THIN FILM TRANSISTOR
    33.
    发明申请
    THIN FILM TRANSISTOR 有权
    薄膜晶体管

    公开(公告)号:US20150249159A1

    公开(公告)日:2015-09-03

    申请号:US14436241

    申请日:2013-10-15

    CPC classification number: H01L29/78606 H01L29/7869 H01L29/78693

    Abstract: Provided is a thin film transistor wherein the shape of a protrusion formed on the interface between an oxide semiconductor layer and a protection film is suitably controlled, and stable characteristics are achieved. This thin film transistor is characterized in that: the thin film transistor has an oxide semiconductor layer formed of an oxide containing at least In, Zn and Sn as metal elements, and a protection film directly in contact with the oxide semiconductor layer; and the maximum height of a protrusion formed on the oxide semiconductor layer surface directly in contact with the protection film is less than 5 nm.

    Abstract translation: 提供一种薄膜晶体管,其中形成在氧化物半导体层和保护膜之间的界面上的突起的形状被适当地控制,并且实现了稳定的特性。 该薄膜晶体管的特征在于:薄膜晶体管具有由至少含有In,Zn和Sn作为金属元素的氧化物和与氧化物半导体层直接接触的保护膜形成的氧化物半导体层; 在与保护膜直接接触的氧化物半导体层表面上形成的突起的最大高度小于5nm。

    Display device and method of manufacturing the same
    34.
    发明授权
    Display device and method of manufacturing the same 有权
    显示装置及其制造方法

    公开(公告)号:US08912027B2

    公开(公告)日:2014-12-16

    申请号:US13733820

    申请日:2013-01-03

    CPC classification number: H01L33/44 H01L27/1225 H01L29/7869

    Abstract: A display device according to an exemplary embodiment of the present invention includes a semiconductor layer; a data line disposed on the semiconductor layer, and a source electrode as well as a drain electrode disposed on the semiconductor layer and facing the source electrode. The semiconductor layer is made of an oxide semiconductor including indium, tin, and zinc. An atomic percent of indium in the oxide semiconductor is equal to or larger than about 10 at % and equal to or smaller than about 90 at %, an atomic percent of zinc in the oxide semiconductor is equal to or larger than about 5 at % and equal to or smaller than about 60 at %, and an atomic percent of tin in the oxide semiconductor is equal to or larger than about 5 at % and equal to or smaller than about 45 at %, and the data line and the drain electrode comprise copper.

    Abstract translation: 根据本发明的示例性实施例的显示装置包括半导体层; 设置在半导体层上的数据线,以及设置在半导体层上并面向源电极的源电极以及漏电极。 半导体层由包括铟,锡和锌的氧化物半导体制成。 氧化物半导体中的铟的原子百分比等于或大于约10原子%且等于或小于约90原子%,氧化物半导体中的锌的原子百分比等于或大于约5原子%,以及 等于或小于约60at%,并且氧化物半导体中的锡的原子百分比等于或大于约5at%且等于或小于约45at%,并且数据线和漏电极包括 铜。

    Display device
    36.
    发明授权

    公开(公告)号:US12219835B2

    公开(公告)日:2025-02-04

    申请号:US18387145

    申请日:2023-11-06

    Abstract: A display device includes a display area which includes a first display area including a plurality of first pixels and a second display area including at least one second pixel and at least one light-transmitting portion, a peripheral area disposed around the display area, a data line including a first portion and a second portion spaced apart from each other in a predetermined direction with the light-transmitting portion therebetween, and a conductive pattern disposed at a different conductive layer from the data line. The conductive pattern includes a first pattern portion including a bypass portion that bypasses a periphery of the second display area in a plan view and disposed in the first display area, and the first pattern portion includes a first end electrically connected to the first portion of the data line and a second end electrically connected to the second portion of the data line.

    Display device
    37.
    发明授权

    公开(公告)号:US12183283B2

    公开(公告)日:2024-12-31

    申请号:US18106950

    申请日:2023-02-07

    Abstract: A display device includes: a base layer; a display element layer on the base layer, and including a light emitting element, a light detection element, and a photovoltaic element adjacent to one another; a light shielding layer on the display element layer, and having a plurality of opening parts; and a color filter layer on the display element layer, and covering the plurality of opening parts. The light detection element and the photovoltaic element are located at the same layer as each other, the light detection element is to detect an external input based on incident light from the outside, and the photovoltaic element is to generate electrical energy based on the incident light.

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