公开(公告)号：US20100091284A1

公开(公告)日：2010-04-15

申请号：US12641663

申请日：2009-12-18

申请人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus G. Dziura ,  Mark Ghinovker

发明人： Walter D. Mieher ,  Ady Levy ,  Boris Golovanevsky ,  Michael Friedmann ,  Ian Smith ,  Michael Adel ,  Anatoly Fabrikant ,  Christopher F. Bevis ,  John Fielden ,  Noah Bareket ,  Kenneth P. Gross ,  Piotr Zalicki ,  Dan Wack ,  Paola Dececco ,  Thaddeus G. Dziura ,  Mark Ghinovker

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G01N21/956 ,  G01N2021/213 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70683 ,  G03F9/7049 ,  G03F9/7084

摘要： Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. A plurality of targets is provided. Each target includes a portion of the first and second structures and each is designed to have an offset between its first and second structure portions. The targets are illuminated with electromagnetic radiation to thereby obtain spectra from each target at a −1st diffraction order and a +1st diffraction order. It is determined whether there are any overlay error between the first structures and the second structures using a scatterometry technique based on the detected spectra by (i) for each target, determining a first differential intensity between the −1st diffraction order and a +1st diffraction order, (ii) for a plurality of pairs of targets each having a first target and a second target, determining a second differential intensity between the first differential intensity of the first target and the first differential intensity of the second target, and (iii) determining any overlay error between the first structures and the second structures using a scatterometry technique based on the second differential intensities determined from each target pair.

摘要翻译： 公开了用于确定样品的两层之间的重叠误差的技术，装置和目标。 提供多个目标。 每个目标包括第一和第二结构的一部分，并且每个目标被设计成在其第一和第二结构部分之间具有偏移。 用电磁辐射照射靶，从而以第一衍射级和+ 1衍射级获得每个靶的光谱。 使用基于检测到的光谱的第一结构和第二结构之间是否存在任何覆盖误差（i）对于每个目标，确定第一衍射级和第+第一衍射之间的第一差分强度 （ii）对于具有第一目标和第二目标的多对目标对，确定第一目标的第一差分强度与第二目标的第一差分强度之间的第二差分强度，以及（iii） 使用基于从每个目标对确定的第二差分强度的散射测量技术来确定第一结构和第二结构之间的任何覆盖误差。

公开(公告)号：US07483133B2

公开(公告)日：2009-01-27

申请号：US11078572

申请日：2005-03-11

申请人： Noah Bareket ,  Haiming Wang

发明人： Noah Bareket ,  Haiming Wang

IPC分类号： G01J3/28 ,  G01J3/42 ,  G01J3/427 ,  G01B11/14 ,  G01B11/04 ,  G01B11/08

CPC分类号： G01B11/0641 ,  G01N21/211 ,  G01N21/956

摘要： Techniques for optimizing the sensitivity of spectroscopic measurement techniques with respect to certain profile variables by selecting desired measurement angles since the measurement sensitivity to each variable depends, at least in part, on the measurement angles of an incident beam. The selected desired set of measurement angles includes both an azimuth angle and a polar angle. Optimizing the sensitivity of spectroscopic measurement techniques can also reduce or eliminates measurement correlation among variable to be measured.

摘要翻译： 由于对每个变量的测量灵敏度，因此通过选择所需的测量角度来优化光谱测量技术对某些分布变量的灵敏度的技术，至少部分取决于入射光束的测量角度。 所选择的所需的测量角度集合包括方位角和极角。 优化光谱测量技术的灵敏度也可以减少或消除待测量的变量之间的测量相关性。

公开(公告)号：US20060126079A1

公开(公告)日：2006-06-15

申请号：US11078572

申请日：2005-03-11

申请人： Noah Bareket ,  Haiming Wang

发明人： Noah Bareket ,  Haiming Wang

IPC分类号： G01B11/14

CPC分类号： G01B11/0641 ,  G01N21/211 ,  G01N21/956

摘要： Techniques for optimizing the sensitivity of spectroscopic measurement techniques with respect to certain profile variables by selecting desired measurement angles since the measurement sensitivity to each variable depends, at least in part, on the measurement angles of an incident beam. The selected desired set of measurement angles includes both an azimuth angle and a polar angle. Optimizing the sensitivity of spectroscopic measurement techniques can also reduce or eliminates measurement correlation among variable to be measured.

公开(公告)号：US20050174574A1

公开(公告)日：2005-08-11

申请号：US11101736

申请日：2005-04-07

申请人： Noah Bareket

发明人： Noah Bareket

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70633

摘要： A mark comprising at least one set of calibration periodic structures and at least two sets of test periodic structures, both types of which are positioned along an axis. The mark is used to measure the relative position between two layers of a device. Each set of test periodic structures has its periodic structures formed within first and second sections. The periodic structures of the first and second sections are each formed on one of the two layers of the device, respectively. The first and second sections of each test set is positioned proximate to the second and first sections of the next test set, respectively. This mark allows two beams which scan the mark to travel over both a test section formed on one layer of the device and a test section formed on the other of the two layers. Scanning multiple test sets provides multiple registration error values which are then averaged to obtain an average registration error value. Another aspect of the present invention is directed towards a method for measuring the relative position between two layers of a device. The method begins by providing a mark as described above. A beam is scanned in a first path across the mark. A beam is then scanned in a second path across the mark. Signals are generated with respect to the portion of each beam which reflects off the surface of the device so that the registration error between the two layers may be calculated.

公开(公告)号：US06580505B1

公开(公告)日：2003-06-17

申请号：US10212281

申请日：2002-08-01

申请人： Noah Bareket

发明人： Noah Bareket

IPC分类号： G01B1100

CPC分类号： G03F7/70633

摘要： A mark comprising at least one set of calibration periodic structures and at least two sets of test periodic structures, both types of which are positioned along an axis. The mark is used to measure the relative position between two layers of a device. Each set of test periodic structures has its periodic structures formed within first and second sections. The periodic structures of the first and second sections are each formed on one of the two layers of the device, respectively. The first and second sections of each test set is positioned proximate to the second and first sections of the next test set, respectively. This mark allows two beams which scan the mark to travel over both a test section formed on one layer of the device and a test section formed on the other of the two layers. Scanning multiple test sets provides multiple registration error values which are then averaged to obtain an average registration error value. Another aspect of the present invention is directed towards a method for measuring the relative position between two layers of a device. The method begins by providing a mark as described above. A beam is scanned in a first path across the mark. A beam is then scanned in a second path across the mark. Signals are generated with respect to the portion of each beam which reflects off the surface of the device so that the registration error between the two layers may be calculated.

公开(公告)号：US06462818B1

公开(公告)日：2002-10-08

申请号：US09603120

申请日：2000-06-22

申请人： Noah Bareket

发明人： Noah Bareket

IPC分类号： G01B1127

CPC分类号： G03F7/70633

摘要： A mark comprising at least one set of calibration periodic structures and at least two sets of test periodic structures, both types of which are positioned along an axis. The mark is used to measure the relative position between two layers of a device. Each set of test periodic structures has its periodic structures formed within first and second sections. The periodic structures of the first and second sections are each formed on one of the two layers of the device, respectively. The first and second sections of each test set is positioned proximate to the second and first sections of the next test set, respectively. This mark allows two beams which scan the mark to travel over both a test section formed on one layer of the device and a test section formed on the other of the two layers. Scanning multiple test sets provides multiple registration error values which are then averaged to obtain an average registration error value. Another aspect of the present invention is directed towards a method for measuring the relative position between two layers of a device. The method begins by providing a mark as described above. A beam is scanned in a first path across the mark. A beam is then scanned in a second path across the mark. Signals are generated with respect to the portion of each beam which reflects off the surface of the device so that the registration error between the two layers may be calculated.

摘要翻译： 包括至少一组校准周期性结构和至少两组测试周期性结构的标记，其两种类型沿轴线定位。 该标记用于测量设备两层之间的相对位置。 每组测试周期结构具有形成在第一和第二部分内的周期性结构。 第一和第二部分的周期性结构分别形成在装置的两层之一上。 每个测试集的第一和第二部分分别位于下一个测试集的第二和第一部分附近。 该标记允许扫描标记的两个光束在形成在装置的一层上的测试部分和形成在两个层中的另一层上的测试部分上行进。 扫描多个测试集提供多个配准误差值，然后对其进行平均以获得平均配准误差值。 本发明的另一方面涉及一种用于测量装置的两层之间的相对位置的方法。 该方法通过提供如上所述的标记开始。 在标记上的第一条路径中扫描光束。 然后在标记上的第二条路径中扫描光束。 相对于从设备表面反射的每个光束的部分产生信号，从而可以计算两层之间的配准误差。

公开(公告)号：US5889593A

公开(公告)日：1999-03-30

申请号：US806347

申请日：1997-02-26

申请人： Noah Bareket

发明人： Noah Bareket

IPC分类号： G01B11/06 ,  G01N21/55 ,  G03F1/00 ,  G03F1/84

CPC分类号： G01B11/0633 ,  G01N21/55 ,  G03F1/84

摘要： An angle-dependent reflectometer or transmissometer includes an optical imaging array in the incident and reflected or transmitted light path that breaks up an incident light beam into mutually spatially incoherent light bundles. The individual light bundles are then focused to a common spot by a high numerical aperture objective lens so as to provide a range of incidence angles on a sample surface. In a reflectometer, reflected light returns through the objective lens and imaging array and is imaged onto a detector array where different incidence and reflection angles are received by different groups of detection elements. In the angle-dependent transmissometer, the imaging array and high numerical aperture focusing objective lens are used for illuminating a spot on the sample, with a second high numerical aperture collection objective lens and detector array used for receiving transmitted light over a wide range of collection angles. The angle-dependent reflectance or transmittance measurement provided by the detector array can be analyzed to determine a desired characteristic parameter of the illuminated area of the sample surface. For example, a periodic text pattern on a wafer or mask surface can be illuminated to obtain a linewidth measurement. The break up of the light by the imaging array into light bundles allows the spot size to be controlled independently of the range of illumination angles so that areas much larger than the diffraction limit can be illuminated.

摘要翻译： 角度相关的反射计或透射计包括在入射和反射或透射光路中的光学成像阵列，其将入射光束分解成相互空间上不相干的光束。 然后通过高数值孔径物镜将各个光束聚焦到公共点，以便在样品表面上提供一定范围的入射角。 在反射计中，反射光通过物镜和成像阵列返回，并被成像到检测器阵列上，其中不同的入射角和反射角由不同的检测元件组接收。 在角度依赖的透射计中，成像阵列和高数值孔径聚焦物镜用于照射样品上的斑点，第二高数值孔径采集物镜和检测器阵列用于在广泛的收集范围内接收透射光 角度。 可以分析由检测器阵列提供的与角度相关的反射率或透射率测量值，以确定样品表面的照射区域的期望特征参数。 例如，可以照亮晶片或掩模表面上的周期性文本图案以获得线宽测量。 通过成像阵列将光分解成光束使得可以独立于照明角度的范围来控制光斑尺寸，使得可以照亮远大于衍射极限的面积。

公开(公告)号：US4687332A

公开(公告)日：1987-08-18

申请号：US787198

申请日：1985-10-15

申请人： Noah Bareket

发明人： Noah Bareket

IPC分类号： G01B9/02 ,  G01J9/02

CPC分类号： G01J9/0215

摘要： A scan-shear interferometer comprises a beamsplitter (11) for dividing an optical beam into a transmitted component I and a reflected component II, which are propagated in opposite directions along a triangular portion of an optical path defined by mirrors (12) and (13) back to the beamsplitter (11), from which the beam component I is transmitted and the beam component II is reflected to a mirror (14), which reflects the beam components I and II coincidentally to form pupils on an interference plane at a photodetector device (15). A rotating prism (16) is positioned so that each of the beam components I and II makes a double pass through the prism (16) before reaching the interference plane. Rotation of the prism (16) causes the pupil formed by the beam component II to remain stationary, and causes the pupil formed by the beam component I to move across the stationary pupil along a scan axis on the interference plane. The photodetector device (15) comprises a linear array of photodetector elements positioned along an axis perpendicular to the scan axis. The mirror (12) is tilted to introduce a shearing of the moving pupil with respect to the stationary pupil along the axis of the photodetector array. Each photodetector element generates an electronic signal indicative of a temporarily varying one-dimensional phase profile of a local portion of the wavefront of the beam. Electronic signals from all the photodetector elements of the array are processed to provide inputs to a standard algorithm for reconstructing a two-dimensional phase distribution of the beam wavefront.

摘要翻译： 扫描剪切干涉仪包括用于将光束分成透射分量I和反射分量II的分束器（11），反射分量II沿着由反射镜（12）和（13）限定的光学路径的三角形部分沿相反方向传播 ）返回到分束器（11），光束分量I从该分束器（11）被传输，并且光束分量II被反射到反射镜（14），其将光束分量I和II巧合地反射以在光电检测器上的干涉平面上形成瞳孔 装置（15）。 旋转棱镜（16）被定位成使得每个光束分量I和II在到达干涉平面之前双重穿过棱镜（16）。 棱镜（16）的旋转使得由光束分量II形成的光瞳保持静止，并且使得由光束分量I形成的光瞳沿着干涉平面上的扫描轴移动穿过固定光瞳。 光检测器装置（15）包括沿着垂直于扫描轴的轴定位的光电检测器元件的线性阵列。 倾斜镜子（12）以沿着光电检测器阵列的轴线相对于静止光瞳引入移动光瞳的剪切。 每个光电检测器元件产生指示波束的波阵面的局部部分的暂时变化的一维相位轮廓的电子信号。 处理来自阵列的所有光电检测器元件的电子信号，以提供用于重建波束波阵面的二维相位分布的标准算法的输入。