公开(公告)号：US20150279703A1

公开(公告)日：2015-10-01

申请号：US14432818

申请日：2013-09-30

申请人： Yuichi OGAWA ,  Haruyoshi YAMAKAWA ,  Kurita Water Industries Ltd.

发明人： Yuichi Ogawa ,  Haruyoshi Yamakawa

IPC分类号： H01L21/67 ,  H01L21/02

CPC分类号： H01L21/67051 ,  H01L21/02068 ,  H01L21/28518 ,  H01L21/32134

摘要： A method and system for cleaning a semiconductor substrate in which Al is at least partially exposed on a silicon substrate and which is silicided with a metallic substance, without damaging Al and a silicide layer, comprising a cleaning portion (2) for cleaning a semiconductor substrate 100 in which Al is at least partially exposed on a silicon substrate and which is silicided with a metallic substance; a delivery portion (30) disposed in the cleaning portion for delivering a cleaning solution to the semiconductor substrate in the cleaning portion to bring the cleaning solution into contact with the semiconductor substrate; a sulfuric acid solution transfer path (5) connected to the delivery portion for transferring a sulfuric acid solution comprising an oxidant to the delivery portion; and an adsorptive inhibitor solution transfer path (11) connected to the delivery portion for transferring a solution comprising an adsorptive inhibitor having any one or more of N-based, S-based, and P-based polar groups to the delivery portion. The sulfuric acid solution and the adsorptive inhibitor solution may be mixed or separately transferred to come into contact with or on the semiconductor substrate.

摘要翻译： 一种用于清洁半导体衬底的方法和系统，其中Al至少部分地暴露在硅衬底上并且被金属物质硅化，而不损坏Al和硅化物层，包括用于清洁半导体衬底的清洁部分（2） 100，其中Al至少部分地暴露在硅衬底上并且被金属物质硅化; 设置在清洁部分中的输送部分（30），用于将清洁溶液输送到清洁部分中的半导体衬底，以使清洗溶液与半导体衬底接触; 连接到输送部分的用于将包含氧化剂的硫酸溶液转移到输送部分的硫酸溶液转移路径（5） 以及连接到输送部分的吸附抑制剂溶液转移路径（11），用于将包含具有任何一种或多种N基，S基和P基极性基团的吸附抑制剂的溶液转移到输送部分。 硫酸溶液和吸附抑制剂溶液可以混合或分开转移以与半导体衬底接触或接触。

公开(公告)号：US09146803B2

公开(公告)日：2015-09-29

申请号：US13412711

申请日：2012-03-06

申请人： Yuichi Ogawa

发明人： Yuichi Ogawa

IPC分类号： G06F11/00 ,  G06F11/07 ,  G06F11/10 ,  G06F11/14

CPC分类号： G06F11/0793 ,  G06F11/0727 ,  G06F11/1004 ,  G06F11/1443

摘要： In a storage apparatus a control section writes, at the time of updating at least a part of first data stored in a first storage area by at least a part of second data, the second data to a second storage area other than the first storage area. In addition, the control section determines whether or not a write error occurs. When the write error does not occur, the control section combines the first data and the second data.

摘要翻译： 在存储装置中，控制部在将存储在第一存储区域中的第一数据的至少一部分更新了至少一部分第二数据的情况下，将第二数据写入除了第一存储区域以外的第二存储区域 。 此外，控制部分确定是否发生写入错误。 当不发生写错误时，控制部分组合第一数据和第二数据。

公开(公告)号：US08974609B2

公开(公告)日：2015-03-10

申请号：US12923074

申请日：2010-08-31

申请人： Yuichi Ogawa ,  Eric A. Theisen ,  Yuji Matsumoto ,  James Perrozi ,  Ryusuke Hasegawa

发明人： Yuichi Ogawa ,  Eric A. Theisen ,  Yuji Matsumoto ,  James Perrozi ,  Ryusuke Hasegawa

IPC分类号： H01F27/25 ,  B22D11/00 ,  H01F1/153 ,  B22D11/06 ,  H01F41/02

CPC分类号： B22D11/0611 ,  H01F1/15308 ,  H01F1/15333 ,  H01F41/0226 ,  Y10T29/49988

摘要： A ferromagnetic amorphous alloy ribbon includes an alloy having a composition represented by FeaSibBcCd where 80.5≦a≦83 at. %, 0.5≦b≦6 at. %, 12≦c≦16.5 at. %, 0.01≦d≦1 at. % with a+b+c+d=100 and incidental impurities, the defect length along a direction of the ribbon's length being between 5 mm and 200 mm, the defect depth being less than 0.4×t μm and the defect occurrence frequency being less than 0.05×w times within 1.5 m of ribbon length, where t and w are ribbon thickness and ribbon width, respectively, and the ribbon in its annealed state and straight strip form of the ribbon, has a saturation magnetic induction exceeding 1.60 T, and exhibits a magnetic core loss of less than 0.14 W/kg when measured at 60 Hz and at 1.3 T induction level. The ribbon is suitable for use in transformer cores, rotational machines, electrical chokes, magnetic sensors and pulse power devices.

摘要翻译： 铁磁非晶合金带包括具有由FeaSibBcCd表示的组成的合金，其中80.5＆lt; 1; a＆nlE; 83 at。 ％，0.5＆nlE; b＆nlE; 6 at。 ％，12＆nlE; c＆nlE; 16.5 at。 ％，0.01＆nlE; d＆nlE; 1 at。 ％+ b + c + d = 100和附带杂质，沿着色带长度方向的缺陷长度在5mm至200mm之间，缺陷深度小于0.4×tμm，缺陷发生频率较小 在丝带长度1.5μm以内，分别为丝带厚度和带宽度为t和w的0.05×w倍以上，带状退火状态的丝带和带状带状形状的饱和磁感应超过1.60T， 当在60Hz和1.3T诱导水平下测量时，磁芯损耗小于0.14W / kg。 该带适用于变压器铁芯，旋转机，电扼流圈，磁传感器和脉冲功率器件。

公开(公告)号：US08968490B2

公开(公告)日：2015-03-03

申请号：US12923224

申请日：2010-09-09

申请人： Eric A. Theisen ,  James Perrozi ,  Yuichi Ogawa ,  Yuji Matsumoto ,  Daichi Azuma ,  Ryusuke Hasegawa

发明人： Eric A. Theisen ,  James Perrozi ,  Yuichi Ogawa ,  Yuji Matsumoto ,  Daichi Azuma ,  Ryusuke Hasegawa

IPC分类号： H01F27/25 ,  B22D11/00 ,  B22D11/06 ,  H01F1/153 ,  H01F41/02

CPC分类号： B22D11/0611 ,  B22D11/001 ,  H01F1/15308 ,  H01F1/15333 ,  H01F27/25 ,  H01F41/0226 ,  Y10T29/49071

摘要： A ferromagnetic amorphous alloy ribbon includes an alloy having a composition represented by FeaSibBcCd where 80.5≦a≦83 at. %, 0.5≦b≦6 at. %, 12≦c≦16.5 at. %, 0.01≦d≦1 at. % with a+b+c+d=100 and incidental impurities, the ribbon being cast from a molten state of the alloy with a molten alloy surface tension of greater than or equal to 1.1 N/m on a chill body surface; the ribbon having a ribbon length, a ribbon thickness, and a ribbon surface facing the chill body surface; the ribbon having ribbon surface protrusions being formed on the ribbon surface facing the chill body surface; the ribbon surface protrusions being measured in terms of a protrusion height and a number of protrusions; the protrusion height exceeding 3 μm and less than four times the ribbon thickness, and the number of protrusions being less than 10 within 1.5 m of the cast ribbon length; and the alloy ribbon in its annealed straight strip form having a saturation magnetic induction exceeding 1.60 T and exhibiting a magnetic core loss of less than 0.14 W/kg when measured at 60 Hz and at 1.3 T induction level in its annealed straight strip form. The ribbon is suitable for transformer cores, rotational machines, electrical chokes, magnetic sensors, and pulse power devices.

摘要翻译： 铁磁非晶合金带包括具有由FeaSibBcCd表示的组成的合金，其中80.5＆lt; 1; a＆nlE; 83 at。 ％，0.5＆nlE; b＆nlE; 6 at。 ％，12＆nlE; c＆nlE; 16.5 at。 ％，0.01＆nlE; d＆nlE; 1 at。 ％+ a + b + c + d = 100和偶然的杂质，该带从合金的熔融状态浇铸，熔融合金的表面张力大于或等于1.1N / m; 所述带具有带长度，带厚度和面向所述冷却体表面的带状表面; 所述带状带表面突起形成在所述带状表面上面向所述冷却体表面; 根据突出高度和突出数量来测量带状表面突起; 突出高度超过3μm且小于带厚度的四倍，并且在铸带长度的1.5μm内的突起数量小于10; 并且其退火的直条形状的合金带形状具有超过1.60T的饱和磁感应，并且在其退火的直条形式下以60Hz和1.3T的感应电平测量时，磁芯损耗小于0.14W / kg。 该带适用于变压器铁芯，旋转机，电扼流圈，磁传感器和脉冲功率器件。

公开(公告)号：US08514403B2

公开(公告)日：2013-08-20

申请号：US13086759

申请日：2011-04-14

申请人： Yuichi Ogawa ,  Shinichiro Hayashi ,  Seiji Kamba ,  Takashi Kondo

发明人： Yuichi Ogawa ,  Shinichiro Hayashi ,  Seiji Kamba ,  Takashi Kondo

IPC分类号： G01B11/02

CPC分类号： G01N21/3581 ,  G01N21/3563

摘要： A sample analysis method is provided for analyzing a sample having a permeability to terahertz radiation and accurately measure the composition, physical properties, mass and dimensions of a very small sample or a minute amount of sample by irradiating the sample with terahertz radiation. In the method, a reflective member is provided adjoining a first principal surface of the sample, an entrance member is provided adjoining a second principal surface of the sample, terahertz radiation is delivered from outside of entrance member towards the sample, and the sample is analyzed using an interference wave generated from a first-surface reflected wave at the interface between the first principal surface of the sample and the reflective member and a second-surface reflected wave at the interface between the second principal surface of the sample and the entrance member.

摘要翻译： 提供样品分析方法，用于分析具有太赫兹辐射渗透性的样品，并通过用太赫兹辐射照射样品来精确测量非常小样品或微量样品的组成，物理性质，质量和尺寸。 在该方法中，邻接样品的第一主表面设置反射构件，邻接样品的第二主表面设置入口构件，将太赫兹辐射从入口构件的外部朝向样品传送，并分析样品 使用从样品的第一主表面和反射构件之间的界面处的第一表面反射波产生的干涉波和在样品的第二主表面与入口构件之间的界面处的第二表面反射波。

公开(公告)号：US20130076912A1

公开(公告)日：2013-03-28

申请号：US13701701

申请日：2011-05-20

申请人： Naoki Oda ,  Yuichi Ogawa ,  Iwao Hosako ,  Norihiko Sekine

发明人： Naoki Oda ,  Yuichi Ogawa ,  Iwao Hosako ,  Norihiko Sekine

IPC分类号： H04N5/33

CPC分类号： H04N5/33 ,  G01N21/3581

摘要： In order to generate a two-dimensional image of a sample in a short time using THz waves, provided is a reflective imaging device including a sample holder, a THz wave light source, a THz wave camera, a rotation mechanism for rotating the holder and the camera, and a processing unit. A sample unit includes an incidence member, a sample, and a reflection member. The sample includes a first region of only a membrane and a second region including a biopolymer. The camera detects, with regard to respective incident angles, a THz wave in which interference occurs between a component reflected at an interface between the incidence member and the sample and a component reflected at an interface between the sample and the reflection member, of each portion of the sample unit, and outputs a signal. The processing unit specifies an incident angle at which a signal of a first THz wave that interferes in the first region is relatively small and a signal of a second THz that interferes in the second region is relatively large, and generates a two-dimensional image of the sample based on the signal from the camera with regard to the specified incident angle.

摘要翻译： 为了使用太赫兹波在短时间内产生样本的二维图像，提供了一种反射成像装置，其包括样本保持器，太赫兹波光源，太赫兹波相机，用于旋转支架的旋转机构和 相机和处理单元。 样品单元包括入射构件，样品和反射构件。 样品包括只有膜的第一区域和包括生物聚合物的第二区域。 摄像机检测相对于入射角度的THz波，其中在入射构件和样品之间的界面处反射的分量与在样品与反射构件之间的界面处反射的分量之间发生干涉， 并输出信号。 处理单元指定在第一区域中干扰的第一THz波的信号相对较小并且在第二区域中干扰的第二THz的信号相对较大的入射角，并且生成二维图像 该样本基于来自摄像机的信号对于指定的入射角度。

公开(公告)号：US08269967B2

公开(公告)日：2012-09-18

申请号：US13239830

申请日：2011-09-22

申请人： Seiji Kamba ,  Takashi Kondo ,  Koji Tanaka ,  Kazuhiro Takigawa ,  Yuichi Ogawa

发明人： Seiji Kamba ,  Takashi Kondo ,  Koji Tanaka ,  Kazuhiro Takigawa ,  Yuichi Ogawa

IPC分类号： G01J3/28

CPC分类号： G01N21/4788 ,  G01N33/54373

摘要： A method of attaching an object to be measured to a structure causing a diffraction phenomenon; irradiating the structure to which the object to be measured is attached and which causes the diffraction phenomenon with an electromagnetic wave; detecting the electromagnetic wave scattered by the structure causing the diffraction phenomenon; and measuring a characteristic of the object to be measured from the frequency characteristic of the detected electromagnetic wave. The object to be measured is attached directly to the surface of the structure causing the diffraction phenomenon. Thus, the method for measuring the characteristic of an object to be measured exhibits an improved measurement sensitivity and high reproducibility. A structure causing a diffraction phenomenon and used for the method, and a measuring device are provided.

摘要翻译： 将测量对象附着到引起衍射现象的结构的方法; 照射被测定对象物的结构，并用电磁波引起衍射现象; 检测由结构散射的电磁波引起的衍射现象; 并根据检测到的电磁波的频率特性来测量待测物体的特性。 要测量的物体直接附着在结构的表面，引起衍射现象。 因此，用于测量待测物体的特性的方法具有改进的测量灵敏度和高再现性。 提供引起衍射现象并用于该方法的结构和测量装置。

公开(公告)号：US08253103B2

公开(公告)日：2012-08-28

申请号：US12511016

申请日：2009-07-28

申请人： Yuichi Ogawa ,  Shinichiro Hayashi ,  Eiji Kato

发明人： Yuichi Ogawa ,  Shinichiro Hayashi ,  Eiji Kato

IPC分类号： G01J1/00 ,  G01J5/00

CPC分类号： G01N21/3581 ,  G01N21/95692 ,  H01L31/0232 ,  H01L31/101

摘要： There is provided a measuring apparatus including a space arrangement structure that includes space regions surrounded by conductors in a plane, an electromagnetic wave emitter that emits electromagnetic waves towards an object held by the space arrangement structure, and an electromagnetic wave detector that measures the electromagnetic waves that have passed through the space arrangement structure. Here, characteristics of the object are measured by measuring the electromagnetic waves that have passed through the space arrangement structure. The electromagnetic waves emitted from the electromagnetic wave emitter towards the space arrangement structure are incident on the plane containing the space regions at an angle, and the electromagnetic waves that have passed through the space arrangement structure are measured.

摘要翻译： 提供了一种测量装置，包括：空间布置结构，包括由平面内的导体包围的空间区域;朝向由所述空间布置结构保持的物体发射电磁波的电磁波发射器;以及测量电磁波的电磁波检测器 已经通过了空间布置结构。 这里，通过测量已经通过空间排列结构的电磁波来测量物体的特性。 从电磁波发射器朝向空间配置结构发射的电磁波以一定角度入射在包含空间区域的平面上，并且测量已经通过空间布置结构的电磁波。

公开(公告)号：US20110243582A1

公开(公告)日：2011-10-06

申请号：US13075584

申请日：2011-03-30

申请人： Tae Matsumoto ,  Tomoyuki Saiki ,  Takayuki Fukutani ,  Yuuji Takayama ,  Yuichi Ogawa

发明人： Tae Matsumoto ,  Tomoyuki Saiki ,  Takayuki Fukutani ,  Yuuji Takayama ,  Yuichi Ogawa

IPC分类号： G03G15/00

CPC分类号： G03G15/0131 ,  G03G15/5058 ,  G03G2215/00059 ,  G03G2215/00063 ,  G03G2215/0129 ,  G03G2215/0164

摘要： An image forming apparatus executes banding correction at a level determined according to variation of the density characteristic of the image forming apparatus to achieve a high quality image. In the image forming apparatus, a banding correction unit acquires information about a cause of density variation that may occur in a sub scanning direction of a rotation member, which is used for forming a toner image on an image carrier based on input image information and sets, based on the acquired information, the level of the density correction, which is determined according to the density variation cause information.

摘要翻译： 图像形成装置以根据图像形成装置的浓度特性的变化确定的水平执行条带校正，以实现高质量图像。 在图像形成装置中，条带校正单元基于输入图像信息获取关于在图像载体上形成调色剂图像的旋转构件的副扫描方向上可能发生的浓度变化的原因的信息，并且设置 基于获取的信息，根据密度变化确定的浓度校正的水平导致信息。

公开(公告)号：US20110205528A1

公开(公告)日：2011-08-25

申请号：US13086759

申请日：2011-04-14

申请人： Yuichi Ogawa ,  Shinichiro Hayashi ,  Seiji Kamba ,  Takashi Kondo

发明人： Yuichi Ogawa ,  Shinichiro Hayashi ,  Seiji Kamba ,  Takashi Kondo

IPC分类号： G01N21/55

CPC分类号： G01N21/3581 ,  G01N21/3563

摘要： A sample analysis method is provided for analyzing a sample having a permeability to terahertz radiation and accurately measure the composition, physical properties, mass and dimensions of a very small sample or a minute amount of sample by irradiating the sample with terahertz radiation. In the method, a reflective member is provided adjoining a first principal surface of the sample, an entrance member is provided adjoining a second principal surface of the sample, terahertz radiation is delivered from outside of entrance member towards the sample, and the sample is analyzed using an interference wave generated from a first-surface reflected wave at the interface between the first principal surface of the sample and the reflective member and a second-surface reflected wave at the interface between the second principal surface of the sample and the entrance member.

摘要翻译： 提供样品分析方法，用于分析具有太赫兹辐射渗透性的样品，并通过用太赫兹辐射照射样品来精确测量非常小样品或微量样品的组成，物理性质，质量和尺寸。 在该方法中，邻接样品的第一主表面设置反射构件，邻接样品的第二主表面设置入口构件，将太赫兹辐射从入口构件的外部朝向样品传送，并分析样品 使用从样品的第一主表面和反射构件之间的界面处的第一表面反射波产生的干涉波和在样品的第二主表面与入口构件之间的界面处的第二表面反射波。