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公开(公告)号：US20090033905A1
公开(公告)日：2009-02-05
申请号：US12243291
申请日：2008-10-01
申请人： Bob STREEFKERK , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Mertens , Koen Jacobus Johannes Zaal , Minne Cuperus
发明人： Bob STREEFKERK , Henrikus Herman Marie Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Mertens , Koen Jacobus Johannes Zaal , Minne Cuperus
IPC分类号： G03D3/06
CPC分类号： G03F7/70341 , G03F7/70641 , G03F7/70783
摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
摘要翻译： 浸没式光刻设备包括液体供应系统构件，其构造成在光刻设备的投影系统和基板之间的空间中容纳液体，液体供应系统构件补偿器被布置成补偿液体供应系统构件和衬底台之间的相互作用 。
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公开(公告)号：US20050259233A1
公开(公告)日：2005-11-24
申请号：US10850451
申请日：2004-05-21
申请人： Bob Streefkerk , Henrikus Herman Cox , Christiaan Hoogendam , Jeroen Johannes Sophia Mertens , Koen Jacobus Johannes Zaal , Minne Cuperus
发明人： Bob Streefkerk , Henrikus Herman Cox , Christiaan Hoogendam , Jeroen Johannes Sophia Mertens , Koen Jacobus Johannes Zaal , Minne Cuperus
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70641 , G03F7/70783
摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
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公开(公告)号：US08638419B2
公开(公告)日：2014-01-28
申请号：US12986576
申请日：2011-01-07
申请人： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
发明人： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70925
摘要： A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
摘要翻译： 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地，可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。
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公开(公告)号：US08102507B2
公开(公告)日：2012-01-24
申请号：US12694880
申请日：2010-01-27
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
CPC分类号： G03F9/7023 , G03F7/70341 , G03F7/70883
摘要： A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.
摘要翻译： 光刻设备包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置成在其横截面中赋予图案的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板台之间的空间提供液体; 传感器，被配置为使用通过所述液体投影的测量光束来测量曝光参数; 以及校正系统，其被配置为基于影响使用所述测量光束进行的测量的物理属性的变化来确定偏移，以至少部分地校正所测量的曝光参数。
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公开(公告)号：US07670730B2
公开(公告)日：2010-03-02
申请号：US11298942
申请日：2005-12-12
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Jeroen Johannes Sophia Mertens , Johannes Catharinus Hubertus Mulkens , Christiaan Alexander Hoogendam
CPC分类号： G03F9/7023 , G03F7/70341 , G03F7/70883
摘要： A method for correcting an exposure parameter of an immersion lithographic apparatus is provided. In the method, an exposure parameter is measured using a measuring beam projected through a liquid between the projection system and a substrate table of the immersion lithographic apparatus and offset is determined based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter. Also, there is provided an apparatus and method to measure a height of an optical element connected to liquid between the projection system and the substrate table in the immersion lithographic apparatus.
摘要翻译： 提供了一种用于校正浸没式光刻设备的曝光参数的方法。 在该方法中，使用通过投影系统和浸没式光刻设备的衬底台之间的液体投影的测量光束来测量曝光参数，并且基于影响使用测量光束进行的测量的物理性质的变化来确定偏移 至少部分地校正测量的曝光参数。 此外，提供了一种用于在浸没式光刻设备中测量连接到投影系统和基板台之间的液体的光学元件的高度的装置和方法。
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公开(公告)号：US20060038968A1
公开(公告)日：2006-02-23
申请号：US10921348
申请日：2004-08-19
申请人： Nicolaas Kemper , Henrikus Marie Cox , Sjoerd Nicolaas Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Kate , Jeroen Johannes Sophia Mertens , Frits Der Meulen , Franciscus Herman Maria Teunissen , Jan-Gerard Van Der Toorn , Martinus Cornelis Verhagen , Stefan Belfroid , Johannes Smeulers
发明人： Nicolaas Kemper , Henrikus Marie Cox , Sjoerd Nicolaas Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Kate , Jeroen Johannes Sophia Mertens , Frits Der Meulen , Franciscus Herman Maria Teunissen , Jan-Gerard Van Der Toorn , Martinus Cornelis Verhagen , Stefan Belfroid , Johannes Smeulers
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US20050219483A1
公开(公告)日：2005-10-06
申请号：US11092964
申请日：2005-03-30
申请人： Johannes Baselmans , Sjoerd Nicolaas Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Sophia Mertens , Johannes Catharinus Mulkens , Bob Streefkerk
发明人： Johannes Baselmans , Sjoerd Nicolaas Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Sophia Mertens , Johannes Catharinus Mulkens , Bob Streefkerk
IPC分类号： H01L21/027 , G03B27/52 , G03F7/20 , G03F9/00
CPC分类号： G03F9/7096 , G03F7/70341
摘要： An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.
摘要翻译： 公开了一种浸没式光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充投影系统的最终元件和基板台之间的空间与第一液体，以及测量系统，其被配置为测量每个 多个点在基板上，测量系统布置成使得通过第二液体进行测量，第二液体不由液体供应系统供应。
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公开(公告)号：US20050243292A1
公开(公告)日：2005-11-03
申请号：US10835856
申请日：2004-05-03
申请人： Johannes Jacobus Baselmans , Sjoerd Nicolaas Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Sophia Mertens , Johannes Catharinus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Baselmans , Sjoerd Nicolaas Donders , Christiaan Hoogendam , Hans Jansen , Jeroen Johannes Sophia Mertens , Johannes Catharinus Mulkens , Bob Streefkerk
IPC分类号： H01L21/027 , G03B27/42 , G03F7/20 , G03F9/00
CPC分类号： G03F9/7034 , G03F7/70341
摘要： A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which levelling and exposure are performed simultaneously.
摘要翻译： 在用于浸没式光刻的实施例中的光刻设备和方法被公开在其中同时执行调平和曝光的单个阶段。
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公开(公告)号：US20050263068A1
公开(公告)日：2005-12-01
申请号：US10966110
申请日：2004-10-18
申请人： Christiaan Hoogendam , Bob Streefkerk , Johannes Catharinus Mulkens , Erik Theodorus Bijlaart , Aleksey Kolesnychenko , Erik Loopstra , Jeroen Johannes Sophia Mertens , Bernardus Slaghekke , Patricius Aloysius Tinnemans , Helmar Van Santen
发明人： Christiaan Hoogendam , Bob Streefkerk , Johannes Catharinus Mulkens , Erik Theodorus Bijlaart , Aleksey Kolesnychenko , Erik Loopstra , Jeroen Johannes Sophia Mertens , Bernardus Slaghekke , Patricius Aloysius Tinnemans , Helmar Van Santen
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。
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公开(公告)号：US20050048220A1
公开(公告)日：2005-03-03
申请号：US10900394
申请日：2004-07-28
申请人： Jeroen Johannes Sophia Mertens , Christiaan Hoogendam , Hans Jansen , Patricius Aloysius Tinnemans , Leon Van Den Schoor , Sjoerd Donders , Bob Streefkerk
发明人： Jeroen Johannes Sophia Mertens , Christiaan Hoogendam , Hans Jansen , Patricius Aloysius Tinnemans , Leon Van Den Schoor , Sjoerd Donders , Bob Streefkerk
IPC分类号： G03F7/20 , H01L21/027 , B05D5/12 , B05C11/00
CPC分类号： G03F7/70341
摘要： In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
摘要翻译： 在浸没式光刻设备中，浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度，以确保液体的恒定流动。
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