公开(公告)号：US08696347B2

公开(公告)日：2014-04-15

申请号：US13133262

申请日：2008-12-12

申请人： Witold Neter ,  Helmut Thoemmes ,  Rainer Petry ,  Christian Wagner

发明人： Witold Neter ,  Helmut Thoemmes ,  Rainer Petry ,  Christian Wagner

IPC分类号： B29B11/08

CPC分类号： B29C45/7207 ,  B29C49/06 ,  B29C49/6427 ,  B29C2045/7214

摘要： A system for the post-treatment of preforms (9) produced by means of injection moulding, including a removal element (4) having at least one receiving element (5) for receiving a preform (9), and a device for moving the removal element (4) between two tool halves of an opened injection moulding mould and for moving the removal element (4) out of the opened injection moulding mould, a post-treatment element (6) having at least one post-treatment pin (7) having a pin-shaped passage element (7), of which one end can be connected to the environment or a vacuum or reduced-pressure source and of which the other end has an outlet (18) for a coolant, and a motion device with which the removal element (4) can be reciprocated relative to the post-treatment element (6) between a first position in which the post-treatment pin (7) is positioned within the receiving element (5) and a second position in which the post-treatment pin (7) is not positioned within the receiving element (5), wherein the removal element (4) and the post-treatment element (6) are so designed that in the first position coolant can be introduced by way of the coolant inlet into a preform held in the receiving element (5) in such a way that it can flow between the inside wall of the preform (9) and the outside wall of the pin-shaped passage element (7) to the coolant outlet (18) and can be discharged by way of the passage element (7).

摘要翻译： 一种用于后处理通过注射成型制成的预成型件（9）的系统，包括具有用于容纳预成型件（9）的至少一个接收元件（5）的去除元件（4））以及用于移动所述移除装置 在打开的注塑模具的两个工具半部之间的元件（4）和用于将所述移除元件（4）移出所述打开的注塑模具中的后处理元件（6），所述后处理元件（6）具有至少一个后处理销（7） 具有销形通道元件（7），其一端可连接到环境或真空或减压源，另一端具有用于冷却剂的出口（18），以及具有 其中所述移除元件（4）可以在所述后处理销（7）位于所述接收元件（5）内的第一位置和所述第二位置之间相对于所述后处理元件（6）往复运动， 后处理销（7）不位于接收元件（5）内，其中r 表面元件（4）和后处理元件（6）被设计成使得在第一位置中，可以通过冷却剂入口将冷却剂引入保持在接收元件（5）中的预成型件中，使得其可以 在预成型件（9）的内壁和销状通道元件（7）的外壁到冷却剂出口（18）之间流动并且可以通过通道元件（7）排出。

公开(公告)号：US20130287883A1

公开(公告)日：2013-10-31

申请号：US13979405

申请日：2012-01-02

申请人： Stefan Schweininger ,  Christian Wagner

发明人： Stefan Schweininger ,  Christian Wagner

IPC分类号： B29C45/23

CPC分类号： B29C45/231 ,  B29C45/281

摘要： This relates to an injection-moulding machine comprising a hot runner for feeding a melt into a mould, a shut-off needle for closing or opening the hot runner, a piston connected to the shut-off needle, dividing the housing into first and second chambers, and a covering plate with a first and a second fluid 72 outlet, wherein the housing has a first fluid inlet, which is in connection with the first chamber, and a second fluid inlet, which is in connection with the second chamber, which are arranged in such a way that fluid can be transferred via the first fluid outlet of the covering plate into the first fluid inlet of the housing and fluid can be transferred via the second fluid inlet of the housing, and so fluid can be applied to the piston from both sides.

摘要翻译： 这涉及一种注射成型机，其包括用于将熔体输送到模具中的热流道，用于关闭或打开热流道的关闭针，连接到关闭针的活塞，将壳体分成第一和第二 室和具有第一和第二流体72出口的盖板，其中壳体具有与第一室连接的第一流体入口和与第二室连接的第二流体入口， 被布置成使得流体可以经由盖板的第一流体出口转移到壳体的第一流体入口中，并且流体可以经由壳体的第二流体入口传递，并且因此流体可以被施加到 活塞从两侧。

公开(公告)号：US08405825B2

公开(公告)日：2013-03-26

申请号：US12904610

申请日：2010-10-14

申请人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Christian Wagner

发明人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Christian Wagner

IPC分类号： G01N21/00

CPC分类号： G01N21/94 ,  G01N2021/95676 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

摘要： A detector detects radiation from a mask to form an image, but the focal plane of the image is in front of the mask. Any particles arranged on the mask will be in focus. However, the pattern on the mask will be out of focus. It is therefore possible to detect the existence and location of particles on a mask having an arbitrary pattern. The depth of field of the detector is small and the focal plane is no further from the surface of the patterning device than two times the depth of field.

摘要翻译： 检测器检测来自掩模的辐射以形成图像，但是图像的焦平面位于掩模的前面。 布置在面罩上的任何颗粒将被聚焦。 然而，面具上的图案将会失焦。 因此可以检测具有任意图案的掩模上的颗粒的存在和位置。 检测器的景深较小，焦平面不比图案形成装置的表面高两倍的景深。

公开(公告)号：US20110305789A1

公开(公告)日：2011-12-15

申请号：US13133262

申请日：2008-12-12

申请人： Witold Neter ,  Helmut Thoemmes ,  Rainer Petry ,  Christian Wagner

发明人： Witold Neter ,  Helmut Thoemmes ,  Rainer Petry ,  Christian Wagner

IPC分类号： B29B11/08

CPC分类号： B29C45/7207 ,  B29C49/06 ,  B29C49/6427 ,  B29C2045/7214

摘要： A system for the post-treatment of preforms (9) produced by means of injection moulding, including a removal element (4) having at least one receiving element (5) for receiving a preform (9), and a device for moving the removal element (4) between two tool halves of an opened injection moulding mould and for moving the removal element (4) out of the opened injection moulding mould, a post-treatment element (6) having at least one post-treatment pin (7) having a pin-shaped passage element (7), of which one end can be connected to the environment or a vacuum or reduced-pressure source and of which the other end has an outlet (18) for a coolant, and a motion device with which the removal element (4) can be reciprocated relative to the post-treatment element (6) between a first position in which the post-treatment pin (7) is positioned within the receiving element (5) and a second position in which the post-treatment pin (7) is not positioned within the receiving element (5), wherein the removal element (4) and the post-treatment element (6) are so designed that in the first position coolant can be introduced by way of the coolant inlet into a preform held in the receiving element (5) in such a way that it can flow between the inside wall of the preform (9) and the outside wall of the pin-shaped passage element (7) to the coolant outlet (18) and can be discharged by way of the passage element (7).

摘要翻译： 一种用于后处理通过注射成型制成的预成型件（9）的系统，包括具有用于容纳预成型件（9）的至少一个接收元件（5）的去除元件（4））以及用于移动所述移除装置 在打开的注塑模具的两个工具半部之间的元件（4）和用于将所述移除元件（4）移出所述打开的注塑模具中的后处理元件（6），所述后处理元件（6）具有至少一个后处理销（7） 具有销形通道元件（7），其一端可连接到环境或真空或减压源，另一端具有用于冷却剂的出口（18），以及具有 其中所述移除元件（4）可以在所述后处理销（7）位于所述接收元件（5）内的第一位置和所述第二位置之间相对于所述后处理元件（6）往复运动， 后处理销（7）不位于接收元件（5）内，其中r 表面元件（4）和后处理元件（6）被设计成使得在第一位置中，可以通过冷却剂入口将冷却剂引入保持在接收元件（5）中的预成型件中，使得其可以 在预成型件（9）的内壁和销状通道元件（7）的外壁到冷却剂出口（18）之间流动并且可以通过通道元件（7）排出。

公开(公告)号：US07663741B2

公开(公告)日：2010-02-16

申请号：US10929882

申请日：2004-08-31

申请人： Hans Van Der Laan ,  Christian Wagner

发明人： Hans Van Der Laan ,  Christian Wagner

IPC分类号： G01B9/00 ,  G03B27/32 ,  G03C5/00

CPC分类号： G03F7/70666 ,  G03F7/70516

摘要： To calibrate a lithographic apparatus contrast in the aerial image is measured for a plurality of different settings of available manipulators of the projection system. Appropriate settings of the manipulators are determined as those giving the maximum contrast values.

摘要翻译： 为了校准光刻设备，对于投影系统的可用操纵器的多个不同设置来测量空中图像中的对比度。 操纵器的适当设置被确定为给出最大对比度值的那些。

公开(公告)号：US20080055740A1

公开(公告)日：2008-03-06

申请号：US11925359

申请日：2007-10-26

申请人： Christian Wagner ,  Michael Gerhard ,  Gerald Richter

发明人： Christian Wagner ,  Michael Gerhard ,  Gerald Richter

IPC分类号： G02B17/08

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G02B26/06 ,  G02B26/0825 ,  G02B27/0025 ,  G02B27/0043 ,  G03F7/70225 ,  G03F7/70266

摘要： A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are mated to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.

摘要翻译： 用于微光刻的反射折射投射物镜具有至少一个可变形的弯曲镜，并且可调节可变形反射镜的元件。 调整元件与给定的图像错误及其校正相匹配。 本发明适用于散光，由于透镜加热，压实等引起的四重波前变形。

公开(公告)号：US20070266882A1

公开(公告)日：2007-11-22

申请号：US11727869

申请日：2007-03-28

申请人： Rainer Gaisbauer ,  Heinz Bannach ,  Vikron Kadavanich ,  Martin Fegg ,  Christian Wagner

发明人： Rainer Gaisbauer ,  Heinz Bannach ,  Vikron Kadavanich ,  Martin Fegg ,  Christian Wagner

IPC分类号： F42B4/26

CPC分类号： F42B5/16 ,  C06B45/00 ,  C06C15/00 ,  F42B4/26

摘要： An active body is provided that includes at least one active mass block made of monobasic or polybasic high-energy materials such as a nitrocellulose mixture, for example, comprising approximately 60 percent nitroglycerin and 40 percent diethylene glycol dinitrate, which is provided with structures both on a surface and on an interior. In addition, the inner structures can be filled with an active mass substance. The ignition is triggered by a pyrotechnical primer composition, which initiates the active body, preferably from the inside.

摘要翻译： 提供了一种活性物质，其包含至少一种由一元或多碱性高能材料如硝酸纤维素混合物制成的至少一种活性质量块，例如包含约60％硝酸甘油和40％二甘醇二硝酸酯，其具有两者结构 表面和内部。 此外，内部结构可以填充有活性物质。 点火是由烟火底漆组合物触发的，其引发活性体，优选从内部引发。

公开(公告)号：US20060171020A1

公开(公告)日：2006-08-03

申请号：US11392027

申请日：2006-03-29

申请人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

发明人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

IPC分类号： G02B13/14 ,  G02B3/00

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

公开(公告)号：US20060046165A1

公开(公告)日：2006-03-02

申请号：US10929882

申请日：2004-08-31

申请人： Hans Laan ,  Christian Wagner

发明人： Hans Laan ,  Christian Wagner

IPC分类号： G03C5/00 ,  G03B27/42

CPC分类号： G03F7/70666 ,  G03F7/70516

摘要： To calibrate a lithographic apparatus contrast in the aerial image is measured for a plurality of different settings of available manipulators of the projection system. Appropriate settings of the manipulators are determined as those giving the maximum contrast values.

摘要翻译： 为了校准光刻设备，对于投影系统的可用操纵器的多个不同设置来测量空中图像中的对比度。 操纵器的适当设置被确定为给出最大对比度值的那些。

公开(公告)号：US06950174B2

公开(公告)日：2005-09-27

申请号：US10984161

申请日：2004-11-09

申请人： Karl-Heinz Schuster ,  Christian Wagner ,  Martin Schriever

发明人： Karl-Heinz Schuster ,  Christian Wagner ,  Martin Schriever

IPC分类号： G02B19/00 ,  G02B5/30 ,  G02B17/08 ,  G02B27/28 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/54 ,  G03B27/42

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G02B27/28 ,  G03B27/72 ,  G03F7/70125 ,  G03F7/70225 ,  G03F7/70566

摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.

摘要翻译： 用于在高孔径处的微光刻投影曝光的方法和装置通过垂直于抗蚀剂入射平面的光的偏振来实现对比度增加。 提供了影响在照明系统和还原目​​标中适应于偶极子照明的切向偏振或线偏振的布置。