公开(公告)号：US06924581B2

公开(公告)日：2005-08-02

申请号：US10261087

申请日：2002-09-30

Applicant: Dennis S. Greywall

Inventor： Dennis S. Greywall

IPC: B81B3/00 ,  B81C99/00 ,  G02B26/08 ,  H02N1/00

CPC classification number: B81B3/0051 ,  B81B2201/038 ,  B81B2201/045 ,  B81B2203/0118 ,  B81B2203/058 ,  B81C1/00214 ,  G02B26/0841 ,  H02N1/006

Abstract: An integrated device has a spring having at least two split parts that are not in direct electrical contact with each other. The integrated device also has a substrate and a movable part, where both parts of the spring are configured between the substrate and the movable part to support the movable part on the substrate. The two or more split parts of the spring enable two or more independent voltages to be applied to the movable part. The split spring of the invention may be used in MEMS devices for optical switches in order to provide independent voltages to the movable part(s) in those devices.

Abstract translation: 集成装置具有至少两个彼此不直接电接触的分开部分的弹簧。 集成装置还具有基板和可动部，弹簧的两部分构造在基板和可动部之间，以支撑基板上的可动部。 弹簧的两个或多个分开部分能够将两个或多个独立电压施加到可动部件。 本发明的裂缝弹簧可以用于光学开关的MEMS装置中，以便为这些装置中的可移动部件提供独立的电压。

公开(公告)号：US20050145053A1

公开(公告)日：2005-07-07

申请号：US10752183

申请日：2004-01-07

Applicant: Qing Bai ,  Storrs Hoen ,  Jonah Harley ,  Kirt Williams

Inventor： Qing Bai ,  Storrs Hoen ,  Jonah Harley ,  Kirt Williams

IPC: B81B3/00 ,  G02B26/08 ,  F16M13/00

CPC classification number: G02B26/0841 ,  B81B3/0062 ,  B81B2201/045 ,  Y10T74/20

Abstract: A device includes first and second supports, a rotatable body and first and second flexible members. The first flexible member extends between the first support and a first position on the rotatable body. The second flexible member extends between the second support and a second position on the rotatable body. At least one of the supports is capable of linear movement in a first direction with respect to the other. The first position is offset from the second position in a second direction orthogonal to the first direction.

Abstract translation: 一种装置包括第一和第二支撑件，可旋转主体和第一和第二柔性构件。 第一柔性构件在第一支撑件和可旋转主体上的第一位置之间延伸。 第二柔性构件在第二支撑件和可旋转主体上的第二位置之间延伸。 至少一个支撑件能够相对于另一个在第一方向上线性移动。 第一位置在与第一方向正交的第二方向上偏离第二位置。

公开(公告)号：US06888979B2

公开(公告)日：2005-05-03

申请号：US09834744

申请日：2001-04-12

Applicant: Behrang Behin ,  Michael J. Daneman ,  Chuang-Chia Lin ,  Boris Kobrin ,  Murali Chaparala ,  Gary Zalewski

Inventor： Behrang Behin ,  Michael J. Daneman ,  Chuang-Chia Lin ,  Boris Kobrin ,  Murali Chaparala ,  Gary Zalewski

IPC: B81B3/00 ,  B81C99/00 ,  G02B6/12 ,  G02B6/32 ,  G02B6/35 ,  G02B26/08 ,  G02B6/26

CPC classification number: G02B26/0841 ,  B81B3/0008 ,  B81B2201/045 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00214 ,  G02B6/32 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/3548 ,  G02B6/357 ,  G02B6/358 ,  G02B6/3584 ,  G02B2006/12104

Abstract: A microelectromechanical (MEMS) apparatus has a base and a flap with a portion coupled to the base so that the flap may move out of the plane of the base between first and second position. The base may have a cavity with largely vertical sidewalls that contact a portion of the flap when the flap is in the second position Electrodes may be placed on the vertical sidewalls and electrically isolated from the base to provide electrostatic clamping of the flap to the sidewall. The base may be made from a substrate portion of a silicon-on-insulator (SOI) wafer and the flap defined from a device layer of the SOI wafer. The flap may be connected to the base by one or more flexures such as torsional beams. An array of one or more of such structures may be used to form an optical switch.

Abstract translation: 微机电（MEMS）装置具有底座和翼片，其中一部分联接到基座，使得翼片可在第一和第二位置之间移动离开基座的平面。 底座可以具有一个具有很大垂直侧壁的空腔，当翼片处于第二位置时，电极可以被放置在垂直侧壁上并与基座电隔离以提供瓣片向侧壁的静电夹持。 基底可以由绝缘体上硅（SOI）晶片的衬底部分和从SOI晶片的器件层限定的瓣形成。 翼片可以通过一个或多个挠曲件（例如扭转梁）连接到基座。 可以使用一个或多个这样的结构的阵列来形成光学开关。

公开(公告)号：US06887396B2

公开(公告)日：2005-05-03

申请号：US09950710

申请日：2001-09-13

Applicant: Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

Inventor： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

IPC: B81B3/00 ,  B81C1/00 ,  G02B26/08 ,  G11B7/09 ,  C03C15/00

CPC classification number: B81C1/00142 ,  B81B3/0078 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00396 ,  G02B26/0841 ,  Y10S359/904

Abstract: A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

Abstract translation: 提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。 该方法包括以下步骤。 首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。 然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。 然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。 然后，选择性地去除第二掩模图案。 然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。 最后，删除第一个掩模图案。

公开(公告)号：US20050069246A1

公开(公告)日：2005-03-31

申请号：US10942583

申请日：2004-09-16

Applicant: Yoshichika Kato ,  Satoshi Yoshida ,  Keiichi Mori ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

Inventor： Yoshichika Kato ,  Satoshi Yoshida ,  Keiichi Mori ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

IPC: B81B3/00 ,  B81C1/00 ,  G02B6/35 ,  G02B26/08 ,  G02B6/26

CPC classification number: G02B6/3584 ,  B81B3/0083 ,  B81B2201/045 ,  B81C1/00182 ,  G02B6/122 ,  G02B6/136 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/3546 ,  G02B6/357 ,  G02B6/3596 ,  G02B26/0841

Abstract: A micro-optic device including a complicate structure and a movable mirror is made to be manufactured in a reduced length of time. A silicon substrate and a single crystal silicon device layer with an intermediate layer of silicon dioxide interposed therebetween defines a substrate on which a layer of mask material is formed and is patterned to form a mask having the same pattern as the configuration of the intended optical device as viewed in plan view. A surface which is to be constructed as a mirror surface is chosen to be in a plane of the silicon crystal. Using the mask, the device layer is vertically etched by a reactive ion dry etching until the intermediate layer is exposed. Subsequently, using KOH solution, a wet etching which is anisotropic to the crystallographic orientation is performed with an etching rate which is on the order of 0.1 μm/min for a time interval on the order of ten minutes is performed to convert the sidewall surface of the mirror into a smooth crystallographic surface. Subsequently, the intermediate layer is selectively subject to a wet etching to remove the intermediate layer only in an area located below the movable part of the optical device.

Abstract translation: 制造包括复杂结构的微光学装置和可移动反射镜以缩短的时间来制造。 硅衬底和介于其间的二氧化硅中间层的单晶硅器件层限定了其上形成有掩模材料层的衬底并且被图案化以形成具有与所需光学器件的配置相同的图案的掩模 如平面图所示。 要被构造为镜面的表面被选择为在硅晶体的平面内。 使用掩模，通过反应离子干蚀刻垂直蚀刻器件层，直到中间层露出。 随后，使用KOH溶液，对晶体取向进行各向异性的湿式蚀刻，以10分钟左右的时间间隔进行蚀刻速度为0.1μm/分钟左右的蚀刻速度， 镜子变成光滑的结晶表面。 随后，中间层选择性地进行湿式蚀刻，仅在位于光学器件的可移动部分下方的区域中除去中间层。

公开(公告)号：US20050002084A1

公开(公告)日：2005-01-06

申请号：US10142821

申请日：2002-05-09

Applicant: Chang Wan

Inventor： Chang Wan

IPC: B81B3/00 ,  B81B7/02 ,  G02B26/08 ,  G02B26/00

CPC classification number: G02B26/0841 ,  B81B3/0035 ,  B81B2201/033 ,  B81B2201/045 ,  B81B2203/058

Abstract: The present invention is related to a novel micro-electro-mechanical systems (MEMS) torsional drive that is capable of tilting suspended structure such as a micro-mirror for steering light beams in three-dimensional analog fashion, which is suitable for high port count optical switches. The torsional drive has the advantages of allowing large tilt angle, having low drive voltage, and capable of providing a feedback signal for closed-loop control.

Abstract translation: 本发明涉及一种新颖的微电机械系统（MEMS）扭转驱动器，其能够倾斜诸如用于以三维模拟方式转向光束的微镜等悬置结构，适用于高端口数 光开关。 扭转驱动器具有允许具有低驱动电压的大倾斜角度并且能够提供用于闭环控制的反馈信号的优点。

公开(公告)号：US06817725B2

公开(公告)日：2004-11-16

申请号：US10327855

申请日：2002-12-26

Applicant: Yoshihiro Mizuno ,  Satoshi Ueda ,  Osamu Tsuboi ,  Ippei Sawaki ,  Hisao Okuda ,  Norinao Kouma ,  Hiromitsu Soneda ,  Fumio Yamagishi

Inventor： Yoshihiro Mizuno ,  Satoshi Ueda ,  Osamu Tsuboi ,  Ippei Sawaki ,  Hisao Okuda ,  Norinao Kouma ,  Hiromitsu Soneda ,  Fumio Yamagishi

IPC: G02B7182

CPC classification number: G02B26/0841 ,  B81B2201/045 ,  B81B2203/0136 ,  B81C1/00182 ,  B81C2203/0109 ,  Y10S359/904

Abstract: A micro mirror unit includes a moving part carrying a mirror portion, a frame and torsion bars connecting the moving part to the frame. The moving part, the frame and the torsion bars are formed integral from a material substrate. The frame includes a portion thicker than the moving part.

Abstract translation: 微镜单元包括承载镜部分的移动部分，框架和将移动部件连接到框架的扭杆。 移动部件，框架和扭杆从材料基板形成为一体。 框架包括比移动部分更厚的部分。

公开(公告)号：US20040141894A1

公开(公告)日：2004-07-22

申请号：US10755339

申请日：2004-01-13

Applicant: FUJITSU LIMITED ,  FUJITSU MEDIA DEVICES LIMITED

Inventor： Yoshihiro Mizuno ,  Satoshi Ueda ,  Osamu Tsuboi ,  Ippei Sawaki ,  Hisao Okuda ,  Fumio Yamagishi ,  Norinao Kouma

IPC: F28D007/00

CPC classification number: G02B26/0841 ,  B01D53/885 ,  B01J8/0453 ,  B01J8/0496 ,  B01J2208/00212 ,  B01J2208/00309 ,  B01J2208/025 ,  B81B2201/045 ,  B81B2203/0136 ,  B81C1/00142 ,  B81C1/00626 ,  B81C2201/0142 ,  C01B3/16 ,  C01B2203/0288 ,  C01B2203/045 ,  C01B2203/0485 ,  Y10S359/904

Abstract: A method of making a micromirror unit is provided. In accordance with the method, a micromirror unit is made from a material substrate having a multi-layer structure composed of silicon layers and at least one intermediate layer. The resulting micromirror unit includes a mirror forming base, a frame and a torsion bar. The method includes the following steps. First, a pre-torsion bar is formed by subjecting one of the silicon layers to etching. The obtained pre-torsion bar is rendered smaller in thickness than the mirror forming base and is held in contact with the intermediate layer. Then, the desired torsion bar is obtained by removing the intermediate layer contacting with the pre-torsion bar.

公开(公告)号：US20040076008A1

公开(公告)日：2004-04-22

申请号：US10468873

申请日：2003-08-25

Inventor： Koichi Ikeda

IPC: F21K002/00

CPC classification number: B81C1/0015 ,  B81B2201/045 ,  B81B2203/04 ,  B81C2201/0109 ,  B81C2201/0173 ,  B81C2203/0109 ,  G02B26/0841

Abstract: The present invention provides an electrostatic drive type MEMS device and a manufacturing method thereof, in which flattening the surface of a driving side electrode, improving performance, and further the improvements of the degree of freedom of designing in the manufacturing process are implemented. In addition, the present invention provides a GLV device using this MEMS device, and further a laser display using this GLV device. In the present invention an electrostatic drive type MEMS device includes a substrate side electrode and a beam having a driving side electrode driven by electrostatic attraction force or electrostatic repulsion force that acts between the substrate side electrode and driving side electrode, in which the substrate side electrode is formed of an impurities-doped conductive semiconductor region in a semiconductor substrate.

Abstract translation: 本发明提供了一种静电驱动型MEMS器件及其制造方法，其中使驱动侧电极的表面变平，提高性能，并进一步提高制造工艺中的设计自由度。 此外，本发明提供了一种使用该MEMS器件的GLV器件，还提供了使用该GLV器件的激光显示器。 在本发明中，静电驱动型MEMS器件包括基板侧电极和具有由基板侧电极和驱动侧电极之间作用的静电吸引力或静电排斥力驱动的驱动侧电极的光束，其中基板侧电极 由半导体衬底中的杂质掺杂导电半导体区形成。

公开(公告)号：US06723659B2

公开(公告)日：2004-04-20

申请号：US09995588

申请日：2001-11-29

Applicant: Yoshihiro Mizuno ,  Satoshi Ueda ,  Osamu Tsuboi ,  Ippei Sawaki ,  Hisao Okuda ,  Fumio Yamagishi ,  Norinao Kouma

Inventor： Yoshihiro Mizuno ,  Satoshi Ueda ,  Osamu Tsuboi ,  Ippei Sawaki ,  Hisao Okuda ,  Fumio Yamagishi ,  Norinao Kouma

IPC: H01L21302

CPC classification number: G02B26/0841 ,  B01D53/885 ,  B01J8/0453 ,  B01J8/0496 ,  B01J2208/00212 ,  B01J2208/00309 ,  B01J2208/025 ,  B81B2201/045 ,  B81B2203/0136 ,  B81C1/00142 ,  B81C1/00626 ,  B81C2201/0142 ,  C01B3/16 ,  C01B2203/0288 ,  C01B2203/045 ,  C01B2203/0485 ,  Y10S359/904

Abstract: A method of making a micromirror unit is provided. In accordance with the method, a micromirror unit is made from a material substrate having a multi-layer structure composed of silicon layers and at least one intermediate layer. The resulting micromirror unit includes a mirror forming base, a frame and a torsion bar. The method includes the following steps. First, a pre-torsion bar is formed by subjecting one of the silicon layers to etching. The obtained pre-torsion bar is rendered smaller in thickness than the mirror forming base and is held in contact with the intermediate layer. Then, the desired torsion bar is obtained by removing the intermediate layer contacting with the pre-torsion bar.

Abstract translation: 提供了制造微镜单元的方法。 根据该方法，微镜单元由具有由硅层和至少一个中间层构成的多层结构的材料基板制成。 所得到的微镜单元包括反射镜形成基座，框架和扭杆。 该方法包括以下步骤。 首先，通过使一个硅层进行蚀刻来形成预扭杆。 所获得的预扭杆的厚度比反射镜形成基座的厚度小，并与中间层保持接触。 然后，通过去除与预扭杆接触的中间层来获得所需的扭力杆。