Abstract:
A semiconductor device is provided. The semiconductor device includes: a first wire pattern disposed on a substrate and extending in a first direction; a first gate electrode surrounding the first wire pattern and extending in a second direction, the first direction intersecting the second direction perpendicularly; a first transistor including the first wire pattern and the first gate electrode; a second wire pattern disposed on the substrate and extending in the first direction; a second gate electrode surrounding the second wire pattern and extending in the second direction; and a second transistor including the second wire pattern and the second gate electrode, wherein a width of the first wire pattern in the second direction is different from a width of the second wire pattern in the second direction.
Abstract:
A semiconductor device includes channel layers on a substrate, the channel layers being spaced apart from each other, and having first side surfaces and second side surfaces opposing each other in a first direction, a gate electrode surrounding the channel layers and having a first end portion and a second end portion, opposing each other in the first direction, and a source/drain layer on a first side of the gate electrode and in contact with the channel layers, a portion of the source/drain layer protruding further than the first end portion of the gate electrode in the first direction, wherein a first distance from the first end portion of the gate electrode to the first side surfaces of the channel layers is shorter than a second distance from the second end portion of the gate electrode to the second side surfaces of the channel layers.
Abstract:
A vertical-type memory device a vertical-type memory device comprising a substrate including a first region and a second region, adjacent to the first region, a first conductive layer extending on the first region and the second region, and a second conductive layer extending on the first region and the second region, the second conductive layer stacked on the first conductive layer. An upper surface of the substrate has a step portion at a boundary between the first region and the second region, and the upper surface of the substrate in the first region is lower than in the second region.
Abstract:
A method including forming hard mask patterns on a substrate; forming etch stop patterns surrounding the hard mask patterns; forming spacer patterns covering sidewalls of the etch stop patterns; removing the etch stop patterns; etching the substrate to form active and dummy fins; forming a block mask pattern layer surrounding the active and dummy fins and forming mask etch patterns on a top surface of the block mask pattern layer; etching the block mask pattern layer to form block mask patterns surrounding the active fins; etching the dummy fins; removing the block mask patterns surrounding the active fins; and depositing a device isolation film on the substrate such that the device isolation film is not in contact with the upper portions of the active fins, wherein a spacing distance between the active fin and the dummy fin is greater than an active fin spacing distance between the active fins.
Abstract:
A clothes treating apparatus includes a main body having a laundry insertion opening formed on a front side of the main body, and a door to open or close the laundry insertion opening. The door includes a cover frame having a central opening and a side opening elongated in a circumferential direction of the cover frame; a hand receiving member configured to be coupled to the cover frame from a rear side of the cover frame, and having a pocket for receiving a hand of a user; and a cover panel configured to be coupled to the cover frame from a front side of the cover frame to cover the central opening of the cover frame, and having a recessed portion disposed to correspond to the side opening of the cover frame and to provide access to the pocket of the hand receiving member.
Abstract:
The robot cleaner includes a main body configured to remove dust from a floor while traveling on the floor, the main body having a lateral rim defining the external appearance of a lateral surface of the robot cleaner, and at least one side brush assembly mounted to the main body to clean the corner of the floor. The side brush assembly includes a side arm pivotably coupled to the main body, the side arm moving between a first position where the side arm is inserted into the main body and a second position where the side arm protrudes outward from the lateral rim of the main body, a brush unit provided at the side arm to sweep the floor, and a rim cover coupled to the side arm to form a part of the lateral rim of the main body when the side arm is inserted into the main body.
Abstract:
A robot cleaner provided with a shutter to open or close an inlet of a dust box when the dust box is separated from a body of the robot cleaner. Another robot cleaner, which docks with an automatic exhaust station, is also disclosed, together with the automatic exhaust station. The latter robot cleaner includes a shutter to be automatically opened by air discharged from the automatic exhaust station in a docked state of the robot cleaner to exhaust dust from the dust box, in order to allow even heavy dust to be easily exhausted.
Abstract:
A robot cleaner and a control method thereof may judge whether or not water is received in the robot cleaner performing wet cleaning. The robot cleaner includes a main body, moving units, a cleaning unit mounted on the main body and contacting a floor surface to perform cleaning, a water supply unit supplying water to the cleaning unit, and a sensing unit provided on at least a portion of the water supply unit to sense whether or not there is water within the water supply unit. The sensing unit includes a housing, a transmission part radiating electromagnetic waves, a reception part receiving the electromagnetic waves radiated by the transmission part, and a stepped part provided on at least a portion of the housing along a moving path of the electromagnetic waves radiated by the transmission part and received by the reception part.
Abstract:
Disclosed herein is an autonomous cleaning machine with a brush cleaning unit to clean a brush unit. The autonomous cleaning machine includes a main body, the brush unit rotatably provided on the main body, first brush cleaning members contacting the brush unit to move foreign substances wound on the brush unit in a lengthwise direction of the brush unit, and second brush cleaning members contacting the brush unit to remove the foreign substances wound on the brush unit from the brush unit.
Abstract:
A robot cleaner including a suction hole to suction dust, a blower to generate a suction force to suction the dust, a dust collector to receive the dust suctioned by said suction force through the suction hole, and a rotating brush to sweep up and collect the dust into the dust collector through the suction hole by a drive force of the rotating brush. The dust collector includes a backflow preventing member movable between an open position and a closed position. The backflow preventing member is pivotably rotatable in an air suction direction by the suction force of the blower to the open position and is adapted to return to the closed position to prevent the dust in the dust collector from being discharged through the suction hole upon stoppage of the blower.