Electron beam apparatus
    1.
    发明授权
    Electron beam apparatus 有权
    电子束装置

    公开(公告)号:US07960697B2

    公开(公告)日:2011-06-14

    申请号:US12257304

    申请日:2008-10-23

    IPC分类号: H01J49/44

    摘要: The present invention relates to a charged particle beam apparatus which employs a scanning electron microscope for sample inspection and defect review.The present invent provides solution of improving imaging resolution by utilizing a field emission cathode tip with a large tip radius, applying a large accelerating voltage across ground potential between the cathode and anode, positioning the beam limit aperture before condenser lens, utilizing condenser lens excitation current to optimize image resolution, applying a high tube bias to shorten electron travel time, adopting and modifying SORIL objective lens to ameliorate aberration at large field of view and under electric drifting and reduce the urgency of water cooling objective lens while operating material analysis.The present invent provides solution of improving throughput by utilizing fast scanning ability of SORIL and providing a large voltage difference between sample and detectors.

    摘要翻译: 本发明涉及采用扫描电子显微镜进行样品检查和缺陷检查的带电粒子束装置。 本发明提供了通过利用具有大的尖端半径的场致发射阴极尖端来提高成像分辨率的解决方案,在阴极和阳极之间的地电位上施加大的加速电压,将光束极限孔定位在聚光透镜之前,利用聚光透镜激发电流 优化图像分辨率,应用高管偏压缩短电子行进时间,采用和修正SORIL物镜,以改善大视野和电漂移下的像差,并减少水冷物镜在操作材料分析时的紧迫性。 本发明提供了通过利用SORIL的快速扫描能力并在样品和检测器之间提供大的电压差来提高产量的解决方案。

    E-beam defect review system
    2.
    发明授权
    E-beam defect review system 有权
    电子束缺陷检查系统

    公开(公告)号:US08094924B2

    公开(公告)日:2012-01-10

    申请号:US12335458

    申请日:2008-12-15

    IPC分类号: G06K9/00

    摘要: An apparatus comprises an imaging unit to image a wafer to be reviewed, wherein imaging unit is the modified SORIL column. The modified SORIL column includes a focusing sub-system to do micro-focusing due to a wafer surface topology, wherein the focusing sub-system verifies the position of a grating image reflecting from the wafer surface to adjust the focus; and a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under a flood gun beam rather than under a primary beam. The modified SORIL column further includes a storage unit for storing wafer design database; and a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage unit are linked by high speed network.

    摘要翻译: 一种装置包括成像单元以对待审查的晶片进行成像,其中成像单元是经修改的SORIL柱。 改进的SORIL柱包括由于晶片表面拓扑而进行微聚焦的聚焦子系统,其中聚焦子系统验证从晶片表面反射的光栅图像的位置以调整焦点; 以及表面电荷控制,用于调节在复查过程期间由于电子辐射引起的电荷累积,其中气体分子在洪水枪光束下而不是在主光束下方注入。 改进的SORIL列还包括用于存储晶片设计数据库的存储单元; 以及用于管理缺陷定位,缺陷采样和缺陷分类的主计算机,其中主计算机和存储单元通过高速网络链接。

    ELECTRON BEAM APPARATUS
    3.
    发明申请
    ELECTRON BEAM APPARATUS 失效
    电子束设备

    公开(公告)号:US20090294664A1

    公开(公告)日:2009-12-03

    申请号:US12130879

    申请日:2008-05-30

    IPC分类号: G01N23/00

    摘要: The present invention includes an electron beam device for examining defects on semiconductor devices. The device includes an electron source for generating a primary electron beam, wherein the total acceleration potential is divided and is provided across the ground potential. Also included is at least one condenser lens for pre-focusing the primary electron beam, an aperture for confining the primary electron beam to ameliorate electron-electron interaction, wherein the aperture is positioned right underneath the last condenser lens, and a SORIL objective lens system for forming immersion magnetic field and electrostatic field to focus the primary beam onto the specimen in the electron beam path. A pair of grounding rings for providing virtual ground voltage potential to those components within the electron beam apparatus installed below a source anode and above a last polepiece of the SORIL objective lens.

    摘要翻译: 本发明包括用于检查半导体器件上的缺陷的电子束装置。 该装置包括用于产生一次电子束的电子源,其中总加速电位被分开并提供在地电位之间。 还包括至少一个用于预聚焦一次电子束的聚光透镜,用于限制一次电子束以改善电子 - 电子相互作用的孔,其中孔位于最后的聚光透镜的正下方,以及SORIL物镜系统 用于形成浸没磁场和静电场,以将主光束聚焦在电子束路径中的样本上。 一对接地环,用于为安装在源极阳极和SORIL物镜的最后一个极点之上的电子束装置内的那些部件提供虚拟接地电压电位。

    Electron beam apparatus
    4.
    发明授权
    Electron beam apparatus 失效
    电子束装置

    公开(公告)号:US07759653B2

    公开(公告)日:2010-07-20

    申请号:US12130879

    申请日:2008-05-30

    IPC分类号: H01J37/00 H01J37/28

    摘要: The present invention includes an electron beam device for examining defects on semiconductor devices. The device includes an electron source for generating a primary electron beam, wherein the total acceleration potential is divided and is provided across the ground potential. Also included is at least one condenser lens for pre-focusing the primary electron beam, an aperture for confining the primary electron beam to ameliorate electron-electron interaction, wherein the aperture is positioned right underneath the last condenser lens, and a SORIL objective lens system for forming immersion magnetic field and electrostatic field to focus the primary beam onto the specimen in the electron beam path. A pair of grounding rings for providing virtual ground voltage potential to those components within the electron beam apparatus installed below a source anode and above a last polepiece of the SORIL objective lens.

    摘要翻译: 本发明包括用于检查半导体器件上的缺陷的电子束装置。 该装置包括用于产生一次电子束的电子源,其中总加速电位被分开并提供在地电位之间。 还包括至少一个用于预聚焦一次电子束的聚光透镜,用于限制一次电子束以改善电子 - 电子相互作用的孔,其中孔位于最后的聚光透镜的正下方,以及SORIL物镜系统 用于形成浸没磁场和静电场,以将主光束聚焦在电子束路径中的样本上。 一对接地环,用于为安装在源极阳极和SORIL物镜的最后一个极点之上的电子束装置内的那些部件提供虚拟接地电压电位。

    Apparatus of plural charged particle beams with multi-axis magnetic lens
    5.
    发明授权
    Apparatus of plural charged particle beams with multi-axis magnetic lens 有权
    具有多轴磁性透镜的多个带电粒子束的装置

    公开(公告)号:US08445862B2

    公开(公告)日:2013-05-21

    申请号:US12968221

    申请日:2010-12-14

    IPC分类号: H01J37/143

    摘要: An apparatus basically uses a simple and compact multi-axis magnetic lens to focus each of a plurality of charged particle beams on sample surface at the same time. In each sub-lens module of the multi-axis magnetic lens, two magnetic rings are respectively inserted into upper and lower holes with non-magnetic radial gap. Each gap size is small enough to keep a sufficient magnetic coupling and large enough to get a sufficient axial symmetry of magnetic scale potential distribution in the space near to its optical axis. This method eliminates the non-axisymmetric transverse field in each sub-lens and the round lens field difference among all sub-lenses at the same time; both exist inherently in a conventional multi-axis magnetic lens. In the apparatus, some additional magnetic shielding measures such as magnetic shielding tubes, plates and house are used to eliminate the non-axisymmetric transverse field on the charged particle path from each charged particle source to the entrance of each sub-lens and from the exit of each sub-lens to the sample surface.

    摘要翻译: 设备基本上使用简单紧凑的多轴磁性透镜来同时将多个带电粒子束中的每一个聚焦在样品表面上。 在多轴磁性透镜的每个子透镜模块中,两个磁环分别插入具有非磁性径向间隙的上孔和下孔中。 每个间隙尺寸足够小以保持足够的磁耦合并且足够大以在靠近其光轴的空间中获得足够的磁标势电位分布的轴向对称性。 该方法同时消除了每个子透镜中的非轴对称横向场和所有子透镜之间的圆透镜场差; 都存在于传统的多轴磁性透镜中。 在该装置中,使用一些额外的磁屏蔽措施,例如磁屏蔽管,板和房子来消除带电粒子路径上从每个带电粒子源到每个子透镜的入口和从出口的入口处的非轴对称横向场 每个子透镜到样品表面。

    Wien filter
    6.
    发明授权
    Wien filter 有权
    维恩过滤器

    公开(公告)号:US08436317B1

    公开(公告)日:2013-05-07

    申请号:US13292455

    申请日:2011-11-09

    IPC分类号: H01J1/50

    摘要: This invention provides a multi-pole type Wien filter, which acts more purely approaching its fundamentally expected performance. A 12-electrode electric device acts as an electric deflector, or acts as an electric deflector and an electric stigmator together. A cylindrical 4-coil magnetic device with a magnetic core acts as a magnetic deflector. Both can produce a dipole field while only incurring a negligibly-small 3rd order field harmonic. The magnetic core enhances the strength and more preciously regulates the distribution of the magnetic field originally generated by the coils. Then two ways to construct a Wien filter are proposed. One way is based on both of the foregoing electric and magnetic devices, and the other way is based on the foregoing electric device and a conventional magnetic deflector. The astigmatism in each of such Wien filters can be compensated by the electric stigmator of the electric device.

    摘要翻译: 本发明提供了一种多极型Wien滤波器,其更加纯粹地接近其根本预期的性能。 12电极电气装置用作电导向器,或者用作电导向器和电极连接器。 具有磁芯的圆柱形4线圈磁性装置用作磁导流板。 两者都可以产生偶极场,同时只产生一个可忽略的小三阶场谐波。 磁芯增强了强度,更加珍贵地调节了最初由线圈产生的磁场的分布。 然后提出构建维恩滤波器的两种方法。 一种方法是基于上述电气和磁性装置两者,另一种方法是基于前述的电气装置和常规的磁导向装置。 每个这样的维恩滤波器中的像散可以通过电气设备的电极来补偿。

    Wien filter with reduced field leakage
    7.
    发明授权
    Wien filter with reduced field leakage 有权
    维恩滤波器,减少了漏电

    公开(公告)号:US08421029B1

    公开(公告)日:2013-04-16

    申请号:US13298651

    申请日:2011-11-17

    IPC分类号: H01J1/50

    摘要: This invention provides a design of Wien filter for satisfying Wien Condition so as to ensure the Wien filter's performance. At first, to minimize the magnetic flux leaking out of the Wien filter, the invention proposes three measures to form a magnetic circuit to cover the magnetic device of a Wien filter respectively. The measures especially benefit a Wien filter acting as beam separator or Monochromator in a high resolution SEM. Secondly, based on the Wien filter proposed in cross-reference, several ways are provided for reducing the dissatisfaction of Wien Condition within the Wien filter, which especially modify either or both of the distribution shapes of the on-axis electric and magnetic dipole fields at two ends of the Wien filter. These ways provide more flexibility to reduce the dissatisfaction of Wien Condition in a Wien filter to a given degree at a reasonable manufacturing cost.

    摘要翻译: 本发明提供了一种用于满足维恩条件的维恩滤波器的设计,以确保维恩滤波器的性能。 首先,为了使从Wien滤波器漏出的磁通量最小化,本发明提出了三种措施,以分别形成覆盖Wien滤波器的磁性装置的磁路。 该措施特别有益于在高分辨率扫描电镜中作为光束分离器或单色器的维恩滤光片。 其次,基于在交叉引用中提出的维恩滤波器,提供了几种方式来减少维恩滤波器中的维恩条件的不满,其特别地修改了在轴电磁场和磁偶极场的分布形状中的一个或两个 维恩过滤器的两端。 这些方式提供了更多的灵活性,可以以合理的制造成本将维恩过滤器中的维恩条件的不满度降低到给定的程度。

    Multi-axis magnetic lens
    8.
    发明授权
    Multi-axis magnetic lens 有权
    多轴磁性镜头

    公开(公告)号:US08003953B2

    公开(公告)日:2011-08-23

    申请号:US12636007

    申请日:2009-12-11

    IPC分类号: H01J1/50

    CPC分类号: H01J37/141 H01J2237/1405

    摘要: The present invention relates to a multi-axis magnetic lens for a charged particle beam system. The apparatus eliminates the undesired non-axisymmetric transverse magnetic field components from the magnetic field generated by a common excitation coil and leaves the desired axisymmetric field for focusing each particle beam employed within the system.

    摘要翻译: 本发明涉及带电粒子束系统的多轴磁透镜。 该装置从由公共的励磁线圈产生的磁场中消除不期望的非轴对称的横向磁场分量,并且留下用于聚焦在系统内采用的每个粒子束的期望的轴对称场。

    WIEN FILTER
    9.
    发明申请

    公开(公告)号:US20130112889A1

    公开(公告)日:2013-05-09

    申请号:US13292455

    申请日:2011-11-09

    IPC分类号: H01J3/26

    摘要: This invention provides a multi-pole type Wien filter, which acts more purely approaching its fundamentally expected performance. A 12-electrode electric device acts as an electric deflector,or acts as an electric deflector and an electric stigmator together. A cylindrical 4-coil magnetic device with a magnetic core acts as a magnetic deflector. Both can produce a dipole field while only incurring a negligibly-small 3rd order field harmonic. The magnetic core enhances the strength and more preciously regulates the distribution of the magnetic field originally generated by the coils. Then two ways to construct a Wien filter are proposed. One way is based on both of the foregoing electric and magnetic devices, and the other way is based on the foregoing electric device and a conventional magnetic deflector. The astigmatism in each of such Wien filters can be compensated by the electric stigmator of the electric device.

    摘要翻译: 本发明提供了一种多极型Wien滤波器,其更加纯粹地接近其根本预期的性能。 12电极电气装置用作电导向器,或者用作电导向器和电极连接器。 具有磁芯的圆柱形4线圈磁性装置用作磁导流器。 两者都可以产生偶极场,同时只产生一个可忽略的小三阶场谐波。 磁芯增强了强度,更加珍贵地调节了最初由线圈产生的磁场的分布。 然后提出构建维恩滤波器的两种方法。 一种方法是基于上述电气和磁性装置两者,另一种方法是基于前述的电气装置和常规的磁导向装置。 每个这样的维恩滤波器中的像散可以通过电气设备的电极来补偿。

    Apparatus of plural charged particle beams with multi-axis magnetic lens
    10.
    发明授权
    Apparatus of plural charged particle beams with multi-axis magnetic lens 有权
    具有多轴磁性透镜的多个带电粒子束的装置

    公开(公告)号:US08294095B2

    公开(公告)日:2012-10-23

    申请号:US12968201

    申请日:2010-12-14

    IPC分类号: H01J29/56 G01N23/225

    摘要: An apparatus basically uses a simple and compact multi-axis magnetic lens to focus each of a plurality of charged particle beams on sample surface at the same time. In each sub-lens module of the multi-axis magnetic lens, two magnetic rings are respectively inserted into upper and lower holes with non-magnetic radial gap. Each gap size is small enough to keep a sufficient magnetic coupling and large enough to get a sufficient axial symmetry of magnetic scale potential distribution in the space near to its optical axis. This method eliminates the non-axisymmetric transverse field in each sub-lens and the round lens field difference among all sub-lenses at the same time; both exist inherently in a conventional multi-axis magnetic lens. In the apparatus, some additional magnetic shielding measures such as magnetic shielding tubes, plates and house are used to eliminate the non-axisymmetric transverse field on the charged particle path from each charged particle source to the entrance of each sub-lens and from the exit of each sub-lens to the sample surface.

    摘要翻译: 设备基本上使用简单紧凑的多轴磁性透镜来同时将多个带电粒子束中的每一个聚焦在样品表面上。 在多轴磁性透镜的每个子透镜模块中,两个磁环分别插入具有非磁性径向间隙的上孔和下孔中。 每个间隙尺寸足够小以保持足够的磁耦合并且足够大以在靠近其光轴的空间中获得足够的磁标势电位分布的轴向对称性。 该方法同时消除了每个子透镜中的非轴对称横向场和所有子透镜之间的圆透镜场差; 都存在于传统的多轴磁性透镜中。 在该装置中,使用一些额外的磁屏蔽措施,例如磁屏蔽管,板和房子来消除带电粒子路径上从每个带电粒子源到每个子透镜的入口和从出口的入口处的非轴对称横向场 每个子透镜到样品表面。