公开(公告)号：US07737425B2

公开(公告)日：2010-06-15

申请号：US11798710

申请日：2007-05-16

申请人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

发明人： Levinus Pieter Bakker ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Maria Freriks ,  Frank Jeroen Pieter Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Josephus Box

IPC分类号： G21F1/12

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.

摘要翻译： 被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎屑的污染屏障。 污染屏障包括支撑结构，布置在支撑结构上并沿着径向方向从支撑结构的轴线延伸的多个板构件以及被构造成阻挡支撑结构的至少一部分被辐射撞击的屏蔽 或来自辐射源的碎片。

公开(公告)号：US20090206279A1

公开(公告)日：2009-08-20

申请号：US10599345

申请日：2005-03-18

申请人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Jeroen Jonkers ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： A61N5/00

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908

摘要： A method for removing contaminant particles (14), such as atoms, molecules, clusters, ions, and the like, produced by means of a radiation source (10) during generation of short-wave radiation (12) having a wavelength of up to approximately 20 nm, by means of a first gas (22) guided at high mass throughput between the radiation source (10) and a particle trap (20) arranged in a wall (16) of a mirror chamber (18) is described that can be used for a lithography device or a microscope. In order to protect an optical device and/or articles to he irradiated against contamination, the method is designed such that a second gas (24) is introduced into the mirror chamber (18) and its pressure is adjusted such that it is at least as high as the pressure of the first gas (22).

摘要翻译： 一种用于去除在产生短波辐射（12）期间通过辐射源（10）产生的污染物颗粒（14）的方法，例如原子，分子，簇，离子等，其具有波长直至 描述了通过在辐射源（10）和布置在反射镜腔（18）的壁（16）中的颗粒捕获器（20）之间以高质量通量引导的第一气体（22）的大约20nm，其可以 用于光刻设备或显微镜。 为了保护光学装置和/或物品以照射到污染物上，该方法被设计成使得第二气体（24）被引入反射镜室（18）中，并且调节其压力使其至少等于 作为第一气体（22）的压力高。

公开(公告)号：US07279690B2

公开(公告)日：2007-10-09

申请号：US11094490

申请日：2005-03-31

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Bastiaan Matthias Mertens ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans ,  Givi Georgievitch Zukavishvili ,  Bastiaan Theodoor Wolschrijn ,  Marc Hubertus Lorenz Van Der Velden

IPC分类号： H05H3/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

公开(公告)号：US07256407B2

公开(公告)日：2007-08-14

申请号：US11224084

申请日：2005-09-13

申请人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

发明人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

IPC分类号： H01J37/00 ,  G21K5/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70958

摘要： A lithographic projection apparatus includes reflector assembly, a foil trap, and a housing that is constructed and arranged to contain the reflector assembly and the foil trap. The reflector assembly is connected to the housing via a first wall, and the foil trap is connected to the housing via a second wall. The apparatus also includes a chamber between the foil trap and the reflector assembly. The chamber is defined by the housing, the first wall, and the second wall. The apparatus further includes a pump that is configured to create a vacuum in the chamber.

摘要翻译： 光刻投影设备包括反射器组件，箔捕获器和壳体，其被构造和布置成容纳反射器组件和箔阱。 反射器组件经由第一壁连接到壳体，并且箔阱通过第二壁连接到壳体。 该设备还包括在箔捕获器和反射器组件之间的室。 腔室由壳体，第一壁和第二壁限定。 该设备还包括被配置为在腔室中产生真空的泵。

公开(公告)号：US07211810B2

公开(公告)日：2007-05-01

申请号：US11024011

申请日：2004-12-29

申请人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： H01J37/08

CPC分类号： G03F7/70958 ,  G03F7/70033 ,  G03F7/70916

摘要： A method for the protection of an optical element of a lithographic apparatus including the optical element and a source of radiation includes providing a material including one or more elements selected from B, C, Si, Ge and/or Sn, and arranging the material such that the source, in use, causes removal of at least part of the material, thereby providing depositable material, and such that at least part of the depositable material deposits on the optical element.

摘要翻译： 一种用于保护包括光学元件和辐射源的光刻设备的光学元件的方法包括提供包括选自B，C，Si，Ge和/或Sn中的一种或多种元素的材料，并且将材料 使用中的源使得至少部分材料的去除，从而提供可沉积材料，并且使得至少部分可沉积材料沉积在光学元件上。

公开(公告)号：US20110121177A1

公开(公告)日：2011-05-26

申请号：US13021226

申请日：2011-02-04

申请人： Vadim Yevgenyevich BANINE ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich BANINE ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G01N23/08

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US20050264775A1

公开(公告)日：2005-12-01

申请号：US11127312

申请日：2005-05-12

申请人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Pieter Schuurmans ,  Jan Evert Der Werf

发明人： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Pieter Schuurmans ,  Jan Evert Der Werf

IPC分类号： G03B27/52 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K1/06

摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

公开(公告)号：US08445873B2

公开(公告)日：2013-05-21

申请号：US13478446

申请日：2012-05-23

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G21G5/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US07776390B2

公开(公告)日：2010-08-17

申请号：US11878989

申请日：2007-07-30

申请人： Ralph Kurt ,  Levinus Pieter Bakker

发明人： Ralph Kurt ,  Levinus Pieter Bakker

IPC分类号： B05D5/06

CPC分类号： G03F1/62 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G21K1/10

摘要： A filter window manufacturing method includes fabricating a structure of wires on a substrate, depositing a lacquer over the wires and the substrate, depositing a first layer that includes a material selected from the group consisting of AlN, Ru, Ir, Au, SiN, Rh, C and combinations thereof, removing the lacquer, removing the substrate, and baking the first layer.

摘要翻译： 一种滤光器窗口制造方法，包括在基板上制造导线的结构，在导线和基板上沉积漆，沉积第一层，该第一层包括选自由AlN，Ru，Ir，Au，SiN，Rh ，C及其组合，除去漆，除去基材，并烘烤第一层。

公开(公告)号：US07116394B2

公开(公告)日：2006-10-03

申请号：US10738976

申请日：2003-12-19

申请人： Levinus Pieter Bakker ,  Ralph Kurt ,  Bastiaan Matthias Mertens ,  Markus Weiss ,  Johann Trenkler ,  Wolfgang Singer

发明人： Levinus Pieter Bakker ,  Ralph Kurt ,  Bastiaan Matthias Mertens ,  Markus Weiss ,  Johann Trenkler ,  Wolfgang Singer

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70916 ,  B08B6/00 ,  B08B7/0035 ,  G03F7/70925

摘要： A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.

摘要翻译： 公开了一种用于去除光刻投影装置中的部件表面的至少一部分的污染物的清洁系统。 清洁系统包括产生电场以在组件的表面附近提供清洁颗粒的电场发生器。