公开(公告)号：US07019816B2

公开(公告)日：2006-03-28

申请号：US10736988

申请日：2003-12-17

申请人： Joost Jeroen Ottens ,  Henrikus Herman Marie Cox ,  Koen Jacobus Johannes Maria Zaal

发明人： Joost Jeroen Ottens ,  Henrikus Herman Marie Cox ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G03B27/58 ,  G03B27/62

CPC分类号： G03F7/707

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, an article support to support an article to be placed in a beam path of the beam of radiation, and a clamp to clamp the article to the article support. The clamp is provided with a plurality of zones located around a circumference of the article support to create a locally adjusted pressure so as to provide a local bending moment to locally bend the article.

摘要翻译： 公开了一种光刻设备。 该装置包括：照明系统，用于提供辐射束;物品支撑件，用于支撑放置在辐射束的光束路径中的物品;以及夹具，用于将物品夹持到物品支撑件上。 夹具设置有围绕物品支撑件的圆周设置的多个区域，以产生局部调节的压力，以便提供局部弯曲力矩以局部弯曲物品。

公开(公告)号：US08964164B2

公开(公告)日：2015-02-24

申请号：US13188026

申请日：2011-07-21

申请人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Matthijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

发明人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Matthijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

摘要翻译： 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。

公开(公告)号：US08749754B2

公开(公告)日：2014-06-10

申请号：US12647876

申请日：2009-12-28

申请人： Bob Streefkerk ,  Henrikus Herman Marie Cox ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Koen Jacobus Johannes Maria Zaal ,  Minne Cuperus

发明人： Bob Streefkerk ,  Henrikus Herman Marie Cox ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Koen Jacobus Johannes Maria Zaal ,  Minne Cuperus

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03F7/70641 ,  G03F7/70783

摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

摘要翻译： 浸没式光刻设备包括液体供应系统构件，其构造成在光刻设备的投影系统和基板之间的空间中容纳液体，液体供应系统构件补偿器被布置成补偿液体供应系统构件和衬底台之间的相互作用 。

公开(公告)号：US20120327387A1

公开(公告)日：2012-12-27

申请号：US13494703

申请日：2012-06-12

申请人： Raymond Wilhelmus Louis LAFARRE ,  Henrikus Herman Marie Cox ,  Antonius Franciscus Johannes De Groot ,  Johannes Petrus Martinus Bernardus Vermeulen

发明人： Raymond Wilhelmus Louis LAFARRE ,  Henrikus Herman Marie Cox ,  Antonius Franciscus Johannes De Groot ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC分类号： G03B27/58

CPC分类号： G03F7/70758 ,  G03F7/70716 ,  H01L21/682

摘要： A positioning device for positioning an object within a lithographic apparatus, including a support structure for supporting the object, at least two short-stroke units, each connected to the support structure, and a long-stroke unit. In the arrangement, each of the short-stroke units includes a short-stroke actuator system configured to provide independently at least one actuation force between the short-stroke unit and the long-stroke unit, and the long-stroke unit includes a long-stroke actuator system configured to provide at least one actuation force between the long-stroke unit and a reference structure of the lithographic apparatus.

摘要翻译： 一种用于将物体定位在光刻设备内的定位装置，包括用于支撑物体的支撑结构，连接到支撑结构的至少两个短行程单元和长行程单元。 在该结构中，每个短行程单元包括短行程致动器系统，该短行程致动器系统构造成在短行程单元和长行程单元之间独立地提供至少一个致动力，并且长行程单元包括长行程单元， 行程致动器系统被配置为在长行程单元和光刻设备的参考结构之间提供至少一个致动力。

公开(公告)号：US20120127451A1

公开(公告)日：2012-05-24

申请号：US13301505

申请日：2011-11-21

申请人： Hans Butler ,  Henrikus Herman Marie Cox

发明人： Hans Butler ,  Henrikus Herman Marie Cox

IPC分类号： G03B27/58

CPC分类号： G03F7/70775 ,  G03B27/53 ,  G03B27/58 ,  G03F7/70725

摘要： A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.

摘要翻译： 一种用于控制光刻设备的第一部件和第二部件之间的相对位置的定位系统，其中每个部件的位置由一组正交坐标定义，所述定位系统包括：测量装置，其被配置为确定 相对于测量坐标中的设定点位置的部件之一的瞬时位置; 以及控制器，被配置为基于所确定的误差来控制所述另一部件在控制坐标中的移动; 其中测量坐标与控制坐标不同。

公开(公告)号：US20110317142A1

公开(公告)日：2011-12-29

申请号：US13116934

申请日：2011-05-26

申请人： Henrikus Herman Marie Cox ,  Willem Herman Gertruda Anna Koenen ,  Thomas Augustus Mattaar ,  Martinus Theodorus Jacobus Pieterse ,  Rob Antonius Andries Verkooijen

发明人： Henrikus Herman Marie Cox ,  Willem Herman Gertruda Anna Koenen ,  Thomas Augustus Mattaar ,  Martinus Theodorus Jacobus Pieterse ,  Rob Antonius Andries Verkooijen

IPC分类号： G03B27/54 ,  G06F15/00

CPC分类号： G03F7/70775 ,  G03F7/70508

摘要： A measurement system is configured to derive a position quantity of an object, the measurement system includes at least one position quantity sensor configured to provide respective position quantity measurement signals; a position quantity calculator configured to determine a position quantity of the object from the position quantity measurement signal, wherein the position quantity calculator includes a torsion estimator configured to estimate a torsion of the object, the position quantity calculator being configured to correct the determined position quantity of the object for the estimated torsion.

摘要翻译： 测量系统被配置为导出物体的位置量，测量系统包括配置成提供各个位置量测量信号的至少一个位置量传感器; 位置量计算器，其被配置为根据所述位置量测量信号确定所述物体的位置量，其中所述位置量计算器包括被配置为估计所述物体的扭转的扭转估计器，所述位置量计算器被配置为校正所确定的位置量 的物体估计扭转。

公开(公告)号：US20090033905A1

公开(公告)日：2009-02-05

申请号：US12243291

申请日：2008-10-01

申请人： Bob STREEFKERK ,  Henrikus Herman Marie Cox ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Mertens ,  Koen Jacobus Johannes Zaal ,  Minne Cuperus

发明人： Bob STREEFKERK ,  Henrikus Herman Marie Cox ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Mertens ,  Koen Jacobus Johannes Zaal ,  Minne Cuperus

IPC分类号： G03D3/06

CPC分类号： G03F7/70341 ,  G03F7/70641 ,  G03F7/70783

摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

摘要翻译： 浸没式光刻设备包括液体供应系统构件，其构造成在光刻设备的投影系统和基板之间的空间中容纳液体，液体供应系统构件补偿器被布置成补偿液体供应系统构件和衬底台之间的相互作用 。

公开(公告)号：US07456935B2

公开(公告)日：2008-11-25

申请号：US11098608

申请日：2005-04-05

申请人： Henrikus Herman Marie Cox ,  Sven Antoin Johan Hol ,  Petrus Matthijs Henricus Vosters

发明人： Henrikus Herman Marie Cox ,  Sven Antoin Johan Hol ,  Petrus Matthijs Henricus Vosters

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/70791 ,  G03F7/70716 ,  G03F7/70758

摘要： A positioning device for positioning an object table includes a frame for supporting the object table in a first direction and a motor constructed and arranged to exert a first force on the object table in a second direction substantially perpendicular to the first direction and a second force on the object table in a third direction substantially perpendicular to the first direction and the second direction. A first part of the motor is constructed and arranged to co-operate with a second part for generating the first and second force. The first part is arranged on the object table, such that both the first force and the second force are directed substantially through the center of gravity of the object table.

摘要翻译： 用于定位物体台的定位装置包括：用于在第一方向上支撑物体台的框架;以及构造和布置成在基本上垂直于第一方向的第二方向上在第一方向上施加第一力并在第二方向施加第二力的电动机 所述物体台在大致垂直于所述第一方向和所述第二方向的第三方向上。 马达的第一部分被构造和布置成与第二部分配合以产生第一和第二力。 第一部分布置在物体台上，使得第一力和第二力都基本上指向物体台的重心。

公开(公告)号：US20080218717A1

公开(公告)日：2008-09-11

申请号：US12068546

申请日：2008-02-07

申请人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Matthijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

发明人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Matthijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

公开(公告)号：US20080123071A1

公开(公告)日：2008-05-29

申请号：US12000774

申请日：2007-12-17

申请人： Jan-Gerard Cornelis Van Der Toorn ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Evert Hendrik Jan Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Hermanus Frencken ,  Martijn Houkes ,  Antonius Henricus Arends ,  Minne Cuperus

发明人： Jan-Gerard Cornelis Van Der Toorn ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Evert Hendrik Jan Draaijer ,  Nicolaas Ten Kate ,  Frits Van Der Meulen ,  Mark Johannes Hermanus Frencken ,  Martijn Houkes ,  Antonius Henricus Arends ,  Minne Cuperus

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.

摘要翻译： 控制系统，被配置为控制流体供应系统的位置，所述流体供应系统构造和布置成在基板和投影系统之间提供流体，所述基板定位在基板台上，所述控制系统包括控制器，所述控制器被配置为确定 基于要提供给衬底台的位置信号和位置偏移的流体供应系统的期望位置，位置偏移被添加到要提供给衬底台的位置信号。