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公开(公告)号：US20050219707A1
公开(公告)日：2005-10-06
申请号：US11097398
申请日：2005-04-01
CPC分类号： G03F7/70266 , G02B3/12 , G02B13/143 , G02B27/0068 , G03F7/70883 , G03F7/70958
摘要： A projection objective of a microlithographic projection exposure apparatus has a correction device which can correct photoinduced imaging errors without optical elements having to be removed for this purpose. The correction device includes a first optical element and a second optical element, whose surface facing the first optical element is provided with a local surface deformation for improving the imaging properties of the projection objective. In a wall, which seals an intermediate space formed between the first optical element and the second optical element, an opening is provided through which the intermediate space can be filled with a fluid. By modifying the refractive index of the fluid adjacent to the surface, the effect of the surface deformation can be modified in a straightforward way.
摘要翻译： 微光刻投影曝光装置的投影物镜具有校正装置，该校正装置可以校正光诱导的成像误差，而不需要为此而移除光学元件。 校正装置包括第一光学元件和第二光学元件，其面向第一光学元件的表面设置有用于改善投影物镜的成像特性的局部表面变形。 在密封形成在第一光学元件和第二光学元件之间的中间空间的壁中，设置有可以用流体填充中间空间的开口。 通过改变与表面相邻的流体的折射率，可以以直接的方式修改表面变形的影响。
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公开(公告)号：US20050083583A1
公开(公告)日：2005-04-21
申请号：US10688212
申请日：2003-10-15
CPC分类号： G03F7/70241 , G02B13/143
摘要： According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive refractive power and at least one other lens group having a negative refractive power. In one embodiment, the projections lens includes a second lens group having a positive refractive power; a third lens group having a negative refractive power; and fourth, fifth and sixth lens groups having overall positive refractive power. The projection lens having a numerical aperture of at least about 0.85 and is of a 1½ waist construction, with the ½ waist defined in the first lens group and a primary waist is defined in the third lens group.
摘要翻译： 根据一个示例性实施例，提供具有物平面和像平面的投影透镜，并且包括以成像方式对象地列出的以下透镜组：（1）具有负屈光力的第一透镜组; 和（2）具有正屈光力的至少三个其它透镜组和具有负屈光力的至少一个其它透镜组。 在一个实施例中，投影透镜包括具有正折光力的第二透镜组; 具有负屈光力的第三透镜组; 以及具有总正正屈光力的第四，第五和第六透镜组。 投影透镜具有至少约0.85的数值孔径，并且具有1/2腰围结构，其中限定在第一透镜组中的1/2腰围和初级腰围限定在第三透镜组中。
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公开(公告)号：US07969663B2
公开(公告)日：2011-06-28
申请号：US12819861
申请日：2010-06-21
IPC分类号： G02B9/60
CPC分类号： G03F7/70241 , G02B13/143 , G03F7/70341
摘要： A projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, and has a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.
摘要翻译： 适用于浸没微光刻的投影物镜被设计为具有五个透镜组的单腰系统，并且具有负折光力的第一透镜组，正屈光力的第二透镜组，负折射光焦度的第三透镜组， 正屈光力的第四透镜组和正屈光力的第五透镜组。 第四透镜组具有位于第三透镜组（LG3）和第四透镜组（LG4）之间的边缘光线高度的拐点附近的入射面（E）。 在入射面和系统隔膜（5）之间没有设置具有大量屈光力的负透镜。 本发明的投影物镜的实施例结合大图像场实现非常高的数值孔径NA> 1，并且通过紧凑的设计尺寸来区分。 对于低于200nm的工作波长，当在投影物镜和基底之间使用浸没流体时，可以解决基本上在100nm以下的结构宽度。
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公开(公告)号：US07492509B2
公开(公告)日：2009-02-17
申请号：US10581651
申请日：2004-11-25
IPC分类号： G02B13/14
CPC分类号： G03F7/70241 , G02B13/143
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation is fulfilled: 2 · y · NA · 1 k · ∑ i = 1 k φ i ≥ V 1 wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, φi is a refractive power in mm−1 of the ith lens, k is a total number of lenses of the projection optical system, and wherein V1 is greater than 0.045.
摘要翻译： 投影光学系统包括沿投影光学系统的光轴设置的多个透镜; 其中所述多个透镜可分为四个不重叠的正和负屈光力透镜组，其中满足以下关系：
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公开(公告)号：US07408716B2
公开(公告)日：2008-08-05
申请号：US11649274
申请日：2007-01-04
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译： 适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有 提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。 束束狭窄收缩的收缩位置位于腰部区域。 在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。 本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。
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公开(公告)号：US20080043345A1
公开(公告)日：2008-02-21
申请号：US10576754
申请日：2003-10-22
IPC分类号： G02B27/18
CPC分类号： G03F7/70241 , G02B13/143 , G03F7/70341
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups in the case of which a first lens group of negative refractive power, a second lens group of positive refractive power, a third lens group of negative refractive power, a fourth lens group of positive refractive power and a fifth lens group of positive refractive power are provided. The fourth lens group has an entrance surface (E) that lies in the vicinity of a point of inflection of a marginal ray height between the third lens group (LG3) and the fourth lens group (LG4). No negative lens of substantial refractive power is arranged between the entrance surface and the system diaphragm (5). Embodiments of inventive projection objectives achieve a very high numerical aperture NA>1 in conjunction with a large image field and are distinguished by a compact design size. For working wavelengths below 200 nm, structural widths of substantially under 100 nm can be resolved when use is made of immersion fluids between the projection objective and substrate.
摘要翻译： 适合于浸没微光刻的纯折射投影物镜被设计为具有五个透镜组的单腰系统，在这种情况下，具有负屈光力的第一透镜组，正屈光力的第二透镜组，负折射力的第三透镜组 提供折射光焦度，正屈光力的第四透镜组和正屈光力的第五透镜组。 第四透镜组具有位于第三透镜组（LG 3）和第四透镜组（LG 4）之间的边缘光线高度的拐点附近的入射面（E）。 在入射面和系统隔膜（5）之间没有设置具有大量屈光力的负透镜。 本发明的投影物镜的实施例结合大图像场实现非常高的数值孔径NA> 1，并且通过紧凑的设计尺寸来区分。 对于低于200nm的工作波长，当在投影物镜和基底之间使用浸没流体时，可以解决基本上在100nm以下的结构宽度。
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公开(公告)号：US20070258152A1
公开(公告)日：2007-11-08
申请号：US10581651
申请日：2004-11-25
IPC分类号： G02B9/34
CPC分类号： G03F7/70241 , G02B13/143
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation is fulfilled: 2 · y · NA · 1 k · ∑ i = 1 k φ i ≥ V 1 wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, φi is a refractive power in mm−1 of the ith lens, k is a total number of lenses of the projection optical system, and wherein V1 is greater than 0.045.
摘要翻译： 投影光学系统包括沿投影光学系统的光轴设置的多个透镜; 其中所述多个透镜可被分成具有正和负折射光焦度的四个不重叠的透镜组，其中满足以下关系：
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公开(公告)号：US20050231814A1
公开(公告)日：2005-10-20
申请号：US11085602
申请日：2005-03-22
CPC分类号： G02B13/143 , G03F7/70241 , G03F7/70341
摘要： A purely refractive projection objective suitable for immersion micro-lithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with a negative refracting power, a second lens group with a positive refracting power, a third lens group with a negative refracting power, a fourth lens group with a positive refracting power and a fifth lens group with a positive refracting power are provided. The system aperture is in the region of maximum beam diameter between the fourth and the fifth lens group. Embodiments of projection objectives according to the invention achieve a very high numerical aperture of NA>1 in conjunction with a large image field, and are distinguished by a good optical correction state and moderate overall size. Pattern widths substantially below 100 nm can be resolved when immersion fluids are used between the projection objective and substrate in the case of operating wavelengths below 200 nm.
摘要翻译： 适用于浸没式微光刻的纯折射投影物镜被设计为具有五个透镜组的单腰系统，在具有负折射力的第一透镜组，具有正折射力的第二透镜组， 提供具有负折射率的第三透镜组，具有正折射率的第四透镜组和具有正折射率的第五透镜组。 系统孔径在第四和第五透镜组之间的最大光束直径的区域中。 根据本发明的投影物镜的实施例与大图像场一起实现了NA> 1的非常高的数值孔径，并且通过良好的光学校正状态和适度的总体尺寸来区分。 在波长低于200nm的情况下，当在投影物镜和基底之间使用浸液时，可以解析出大致低于100nm的图案宽度。
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39.发明申请公开(公告)号：US20100085644A1
公开(公告)日：2010-04-08
申请号：US12609437
申请日：2009-10-30
CPC分类号： G03F7/70941 , G03F7/70225
摘要： A projection objective of a projection exposure apparatus for microlithography serves for imaging an object arranged in an object plane onto a light-sensitive wafer in an image plane. The projection objective has a plurality of optical elements which have at least one reflective element and at least one refractive element. The plurality of optical elements lie, in the light propagation direction of the useful light, downstream of the reflective element on a common straight optical axis. The at least one reflective element has a substrate having at least one opening through which light beams can pass. The at least one reflective element is at least partly made from a material which suppresses stray light impinging on the reflective element rearward.
摘要翻译： 用于微光刻的投影曝光装置的投影物镜用于将在物平面中布置的物体成像到图像平面中的感光晶片上。 投影物镜具有多个具有至少一个反射元件和至少一个折射元件的光学元件。 多个光学元件在有用光的光传播方向上位于共同的直线光轴上的反射元件的下游。 所述至少一个反射元件具有基板，该基板具有至少一个光束可以通过的开口。 至少一个反射元件至少部分地由抑制入射到反射元件上的杂散光向后的材料制成。
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公开(公告)号：US07570343B2
公开(公告)日：2009-08-04
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译： 微光投影曝光装置包括用于产生投影光的照明系统和投影透镜，能够将能够布置在投影透镜的物平面中的光罩成像到能够布置的感光层上的投影透镜 在投影透镜的图像平面中。 投影透镜被设计用于浸没模式，其中在图像侧的投影透镜的最终透镜元件浸入浸没液体中。 相对于突起而言透明的端接元件紧固在图像侧的最终透镜元件与感光层之间。
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