Source of x-rays
    31.
    发明申请
    Source of x-rays 有权
    X光源

    公开(公告)号:US20070253535A1

    公开(公告)日:2007-11-01

    申请号:US11411131

    申请日:2006-04-26

    CPC classification number: H05G2/00 H01J25/00

    Abstract: A charged particle beam including charged particles (e.g., electrons) is generated from a charged particle source (e.g., a cathode or scanning electron beam). As the beam is projected, it passes between plural alternating electric fields. The attraction of the charged particles to their oppositely charged fields accelerates the charged particles, thereby increasing their velocities in the corresponding (positive or negative) direction. The charged particles therefore follow an oscillating trajectory. When the electric fields are selected to produce oscillating trajectories having the same (or nearly the same) as a multiple of the frequency of the emitted x-rays, the resulting photons can be made to constructively interfere with each other to produce a coherent x-ray source.

    Abstract translation: 从带电粒子源(例如阴极或扫描电子束)产生包括带电粒子(例如电子)的带电粒子束。 当光束投射时,它通过多个交变电场。 带电粒子对其带电荷的场的吸引力加速了带电粒子,从而在相应的(正或负)方向上增加了它们的速度。 带电粒子因此遵循振荡轨迹。 当选择电场以产生具有与发射的x射线的频率的倍数相同(或几乎相同)的振荡轨迹时,可以使得到的光子相互干涉以产生相干的x射线, 射线源。

    Wafer-level testing of light-emitting resonant structures
    33.
    发明申请
    Wafer-level testing of light-emitting resonant structures 审中-公开
    发光谐振结构的晶片级测试

    公开(公告)号:US20070200063A1

    公开(公告)日:2007-08-30

    申请号:US11418124

    申请日:2006-05-05

    Inventor: Jonathan Gorrell

    Abstract: A device for testing a light-emitting resonant structure on a wafer includes a vacuum chamber for holding the resonant structure; a source of charged particles; a electromagnetic radiation detector; a positioning mechanism constructed and adapted control the position of the wafer within the vacuum chamber; and a controller operatively connected to said source of electrons and to said detector and to said positioning mechanism. A voltage source may be provided.

    Abstract translation: 用于测试晶片上的发光谐振结构的装置包括:用于保持谐振结构的真空室; 带电粒子的来源; 电磁辐射探测器; 定位机构构造并适配于控制晶片在真空室内的位置; 以及可操作地连接到所述电子源和所述检测器和所述定位机构的控制器。 可以提供电压源。

    Resonant structure-based display
    34.
    发明申请
    Resonant structure-based display 失效
    基于结构的共振显示

    公开(公告)号:US20070152938A1

    公开(公告)日:2007-07-05

    申请号:US11325432

    申请日:2006-01-05

    Abstract: A display of wavelength elements can be produced from resonant structures that emit light (and other electromagnetic radiation having a dominant frequency higher than that of microwave) when exposed to a beam of charged particles, such as electrons from an electron beam. An exemplary display with three wavelengths per pixel utilizes three resonant structures per pixel. The spacings and lengths of the fingers of the resonant structures control the light emitted from the wavelength elements. Alternatively, multiple resonant structures per wavelength can be used as well.

    Abstract translation: 当暴露于带电粒子束(例如来自电子束的电子)时,可以从发出光的谐振结构(和具有高于微波的主频的其他电磁辐射)产生波长元件的显示。 每像素具有三个波长的示例性显示器每像素使用三个谐振结构。 谐振结构的指状物的间距和长度控制从波长元件发射的光。 或者,也可以使用每个波长的多个谐振结构。

    Method of patterning ultra-small structures
    35.
    发明申请
    Method of patterning ultra-small structures 审中-公开
    图案超小结构的方法

    公开(公告)号:US20070034518A1

    公开(公告)日:2007-02-15

    申请号:US11203407

    申请日:2005-08-15

    CPC classification number: C25D5/18 C25D5/022

    Abstract: We describe a process to produce ultra-small structures of between ones of nanometers to hundreds of micrometers in size, in which the structures are compact, nonporous and exhibit smooth vertical surfaces. Such processing is accomplished with pulsed electroplating techniques using ultra-short pulses in a controlled and predictable manner.

    Abstract translation: 我们描述了一种制造尺寸为纳米至数百微米之间的超小结构的方法,其中结构是紧凑的,无孔的并且呈现平滑的垂直表面。 使用脉冲电镀技术以受控和可预测的方式使用超短脉冲来实现这种处理。

    Patterning thin metal films by dry reactive ion etching
    36.
    发明申请
    Patterning thin metal films by dry reactive ion etching 审中-公开
    通过干式反应离子蚀刻来形成薄金属薄膜

    公开(公告)号:US20060035173A1

    公开(公告)日:2006-02-16

    申请号:US10917511

    申请日:2004-08-13

    CPC classification number: H01L21/32136 H01L21/32139

    Abstract: We describe a new method for etching patterns in silver, copper, or gold, or other plate metal thin films. A pattern of a hard mask is placed onto the surface of the thin film, followed by a step of reactive ion etching using a plasma formed using a gas feed of some combination of some amounts of methane (CH4) and hydrogen (H2), and some or no amount of Argon (Ar). The areas of silver, copper or gold not covered by the hard mask are etched while the hard mask protects those areas that will form the raised portions of thin film in the final structure.

    Abstract translation: 我们描述了一种蚀刻银,铜或金或其他板金属薄膜图案的新方法。 将硬掩模的图案放置在薄膜的表面上,然后使用使用一些组合的一些量的甲烷(CH 3 SO 4)的气体进料形成的等离子体进行反应离子蚀刻的步骤 )和氢(H 2 H 2),以及一些或不含氩量(Ar)。 蚀刻没有被硬掩模覆盖的银,铜或金的区域,而硬掩模保护在最终结构中将形成薄膜的凸起部分的那些区域。

    Switching micro-resonant structures by modulating a beam of charged particles

    公开(公告)号:US08384042B2

    公开(公告)日:2013-02-26

    申请号:US12329866

    申请日:2008-12-08

    Abstract: When using micro-resonant structures, a resonant structure may be turned on or off (e.g., when a display element is turned on or off in response to a changing image or when a communications switch is turned on or off to send data different data bits). Rather than turning the charged particle beam on and off, the beam may be moved to a position that does not excite the resonant structure, thereby turning off the resonant structure without having to turn off the charged particle beam. In one such embodiment, at least one deflector is placed between a source of charged particles and the resonant structure(s) to be excited. When the resonant structure is to be turned on (i.e., excited), the at least one deflector allows the beam to pass by undeflected. When the resonant structure is to be turned off, the at least one deflector deflects the beam away from the resonant structure by an amount sufficient to prevent the resonant structure from becoming excited.

    Integration of vacuum microelectronic device with integrated circuit
    38.
    发明授权
    Integration of vacuum microelectronic device with integrated circuit 失效
    真空微电子器件与集成电路的集成

    公开(公告)号:US08188431B2

    公开(公告)日:2012-05-29

    申请号:US11418318

    申请日:2006-05-05

    Inventor: Jonathan Gorrell

    CPC classification number: H01J23/34 B81C1/00253 H01J25/00

    Abstract: A device includes an integrated circuit (IC) and at least one ultra-small resonant structure formed on said IC. At least the ultra-small resonant structure portion of the device is vacuum packaged. The ultra-small resonant structure portion of the device may be grounded or connected to a known electrical potential. The ultra-small resonant structure may be electrically connected to the underlying IC, or not.

    Abstract translation: 一种器件包括集成电路(IC)和形成在所述IC上的至少一个超小型谐振结构。 至少装置的超小型谐振结构部分被真空包装。 器件的超小谐振结构部分可以接地或连接到已知电位。 超小型谐振结构可以电连接到下面的IC,或者不是。

    Selectable frequency light emitter
    39.
    发明授权
    Selectable frequency light emitter 有权
    可选频率发光器

    公开(公告)号:US07986113B2

    公开(公告)日:2011-07-26

    申请号:US11418096

    申请日:2006-05-05

    CPC classification number: H01J25/00

    Abstract: We describe an ultra-small resonant structure that produces electromagnetic radiation (e.g., visible light) at selected frequencies that can also be used or formed in conjunction with passive optical structures. The resonant structure can be produced from any conducting material (e.g., metal such as silver or gold). The passive optical structures can be formed from glass, polymer, dielectrics, or any other material sufficiently transparent using conventional patterning, etching and deposition techniques. The passive optical structures can be formed directly on the ultra-small resonant structures, or alternatively on an intermediate structure, or the passive optical structures can be formed in combination with other passive optical structures. The size and dimension of the passive optical structures can be identical with underlying structures, they can merely extend outwardly beyond an exterior shape of the underlying structure, or the passive optical structures can span across a plurality of the underlying structures, including in each instance embodiments with and without the intermediate structures.

    Abstract translation: 我们描述了一种超小型谐振结构,其产生可以选择的频率的电磁辐射(例如可见光),其也可以与无源光学结构结合使用或形成。 共振结构可以由任何导电材料(例如金属如银或金)制成。 无源光学结构可以由玻璃,聚合物,电介质或使用常规图案化,蚀刻和沉积技术足够透明的任何其它材料形成。 无源光学结构可以直接形成在超小型谐振结构上,或者在中间结构上形成,或者无源光学结构可以与其它无源光学结构组合形成。 无源光学结构的尺寸和尺寸可以与下面的结构相同,它们只能向外延伸超过下面的结构的外部形状,或者被动光学结构可跨越多个下面的结构,包括在每个实例中 有和没有中间结构。

    Spiral Electron Accelerator for Ultra-Small Resonant Structures
    40.
    发明申请
    Spiral Electron Accelerator for Ultra-Small Resonant Structures 失效
    用于超小型谐振结构的螺旋电子加速器

    公开(公告)号:US20100277066A1

    公开(公告)日:2010-11-04

    申请号:US12636154

    申请日:2009-12-11

    CPC classification number: H05H15/00

    Abstract: An electronic transmitter or receiver employing electromagnetic radiation as a coded signal carrier is described. In the transmitter, the electromagnetic radiation is emitted from ultra-small resonant structures when an electron beam passes proximate the structures. In the receiver, the electron beam passes near ultra-small resonant structures and is altered in path or velocity by the effect of the electromagnetic radiation on structures. The electron beam is accelerated within a series of spiral-shaped anodes to an appropriate current density without the use of a high power supply. Instead, a sequence of low power levels is supplied to the sequence of anodes in the electron beam path. The electron beam is thereby accelerated to a desired current density appropriate for the transmitter or receiver application without the need for a high-level power source.

    Abstract translation: 描述了采用电磁辐射作为编码信号载体的电子发射器或接收器。 在发射机中,当电子束通过结构附近时,电磁辐射从超小型谐振结构发射。 在接收机中,电子束通过附近的超小型谐振结构,并且通过电磁辐射对结构的影响而在路径或速度上改变。 电子束在一系列螺旋状阳极内被加速到适当的电流密度,而不需要使用高功率电源。 相反,一系列低功率电平被提供给电子束路径中的阳极序列。 电子束因此被加速到适合于发射机或接收机应用的期望的电流密度,而不需要高级电源。

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