Gate coupling electrostatic discharge protection circuit with redundant structures
    31.
    发明授权
    Gate coupling electrostatic discharge protection circuit with redundant structures 有权
    栅极耦合静电放电保护电路具有冗余结构

    公开(公告)号:US07440247B2

    公开(公告)日:2008-10-21

    申请号:US11059517

    申请日:2005-02-17

    CPC分类号: H01L27/0274

    摘要: A gate coupling electrostatic discharge protection circuit is disclosed. The protection circuit that is connected an ESD structure with gate coupling to a first level circuit and other ESD structures with gate coupling to a derived circuit derived from the first level circuit in parallel could be used to drain the electrostatic discharge. The resistance of the first level circuit and the resistance of derived circuit are matched in draining the electrostatic discharge, whereby the current wouldn't concentrate on a certain portion of these cascades structures.

    摘要翻译: 公开了一种栅极耦合静电放电保护电路。 将与ESD耦合的ESD结构连接到第一电平电路的保护电路以及与从第一电平电路并联导出的导出电路的栅极耦合的其他ESD结构可以用于排出静电放电。 第一级电路的电阻和导出电路的电阻在排放静电放电时匹配,从而电流将不会集中在这些级联结构的某一部分上。

    Chlamydia antigens and corresponding DNA fragments and uses thereof
    35.
    发明授权
    Chlamydia antigens and corresponding DNA fragments and uses thereof 失效
    衣原体抗原和相应的DNA片段及其用途

    公开(公告)号:US07183402B2

    公开(公告)日:2007-02-27

    申请号:US10976917

    申请日:2004-11-01

    IPC分类号: C07H21/04 C12N15/00 A01N43/04

    摘要: The present invention provides a method of nucleic acid, including DNA, immunization of a host, including humans, against disease caused by infection by a strain of Chlamydia, specifically C. pneumoniae, employing a vector containing a nucleotide sequence encoding a 60 kDa cysteine-rich membrane protein of a strain of Chlamydia pneumoniae and a promoter to effect expression of the 60 kDa cysteine-rich membrane protein gene in the host. Modifications are possible within the scope of this invention.

    摘要翻译: 本发明提供了包含DNA,宿主(包括人)在内的免疫针对由衣原体特异性肺炎衣原体感染引起的疾病的核酸的方法,其使用含有编码60kDa半胱氨酸 - 肺炎衣原体菌株的富含膜蛋白和在宿主中有效表达60kDa富含半胱氨酸的膜蛋白基因的启动子。 在本发明的范围内可以进行修改。

    E-beam defect review system
    38.
    发明授权
    E-beam defect review system 有权
    电子束缺陷检查系统

    公开(公告)号:US08094924B2

    公开(公告)日:2012-01-10

    申请号:US12335458

    申请日:2008-12-15

    IPC分类号: G06K9/00

    摘要: An apparatus comprises an imaging unit to image a wafer to be reviewed, wherein imaging unit is the modified SORIL column. The modified SORIL column includes a focusing sub-system to do micro-focusing due to a wafer surface topology, wherein the focusing sub-system verifies the position of a grating image reflecting from the wafer surface to adjust the focus; and a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under a flood gun beam rather than under a primary beam. The modified SORIL column further includes a storage unit for storing wafer design database; and a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage unit are linked by high speed network.

    摘要翻译: 一种装置包括成像单元以对待审查的晶片进行成像,其中成像单元是经修改的SORIL柱。 改进的SORIL柱包括由于晶片表面拓扑而进行微聚焦的聚焦子系统,其中聚焦子系统验证从晶片表面反射的光栅图像的位置以调整焦点; 以及表面电荷控制,用于调节在复查过程期间由于电子辐射引起的电荷累积,其中气体分子在洪水枪光束下而不是在主光束下方注入。 改进的SORIL列还包括用于存储晶片设计数据库的存储单元; 以及用于管理缺陷定位,缺陷采样和缺陷分类的主计算机,其中主计算机和存储单元通过高速网络链接。

    Method for regulating scanning sample surface charge in continuous and leap-and-scan scanning mode imaging process
    39.
    发明授权
    Method for regulating scanning sample surface charge in continuous and leap-and-scan scanning mode imaging process 有权
    在连续扫描和扫描扫描模式成像过程中调节扫描样品表面电荷的方法

    公开(公告)号:US07973283B2

    公开(公告)日:2011-07-05

    申请号:US12232834

    申请日:2008-09-25

    申请人: Joe Wang Jack Jau

    发明人: Joe Wang Jack Jau

    IPC分类号: G01N23/00

    摘要: A method for regulating sample surface charge has been proposed in this invention. The processes of applying a charged particle beam to a first area and applying a flood energized beam gun with gaseous molecules to a second area are executed in the method when the sample is in both continuous and Leap & Scan movements. The second area is located at a predetermined distance from the first area behind or ahead of the first area being scanned with respect to the movement of the sample. Thus, the surface of the sample may be regulated.

    摘要翻译: 本发明提出了一种调节样品表面电荷的方法。 当样品处于连续和Leap&Scan移动中时,在方法中执行将带电粒子束施加到第一区域并将带有气态分子的泛光束枪施加到第二区域的过程。 第二区域位于相对于样品的运动被扫描的第一区域的后面或之前的第一区域的预定距离处。 因此,可以调节样品的表面。

    Electron beam apparatus
    40.
    发明授权
    Electron beam apparatus 有权
    电子束装置

    公开(公告)号:US07960697B2

    公开(公告)日:2011-06-14

    申请号:US12257304

    申请日:2008-10-23

    IPC分类号: H01J49/44

    摘要: The present invention relates to a charged particle beam apparatus which employs a scanning electron microscope for sample inspection and defect review.The present invent provides solution of improving imaging resolution by utilizing a field emission cathode tip with a large tip radius, applying a large accelerating voltage across ground potential between the cathode and anode, positioning the beam limit aperture before condenser lens, utilizing condenser lens excitation current to optimize image resolution, applying a high tube bias to shorten electron travel time, adopting and modifying SORIL objective lens to ameliorate aberration at large field of view and under electric drifting and reduce the urgency of water cooling objective lens while operating material analysis.The present invent provides solution of improving throughput by utilizing fast scanning ability of SORIL and providing a large voltage difference between sample and detectors.

    摘要翻译: 本发明涉及采用扫描电子显微镜进行样品检查和缺陷检查的带电粒子束装置。 本发明提供了通过利用具有大的尖端半径的场致发射阴极尖端来提高成像分辨率的解决方案,在阴极和阳极之间的地电位上施加大的加速电压,将光束极限孔定位在聚光透镜之前,利用聚光透镜激发电流 优化图像分辨率,应用高管偏压缩短电子行进时间,采用和修正SORIL物镜,以改善大视野和电漂移下的像差,并减少水冷物镜在操作材料分析时的紧迫性。 本发明提供了通过利用SORIL的快速扫描能力并在样品和检测器之间提供大的电压差来提高产量的解决方案。