System and method for forming a sealed chamber

    公开(公告)号:US09997328B2

    公开(公告)日:2018-06-12

    申请号:US15160972

    申请日:2016-05-20

    Abstract: Chamber elements defining an internal chamber to be utilized during a substrate related stage selected from the group consisting of substrate manufacturing stage and substrate inspection stage, the chamber elements comprising: a first element having a first surface; a second element having a second surface about the periphery of the internal chamber; a third element connected to the second element; and a clamping mechanism that is connected to the second and third elements and is arranged to press the second element towards the first element; wherein a first area of the first surface and a second area of the second surface come into proximity with each other at a first interface; wherein the first surface is positioned above the second surface; wherein a gas groove and a vacuum groove are formed in the second area; wherein the second element comprises a gas conduit that is arranged to provide gas to the gas groove and a vacuum conduit that is arranged to provide vacuum to the vacuum groove; wherein a provision of the gas and the vacuum assists in a formation of a gas cushion between the first and second areas; wherein the chamber elements are operable to partially surround a first portion of a movement system and a substrate during the substrate related stage, the movement system is arranged to introduce a movement of the first element in relation to the second element and the third element, wherein the gas cushion maintains predefined conditions in the internal chamber during the movement.

    HOLDING AND ROTATING APPARATUS FOR FLAT OBJECTS
    4.
    发明申请
    HOLDING AND ROTATING APPARATUS FOR FLAT OBJECTS 审中-公开
    平面对象的保持和旋转装置

    公开(公告)号:US20160260631A1

    公开(公告)日:2016-09-08

    申请号:US15028175

    申请日:2014-10-06

    Abstract: The invention relates to a holding and rotating apparatus for flat objects which define an object plane, having a gripper device that is rotatable about a rotation axis, said gripper device having a plurality of edge grippers and being designed to fix the object in a defined position in all spatial directions, the object plane being oriented perpendicularly to the rotation axis in said position, and having a rotary drive coupled to the gripper device, said rotary drive being designed to set the gripper device with the object in rotation about the rotation axis. The invention is characterized by a device for distance positioning, said device being designed to apply a supporting force, directed perpendicularly to the object plane, to the object in a contactless manner.

    Abstract translation: 本发明涉及一种用于平面物体的保持和旋转装置,其定义物平面,具有可围绕旋转轴线旋转的夹持装置,所述夹持装置具有多个边缘夹持器,并被设计成将物体固定在限定位置 在所有空间方向上,所述物体平面在所述位置处垂直于所述旋转轴线定向,并且具有联接到所述夹持装置的旋转驱动器,所述旋转驱动器设计成使所述夹持装置围绕所述旋转轴线旋转。 本发明的特征在于用于距离定位的装置,所述装置被设计成以无接触的方式将垂直于物平面指向的支撑力施加到物体。

    APPARATUS FOR ACQUIRING INFORMATION FROM OBJECT TO BE MEASURED AND AQUIRING METHOD THEREFOR
    5.
    发明申请
    APPARATUS FOR ACQUIRING INFORMATION FROM OBJECT TO BE MEASURED AND AQUIRING METHOD THEREFOR 有权
    用于从要测量的物体获取信息的装置及其方法

    公开(公告)号:US20140209802A1

    公开(公告)日:2014-07-31

    申请号:US14161509

    申请日:2014-01-22

    Inventor: Takeaki Itsuji

    Abstract: An apparatus configured to acquire information on an object to be measured by an electromagnetic wave pulse, the apparatus includes: a generating unit configured to generate the electromagnetic wave pulse with which the object to be measured is irradiated; a detecting unit configured to detect the electromagnetic wave pulse from the object to be measured; a casing including at least a part of a propagation path of the electromagnetic wave pulse leading from the generating unit to the detecting unit; and a measuring window unit configured to change a propagation distance of the electromagnetic wave pulse by moving a measuring window disposed in a part of the casing. The object to be measured is disposed on an opposite side of the propagation path of the electromagnetic wave pulse inside the casing by interposing the measuring window.

    Abstract translation: 一种被配置为通过电磁波脉冲获取关于被测量物体的信息的装置,所述装置包括:生成单元,被配置为产生照射被测量物体的电磁波脉冲; 检测单元,被配置为检测来自被测量物体的电磁波脉冲; 壳体,其包括从所述生成单元引导到所述检测单元的所述电磁波脉冲的传播路径的至少一部分; 以及测量窗单元,被配置为通过移动设置在壳体的一部分中的测量窗来改变电磁波脉冲的传播距离。 待测量物体通过插入测量窗口而设置在壳体内的电磁波脉冲的传播路径的相反侧。

    Interferometer system and method for its operation
    7.
    发明授权
    Interferometer system and method for its operation 有权
    干涉仪系统及其操作方法

    公开(公告)号:US08477316B2

    公开(公告)日:2013-07-02

    申请号:US12743964

    申请日:2008-10-01

    Abstract: In an interferometer system and a method for its operation, the interferometer system includes an interferometer having an interferometer light source whose emitted radiation is able to be split into a measuring arm and a reference arm, an object to be measured being disposed in the measuring arm, and the interferometer delivering interferometer signals as a function of the position of the object to be measured. In addition, a detecting device is provided for detecting fluctuations in the refractive index of the air in the measuring arm and/or reference arm. The detecting device includes a spectrometer unit; the spectrometer unit has at least one spectrometer light source, as well as at least one spectrometer detector unit. The bundles of rays emitted by the spectrometer light source are superimposed on the bundles of rays from the interferometer light source, the spectrometer light source emitting radiation having a wavelength which lies in the range of an absorption line of at least one specific air component. The spectrometer detector unit is used to generate spectrometer signals which characterize the absorption of the air component in terms of the spectrometer light-source wavelength in the measuring arm and/or reference arm.

    Abstract translation: 在干涉仪系统及其操作方法中,干涉仪系统包括具有干涉仪光源的干涉仪,其发射的辐射能够被分裂成测量臂和参考臂,待测量物体设置在测量臂 并且干涉仪将干涉仪信号作为待测量物体的位置的函数传递。 此外,提供了一种用于检测测量臂和/或参考臂中的空气的折射率的波动的检测装置。 检测装置包括光谱仪单元; 光谱仪单元具有至少一个光谱仪光源,以及至少一个光谱仪检测器单元。 由光谱仪光源发射的光线束被叠加在来自干涉仪光源的光束上,发射辐射的光谱仪光源具有位于至少一个特定空气分量的吸收线范围内的波长。 光谱仪检测器单元用于产生表征测量臂和/或参考臂中的光谱仪光源波长的空气分量的吸收的光谱仪信号。

    Analytical equipment enclosure incorporating phase changing materials
    8.
    发明授权
    Analytical equipment enclosure incorporating phase changing materials 有权
    分析设备包含相变材料

    公开(公告)号:US08154728B2

    公开(公告)日:2012-04-10

    申请号:US12347368

    申请日:2008-12-31

    CPC classification number: G01N21/39 G01N2201/022 G01N2201/023 G01N2201/0231

    Abstract: Thermally controlled enclosures that can be used with gas analyzers are described. The enclosures incorporate one or more phase changing materials that buffer ambient and internal heat loads to reduce the power consumption demand of mechanical or electronic heating apparatus. Maintenance of gas analyzer equipment at a consistent temperature can be important to achieving stable and reproducible results. Related systems, apparatus, methods, and/or articles are also described.

    Abstract translation: 描述了可用于气体分析仪的热控制外壳。 外壳采用缓冲环境和内部热负荷的一种或多种相变材料,以减少机械或电子加热设备的功耗需求。 在一致的温度下维护气体分析仪设备对于获得稳定和可重现的结果是重要的。 还描述了相关系统,装置,方法和/或制品。

    Optical inspection equipment for semiconductor wafers with precleaning
    9.
    发明申请
    Optical inspection equipment for semiconductor wafers with precleaning 有权
    具有预清洗功能的半导体晶片的光学检测设备

    公开(公告)号:US20050231719A1

    公开(公告)日:2005-10-20

    申请号:US11151218

    申请日:2005-06-13

    Abstract: A method for improving the measurement of semiconductor wafers is disclosed. In the past, the repeatability of measurements was adversely affected due to the unpredictable growth of a layer of contamination over the intentionally deposited dielectric layers. Repeatability can be enhanced by removing this contamination layer prior to measurement. This contamination layer can be effectively removed in a non-destructive fashion by subjecting the wafer to a cleaning step. In one embodiment, the cleaning is performed by exposing the wafer to microwave radiation. Alternatively, the wafer can be cleaned with a radiant heat source. These two cleaning modalities can be used alone or in combination with each other or in combination with other cleaning modalities. The cleaning step may be carried out in air, an inert atmosphere or a vacuum. Once the cleaning has been performed, the wafer can be measured using any number of known optical measurement systems.

    Abstract translation: 公开了一种改善半导体晶片测量的方法。 在过去,由于在有意沉积的介电层上的污染层的不可预测的增长,测量的重复性受到不利影响。 在测量之前,通过去除这个污染层可以提高重复性。 通过使晶片进行清洁步骤,可以非破坏性地有效地去除该污染层。 在一个实施例中,通过将晶片暴露于微波辐射来进行清洁。 或者,可以用辐射热源清洁晶片。 这两种清洁方式可以单独使用或彼此组合使用或与其他清洁模式组合使用。 清洁步骤可以在空气,惰性气氛或真空中进行。 一旦执行了清洁,就可以使用任何数量的已知光学测量系统测量晶片。

Patent Agency Ranking