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31.发明申请公开(公告)号：US20090231558A1
公开(公告)日：2009-09-17
申请号：US12429017
申请日：2009-04-23
Applicant: Giora Dishon , Moshe Finarov , Zvi Nirel , Yoel Cohen
Inventor： Giora Dishon , Moshe Finarov , Zvi Nirel , Yoel Cohen
IPC: G03F7/20
CPC classification number: G03F7/70058 , G01B11/14 , G01N21/88 , G01N21/9501 , G01N21/956 , G01N2021/8867 , G03F7/3028 , G03F7/70525 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70675 , G03F7/7075 , G03F7/70991 , H01L21/67155
Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.
Abstract translation: 用于根据预定的光刻工艺处理衬底的设备包括其中装载衬底的装载站，其中衬底涂覆有光致抗蚀剂材料的涂覆站，其中光致抗蚀剂涂层通过掩模暴露于光的曝光站 具有预定图案以在光致抗蚀剂涂层上产生掩模的潜像，其中潜像显影的显影站，卸载基板的卸载站和用于相对于预定参数监测基板的监控站 的光刻工艺。
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公开(公告)号：US07482596B2
公开(公告)日：2009-01-27
申请号：US10958665
申请日：2004-10-06
Applicant: Moshe Finarov
Inventor： Moshe Finarov
IPC: G01J1/42
CPC classification number: G01N21/211 , G01N21/01 , G01N2201/023
Abstract: A method and system are presented for use in optical processing of an article by VUV radiation. The method comprises: localizing incident VUV radiation propagation from an optical head assembly towards a processing site on the article outside the optical head assembly and localizing reflected VUV radiation propagation from said processing site towards the optical head assembly by localizing a medium, non-absorbing with respect to VUV radiation, in within the light propagation path in the vicinity of said site outside the optical head assembly. The level of the medium is controlled by measuring the reflected VUV radiation.
Abstract translation: 提出了一种用于通过VUV辐射对物品进行光学处理的方法和系统。 该方法包括：将来自光学头组件的入射VUV辐射传播定位到光学头组件外部的制品上的处理位置，并将来自所述处理部位的反射的VUV辐射传播定位到光学头组件，定位介质，不吸收 相对于在光学头组件外部的所述位置附近的光传播路径内的VUV辐射。 通过测量反射的VUV辐射来控制介质的水平。
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公开(公告)号：US20080065339A1
公开(公告)日：2008-03-13
申请号：US11931520
申请日：2007-10-31
Applicant: Moshe Finarov , Boaz Brill
Inventor： Moshe Finarov , Boaz Brill
IPC: G06F19/00
CPC classification number: G03F7/70616 , G01B11/24 , G01N21/4788 , G01N21/55 , G03F1/84
Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.
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公开(公告)号：US20080059129A1
公开(公告)日：2008-03-06
申请号：US11931342
申请日：2007-10-31
Applicant: Moshe Finarov , Boaz Brill
Inventor： Moshe Finarov , Boaz Brill
IPC: G06G7/48
CPC classification number: G03F7/70616 , G01B11/24 , G01N21/4788 , G01N21/55 , G03F1/84
Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.
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公开(公告)号：US07330259B2
公开(公告)日：2008-02-12
申请号：US11002988
申请日：2004-12-03
Applicant: Moshe Finarov , Shahar Gov
Inventor： Moshe Finarov , Shahar Gov
CPC classification number: G01N21/95607
Abstract: A method and system are presented for use in measuring/inspecting a patterned article. Optical measurements are applied to a measurement site on the article by illuminating the measurement site with a plurality of wavelengths at substantially normal incidence of the illuminating light, detecting light returned from the illuminated site, and generating measured data indicative thereof. The measurements are applied to the measurement site through a polarizer rotatable between its different orientations selected from a number of pre-calibrated orientations.
Abstract translation: 提出了一种用于测量/检查图案制品的方法和系统。 通过以基本上垂直入射的照明光照射具有多个波长的测量部位，检测从照明部位返回的光并产生表示其的测量数据，将光学测量应用于物品上的测量部位。 通过偏振器将测量值施加到测量位置，该偏振器可以在从多个预校准取向中选择的不同取向之间旋转。
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Patent Agency Ranking
公开(公告)号：US20070123151A1
公开(公告)日：2007-05-31
申请号：US11698878
申请日：2007-01-29
Applicant: Moshe Finarov
Inventor： Moshe Finarov
IPC: B24B49/00
Abstract: The present invention is aimed to provide a measurement system installable within a processing equipment and more specifically within the exit station of a polishing machine. The optical scheme of this system includes a spectrophotometric channel, an imaging channel and also means for holding the wafer under measurement.
Abstract translation: 本发明的目的是提供一种可在加工设备内安装的测量系统，更具体地说可以在抛光机的出口台内。 该系统的光学方案包括分光光度通道，成像通道以及用于保持测量晶片的装置。
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公开(公告)号：US20050275845A1
公开(公告)日：2005-12-15
申请号：US11141199
申请日：2005-06-01
Applicant: Moshe Finarov
Inventor： Moshe Finarov
IPC: G01N21/21 , G01N21/88 , G01N21/956 , H01L21/66 , G01N21/55
CPC classification number: G01N21/956 , G01N21/211 , G01N21/8806
Abstract: A system and method are presented for measurement on an article. The system comprises an illuminator for producing light of at least one predetermined wavelength range; an optical system; a displacement arrangement; and a control system. The optical system is configured to define at least a measurement channel, and comprises a light directing assembly for directing an input light beam, propagating along an input light path from the illuminator, onto the article and directing a light beam returned from the illuminated region of the article to at least one light detector. The displacement arrangement is associated with at least the light directing assembly of the optical system, and is configured and operable by the control system to rotate said at least light directing assembly of the optical system with respect to a stage supporting the article about a rotational axis substantially normal to the stage.
Abstract translation: 提出了一种用于物品测量的系统和方法。 该系统包括用于产生至少一个预定波长范围的光的照明器; 光学系统; 排水安排; 和控制系统。 光学系统被配置为至少限定测量通道，并且包括光导组件，用于将输入光束沿着从照明器的输入光路传播到物品上并且引导从照明区域返回的光束 该物品至少有一个光检测器。 所述位移布置与至少所述光学系统的所述光导组件相关联，并且被所述控制系统配置和操作以使所述光学系统的所述至少光导向组件相对于支撑所述制品的旋转轴线 基本上正常于舞台。
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公开(公告)号：US20050264801A1
公开(公告)日：2005-12-01
申请号：US11002988
申请日：2004-12-03
Applicant: Moshe Finarov , Shahar Gov
Inventor： Moshe Finarov , Shahar Gov
IPC: G01B20060101 , G01N21/88 , G01N21/956
CPC classification number: G01N21/95607
Abstract: A method and system are presented for use in measuring/inspecting a patterned article. Optical measurements are applied to a measurement site on the article by illuminating the measurement site with a plurality of wavelengths at substantially normal incidence of the illuminating light, detecting light returned from the illuminated site, and generating measured data indicative thereof. The measurements are applied to the measurement site through a polarizer rotatable between its different orientations selected from a number of pre-calibrated orientations.
Abstract translation: 提出了一种用于测量/检查图案制品的方法和系统。 通过以基本上垂直入射的照明光照射具有多个波长的测量部位，检测从照明部位返回的光并产生表示其的测量数据，将光学测量应用于物品上的测量部位。 通过偏振器将测量值施加到测量位置，该偏振器可以在从多个预校准取向中选择的不同取向之间旋转。
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公开(公告)号：US20050164608A2
公开(公告)日：2005-07-28
申请号：US10860019
申请日：2004-06-04
Applicant: Moshe Finarov
Inventor： Moshe Finarov
CPC classification number: B24B37/345 , B24B49/12 , H01L21/67253 , H01L21/6838
Abstract: Abstract of the DisclosureAn optical system is disclosed for the inspection of wafers during polishing which also includes a measurement system for measuring the thickness of the wafers top layer. The optical system views the wafer through a window and includes a gripping system, which places the wafer in a predetermined viewing location while maintaining the patterned surface completely under water. The optical system also includes a pull-down unit for pulling the measurement system slightly below the horizontal prior to the measurement and returns the measuring system to the horizontal afterwards
Abstract translation: 发明内容公开了一种用于在抛光期间检查晶片的光学系统，其还包括用于测量晶片顶层厚度的测量系统。 光学系统通过窗口观察晶片，并且包括夹持系统，其将晶片放置在预定的观察位置，同时将图案化表面完全保持在水下。 光学系统还包括一个下拉单元，用于在测量之前将测量系统稍微拉下水平面，然后将测量系统返回到水平面
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公开(公告)号：US20050009450A1
公开(公告)日：2005-01-13
申请号：US10860019
申请日：2004-06-04
Applicant: Moshe Finarov
Inventor： Moshe Finarov
CPC classification number: B24B37/345 , B24B49/12 , H01L21/67253 , H01L21/6838
Abstract: The present invention is aimed to provide a measurement system installable within a processing equipment and more specifically within the exit station of a polishing machine. The optical scheme of this system includes a spectrophotometric channel, an imaging channel and also means for holding the wafer under measurement.
Abstract translation: 本发明的目的是提供一种可在加工设备内安装的测量系统，更具体地说可以在抛光机的出口台内。 该系统的光学方案包括分光光度通道，成像通道以及用于保持测量晶片的装置。
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