公开(公告)号：US20090128787A1

公开(公告)日：2009-05-21

申请号：US12250902

申请日：2008-10-14

申请人： Taro Yamamoto ,  Hideo Funakoshi ,  Yuichiro Inatomi

发明人： Taro Yamamoto ,  Hideo Funakoshi ,  Yuichiro Inatomi

IPC分类号： G03B27/52

CPC分类号： H01L21/6715

摘要： A substrate processing apparatus enables an efficient collection of a solvent vapor discharged via a nozzle onto a wafer on which a resist pattern is formed. A retaining base that retains the wafer is moved relative to the nozzle, which includes a nozzle head. A pair of leakage preventing portions are disposed opposite to each other across the nozzle head. Each of the leakage preventing portions has an opening via which the solvent vapor discharged out of the discharge opening can be sucked, or a solvent vapor blocking gas can be discharged selectively. A solvent vapor supply source and a gas supply source are switchably connected to the supply opening of the nozzle head via a first switching valve. An exhaust pump and a solvent-vapor-blocking gas supply source are switchably connected to the openings of the leakage preventing portions via a second switching valve.

摘要翻译： 基板处理装置能够有效地收集经由喷嘴排出的溶剂蒸气到形成有抗蚀剂图案的晶片上。 保持晶片的保持基座相对于包括喷嘴头的喷嘴移动。 一对防漏部分跨越喷嘴头相对设置。 每个防漏部分都有一个开口，通过该开口可以吸出从排出口排出的溶剂蒸气，或者可以选择性地排出溶剂蒸汽阻塞气体。 溶剂蒸气供应源和气体供应源通过第一切换阀可切换地连接到喷嘴头的供应开口。 排气泵和溶剂气体阻断气体供应源经由第二切换阀可切换地连接到防漏部分的开口。

公开(公告)号：US07530749B2

公开(公告)日：2009-05-12

申请号：US10581713

申请日：2004-12-03

申请人： Taro Yamamoto ,  Osamu Hirakawa

发明人： Taro Yamamoto ,  Osamu Hirakawa

IPC分类号： G03D5/00 ,  G03B27/52 ,  G03B27/32

CPC分类号： H01L21/67271 ,  G03F7/3021 ,  G03F7/70341 ,  H01L21/67034 ,  H01L21/6708 ,  H01L21/67253

摘要： A coating and developing system prevents wetting its component units with water when the coating and developing system forms a resist film on a substrate and processes the substrate processed by immersion exposure by a developing process. A substrate having a surface coated with a resist film and processed by immersion exposure is placed on a substrate support device and a liquid detector detects at least the liquid formed a liquid film for immersion exposure and remaining on the surface of the substrate. A decision is made as to whether or not the substrate needs to be dried on the basis of the result of detection made by the liquid detector. If it is decided that the substrate needs to be dried, the substrate is dried by a drying means. Thus wetting the interior of the coating and developing system with water can be prevented. Since only substrates that need to be dried are subjected to a drying process, the coating and developing system is able to operate at a high throughput.

摘要翻译： 当涂层和显影系统在基底上形成抗蚀剂膜时，涂层和显影系统防止用水润湿其组分单元，并通过显影过程处理通过浸渍曝光处理的基底。 具有涂覆有抗蚀剂膜并通过浸渍曝光处理的表面的基板被放置在基板支撑装置上，并且液体检测器至少检测形成用于浸没曝光的液体膜并保留在基板的表面上的液体。 基于由液体检测器进行的检测结果确定基板是否需要被干燥。 如果确定衬底需要干燥，则通过干燥装置干燥衬底。 因此可以防止涂层和显影系统内部的水分润湿。 由于仅需要干燥的基材经受干燥处理，所以涂层和显影系统能够以高产量进行操作。

公开(公告)号：US07485364B2

公开(公告)日：2009-02-03

申请号：US10591671

申请日：2005-02-28

申请人： Taro Yamamoto ,  Masanori Doi

发明人： Taro Yamamoto ,  Masanori Doi

IPC分类号： D02G3/00

CPC分类号： D01F1/10 ,  D01F6/70 ,  Y10T428/2927 ,  Y10T428/2933

摘要： A polyurethane elastic fiber, containing inorganic compound particles that have an average particle size of 0.5 to 5 mm and that show a refractive index of 1.4 to 1.6, having at least one protruded portion that has a maximum width of 0.5 to 5 μm, in the fiber surface, per 120-μm length in the fiber axis direction.

摘要翻译： 一种聚氨酯弹性纤维，其含有平均粒径为0.5〜5mm，折射率为1.4〜1.6的无机化合物粒子，其具有至少一个最大宽度为0.5〜5μm的突出部， 纤维表面，纤维轴方向每120m长。

公开(公告)号：US20080124489A1

公开(公告)日：2008-05-29

申请号：US11944557

申请日：2007-11-23

申请人： Taro Yamamoto ,  Yasushi Takiguchi ,  Akihiro Fujimoto ,  Hideharu Kyouda ,  Junichi Kitano ,  Osamu Miyahara ,  Kenji Tsutsumi

发明人： Taro Yamamoto ,  Yasushi Takiguchi ,  Akihiro Fujimoto ,  Hideharu Kyouda ,  Junichi Kitano ,  Osamu Miyahara ,  Kenji Tsutsumi

IPC分类号： C23C14/28 ,  B05C11/00

CPC分类号： H01L21/6715 ,  H01L21/67178 ,  H01L21/67276

摘要： A coating film forming apparatus includes a process section including one or more coating units and one or more thermally processing units; a pre-coating cleaning unit configured to perform cleaning on a back surface and an edge portion of a substrate; and a pre-coating check unit configured to check a state of a back surface and an edge portion of the substrate. A control section is configured to realize a sequence of cleaning the substrate by the pre-coating cleaning unit, checking the substrate by the pre-coating check unit, making a judgment based on a check result thus obtained of whether or not a state of particles on a back surface and an edge portion of the substrate is within an acceptable range, and permitting transfer of the substrate into the process section where the state of particles is within the acceptable range.

摘要翻译： 涂膜形成装置包括具有一个或多个涂布单元和一个或多个热处理单元的处理部分; 构造成在基板的背面和边缘部分上进行清洗的预涂层清洁单元; 以及配置为检查基板的背面和边缘部分的状态的预涂层检查单元。 控制部被配置为通过预涂清洁单元实现清洁基板的顺序，通过预涂单元检查基板，基于由此获得的检查结果判断颗粒的状态 在基板的后表面和边缘部分处于可接受的范围内，并且允许将基板转移到颗粒状态在可接受范围内的处理部分中。

公开(公告)号：US07284917B2

公开(公告)日：2007-10-23

申请号：US11346430

申请日：2006-02-03

申请人： Seiki Ishida ,  Masahiro Nakaharada ,  Taro Yamamoto

发明人： Seiki Ishida ,  Masahiro Nakaharada ,  Taro Yamamoto

IPC分类号： G03D5/00 ,  G03B27/32 ,  G03B27/52

CPC分类号： H01L21/67184 ,  H01L21/67051 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/67745 ,  Y10S134/902

摘要： A coating and developing system is capable of preventing the contamination of a substrate with particles while the same coats a surface of a substrate with a resist film and develops the resist film after the substrate has been processed by immersion exposure. The coating and developing system includes: a processing block including coating units for forming a resist film on a surface of a substrate and developing units for processing the resist film formed on the substrate with a developer, and an interface block connected to the processing block and an exposure system for carrying out an immersion exposure process. The interface block includes: substrate cleaning units for cleaning the substrate processed by the immersion exposure process, a first carrying mechanism and a second carrying mechanism. The first carrying mechanism carries a substrate processed by immersion exposure to the substrate cleaning unit. The second carrying mechanism carries the substrate cleaned by the substrate cleaning unit. Thus the contamination of the substrate with external particles can be prevented and hence the spread of contamination with particles over the processing units of the processing block and substrates processed by the processing units can be prevented.

摘要翻译： 涂覆和显影系统能够防止具有颗粒的基底污染，同时用抗蚀剂膜涂覆基材的表面，并且在通过浸渍曝光处理基板之后显影抗蚀剂膜。 该涂布显影系统包括：处理块，其包括用于在基板的表面上形成抗蚀剂膜的涂覆单元和用显影剂处理形成在基板上的抗蚀剂膜的显影单元，以及连接到处理块的界面块 用于进行浸没曝光处理的曝光系统。 接口块包括：用于清洗通过浸没曝光工艺处理的基板的基板清洁单元，第一承载机构和第二承载机构。 第一携带机构携带通过浸没曝光处理的基板到基板清洁单元。 第二承载机构承载由基板清洁单元清洁的基板。 因此，可以防止基板与外部颗粒的污染，因此可以防止在处理块的处理单元和由处理单元处理的基板上的颗粒污染的扩散。

公开(公告)号：US20070012339A1

公开(公告)日：2007-01-18

申请号：US11345529

申请日：2006-02-02

申请人： Masahiro Fukuda ,  Taro Yamamoto

发明人： Masahiro Fukuda ,  Taro Yamamoto

IPC分类号： B08B3/00

CPC分类号： H01L21/67051 ,  H01L21/68742

摘要： A wafer W is held in a horizontal attitude within an airtight container 41 by a vacuum chuck 42 such that small gaps are formed between the wafer W and the inner surfaces of the airtight container 41. A cleaning liquid is supplied toward the center portion of a front surface of the wafer W through a fluid supply port 40 which is an end of a fluid supply path 5, and is discharged through a fluid discharge portion 44 arranged in the bottom portion of the airtight container 41 in a form of a groove running along a circle having its center located on the center axis of the wafer W. The cleaning liquid flows and spreads from the center portion of the wafer W toward the peripheral portion while removing particles adhered to the wafer W, and is discharged through the fluid discharge portion 44. This arrangement allows the particles to be uniformly and reliably removed without rotating the wafer W. The entire cleaning apparatus 4 has a small size.

摘要翻译： 通过真空吸盘42将晶片W保持在气密容器41内的水平姿态，使得在晶片W和气密容器41的内表面之间形成小的间隙。 通过作为流体供给路径5的端部的流体供给口40朝向晶片W的前表面的中央部供给清洗液，通过配置在流体供给路径5的底部的流体排出部44排出 气密容器41是沿其圆周方向延伸的凹槽的形式，其中心位于晶片W的中心轴线上。清洗液体从晶片W的中心部向周边部分流动并扩散，同时除去附着在晶片W上的颗粒 晶片W，并通过流体排出部分44排出。 这种布置允许在不旋转晶片W的情况下均匀且可靠地除去颗粒。整个清洁装置4具有小尺寸。

公开(公告)号：US08770111B2

公开(公告)日：2014-07-08

申请号：US13877278

申请日：2011-09-08

申请人： Taro Yamamoto ,  Yusuke Fujiwara

发明人： Taro Yamamoto ,  Yusuke Fujiwara

IPC分类号： B61B3/00

CPC分类号： H01L21/677 ,  B61B3/02 ,  H01L21/6773 ,  H01L21/67733

摘要： A transport vehicle that reduces shaking of a transport article includes a travelling unit, a transport unit, a fall prevention member, and a shaking reduction member. The travelling unit travels along a rail provided on a ceiling. The transport unit transports a transport article. The fall prevention member is rotatably supported such that it can rotate between a fall prevention position and a retracted position. The fall prevention member is, at the fall prevention position, below the transport article. A pushing portion of the shaking reduction member pushes against a side surface of the transport article with a pushing surface thereof in conjunction with the rotating of the fall prevention member from the retracted position to the fall prevention position. A lever portion of the shaking reduction member has one end supporting the pushing portion and the other end rotatably supported in a manner coaxial with the fall prevention member.

摘要翻译： 减少运输物品晃动的运送车辆包括行驶单元，运送单元，防跌落构件和减震构件。 旅行单位沿着设在天花板上的轨道行进。 运输单位运输运输物品。 防坠落构件被可旋转地支撑，使得其能够在防坠落位置和缩回位置之间旋转。 防坠落成员在防坠落位置处在运输物品的下面。 摇动减速部件的推动部分随着其推动表面与防倒下部件从缩回位置的旋转到防止摔倒位置一起推动输送物品的侧表面。 减震构件的杠杆部分具有支撑推动部分的一端，而另一端以与防坠落构件同轴的方式可旋转地支撑。

公开(公告)号：US08636915B2

公开(公告)日：2014-01-28

申请号：US13811522

申请日：2011-07-12

申请人： Yasushi Takiguchi ,  Taro Yamamoto ,  Tsutomu Yamahata ,  Akihiro Fujimoto ,  Kouji Fujimura

发明人： Yasushi Takiguchi ,  Taro Yamamoto ,  Tsutomu Yamahata ,  Akihiro Fujimoto ,  Kouji Fujimura

IPC分类号： B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC分类号： B08B3/04 ,  G03F7/3021 ,  H01L21/6715 ,  H01L21/6719

摘要： To provide a liquid processing apparatus capable of processing substrates with a high throughput with the lesser number of nozzles for chemical-liquid, when the substrates that are horizontally held in cup bodies are liquid-processed by supplying a chemical liquid to the substrates. Taking a developing process as an example of a liquid process, two-types of developing nozzles are prepared for two types of developing methods. The developing nozzle, which is used in the method in which the nozzle is engaged with the process for a longer period of time, is individually disposed on each of a first processing module 1 and a second processing module 2. On the other hand, the developing nozzle, which is used in the method in which the nozzle is engaged with the process for a shorter period of time, is used in common in the first liquid processing module 1 and the second liquid processing module 2. The common developing nozzle is configured to wait on an intermediate position between the modules 1 and 2.

摘要翻译： 为了提供一种液体处理装置，当水平保持在杯体中的基板通过向基板供应化学液体进行液体处理时，能够以较少数量的用于液体的喷嘴来处理具有高产量的基板的液体处理装置。 以液体工艺为例的显影过程，为两种显影方法准备了两种类型的显影喷嘴。 在喷嘴与该处理接合较长时间的方法中使用的显影喷嘴被单独地设置在第一处理模块1和第二处理模块2的每一个上。另一方面， 在第一液体处理模块1和第二液体处理模块2中共同使用在喷嘴与该工艺相比较短时间接合的方法中使用的显影喷嘴。公知的显影喷嘴被配置 等待模块1和2之间的中间位置。

公开(公告)号：US08632295B2

公开(公告)日：2014-01-21

申请号：US12183100

申请日：2008-07-31

申请人： Hisashi Onishi ,  Taro Yamamoto ,  Shinji Fujioka ,  Nobuhiro Gunge

发明人： Hisashi Onishi ,  Taro Yamamoto ,  Shinji Fujioka ,  Nobuhiro Gunge

IPC分类号： B66C3/00

CPC分类号： B65G37/02 ,  B65G2201/0297 ,  H01L21/67259 ,  H01L21/67775 ,  H01L21/68707

摘要： A transporting system includes: a track portion; a plurality of loading platforms, disposed along the track portion, whose positions differ from each other in at least one direction; a plurality of transporting vehicles, each having a travelling device travelling along the track portion and a loading device, for loading transported objects; a first detecting device for detecting a first reference position, of the loading device when a reference transporting vehicle loads the transported object; a second detecting device for detecting a second reference position, of the loading device when each of the other transporting vehicles other than the reference transporting vehicle loads the transported object; and a teaching device for providing information on the position of the loading device with respect to each of the other loading platforms when each of the other transporting vehicles loads the transported object, on the basis of the detected first and second reference positions.

摘要翻译： 传送系统包括：轨道部分; 多个装载平台，沿着轨道部分设置，其位置在至少一个方向上彼此不同; 多个运送车辆，每个运送车辆具有沿轨道部分行进的行进装置和用于装载被运送物体的装载装置; 用于检测第一参考位置的第一检测装置;当参考运送车辆装载被运送物体时，装载装置的第一检测装置; 用于检测第二参考位置的第二检测装置，当除了参考运送车辆之外的其它运输车辆中的每一个装载运送的物体时，装载装置; 以及教学装置，用于根据检测到的第一和第二参考位置，提供关于装载装置相对于每个其他装载平台的位置的信息，当每个其他运送车辆装载被运送物体时。

公开(公告)号：US08333522B2

公开(公告)日：2012-12-18

申请号：US13025490

申请日：2011-02-11

申请人： Hiroshi Arima ,  Kousuke Yoshihara ,  Yuichi Yoshida ,  Yasushi Takiguchi ,  Taro Yamamoto

发明人： Hiroshi Arima ,  Kousuke Yoshihara ,  Yuichi Yoshida ,  Yasushi Takiguchi ,  Taro Yamamoto

IPC分类号： G03D5/00

CPC分类号： G03F7/3021

摘要： There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved.

摘要翻译： 提供了能够实现高产量的显影装置。 显影装置包括在其中形成处理气氛的气密密封处理容器; 气氛气体供给单元，其将含有显影液雾的气氛气体供给到处理容器中，以在装载到处理容器中的基板的表面上形成显影液的液膜; 以及干燥单元，其干燥基板以便通过液膜来停止显影处理。 可以停止抗蚀剂与显影液的反应。 因此，可以与由清洁模块执行的清洁处理并行执行显影处理，并且实现高生产率。