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185 条记录 (耗时 0.039 秒)

    Luminescence Sensor Using Multi-Layer Substrate Structure
    31.
    发明申请
    Luminescence Sensor Using Multi-Layer Substrate Structure 有权
    使用多层基板结构的发光传感器

    公开(公告)号：US20080197292A1

    公开(公告)日：2008-08-21

    申请号：US11995696

    申请日：2006-07-07

    申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

    发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

    IPC分类号： G01J1/58 ,  C09K11/00

    CPC分类号： G01N21/76 ,  G01N21/648 ,  G01N33/54306 ,  G01N33/582

    摘要： The present invention provides a luminescence sensor (2), such as e.g. a luminescence biosensor, comprising a multi-layer structure. The multi-layer structure comprises at least a first layer (2a) formed of a first material and a second layer (2b) formed of a second material. The first material has a first binding capacity towards luminophores and the second material has a second binding capacity towards luminophores, the first binding capacity being different from the second binding capacity. The luminescence sensor (2) according to the present invention shows a high sensitivity because it provides preferred binding sites for luminophores at locations where the combined excitation and detection efficiency is the highest.

    摘要翻译： 本发明提供一种发光传感器（2），例如， 发光生物传感器，包括多层结构。 多层结构至少包括由第一材料形成的第一层（2a）和由第二材料形成的第二层（2b）。 第一材料具有朝向发光体的第一结合能力，第二材料具有朝向发光体的第二结合能力，第一结合能力不同于第二结合能力。 根据本发明的发光传感器（2）显示出高灵敏度，因为它在组合的激发和检测效率最高的位置处为发光体提供优选的结合位点。

    Lithographic apparatus, illumination system and debris trapping system
    33.
    发明授权
    Lithographic apparatus, illumination system and debris trapping system 有权
    平版印刷设备，照明系统和碎片捕获系统

    公开(公告)号：US07145132B2

    公开(公告)日：2006-12-05

    申请号：US11020674

    申请日：2004-12-27

    申请人： Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

    发明人： Levinus Pieter Bakker ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

    IPC分类号： H01S1/00 ,  G03B27/52

    CPC分类号： G03F7/70058 ,  G03F7/70916 ,  G03F7/70933

    摘要： A debris trapping system for trapping debris particles released with the generation of radiation by a radiation source in a lithographic apparatus includes first and second sets of channels. Each channel of the first set enables radiation from a radiating source to propagate therethrough and has an inner wall for catching debris particles. The second set of channels is situated downstream of the first set with respect to a propagation direction of the radiation. Each channel of the second set enables radiation from the radiating source to also propagate therethrough and has an inner wall for catching debris particles. A gas supply and a gas exhaust are configured to provide between the first set and the second set of channels a gas flow having a net flow direction substantially across the propagation direction of the radiation from a radiating source.

    摘要翻译： 用于捕获由光刻设备中的辐射源产生辐射而释放的碎屑颗粒的碎片捕集系统包括第一和第二组通道。 第一组的每个通道使来自辐射源的辐射能够通过其传播并具有用于捕获碎屑颗粒的内壁。 相对于辐射的传播方向，第二组通道位于第一组的下游。 第二组的每个通道使得来自辐射源的辐射也能够通过其传播，并且具有用于捕获碎屑颗粒的内壁。 气体供应和排气被配置为在第一组和第二组通道之间提供气流，其具有基本上横跨辐射源的辐射的传播方向的净流动方向。

    Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned
    36.
    发明申请
    Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned 失效
    光刻设备包括清洁装置，清洁装置和清洁待清洁表面的方法

    公开(公告)号：US20080001101A1

    公开(公告)日：2008-01-03

    申请号：US11478303

    申请日：2006-06-30

    申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

    发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70925 ,  B08B7/00

    摘要： A cleaning arrangement is provided for use in an EUV lithographic apparatus, for example an EUV lithographic apparatus with a Sn source. The cleaning arrangement includes a gas source for a hydrogen containing gas and a hydrogen radical source. The hydrogen radical source is a source of (UV) radiation which induces photo dissociation of the hydrogen. Radicals may reduce Sn oxides (if present) and my form volatile hydrides of Sn deposition and/or carbon deposition. In this way the cleaning arrangement can be used to clean optical elements from Sn and/or C deposition. The EUV source may be used as hydrogen radical source. An optical filter is used to remove undesired EUV radiation and transmit desired UV radiation.

    摘要翻译： 提供了用于EUV光刻设备（例如具有Sn源的EUV光刻设备）的清洁装置。 清洁装置包括用于含氢气体和氢根源的气体源。 氢自由基源是（UV）辐射源，其诱导氢的光解离。 自由基可以减少Sn氧化物（如果存在）和形成Sn沉积和/或碳沉积的挥发性氢化物。 以这种方式，清洁装置可用于从Sn和/或C沉积物清洁光学元件。 EUV源可以用作氢源。 使用滤光器去除不期望的EUV辐射并传输所需的UV辐射。

    Molecular diagnostic system based on evanescent illumination and fluorescence
    39.
    发明授权
    Molecular diagnostic system based on evanescent illumination and fluorescence 有权
    基于ev逝照明和荧光的分子诊断系统

    公开(公告)号：US08502166B2

    公开(公告)日：2013-08-06

    申请号：US12864910

    申请日：2009-01-26

    申请人： Marius Iosif Boamfa ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

    发明人： Marius Iosif Boamfa ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Derk Jan Wilfred Klunder

    IPC分类号： G01N21/64

    CPC分类号： G01N21/648

    摘要： An illumination detection system includes an excitation radiation source and associated radiation processing arrangement for focusing the excitation radiation from the radiation processing arrangement onto an analysis region of a sample. A radiation collection arrangement collects radiation from the analysis region of the sample resulting from the excitation, and a detector detects the collected radiation. The focused excitation radiation includes an excitation line which is evanescent in the sample. This combines the advantages of line scanning (reduced analysis time) and evanescent excitation (reduced background signal) and therewith enables increase measurement speed and precision for point of care application.

    摘要翻译： 照明检测系统包括激发辐射源和相关联的辐射处理装置，用于将来自辐射处理装置的激发辐射聚焦到样品的分析区域上。 辐射收集装置从由激发产生的样品的分析区域收集辐射，并且检测器检测收集的辐射。 聚焦的激发辐射包括在样品中消逝的激发线。 这结合了线扫描的优点（减少的分析时间）和渐逝激励（降低的背景信号），并且因此可以提高护理点应用的测量速度和精度。