rod is defined to transmit RF power from a conductor plate in an electrical components housing to the hot electrode. An upper electrode formed from an electrically conductive material is disposed within the chamber in a substantially horizontal orientation. The upper electrode is electrically connected to the chamber and is defined to be movable in a vertical direction.

摘要翻译： 由导电材料形成的腔室连接到地电位。 由导电材料形成的热电极以大致水平的方向设置在腔室内，并且与腔室物理分离。 热电极包括限定为支撑要测量的部分的顶表面。 射频（RF）传输杆被连接以从热电极的底表面延伸通过腔室的底部中的一个开口，并与腔室物理分离。 RF传输杆被定义为将RF功率从电气部件壳体中的导体板传递到热电极。 由导电材料形成的上电极以大致水平的方向设置在腔室内。 上电极电连接到腔室并被限定为可在垂直方向上移动。

公开(公告)号：US20090091335A1

公开(公告)日：2009-04-09

申请号：US12240414

申请日：2008-09-29

申请人： Jaehyun Kim ,  Arthur H. Sato ,  Keith Comendant ,  Qing Liu ,  Feiyang Wu

发明人： Jaehyun Kim ,  Arthur H. Sato ,  Keith Comendant ,  Qing Liu ,  Feiyang Wu

IPC分类号： G01R27/26

CPC分类号： G01N27/04 ,  G01R27/2623 ,  Y10T29/49117

摘要： Characterizing dielectric properties of a part includes placing a full-sized part within a dielectric property measurement apparatus. In one embodiment, the full-sized part is a dielectric part of a plasma processing system. The dielectric property measurement apparatus is operated to determine a dielectric constant value of the full-sized part and a loss tangent value of the full-sized part. The determined dielectric constant and loss tangent values are affixed to the full-sized part.

摘要翻译： 表征部件的介电性能包括将全尺寸部件放置在介电性能测量装置内。 在一个实施例中，全尺寸部件是等离子体处理系统的电介质部分。 操作介电性能测量装置以确定全尺寸部件的介电常数值和全尺寸部件的损耗角正切值。 所确定的介电常数和损耗正切值贴在全尺寸的部分上。

公开(公告)号：US20090022205A1

公开(公告)日：2009-01-22

申请号：US11826941

申请日：2007-07-19

申请人： Keith Comendant

发明人： Keith Comendant

IPC分类号： G01K1/08 ,  G01K11/20

CPC分类号： G01K1/143 ,  G01K1/16

摘要： Temperature probes for measuring the temperature of objects are disclosed. The temperature probes include a housing and a tip in thermal contact with an end of the housing. The tip is adapted to contact a surface of the object whose temperature is to be measured by the temperature probe. A portion of the housing in contact with the tip has a high thermal resistance effective to thermally isolate the tip from an adjacent portion of the housing. A sensor is located inside of the housing and adapted to measure the temperature of the tip.

摘要翻译： 公开了用于测量物体温度的温度探头。 温度探头包括壳体和与壳体的端部热接触的尖端。 尖端适于接触由温度探针测量温度的物体的表面。 与尖端接触的壳体的一部分具有有效地将尖端与壳体的相邻部分热隔离的高热阻。 传感器位于壳体内部并适于测量尖端的温度。

公开(公告)号：US20080314508A1

公开(公告)日：2008-12-25

申请号：US12230238

申请日：2008-08-26

申请人： Tony Ricci ,  Jim Tappan ,  Keith Comendant

发明人： Tony Ricci ,  Jim Tappan ,  Keith Comendant

IPC分类号： B32B38/10

CPC分类号： H01L21/76251 ,  H01L21/68757 ,  H01L21/68785

摘要： A method of protecting a bond layer in a substrate support adapted for use in a plasma processing system. The method includes the steps of attaching an upper member of a substrate support to a lower member of a substrate support with a bonding material. An adhesive is applied to an outer periphery of the upper member and to an upper periphery of the lower member, and a protective ring is positioned around the outer periphery of the upper member and the upper periphery of the lower member. The protective ring is originally fabricated with dimensions that provide mechanical stability and workability. The protective ring is then machined to an exact set of final dimensions consistent with the design of the substrate support application.

公开(公告)号：US20080090417A1

公开(公告)日：2008-04-17

申请号：US11639264

申请日：2006-12-15

申请人： Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Jason Augustino ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty

发明人： Anthony De La Llera ,  Allan K. Ronne ,  Jaehyun Kim ,  Jason Augustino ,  Rajinder Dhindsa ,  Yen-Kun Wang ,  Saurabh J. Ullal ,  Anthony J. Norell ,  Keith Comendant ,  William M. Denty

IPC分类号： H05H1/24 ,  C23F1/00 ,  H01L21/302

CPC分类号： H01J37/32449 ,  H01J37/32009 ,  H01J37/32541 ,  H01J37/3255

摘要： Components of a plasma processing apparatus includes a backing member with gas passages attached to an upper electrode with gas passages. To compensate for the differences in coefficient of thermal expansion between the metallic backing member and upper electrode, the gas passages are positioned and sized such that they are misaligned at ambient temperature and substantially concentric at an elevated processing temperature. Non-uniform shear stresses can be generated in the elastomeric bonding material, due to the thermal expansion. Shear stresses can either be accommodated by applying an elastomeric bonding material of varying thickness or using a backing member comprising of multiple pieces.

摘要翻译： 等离子体处理装置的组件包括具有气体通道的背衬构件，气体通道连接到具有气体通道的上部电极。 为了补偿金属背衬构件和上部电极之间的热膨胀系数的差异，气体通道的定位和尺寸使得它们在环境温度下不对准并且在升高的处理温度下基本上同心。 由于热膨胀，弹性粘合材料中可能会产生不均匀的剪切应力。 剪切应力可以通过施加不同厚度的弹性粘合材料或使用包括多个片的背衬构件来适应。