公开(公告)号：US08422761B2

公开(公告)日：2013-04-16

申请号：US12637331

申请日：2009-12-14

Applicant: Tadashi Kitamura ,  Akio Ishikawa

Inventor： Tadashi Kitamura ,  Akio Ishikawa

IPC: G06K9/00

CPC classification number: G06T7/0006 ,  G06T7/13 ,  G06T2207/30148

Abstract: Apparatus and method evaluate a wafer fabrication process for forming patterns on a wafer based upon design data. Within a recipe database, two or more inspection regions are defined on the wafer for analysis. Patterns within each of the inspection regions are automatically selected based upon tendency for measurement variation resulting from variation in the fabrication process. For each inspection region, at least one image of patterns within the inspection region is captured, a reference pattern, represented by one or both of (a) one or more line segments and (b) one or more curves, is automatically generated from the design data. An inspection unit detects edges within each of the images and registers the image with the reference pattern. One or more measurements are determined from the edges for each of the selected patterns and are processed within a statistical analyzer to form statistical information associated with the fabrication process.

Abstract translation: 基于设计数据，装置和方法评估在晶片上形成图案的晶片制造工艺。 在配方数据库中，在晶片上定义两个或更多个检查区域用于分析。 基于制造过程的变化导致的测量变化的趋势，自动地选择每个检查区域内的图案。 对于每个检查区域，捕获检查区域内的图案的至少一个图像，由（a）一个或多个线段和（b）一个或多个曲线中的一个或两个表示的参考图案从 设计数据。 检查单元检测每个图像内的边缘，并用参考图案注册图像。 从针对每个所选择的图案的边缘确定一个或多个测量值，并在统计分析器内处理以形成与制造过程相关联的统计信息。

公开(公告)号：US20120328181A1

公开(公告)日：2012-12-27

申请号：US13604456

申请日：2012-09-05

Applicant: Tadashi Kitamura ,  Toshiaki Hasebe ,  Masatoshi Tsuneoka

Inventor： Tadashi Kitamura ,  Toshiaki Hasebe ,  Masatoshi Tsuneoka

IPC: G06K9/62

CPC classification number: G06T7/001 ,  G06K9/00 ,  G06K2209/19 ,  G06T2207/30148

Abstract: A pattern inspection apparatus is used for inspecting a fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines, comprising one of a line segment and a curve, from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.

Abstract translation: 图案检查装置用于检查用于半导体或液晶面板的半导体集成电路（LSI），液晶面板和光掩模（掩模版）等精细图案，其基于用于制造的数据制造 精细图案如设计数据。 图案检查装置包括：参考图案生成装置，被配置为从数据生成包括线段和曲线中的一个或多个线的代表的参考图案，被配置为生成图案的图像的图像生成装置 被检查的检测装置，被配置为检测所述待检查图案的边缘的检测装置;以及检查装置，被配置为通过将所述图案的图像的边缘与所述图案的边缘进行比较来检查所述图案， 用参考图案的一行或多行进行检查。

公开(公告)号：US20100215247A1

公开(公告)日：2010-08-26

申请号：US12725141

申请日：2010-03-16

Applicant: Tadashi Kitamura ,  Akio Ishikawa

Inventor： Tadashi Kitamura ,  Akio Ishikawa

IPC: G06K9/00

CPC classification number: G06T7/001 ,  G06T2207/10004 ,  G06T2207/30148

Abstract: A system and method is described for evaluating a wafer fabrication process for forming patterns on a wafer based upon data. Multiple inspection regions are defined on the wafer for analysis. For each inspection region, images of patterns within the inspection region are captured, edges are detected, and lines are registered to lines of a reference pattern automatically generated from the design data. Line widths are determined from the edges. Measured line widths are analyzed to provide statistics and feedback information regarding the fabrication process. In particular embodiments defects are identified as where measured line widths lie outside boundaries determined from the statistics. In particular embodiments, lines of different drawn width and/or orientation are grouped and analyzed separately. Measured line widths may also be grouped for analysis according to geometry such as shape or proximity to other shapes in the inspection region to provide feedback for optical proximity correction rules.

Abstract translation: 描述了一种基于数据来评估在晶片上形成图案的晶片制造工艺的系统和方法。 在晶片上定义多个检查区域用于分析。 对于每个检查区域，捕获检查区域内的图案的图像，检测边缘，并且将线注册到从设计数据自动生成的参考图案的线上。 线宽从边缘确定。 分析测量线宽以提供关于制造过程的统计和反馈信息。 在特定实施例中，将缺陷识别为测量的线宽在从统计确定的边界之外的位置。 在特定实施例中，将不同拉伸宽度和/或取向的线分开并分开分析。 测量的线宽也可以根据诸如形状或检查区域中其他形状的接近度的几何形状进行分组，以提供用于光学邻近校正规则的反馈。

公开(公告)号：US07541075B2

公开(公告)日：2009-06-02

申请号：US11137401

申请日：2005-05-26

Applicant: Tadashi Kitamura ,  Hiroshi Kondo ,  Sunao Maeda

Inventor： Tadashi Kitamura ,  Hiroshi Kondo ,  Sunao Maeda

IPC: B32B37/12 ,  C08G59/40 ,  C08L63/00 ,  G02F1/1339

CPC classification number: G02F1/1339 ,  C08G59/66 ,  C08K5/16 ,  C08K5/37 ,  C08K5/54 ,  C08L63/00 ,  G02F1/133305 ,  Y10T428/1073 ,  C08L2666/08

Abstract: A sealant composition for a plastic liquid display cell is composed of a one-component epoxy resin composition of a base resin liquid and a curing agent liquid, wherein the base resin is a liquid epoxy resin having from 1.7 to 6 in weight average of epoxy groups in one molecule and an ionic conductivity of 2 mS/m or less; and the curing agent has an ionic conductivity of 0.6 mS/m or less. The sealant composition facilitates the fabrication of plastic liquid crystal displays having enhanced durability and sealant properties, particularly in high temperature and high humidity environments.

Abstract translation: 用于塑料液体显示池的密封剂组合物由基础树脂液体和固化剂液体的单组分环氧树脂组合物组成，其中基础树脂是具有1.7至6重量平均环氧基团的液体环氧树脂 在一分子中，离子电导率为2mS / m以下; 固化剂的离子电导率为0.6mS / m以下。 密封剂组合物有助于制造具有增强的耐久性和密封剂性质的塑料液晶显示器，特别是在高温和高湿度环境中。

公开(公告)号：US20070179221A1

公开(公告)日：2007-08-02

申请号：US11730702

申请日：2007-04-03

Applicant: Tadashi Kitamura

Inventor： Tadashi Kitamura

IPC: C08L95/00

CPC classification number: G02F1/1339 ,  G02F1/1341 ,  G02F2001/13415 ,  G02F2202/023

Abstract: A method for producing a liquid crystal display cell comprising processes of applying a sealing agent on a sealing portion of at least one liquid crystal display cell substrate, dropping liquid crystal on the substrate, and bonding substrates to each other under vacuum, wherein the sealing agent comprising a material to be cured and a curing agent is applied to the sealing portion without mixing the material to be cured and the curing agent, and then the substrates are bonded to each other under vacuum at room temperature to cure the sealing agent, is disclosed. A sealing agent for a liquid crystal display cell wherein the above material to be cured comprise a radically polymerizable resin and an organic peroxide, and the above curing agent comprises a radically polymerizable resin and a decomposition accelerator, is also disclosed.

Abstract translation: 一种制造液晶显示单元的方法，包括在至少一个液晶显示单元基板的密封部分上施加密封剂，在基板上滴下液晶以及在真空下彼此接合基板的方法，其中密封剂 包括待固化的材料，并且将固化剂施加到密封部分上而不混合待固化的材料和固化剂，然后在室温下在真空下将基底彼此粘合以固化密封剂 。 一种用于液晶显示器的密封剂，其中上述待固化的材料包括自由基聚合树脂和有机过氧化物，并且上述固化剂包括可自由基聚合的树脂和分解促进剂。

公开(公告)号：US06812065B1

公开(公告)日：2004-11-02

申请号：US09701602

申请日：2000-11-30

Applicant: Tadashi Kitamura

Inventor： Tadashi Kitamura

IPC: H01L2102

CPC classification number: C09J9/02 ,  C08L63/00 ,  H01B1/22 ,  H05K3/323 ,  H05K2201/0133 ,  H05K2201/0212 ,  H05K2201/068 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1068 ,  Y10T428/1073 ,  Y10T428/31511 ,  Y10T428/31515 ,  Y10T428/31518 ,  Y10T428/31525

Abstract: Provided is an anisotropic conductive paste in which an aqueous solution obtained by admixing the anisotropic conductive paste with purified water has an ionic conductivity of 1 mS/m or less; the B stage-reduced composition has a viscosity of 50 to 10000 Pa.s at 80 to 100° C.; and the cured matter of the anisotropic conductive paste has a linear expansion coefficient of 10×10−5 mm/mm/° C. or less at 0 to 100° C., a heat deformation temperature Tg of 100° C. or higher, a water absorption coefficient of 2 mass % or less and a specific resistance of 1×109&OHgr;.cm or more.

Abstract translation: 提供一种各向异性导电浆料，其中通过将各向异性导电浆料与纯化水混合而获得的水溶液具有1mS / m以下的离子电导率; B阶段还原组合物在80〜100℃下的粘度为50〜10000Pa·s。 并且各向异性导电糊的固化物在0〜100℃下的线膨胀系数为10×10 -5 mm / mm /℃以下，热变形温度Tg为100℃以上， 吸水系数为2质量％以下，电阻率为1×10 9Ω·cm以上。

公开(公告)号：US06399953B1

公开(公告)日：2002-06-04

申请号：US09227231

申请日：1999-01-08

Applicant: Tadashi Kitamura

Inventor： Tadashi Kitamura

IPC: H01J3728

CPC classification number: H01J37/28 ,  H01J2237/2817

Abstract: A method for automatically recognizing a stage position of a feature of a semiconductor wafer comprises the steps of identifying a feature of a semiconductor wafer disposed at a predetermined distance from an alignment mark on the semiconductor wafer and obtaining an electron beam image, an optical image or a differential image thereof of the feature of the semiconductor wafer. A normalized correlation coefficient from the image of the feature is then calculated, and a stage position of the feature of the semiconductor wafer is automatically recognized in accordance with the normalized correlation coefficient.

Abstract translation: 用于自动识别半导体晶片的特征的台位置的方法包括以下步骤：识别设置在半导体晶片上的对准标记预定距离处的半导体晶片的特征，并获得电子束图像，光学图像或 其半导体晶片的特征的差分图像。 然后计算来自特征图像的归一化相关系数，并且根据归一化相关系数自动识别半导体晶片的特征的阶段位置。

公开(公告)号：US5444245A

公开(公告)日：1995-08-22

申请号：US158739

申请日：1993-11-30

Applicant: Tadashi Kitamura

Inventor： Tadashi Kitamura

IPC: G01N21/84 ,  G01B11/00 ,  G01B15/00 ,  H01J37/22 ,  H01J37/28 ,  H01L21/66 ,  H01J37/26

CPC classification number: H01J37/28 ,  B82Y35/00 ,  H01J2237/30433

Abstract: A method of automatically setting a coordinate conversion factor in which, under the condition where a sample having a simple contour, such as a wafer with a known contour, is installed in a shape observing unit, in order to determine the conversion factor between a coordinate system defined by the contour of the sample and a control coordinate system for an observing position such as a stage coordinate system, the edge position of the contour of the sample is automatically recognized at a high accuracy from a secondary electron picture which has been obtained from the shape observing unit, from the result of which the conversion factor between the sample coordinate system and the stage coordinate system is automatically set.

Abstract translation: 一种自动设定坐标转换因子的方法，其中在具有简单轮廓的样本（例如具有已知轮廓的晶片）的样品被安装在形状观察单元中的情况下，以便确定坐标转换系数之间的转换因子 由样本轮廓定义的系统和用于诸如舞台坐标系的观察位置的控制坐标系，从二次电子图像中以高精度自动识别样本轮廓的边缘位置，该二次电子图像从 形状观察单元，其结果是自动设置样本坐标系和平台坐标系之间的转换因子。

公开(公告)号：US4387115A

公开(公告)日：1983-06-07

申请号：US289887

申请日：1981-08-04

Applicant: Tadashi Kitamura ,  Sumio Hirose

Inventor： Tadashi Kitamura ,  Sumio Hirose

IPC: C08K13/02 ,  C09D5/24 ,  H01B1/22 ,  H05K1/09 ,  B05D5/12

CPC classification number: H01B1/22 ,  C08K13/02 ,  C09D5/24 ,  H05K1/095 ,  Y10S428/901

Abstract: Conductive cured products which have superior initial conductivity which is substantially retained even under high temperature and humidity conditions are obtained by curing a resinous composition comprising (a) a metallic copper powder, (b) a copper compound, (c) a compound having a 1,4-dihydroxy benzene ring or 1,2-dihydroxy benzene ring structure, and (d) a resinous curable component. Additionally, inclusion of a chelate forming compound in the uncured composition prevents a curing phenomenon on the surface of the composition during storage. The compound having the dihydroxy benzene ring (compound c) reduces the copper compound (b) to deposit metallic copper, and the resinous curable component integrates the constituents into a conductive product upon curing. The compositions are used as paints, adhesives, printing inks, and moulded articles, and they are useful in the electric, electronic, automobile, and housing fields.

Abstract translation: 通过固化含有（a）金属铜粉末，（b）铜化合物，（c）具有1个碳原子的化合物的化合物的树脂组合物，可获得具有优异的初始导电性的导电性固化物，其即使在高温高湿条件下也基本上保持 ，4-二羟基苯环或1,2-二羟基苯环结构，和（d）可树脂固化组分。 此外，在未固化的组合物中包含形成螯合物的化合物防止了组合物在储存期间的表面上的固化现象。 具有二羟基苯环（化合物c）的化合物减少了铜化合物（b）以沉积金属铜，并且树脂固化组分在固化时将组分整合成导电产物。 该组合物用作油漆，粘合剂，印刷油墨和模制品，并且它们可用于电气，电子，汽车和住房领域。