公开(公告)号：US6120972A

公开(公告)日：2000-09-19

申请号：US136051

申请日：1998-08-18

申请人： Shin-ichiro Iwanaga ,  Eiichi Kobayashi ,  Takayoshi Tanabe ,  Kazuo Kawaguchi

发明人： Shin-ichiro Iwanaga ,  Eiichi Kobayashi ,  Takayoshi Tanabe ,  Kazuo Kawaguchi

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0045 ,  G03F7/039

摘要： A radiation-sensitive resin composition comprising (A) a copolymer which comprises (a) a repeating unit (I) formed by cleavage of a carbon--carbon double bond of a monomer having one polymerizable carbon--carbon double bond and (b) a repeating unit (II) formed by cleavage of a carbon--carbon double bond of a monomer having two or more polymerizable carbon--carbon double bonds and at least one divalent group decomposed by an acid of the following formulas (1) or (2), ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are an alkyl group having 1-5 carbon atoms or an aryl group having 6-14 carbon atoms individually, said monomer having a structure in which each carbon--carbon double bond combines via said divalent group, and (B) a photoacid generator. The radiation-sensitive resin composition exhibits excellent sensitivity and resolution, fewer effect from the swing curves, excellent pattern profile, and superior heat resistance, high sensitivity to ultraviolet rays, far ultraviolet rays, X-rays, and various types of radiation such as charged particle rays, and is useful as a chemically amplified positive tone resist used in the manufacture of integrated circuit devices.

摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）共聚物，其包含（a）通过裂解具有一个可聚合碳 - 碳双键的单体的碳 - 碳双键形成的重复单元（I）和（b）重复 通过裂解具有两个或多个可聚合碳 - 碳双键的单体的碳 - 碳双键形成的单元（II）和由下式（1）或（2）的酸分解的至少一个二价基团，其中 R1，R2，R3和R4分别是具有1-5个碳原子的烷基或具有6-14个碳原子的芳基，所述单体具有其中每个碳 - 碳双键通过所述二价基团结合的结构和（ B）光致酸发生器。 辐射敏感性树脂组合物表现出优异的灵敏度和分辨率，较少的挥发曲线影响，优异的图案轮廓和优异的耐热性，对紫外线，远紫外线，X射线以及各种类型的辐射如带电的高灵敏度 粒子射线，并且可用作用于制造集成电路器件的化学放大正色调抗蚀剂。

公开(公告)号：US5952150A

公开(公告)日：1999-09-14

申请号：US892200

申请日：1997-07-14

申请人： Yoshihisa Ohta ,  Yong Wang ,  Takayoshi Tanabe ,  Shin-ichiro Iwanaga

发明人： Yoshihisa Ohta ,  Yong Wang ,  Takayoshi Tanabe ,  Shin-ichiro Iwanaga

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03C1/492

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/122 ,  Y10S430/128

摘要： A positive-tone or negative-tone radiation sensitive resin composition which allows easy preparation of a resist, exhibits superior storage stability, high sensitivity, and high resolution capability, and is capable of producing excellent resist patterns. The positive-tone type composition comprises (A) a disulfonylmethane derivative in which the main chain with two sulfonyl groups bonded forms a three to eleven member cyclic carbon structure and (B) (a) a resin protected by an acid decomposable group or (b) an alkali-soluble resin and an alkali-solubility control agent. The negative-tone type composition comprises the component (A), (C) an alkali-soluble resin, and (D) a cross-linking agent.

摘要翻译： 可以容易地制备抗蚀剂的正色调或负色度辐射敏感性树脂组合物，显示出优异的储存稳定性，高灵敏度和高分辨能力，并且能够产生优异的抗蚀剂图案。 正调型组合物包含（A）二磺酰基甲烷衍生物，其中具有两个磺酰基键合的主链形成三至十一个环状碳结构，（B）（a）由酸可分解基团保护的树脂或（b ）碱溶性树脂和碱溶性控制剂。 负色型组合物包含组分（A），（C）碱溶性树脂和（D）交联剂。

公开(公告)号：US5736298A

公开(公告)日：1998-04-07

申请号：US536494

申请日：1995-10-02

申请人： Katsuo Koshimura ,  Takayoshi Tanabe ,  Hozumi Sato ,  Noboru Ohshima ,  Takashi Nishioka

发明人： Katsuo Koshimura ,  Takayoshi Tanabe ,  Hozumi Sato ,  Noboru Ohshima ,  Takashi Nishioka

IPC分类号： G03F7/027 ,  G03F7/033 ,  G03C1/73

CPC分类号： G03F7/027 ,  G03F7/033

摘要： A photo-sensitive resin composition is provided which contains (1) a particulate polymer of a carboxy-group-containing-diene having a cross-linked structure; (2) a polymer having two or more photo-polymerizable unsaturated groups at its molecular chain terminals, and, optionally, a photo-polymerizable unsaturated group, carboxyl group, hydroxy group, amino group, or epoxy group in side chains, or (2') a non-diene-type polymer having a photo-polymerizable unsaturated group, carboxyl group, hydroxy group, amino group, or epoxy group in side chains, or a low molecular weight linear diene-type polymer; (3) a photo-polymerizable unsaturated monomer; (4) a polymer containing an amino group; and (5) a photo-polymerization initiator. The photo-sensitive resin composition has excellent water-developing capability and shows almost no swelling in water, causing minimal reduction in strength and only minimal dimensional changes during development. Resin plates prepared from the composition possess excellent strength after exposure to light, excellent elongation at break, impact resilience and superb transparency, providing a good characteristic balance of properties.

摘要翻译： 提供了一种光敏树脂组合物，其包含（1）具有交联结构的含羧基的二烯的颗粒状聚合物; （2）在其分子链末端具有两个以上的光聚合性不饱和基团的聚合物，以及任选的侧链中的光聚合性不饱和基团，羧基，羟基，氨基或环氧基，或（2 '）侧链中具有光聚合性不饱和基团，羧基，羟基，氨基或环氧基的非二烯类聚合物，或低分子线型二烯类聚合物; （3）光聚合性不饱和单体; （4）含有氨基的聚合物; 和（5）光聚合引发剂。 感光树脂组合物具有优异的水显影能力，并且在水中几乎没有溶胀，在显影期间几乎不降低强度并且只有极小的尺寸变化。 由组合物制备的树脂板在曝光后具有优异的强度，优异的断裂伸长率，抗冲击弹性和极好的透明度，提供良好的性能特征平衡。

公开(公告)号：US08247481B2

公开(公告)日：2012-08-21

申请号：US13072788

申请日：2011-03-28

申请人： Atsushi Ito ,  Shigehito Asano ,  Hirofumi Goto ,  Takayoshi Tanabe

发明人： Atsushi Ito ,  Shigehito Asano ,  Hirofumi Goto ,  Takayoshi Tanabe

IPC分类号： C08L53/00 ,  G03F7/004 ,  C08F293/00

CPC分类号： G03F7/033 ,  C08F297/00 ,  G03F7/0045 ,  G03F7/038

摘要： A photosensitive insulating resin composition includes a block copolymer, a crosslinking agent, a photosensitive compound, and a solvent. The block copolymer includes a first structural unit shown by a following formula (1) and a second structural unit shown by a following formula (2), wherein R1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R2 represents an alkyl group having 1 to 4 carbon atoms.

摘要翻译： 光敏绝缘树脂组合物包括嵌段共聚物，交联剂，光敏化合物和溶剂。 嵌段共聚物包括由下式（1）表示的第一结构单元和由下式（2）表示的第二结构单元，其中R 1表示氢原子或具有1至4个碳原子的烷基，R 2表示 具有1至4个碳原子的烷基。

公开(公告)号：US20090279020A1

公开(公告)日：2009-11-12

申请号：US12297244

申请日：2007-02-01

申请人： Takayoshi Tanabe

发明人： Takayoshi Tanabe

IPC分类号： G02F1/13357 ,  F21V7/04

CPC分类号： G02B6/0021 ,  G02B6/0068

摘要： In a surface-area light source device, a light entrance side surface of a light guide plate of a surface-area light source device has a staircase shape having steps in the vertical direction, and light emission diodes are provided at each step. The structure enables the distance between a light emission diode provided at one step and light emission diodes provided at an adjacent step to be maintained greater even if the thickness of the light guide plate is reduced so as to decrease intervals of the light emission diodes in the direction of the thickness of the light guide plate. As a consequence, the amount of transmission and reception of heat produced by the light emission diodes is reduced to prevent an increase in the temperature of the diodes. This allows a reduction in the thickness of the light guide plate with the brightness of light emitted from the light guide plate maintained, enabling the surface-area light source device to be thinned. As a result, a large number of light emitting diodes are provided, so that the brightness of the surface light source device is increased.

摘要翻译： 在表面积光源装置中，表面积光源装置的导光板的光入射侧面具有在垂直方向上具有台阶的阶梯状，在各阶段设置发光二极管。 该结构使得即使在导光板的厚度减小的情况下，一步设置的发光二极管与设置在相邻台阶处的发光二极管之间的距离也能够保持较大，从而减小了发光二极管的间隔 导光板厚度方向。 结果，减少由发光二极管产生的热量的发送和接收量，以防止二极管的温度升高。 这允许导光板的厚度随着从导光板发出的光的亮度得以维持而减小，使得表面光源装置变薄。 结果，提供了大量的发光二极管，从而增加了表面光源装置的亮度。

公开(公告)号：US20070253218A1

公开(公告)日：2007-11-01

申请号：US11573591

申请日：2005-06-22

申请人： Takayoshi Tanabe

发明人： Takayoshi Tanabe

IPC分类号： F21V7/05

CPC分类号： G02B6/0068 ,  G02B6/0021 ,  G02B6/0028 ,  G02B6/0046

摘要： A backlight apparatus of a sidelight type includes a light guide plate having an incident face on a lateral face and a light source unit having a plurality of substrates. The plurality of the substrates are respectively disposed on the incident face side of the light guide plate such that each of substrate faces of the substrates is parallel with a light exit face of the light guide plate, and the substrates are adjacent to one another in a thickness direction of the light guide plate. A plurality of light emitting devices that emit light along the substrate faces are mounted in columns on each of the substrate faces of the plurality of the substrates such that emitting directions of the light emitting devices are directed to the incident face.

摘要翻译： 背光源的背光装置包括具有在侧面上的入射面的导光板和具有多个基板的光源单元。 多个基板分别设置在导光板的入射面侧，使得基板的每个基板面与导光板的光出射面平行，并且基板彼此相邻地邻接 导光板的厚度方向。 沿着衬底面发射光的多个发光器件以多个衬底的每个衬底面上的列安装成使得发光器件的发射方向指向入射面。

公开(公告)号：US20070096355A1

公开(公告)日：2007-05-03

申请号：US10561907

申请日：2004-06-25

申请人： Takao Yashiro ,  Ryoji Tatara ,  Takayoshi Tanabe

发明人： Takao Yashiro ,  Ryoji Tatara ,  Takayoshi Tanabe

IPC分类号： B29C35/08

CPC分类号： C08G18/3853 ,  C08G59/686 ,  G03F7/0037 ,  G03F7/038

摘要： The invention relates to a photocurable resin composition comprising: (A) 20-65 wt % of a cationically polymerizable component, (B) 0.1-10 wt % of a cationic-polymerization initiator, (C) 5-45 wt % of a component having a structure shown by the following formula (1), wherein R′, R2, and R3 individually represent organic groups, provided that at least two of R1, R2, and R3 have a polymerizable carbon-carbon double bond, (D) 0.1-10 wt % of a radical-polymerization initiator, and (E) 0-20 wt % of a component having at least one radically polymerizable group in the molecule; The invention also relates to a method of making three dimensional articles and the use of the articles.

摘要翻译： 本发明涉及一种光固化树脂组合物，其包含：（A）20-65重量％的阳离子可聚合组分，（B）0.1-10重量％的阳离子聚合引发剂，（C）5-45重量％的组分 具有下式（1）所示的结构，其中R'，R“2”和“R 3”各自表示有机基团，条件是R“至少两个 > 1，R 2和R 3具有可聚合的碳 - 碳双键，（D）0.1-10重量％的自由基聚合引发剂 ，和（E）0-20重量％的分子中具有至少一个自由基聚合基团的组分; 本发明还涉及制造三维制品的方法和制品的使用。

公开(公告)号：US06357888B1

公开(公告)日：2002-03-19

申请号：US09401806

申请日：1999-09-22

申请人： Manabu Takata ,  Takayoshi Tanabe

发明人： Manabu Takata ,  Takayoshi Tanabe

IPC分类号： F21V704

CPC分类号： G02B6/0053

摘要： A surface illuminant device includes a surface illuminant having a light distribution characteristic with no directivity relative to specific directions, and a prism sheet having a plurality of prisms each having a predetermined apical angle. The prism sheet is placed on the light emission side of the surface illuminant. One side of the prism sheet on which a plurality of prisms are placed is opposite to the light emission side of the surface illuminant. Accordingly, light can be emitted in a plurality of specific directions in concentrative manner to enhance luminance in that plurality of directions. Further, the surface illuminant device includes an optical sheet which condenses the incident light. In the luminance distribution (light distribution characteristic) thus obtained, the luminance gently decreases in the vicinity of the directions in which light is emitted in concentrative manner.

摘要翻译： 表面发光器件包括具有相对于特定方向没有方向性的光分布特性的表面发光体，以及具有各自具有预定顶角的多个棱镜的棱镜片。 棱镜片放置在表面光源的发光侧。 配置有多个棱镜的棱镜片的一侧与表面光源的发光侧相反。 因此，能够以多个特定方向发光，以提高多个方向的亮度。 此外，表面光源装置包括冷凝入射光的光学片。 在这样得到的亮度分布（配光特性）中，在以集中方式发光的方向附近，亮度缓慢降低。

公开(公告)号：US06235446B1

公开(公告)日：2001-05-22

申请号：US09134163

申请日：1998-08-14

申请人： Toshiaki Ikemura ,  Eiichi Kobayashi ,  Takayoshi Tanabe ,  Shin-ichiro Iwanaga

发明人： Toshiaki Ikemura ,  Eiichi Kobayashi ,  Takayoshi Tanabe ,  Shin-ichiro Iwanaga

IPC分类号： G03F7004

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： A radiation sensitive resin composition comprising (A) a copolymer possessing recurring units of the formulas (1), (2), and (3), which turns alkali soluble in the presence of acid and (B) a photosensitive acid generator. Because the composition can resolve line-and-space patterns, isolated patterns, and contact hole patterns with satisfactory appearance and high resolution, it is useful as a chemically amplified positive resist for use in the manufacture of semiconductor devices.

摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）具有式（1），（2）和（3）的重复单元的共聚物，其在酸的存在下使碱溶解，并且（B）感光酸产生剂。 因为该组合物可以分辨线和空间图案，隔离图案和具有令人满意的外观和高分辨率的接触孔图案，因此它可用作用于制造半导体器件的化学放大型正性抗蚀剂。

公开(公告)号：US5994022A

公开(公告)日：1999-11-30

申请号：US965432

申请日：1997-11-06

申请人： Takayoshi Tanabe ,  Eiichi Kobayashi ,  Makoto Shimizu ,  Shin-ichiro Iwanaga

发明人： Takayoshi Tanabe ,  Eiichi Kobayashi ,  Makoto Shimizu ,  Shin-ichiro Iwanaga

IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/109 ,  Y10S430/111 ,  Y10S430/121

摘要： A radiation sensitive resin composition useful as a chemically amplified positive tone resist is provided. The composition comprises (A) a copolymer which becomes soluble in an alkali developing solution by the action of an acid, the copolymer containing a recurring unit (I) having a structure which is decomposed by the action of an acid and increases the solubility in an alkaline developing solution and a recurring unit(II) obtained from a compound having at least two (meth)acryloyl groups in the molecule by the cleavage of the carbon-carbon double bond, and (B) a photoacid generator which produces an acid on being irradiated by a radiation. The composition exhibits high resolution, superb capability of producing superior pattern forms, and excellent resistance to PED, and high process stability, is affected by a standing wave only to a minimum extent, and possessed prominent heat resistance.

摘要翻译： 提供了可用作化学放大正性抗蚀剂的辐射敏感性树脂组合物。 该组合物包含（A）通过酸作用而变得可溶于碱性显影液的共聚物，该共聚物含有具有通过酸作用分解的结构的重复单元（I），并增加其在 碱性显影液和通过裂解碳 - 碳双键从分子中具有至少两个（甲基）丙烯酰基的化合物获得的重复单元（II），和（B）产生酸的光致酸产生剂 用辐射照射。 该组合物表现出高分辨率，优异的图案形式的出色能力和优异的耐PED性，并且工艺稳定性高，仅受驻波的影响最小，具有显着的耐热性。