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公开(公告)号：US20120184311A1
公开(公告)日：2012-07-19
申请号：US13498386
申请日：2010-10-07
CPC分类号： H04W56/002 , H04W48/16 , H04W88/08 , H04W92/20
摘要： The present invention relates to a base station device 1 that performs wireless communication with a terminal device 2 existing in its cell. The base station device 1 includes an obtainment unit (reception unit 12) that obtains control information for another base station device 1 to achieve synchronization with the another base station device 1, and a selection unit (synchronization control unit 40) that selects the another base station device 1 to be a synchronization source, based on identification information that specifies the type of the another base station device 1, the identification information being included in the control information.
摘要翻译： 本发明涉及与其小区中存在的终端装置2进行无线通信的基站装置1。 基站装置1包括获取单元（获取单元12），其获得另一个基站装置1的控制信息，以实现与另一个基站装置1的同步;以及选择单元（同步控制单元40），其选择另一个基站 站装置1作为同步源，基于指定另一个基站装置1的类型的识别信息，识别信息被包括在控制信息中。
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公开(公告)号：US20120170545A1
公开(公告)日：2012-07-05
申请号：US13496233
申请日：2010-11-08
申请人： Takashi Yamamoto
发明人： Takashi Yamamoto
CPC分类号： H04W72/08 , H04W56/002 , H04W88/08 , H04W92/20
摘要： Basic units (resource blocks) of resource allocation that can be used in a communication area of a base station apparatus are determined without obtaining resource allocation information. To do so, a base station apparatus includes an RF unit 4 that receives a communication signal between another base station apparatus and a terminal apparatus wirelessly connected to the another base station apparatus; a synchronization processing unit 5b that performs a process for synchronizing with the another base station apparatus; and a measurement processing unit 5d that determines power in each resource block of the communication signal received by the RF unit 4 and determines, based on the power, whether the resource block can be used in a communication area of the base station apparatus.
摘要翻译： 确定可以在基站装置的通信区域中使用的资源分配的基本单元（资源块），而不获取资源分配信息。 为此，基站装置包括：RF单元4，其接收另一基站装置与无线连接到另一基站装置的终端装置之间的通信信号; 同步处理单元5b，执行与另一基站装置同步的处理; 以及测量处理单元5d，其确定由RF单元4接收的通信信号的每个资源块中的功率，并且基于该功率确定是否可以在基站设备的通信区域中使用资源块。
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公开(公告)号：US20120155341A1
公开(公告)日：2012-06-21
申请号：US13393430
申请日：2010-10-04
申请人： Takashi Yamamoto , Eiji Mochida , Yoshizo Tanaka
发明人： Takashi Yamamoto , Eiji Mochida , Yoshizo Tanaka
IPC分类号： H04J1/02
CPC分类号： H04B7/063 , H04B7/0617 , H04B7/086 , H04W16/28
摘要： Interference suppression by beam forming is achieved even in an FDD (Frequency Division Duplex) system. A base station device 1 performs communication based on FDD. The base station device 1 includes a downlink signal reception unit 12 that receives a downlink signal transmitted from another base station device. The base station device 1 performs a beam forming process for directing a null beam to an arrival direction of the downlink signal from the another base station device, by using transmission path information between the base station device and the another base station device, the information being available from the downlink signal received by the downlink signal reception unit 12.
摘要翻译： 即使在FDD（频分双工）系统中也能实现波束形成的干扰抑制。 基站装置1进行基于FDD的通信。 基站装置1包括：接收从另一个基站装置发送的下行链路信号的下行链路信号接收部12。 基站装置1通过使用基站装置与另一基站装置之间的传输路径信息，执行用于将空波束引导到来自另一基站装置的下行链路信号的到达方向的波束形成处理，信息为 可从下行链路信号接收单元12接收的下行链路信号获得。
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34.发明授权公开(公告)号：US08113666B2
公开(公告)日：2012-02-14
申请号：US12406610
申请日：2009-03-18
CPC分类号： G03B21/28
摘要： A projector includes a light source, a light modulator that modulates the light flux emitted from the light source in accordance with an image signal to form image light, a projection optical apparatus that enlarges and projects the image light, a reflection section having a reflection surface disposed along the direction in which the projection optical apparatus outputs the image light, the reflection surface reflecting the image light, and an adjustment section that adjusts the inclination angle of the reflection section with respect to the direction in which the image light travels.
摘要翻译： 一种投影仪，包括：光源，根据图像信号调制从光源发出的光束以形成图像光的光调制器;放大和投影图像光的投影光学装置;具有反射面的反射部; 沿着投影光学装置输出图像光的方向，反射图像光的反射面以及调整反射部相对于图像光行进的方向的倾斜角度的调整部。
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公开(公告)号：US20120006025A1
公开(公告)日：2012-01-12
申请号：US13201190
申请日：2009-12-10
申请人： Yoshinori Koyama , Takashi Yamamoto , Osamu Shinada , Hiromi Ishii , Hitoji Yamada , Shozo Kaneko , Kimishiro Tokuda , Isao Mochida , Tatsurou Harada
发明人： Yoshinori Koyama , Takashi Yamamoto , Osamu Shinada , Hiromi Ishii , Hitoji Yamada , Shozo Kaneko , Kimishiro Tokuda , Isao Mochida , Tatsurou Harada
CPC分类号： F23K1/04 , F01K9/003 , F23J2217/102 , F23K2201/101 , F23K2201/103 , F23K2201/20 , F23K2203/104
摘要： A thermal power plant that uses low-grade coal as fuel and allows for increased thermal efficiency of the entire plant is provided. The thermal power plant includes a drying device (3) that dries the low-grade coal to be supplied to a lignite mill (coal pulverizer) (4), and a drying-gas heater (13) that heats air to be supplied to the drying device (3) so as to be used for drying the low-grade coal. A condenser (12) and the drying-gas heater (13) are connected with each other via a heat exchanger (19), and exhaust heat from the condenser (12) is used as a heat source for heating the air.
摘要翻译： 提供了使用低等级煤作为燃料并允许整个工厂的热效率提高的火力发电厂。 火力发电厂包括干燥装置（3），其干燥要供应到褐煤磨（煤粉碎机）（4））的低级煤，以及干燥气体加热器（13），其将供给到 干燥装置（3），用于干燥低档煤。 冷凝器（12）和干燥气体加热器（13）通过热交换器（19）彼此连接，并且来自冷凝器（12）的排气用作用于加热空气的热源。
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公开(公告)号：US08089602B2
公开(公告)日：2012-01-03
申请号：US12369800
申请日：2009-02-12
申请人： Takashi Yamamoto , Yoshihiro Arai , Aki Tsuchiya , Naoki Kikuchi
发明人： Takashi Yamamoto , Yoshihiro Arai , Aki Tsuchiya , Naoki Kikuchi
IPC分类号： G02F1/1339
CPC分类号： G02F1/13394 , G02F2001/13396
摘要： The generation of bubbles in a liquid crystal material of a liquid crystal display panel and the generation of color irregularities when the liquid crystal display panel is pushed can be reduced. In a display device having a liquid crystal display panel in which a liquid crystal material is filled between a first substrate and a second substrate, the second substrate forms, on a surface of an insulation substrate which faces the first substrate, first columnar members, second columnar members and third columnar members which differ from each other in a distance from the surface of the insulation substrate to a top portion of each columnar member. Assuming the distance of the first columnar member as L1, the distance of the second columnar member as L2 and the distance of the third columnar member as L3, a relationship among the distances L1, L3, L2 satisfies L1>L3>L2, and assuming the number of the first columnar members arranged on the surface of the insulation substrate as N1, the number of the second columnar members arranged on the surface of the insulation substrate as N2 and the number of the third columnar members arranged on the surface of the insulation substrate as N3, a relationship among the numbers N1, N2, N3 satisfies N2>N1>N3.
摘要翻译： 可以减少液晶显示面板的液晶材料中的气泡的产生以及液晶显示面板被按压时的颜色不均匀的产生。 在具有在第一基板和第二基板之间填充液晶材料的液晶显示面板的显示装置中，第二基板在与第一基板相对的绝缘基板的表面上形成第一柱状部件，第二基板 柱状构件和第三柱状构件，其在距离绝缘基板的表面至每个柱状构件的顶部的距离处彼此不同。 假设第一柱状构件的距离为L1，第二柱状构件的距离为L2，第三柱状构件的距离为L3，距离L1，L3，L2之间的关系满足L1> L3> L2，并且假定 绝缘基板的表面上配置的第一柱状体的数量为N1，排列在绝缘基板的表面上的第二柱状体的数量为N 2，排列在绝缘体的表面上的第三柱状体的数量 衬底为N3，数字N1，N2，N3之间的关系满足N2> N1> N3。
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公开(公告)号：US20110317259A1
公开(公告)日：2011-12-29
申请号：US13157718
申请日：2011-06-10
IPC分类号： G02B21/06
CPC分类号： G02B21/0032 , G02B21/06
摘要： Disclosed herein is a microscope, including: an illumination optical system; a first image creation optical system; a second image creation optical system; an illumination-field-diaphragm focus adjustment section; and a characteristic-quantity computation block, wherein the illumination-field-diaphragm focus adjustment section adjusts the image creation position for the illumination field diaphragm on the basis of the characteristic quantity computed by the characteristic-quantity computation block.
摘要翻译： 本文公开了一种显微镜，包括：照明光学系统; 第一图像创建光学系统; 第二图像创建光学系统; 照明场光阑聚焦调节部; 以及特征量计算块，其中，所述照明场光阑聚焦调整部基于由所述特征量计算块计算出的特征量来调整所述照明场光阑的图像创建位置。
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公开(公告)号：US20110314814A1
公开(公告)日：2011-12-29
申请号：US13058150
申请日：2009-12-10
申请人： Takanori Tsutsumi , Yoshinori Koyama , Katsuhiro Ota , Takashi Fujii , Takashi Yamamoto , Hiromi Ishii
发明人： Takanori Tsutsumi , Yoshinori Koyama , Katsuhiro Ota , Takashi Fujii , Takashi Yamamoto , Hiromi Ishii
CPC分类号： F01K17/04 , C01B3/14 , C01B3/16 , C01B2203/0883 , C01B2203/0894 , C01B2203/1294 , F01K23/064 , Y02E20/18 , Y02E20/326 , Y02P20/13
摘要： The amount of high-temperature steam supplied from external equipment is reduced. Provided is a hydrogen production system (1) including a reactor (3) that allows a humidified process fluid output from a humidifier (2) to react in the presence of a catalyst to transform carbon monoxide in the process fluid into carbon dioxide; a second channel (B) through which the high-temperature process fluid that has reacted in the reactor (3) flows; a circulation channel (C) through which excess water in the humidifier (2) is circulated; and a first heat exchanger (7), disposed at an intersection of the circulation channel (C) and the second channel (B), for heat exchange between the high-temperature process fluid that has reacted in the reactor (3) and the fluid circulated through the circulation channel (C).
摘要翻译： 从外部设备供应的高温蒸汽量减少。 提供了一种氢生产系统（1），其包括反应器（3），其允许从加湿器（2）输出的加湿过程流体在催化剂存在下反应以将过程流体中的一氧化碳转化为二氧化碳; 在反应器（3）中已经反应的高温处理流体流过的第二通道（B）; 循环通道（C），加湿器（2）中的多余的水循环通过; 和设置在循环通道（C）和第二通道（B）的交点处的第一热交换器（7），用于在反应器（3）中反应的高温处理流体与流体 循环通过循环通道（C）。
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公开(公告)号：US20110303365A1
公开(公告)日：2011-12-15
申请号：US13203191
申请日：2010-07-16
申请人： Takashi Yamamoto , Naoya Ikemoto
发明人： Takashi Yamamoto , Naoya Ikemoto
CPC分类号： H01J37/32422 , H01J37/321 , H01J37/32357
摘要： The present invention relates to a plasma etching apparatus capable of uniformly etching the entire surface of a substrate regardless of the kind of the substrate. A plasma etching apparatus 1 has a processing chamber 11 in which the outer diameter of an upper chamber 12 is formed smaller than a lower chamber 13 and the upper chamber 12 is provided at the central portion of the top surface of the lower chamber 13, a grounded plate-shaped member 14 which is provided on the ceiling of the lower chamber 13 to divide the inner space of the processing chamber 11 and which has a plurality of through holes 14a penetrating from the top surface to the bottom surface thereof, a platen 16 which is disposed in the lower chamber 13 and on which a substrate K is placed, a gas supply device 20 for supplying an etching gas into the upper chamber 12, plasma generating devices 26, 29 for exciting etching gases in the upper chamber 12 and in the lower chamber 13 into a plasma, respectively, an exhaust device 35 for reducing the pressure within the processing chamber 11, and an RF power supply unit 32 for supplying RF power to the platen 16.
摘要翻译： 本发明涉及能够均匀地蚀刻基板的整个表面的等离子体蚀刻装置，而与基板的种类无关。 等离子体蚀刻装置1具有处理室11，其中上室12的外径形成为小于下室13，上室12设置在下室13的顶表面的中心部分， 设置在下室13的天花板上以分隔处理室11的内部空间并且具有从顶表面贯穿其底表面的多个通孔14a的接地板状构件14，压板16 其设置在下室13中并且其上放置有基板K的气体供应装置20，用于将蚀刻气体供应到上室12中，等离子体产生装置26,29用于激发上室12中的蚀刻气体 下室13分别成为等离子体，用于减小处理室11内的压力的排气装置35和用于向压板16提供RF功率的RF电源单元32。
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40.发明申请公开(公告)号：US20110240221A1
公开(公告)日：2011-10-06
申请号：US13075634
申请日：2011-03-30
IPC分类号： H01L21/306 , H05H1/24 , H01L21/00
CPC分类号： H01L21/6831 , C23C16/507 , C23C16/509 , C23C16/5093 , H01J37/32091 , H01J37/32165 , H01J37/32642 , H01L21/67103 , H01L21/67109 , Y10T29/41
摘要： A plasma processing apparatus includes a processing chamber; a lower electrode provided in the processing chamber and having a base made of a conductive metal to which a high frequency power is applied, the lower electrode also serving as a mounting table for mounting thereon a target substrate; an upper electrode provided in the processing chamber to face the lower electrode; and a focus ring disposed above the lower electrode to surround the target substrate. An electrical connection mechanism is provided between the base of the lower electrode and the focus ring to electrically connect the base of the lower electrode to the focus ring through a current control element, and generates a DC current in accordance with a potential difference.
摘要翻译： 等离子体处理装置包括处理室; 设置在处理室中的下电极，具有由导电金属制成的基座，高频电源施加到该底座，下电极也用作用于安装目标衬底的安装台; 设置在所述处理室中以与所述下电极相对的上电极; 以及设置在所述下电极上方以围绕所述目标基板的聚焦环。 电连接机构设置在下电极的底座和聚焦环之间，通过电流控制元件将下电极的底座与聚焦环电连接，并根据电位差产生直流电流。
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