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    Micromirror unit and method of making the same
    31.
    发明授权
    Micromirror unit and method of making the same 有权
    微镜单元及其制作方法

    公开(公告)号：US08693083B2

    公开(公告)日：2014-04-08

    申请号：US13336190

    申请日：2011-12-23

    申请人： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

    发明人： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

    IPC分类号： G02B26/00

    CPC分类号： B81C1/00142 ,  B81B3/0078 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00396 ,  G02B26/0841 ,  Y10S359/904

    摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

    摘要翻译： 提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。 该方法包括以下步骤。 首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。 然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。 然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。 然后，选择性地去除第二掩模图案。 然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。 最后，删除第一个掩模图案。

    MICROMIRROR UNIT AND METHOD OF MAKING THE SAME
    32.
    发明申请
    MICROMIRROR UNIT AND METHOD OF MAKING THE SAME 有权
    微机单元及其制造方法

    公开(公告)号：US20120105936A1

    公开(公告)日：2012-05-03

    申请号：US13336190

    申请日：2011-12-23

    申请人： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

    发明人： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

    IPC分类号： G02B26/00

    CPC分类号： B81C1/00142 ,  B81B3/0078 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00396 ,  G02B26/0841 ,  Y10S359/904

    摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

    摘要翻译： 提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。 该方法包括以下步骤。 首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。 然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。 然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。 然后，选择性地去除第二掩模图案。 然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。 最后，删除第一个掩模图案。

    Micromirror unit and method of making the same
    33.
    发明授权
    Micromirror unit and method of making the same 有权
    微镜单元及其制作方法

    公开(公告)号：US08107157B2

    公开(公告)日：2012-01-31

    申请号：US11480512

    申请日：2006-07-05

    申请人： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

    发明人： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

    IPC分类号： G02B26/00

    CPC分类号： B81C1/00142 ,  B81B3/0078 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00396 ,  G02B26/0841 ,  Y10S359/904

    摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

    摘要翻译： 提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。 该方法包括以下步骤。 首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。 然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。 然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。 然后，选择性地去除第二掩模图案。 然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。 最后，删除第一个掩模图案。

    Micromirror unit and method of making the same
    34.
    发明申请
    Micromirror unit and method of making the same 有权
    微镜单元及其制作方法

    公开(公告)号：US20070091415A1

    公开(公告)日：2007-04-26

    申请号：US11480512

    申请日：2006-07-05

    申请人： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

    发明人： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

    IPC分类号： G02B26/00

    CPC分类号： B81C1/00142 ,  B81B3/0078 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00396 ,  G02B26/0841 ,  Y10S359/904

    摘要： A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

    摘要翻译： 提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。 该方法包括以下步骤。 首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。 然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。 然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。 然后，选择性地去除第二掩模图案。 然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。 最后，删除第一个掩模图案。

    Laser beam scanner and its fabricating method
    37.
    发明授权
    Laser beam scanner and its fabricating method 失效
    激光束扫描器及其制造方法

    公开(公告)号：US4957336A

    公开(公告)日：1990-09-18

    申请号：US269412

    申请日：1988-11-10

    申请人： Shin-ya Hasegawa ,  Masayuki Kato ,  Fumio Yamagishi ,  Hiroyuki Ikeda ,  Takefumi Inagaki

    发明人： Shin-ya Hasegawa ,  Masayuki Kato ,  Fumio Yamagishi ,  Hiroyuki Ikeda ,  Takefumi Inagaki

    IPC分类号： G02B26/10

    CPC分类号： G02B26/106 ,  Y10S359/90

    摘要： A high precision laser beam scanner is provided which is able to shape a beam generated by a laser, suppress the influence of jitter of a scanning beam due to mode hopping of a semiconductor laser, and reduce aberration of the scanning beam. A beam source generates a semiconductor laser beam, which is diffracted by a rotary hologram, forming a scanning beam on a surface to be scanned. An aberration correcting stationary hologram is disposed between the beam source and the rotary hologram. The stationary hologram is constructed with an object wave and a reference wave, which interfere on a stationary hologram substrate subject so that an aberration of the scanning beam on the surface to be scanned shall be corrected. The object wave is a spherical wave which has an aberration, a wave length shorter than that of the semiconductor laser beam, and an incident angle which is not vertical but is inclined with respect to the stationary hologram substrate. A method for fabricating the laser beam scanner is also provided.

    摘要翻译： 提供了能够对由激光产生的光束进行成形的高精度激光束扫描器，抑制由于半导体激光器的跳跃而导致的扫描光束的抖动的影响，并且减小扫描光束的像差。 光束源产生通过旋转全息图衍射的半导体激光束，在要扫描的表面上形成扫描光束。 像差校正固定全息图设置在光束源和旋转全息图之间。 固定全息图由对象波和参考波构成，其干涉固定的全息图基板对象，使得要扫描的表面上的扫描光束的像差被校正。 对象波是具有像差，波长短于半导体激光束的像差的球面波，并且不是垂直但相对于静止全息图基板倾斜的入射角。 还提供了一种用于制造激光束扫描器的方法。

    Multilayer display element and method of fabricating the same
    38.
    发明授权
    Multilayer display element and method of fabricating the same 有权
    多层显示元件及其制造方法

    公开(公告)号：US08269923B2

    公开(公告)日：2012-09-18

    申请号：US12561635

    申请日：2009-09-17

    申请人： Fumio Yamagishi ,  Junji Tomita ,  Hisashi Yamaguchi

    发明人： Fumio Yamagishi ,  Junji Tomita ,  Hisashi Yamaguchi

    IPC分类号： G02F1/1345 ,  G02F1/1347

    CPC分类号： G02F1/1345 ,  G02F1/13452 ,  G02F1/13471 ,  G02F1/13473 ,  G02F1/13718 ,  G02F2001/13478 ,  G02F2201/42

    摘要： A multilayer liquid crystal display element has a plurality of data electrode layer-to-layer interconnects formed in a non-display area of a liquid crystal display panel for connecting data electrodes of liquid crystal display panels for R, G, and B to a plurality of data signal input terminals from layer to layer, and a plurality of scanning electrode layer-to-layer interconnects formed in the non-display area for connecting scanning electrodes of the liquid crystal display panels for R, G, and B to a plurality of scan signal input terminals from layer to layer.

    摘要翻译： 多层液晶显示元件具有形成在用于将R，G和B的液晶显示面板的数据电极连接到多个的液晶显示面板的非显示区域中的多个数据电极层间互连 的数据信号输入端子，以及形成在非显示区域中的多个扫描电极层间布线，用于将用于R，G和B的液晶显示面板的扫描电极连接到多个 从层到层扫描信号输入端子。

    LIQUID CRYSTAL DISPLAY ELEMENT AND METHOD OF DRIVING THE ELEMENT
    39.
    发明申请
    LIQUID CRYSTAL DISPLAY ELEMENT AND METHOD OF DRIVING THE ELEMENT 失效
    液晶显示元件和驱动元件的方法

    公开(公告)号：US20100253714A1

    公开(公告)日：2010-10-07

    申请号：US12783636

    申请日：2010-05-20

    申请人： Tsuneo Watanuki ,  Makoto Fukuda ,  Fumio Yamagishi

    发明人： Tsuneo Watanuki ,  Makoto Fukuda ,  Fumio Yamagishi

    IPC分类号： G09G5/10 ,  G09G3/36

    CPC分类号： G09G3/3611 ,  G09G2300/023 ,  G09G2300/0486 ,  G09G2310/08 ,  G09G2320/0257 ,  G09G2320/041 ,  G09G2320/046 ,  G09G2320/048 ,  G09G2340/0435

    摘要： The invention relates to a liquid crystal display element displaying an image using a liquid crystal layer having memory characteristics and a method of driving the element. A liquid crystal display element capable of suppressing the generation of an afterimage attributable to image sticking is provided along with a method of driving the same. The liquid crystal display element includes a display section having memory characteristics including a cholesteric liquid crystal layer and displaying an image when a voltage is applied to the cholesteric liquid crystal layer, the section being capable of keeping the image displayed without electric power, a driving condition storing section for storing a plurality of different driving conditions including a voltage and an application period of the voltage, and a control section determining a display period for which a presently displayed image has been displayed on the display section when the displayed image is rewritten into a new image, acquiring a driving condition according to the display period from the driving condition storing section, and causing the display section to display the new image based on the acquired driving condition.

    摘要翻译： 本发明涉及使用具有记忆特性的液晶层显示图像的液晶显示元件和驱动该元件的方法。 提供能够抑制由于图像残留引起的残像的产生的液晶显示元件及其驱动方法。 液晶显示元件包括具有包括胆甾醇型液晶层的存储特性的显示部分，并且当向胆甾醇型液晶层施加电压时显示图像，该部分能够保持图像在没有电力的情况下显示，驱动条件 存储部分，用于存储包括电压的电压和施加周期的多个不同的驱动条件;以及控制部分，当显示的图像被重写为一个时，确定当前显示的图像已经被显示在显示部分上的显示周期 新图像，根据从驾驶状态存储部分的显示周期获取驾驶状况，并使显示部分基于所获取的驾驶状况显示新图像。