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    APPARATUS AND METHOD FOR INSPECTING DEFECTS
    31.
    发明申请
    APPARATUS AND METHOD FOR INSPECTING DEFECTS 审中-公开
    检查缺陷的装置和方法

    公开(公告)号：US20100265496A1

    公开(公告)日：2010-10-21

    申请号：US12827470

    申请日：2010-06-30

    申请人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

    发明人： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

    IPC分类号： G01N21/00 ,  G06K9/00

    CPC分类号： G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

    摘要： A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.

    摘要翻译： 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。

    Method of inspecting defects
    32.
    发明授权
    Method of inspecting defects 失效
    检查缺陷的方法

    公开(公告)号：US07508973B2

    公开(公告)日：2009-03-24

    申请号：US10809321

    申请日：2004-03-26

    申请人： Takafumi Okabe ,  Shunji Maeda ,  Yukihiro Shibata ,  Hidetoshi Nishiyama

    发明人： Takafumi Okabe ,  Shunji Maeda ,  Yukihiro Shibata ,  Hidetoshi Nishiyama

    IPC分类号： G06K9/00 ,  G06F3/048

    CPC分类号： G06T7/0004 ,  G06T2207/30148

    摘要： A method of inspecting detects includes assigning a plurality of sets of image acquisition conditions, executing inspection using each of the sets of conditions, classifying all detected defects into real defects and false defects by use of an automatic defect classification function, and selecting, from the plurality of sets of conditions, a set of conditions ideal for detection.

    摘要翻译： 检查检测方法包括：分配多组图像获取条件，使用每种条件执行检查，通过使用自动缺陷分类功能将所有检测到的缺陷分类为真实缺陷和假缺陷，并且从 多组条件，一套条件理想的检测。

    Method and apparatus for inspecting defects
    34.
    发明申请
    Method and apparatus for inspecting defects 审中-公开
    检查缺陷的方法和装置

    公开(公告)号：US20060078190A1

    公开(公告)日：2006-04-13

    申请号：US11196396

    申请日：2005-08-04

    申请人： Yukihiro Shibata ,  Kei Shimura ,  Hidetoshi Nishiyama ,  Shunji Maeda

    发明人： Yukihiro Shibata ,  Kei Shimura ,  Hidetoshi Nishiyama ,  Shunji Maeda

    IPC分类号： G06K9/00

    CPC分类号： G06T7/0004 ,  G06T2207/30148

    摘要： In order to detect defects without reducing the inspection speed, even when inspection is made by acquiring a high magnification image, defect inspection method is provided in which a surface of a sample is illuminated, via an illumination optical system, with light emitted by an illumination light source, an image of the sample illuminated with the light is picked up via a detection optical system, and the picked up image of the sample is compared with a previously stored image to detect defects. In illuminating the sample with the light, the area of the sample to be illuminated is varied according to an imaging magnification of the detection optical system.

    摘要翻译： 为了在不降低检查速度的情况下检测缺陷，即使通过获取高倍率图像进行检查，也提供了通过照明光学系统对样品的表面照射由照明发出的光的缺陷检查方法 光源，通过检测光学系统拾取用光照射的样品的图像，并将样品的拾取图像与先前存储的图像进行比较以检测缺陷。 在用光照射样品时，要照亮的样品的面积根据检测光学系统的成像倍率而变化。

    Pattern defect inspection apparatus and method
    37.
    发明授权
    Pattern defect inspection apparatus and method 有权
    图案缺陷检查装置及方法

    公开(公告)号：US08467048B2

    公开(公告)日：2013-06-18

    申请号：US13535955

    申请日：2012-06-28

    申请人： Hidetoshi Nishiyama ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

    发明人： Hidetoshi Nishiyama ,  Kei Shimura ,  Sachio Uto ,  Minori Noguchi

    IPC分类号： G01N21/00

    CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/4711

    摘要： A pattern defect inspection apparatus capable of detecting minute defects on a sample with high sensitivity without generating speckle noise in signals is realized. Substantially the same region on a surface of a wafer is detected by using two detectors at mutually different timings. Output signals from the two detectors are summed and averaged to eliminate noise. Since a large number of rays of illumination light are not simultaneously irradiated to the same region on the wafer, a pattern defect inspection apparatus capable of suppressing noise resulting from interference of a large number of rays, eliminating noise owing to other causes and detecting with high sensitivity minute defects on the sample without the occurrence of speckle noise in the signal can be accomplished.

    摘要翻译： 实现能够以高灵敏度检测样品上的微小缺陷而不产生信号中的斑点噪声的图案缺陷检查装置。 通过在相互不同的定时使用两个检测器来检测晶片表面上的基本上相同的区域。 来自两个检测器的输出信号被相加和平均以消除噪声。 由于大量的照明光线不能同时照射到晶片上的相同区域，所以能够抑制由于大量光线的干扰而产生的噪声的图案缺陷检查装置，消除由于其它原因引起的噪声和高检测 可以实现样品上的灵敏度微小缺陷，而不会在信号中发生斑点噪声。