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公开(公告)号：US08134701B2
公开(公告)日：2012-03-13
申请号：US12774379
申请日：2010-05-05
Applicant: Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
Inventor： Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N21/94 , G01N2021/8822 , G01N2201/1211 , G01N2201/1218
Abstract: A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
Abstract translation: 本发明的缺陷检查装置解决了在缺陷检查装置中，由于通过减小检测像素尺寸来提高微观缺陷的检测灵敏度，焦点深度变浅，成像高度由于环境变化而变化， 缺陷的检测灵敏度变得不稳定。 该装置包括XY台，其承载要检查的基板并沿预定方向扫描;以及机构，其具有以倾斜方式照射被检查基板上的缺陷的系统，并且通过设置在所述检测光学系统上的检测光学系统检测所述缺陷 上部，其实时校正成像的高度以改变温度和大气压力，以便将成像保持在最佳状态。
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公开(公告)号：US07508521B2
公开(公告)日：2009-03-24
申请号：US11724665
申请日：2007-03-14
Applicant: Xiang Liu , Xin Zhou , Alfred Feitisch , Greg Sanger
Inventor： Xiang Liu , Xin Zhou , Alfred Feitisch , Greg Sanger
CPC classification number: G01N21/39 , G01J3/433 , G01N21/3504 , G01N2021/3513 , G01N2021/354 , G01N2021/399 , G01N2201/1218
Abstract: A system includes a light source, a detector, at least one pressure sensor, and a control unit. The light source emits light at a wavelength substantially corresponding to an absorption line of a target gas. The detector is positioned to detect the intensity of light emitted from the light source that has passed through the target gas. The pressure sensor detects the pressure of the target gas. The control circuit is coupled to the detector and the light source to adjust the modulation amplitude of the light source based on the pressure detected by the at least one pressure sensor. Related systems, apparatus, methods, and/or articles are also described.
Abstract translation: 系统包括光源，检测器，至少一个压力传感器和控制单元。 光源以基本对应于目标气体的吸收线的波长发射光。 检测器被定位成检测从已经通过目标气体的光源发射的光的强度。 压力传感器检测目标气体的压力。 控制电路耦合到检测器和光源，以基于由至少一个压力传感器检测到的压力来调节光源的调制幅度。 还描述了相关系统，装置，方法和/或制品。
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公开(公告)号：US20070216896A1
公开(公告)日：2007-09-20
申请号：US11717651
申请日：2007-03-14
Applicant: Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
Inventor： Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
IPC: G01N21/88
CPC classification number: G01N21/9501 , G01N21/94 , G01N2021/8822 , G01N2201/1211 , G01N2201/1218
Abstract: A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
Abstract translation: 本发明的缺陷检查装置解决了在缺陷检查装置中，由于通过减小检测像素尺寸来提高微观缺陷的检测灵敏度，焦点深度变浅，成像高度由于环境变化而变化， 缺陷的检测灵敏度变得不稳定。 该装置包括XY台，其承载要检查的基板并沿预定方向扫描;以及机构，其具有以倾斜方式照射被检查基板上的缺陷的系统，并且通过设置在所述检测光学系统上的检测光学系统检测所述缺陷 上部，其实时校正成像的高度以改变温度和大气压力，以便将成像保持在最佳状态。
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34.发明授权Compensated infrared absorption sensor for carbon dioxide and other infrared absorbing gases 有权用于二氧化碳和其他红外吸收气体的补偿红外吸收传感器公开(公告)号：US06969857B2
公开(公告)日：2005-11-29
申请号：US10753614
申请日：2004-01-08
Applicant: Thomas E. Owen
Inventor： Thomas E. Owen
CPC classification number: G01N21/3518 , G01J3/0232 , G01J3/427 , G01N21/05 , G01N21/314 , G01N21/3504 , G01N21/61 , G01N33/004 , G01N33/0054 , G01N2021/3125 , G01N2021/3137 , G01N2201/0675 , G01N2201/1211 , G01N2201/1218 , Y02A50/244 , Y02A50/246
Abstract: A gas sensor, whose chamber uses filters and choppers in either a semicircular geometry or annular geometry, and incorporates separate infrared radiation filters and optical choppers. This configuration facilitates the use of a single infrared radiation source and a single detector for infrared measurements at two wavelengths, such that measurement errors may be compensated.
Abstract translation: 气体传感器，其室使用半圆形几何形状或环形几何形状的过滤器和斩波器，并且包含单独的红外辐射滤波器和光学切割器。 这种配置有助于在两个波长处使用单个红外辐射源和单个检测器用于红外测量，从而可以补偿测量误差。
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35.发明申请DEVICE FOR CORRECTING LIGHT ABSORPTION SPECTRUM, METHOD OF MANUFACTURING THE DEVICE, AND METHOD OF CORRECTING LIGHT ABSORPTION SPECTRUM 审中-公开用于校正光吸收光谱的装置，制造装置的方法和校正光吸收光谱的方法公开(公告)号：US20160089088A1
公开(公告)日：2016-03-31
申请号：US14818485
申请日：2015-08-05
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sangkyu KIM , Joonhyung LEE , Seongho CHO
CPC classification number: A61B5/7278 , A61B5/0075 , A61B5/6843 , A61B5/7246 , A61B2562/12 , G01N21/35 , G01N21/552 , G01N2201/1218
Abstract: Provided are light absorption spectrum correction devices, methods of manufacturing the light absorption spectrum correction devices, and methods of correcting a light absorption spectrum. The light absorption spectrum correction device includes: a light source configured to emit light; an attenuated total reflectance (ATR) crystal layer configured to contact a subject and provide an optical passage along which the light emitted from the light source travels to the subject; a pressure sensor configured to detect a contact pressure applied to the ATR crystal layer by the subject; a spectrum detector and analyzer configured to detect light emitted from the ATR crystal layer, form a light absorption spectrum based on the detected light, and determine an intensity of the light emitted from the ATR crystal layer; and a spectrum correction device configured to correct the light absorption spectrum based on the contact pressure.
Abstract translation: 提供了光吸收光谱校正装置，制造光吸收光谱校正装置的方法和校正光吸收光谱的方法。 光吸收光谱校正装置包括：配置为发光的光源; 衰减的全反射（ATR）晶体层，被配置为接触被摄体并且提供光源，所述光通路沿着所述光通路传播到所述被摄体; 压力传感器，被配置为检测被检体施加到所述ATR晶体层的接触压力; 配置为检测从ATR晶体层发射的光的光谱检测器和分析器，基于检测到的光形成光吸收光谱，并确定从ATR晶体层发射的光的强度; 以及频谱校正装置，被配置为基于接触压力校正光吸收光谱。
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Patent Agency Ranking
公开(公告)号：US09046481B2
公开(公告)日：2015-06-02
申请号：US14279369
申请日：2014-05-16
Applicant: Sick AG
Inventor： Julian Edler , Thomas Beyer , Rolf Disch
IPC: G01N21/00 , G01N21/17 , G01N21/31 , G01N21/39 , G01N21/3504 , G01J3/433 , G01N21/27 , G01N21/3554
CPC classification number: G01N21/39 , G01J3/433 , G01J3/4338 , G01N21/274 , G01N21/3504 , G01N21/3554 , G01N2021/399 , G01N2201/0691 , G01N2201/1211 , G01N2201/1215 , G01N2201/1218
Abstract: A method of determining a concentration of a gas in a sample and/or the composition of a gas using a spectrometer comprises transmitting of radiation whose wavelength substantially continuously runs through a wavelength range, wherein the continuous running through of the wavelength range is overlaid by a wavelength modulation; measuring of an absorption signal as a function of the wavelength of the radiation; converting of the absorption signal into first and second derivative signals; deriving of a first and a second measured gas concentration value from the first and the second derivative signals, respectively; and determining of the concentration and/or the composition of the gas from at least the first measured gas concentration value, wherein the wavelength modulation is adapted in response to a change of a state variable of the gas such that a ratio between the first and the second measured gas concentration values is kept substantially constant.
Abstract translation: 使用光谱仪确定样品中的气体浓度和/或气体组成的方法包括传输其波长基本上连续穿过波长范围的辐射，其中波长范围的连续穿过被覆盖在 波长调制; 测量作为辐射波长的函数的吸收信号; 将吸收信号转换为第一和第二导数信号; 分别从第一和第二导数信号得出第一和第二测量气体浓度值; 以及从至少第一测量的气体浓度值确定气体的浓度和/或组成，其中响应于气体的状态变量的改变而适配波长调制，使得第一和第 第二测量气体浓度值保持基本恒定。
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公开(公告)号：US20120291515A1
公开(公告)日：2012-11-22
申请号：US13471917
申请日：2012-05-15
Applicant: Achim Stangelmayer , Damian Andrzejewski
Inventor： Achim Stangelmayer , Damian Andrzejewski
CPC classification number: G06T7/40 , G01N21/274 , G01N21/78 , G01N2021/7786 , G01N2201/1211 , G01N2201/1218 , G01N2201/12746
Abstract: A sensor unit is disclosed which includes a sensor and an information module. The sensor exhibits an optical behavior dependent on at least one variable of a sample. Sensor related information can be emitted by the information module as optical radiation. In embodiments the sensor related information includes calibration data for the sensor. The sensor related information may additionally include identification data for the sensor. In embodiments the information module measures at least one ambient parameter, and emits the measurement value in an optical signal. The measurement value is taken into account when determining at least one variable of a sample by means of the sensor unit. In embodiments the information module may also transmit status information of the sensor unit. Furthermore a method for determining a variable of a sample with a sensor unit and a measurement system is disclosed.
Abstract translation: 公开了一种传感器单元，其包括传感器和信息模块。 传感器表现出取决于样品的至少一个变量的光学行为。 传感器相关信息可由信息模块作为光辐射发射。 在实施例中，传感器相关信息包括传感器的校准数据。 传感器相关信息可另外包括传感器的识别数据。 在实施例中，信息模块测量至少一个环境参数，并且在光信号中发射测量值。 当通过传感器单元确定样品的至少一个变量时，考虑测量值。 在实施例中，信息模块还可以发送传感器单元的状态信息。 此外，公开了一种用传感器单元和测量系统确定样品的变量的方法。
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公开(公告)号：US07733475B2
公开(公告)日：2010-06-08
申请号：US12428065
申请日：2009-04-22
Applicant: Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
Inventor： Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N21/94 , G01N2021/8822 , G01N2201/1211 , G01N2201/1218
Abstract: A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
Abstract translation: 本发明的缺陷检查装置解决了在缺陷检查装置中，由于通过减小检测像素尺寸来提高微观缺陷的检测灵敏度，焦点深度变浅，成像高度由于环境变化而变化， 缺陷的检测灵敏度变得不稳定。 该装置包括XY台，其承载要检查的基板并沿预定方向扫描;以及机构，其具有以倾斜方式照射被检查基板上的缺陷的系统，并且通过设置在所述检测光学系统上的检测光学系统检测所述缺陷 上部，其实时校正成像的高度以改变温度和大气压力，以便将成像保持在最佳状态。
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公开(公告)号：US07535561B2
公开(公告)日：2009-05-19
申请号：US11717651
申请日：2007-03-14
Applicant: Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
Inventor： Shuichi Chikamatsu , Minori Noguchi , Kenji Aiko
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N21/94 , G01N2021/8822 , G01N2201/1211 , G01N2201/1218
Abstract: A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.
Abstract translation: 本发明的缺陷检查装置解决了在缺陷检查装置中，由于通过减小检测像素尺寸来提高微观缺陷的检测灵敏度，焦点深度变浅，成像高度由于环境变化而变化， 缺陷的检测灵敏度变得不稳定。 该装置包括XY台，其承载待检查的基板和沿预定方向扫描的机构，以及具有以倾斜方式照射被检查基板上的缺陷的系统的机构，并且通过设置在该检测光学系统上的检测光学系统检测该缺陷 上部，其实时校正成像的高度以改变温度和大气压力，以便将成像保持在最佳状态。
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公开(公告)号：US20080225296A1
公开(公告)日：2008-09-18
申请号：US11724665
申请日：2007-03-14
Applicant: Xiang Liu , Xin Zhou , Alfred Feitisch , Greg Sanger
Inventor： Xiang Liu , Xin Zhou , Alfred Feitisch , Greg Sanger
IPC: G01N21/00
CPC classification number: G01N21/39 , G01J3/433 , G01N21/3504 , G01N2021/3513 , G01N2021/354 , G01N2021/399 , G01N2201/1218
Abstract: A system includes a light source, a detector, at least one pressure sensor, and a control unit. The light source emits light at a wavelength substantially corresponding to an absorption line of a target gas. The detector is positioned to detect the intensity of light emitted from the light source that has passed through the target gas. The pressure sensor detects the pressure of the target gas. The control circuit is coupled to the detector and the light source to adjust the modulation amplitude of the light source based on the pressure detected by the at least one pressure sensor. Related systems, apparatus, methods, and/or articles are also described.
Abstract translation: 系统包括光源，检测器，至少一个压力传感器和控制单元。 光源以基本对应于目标气体的吸收线的波长发射光。 检测器被定位成检测从已经通过目标气体的光源发射的光的强度。 压力传感器检测目标气体的压力。 控制电路耦合到检测器和光源，以基于由至少一个压力传感器检测到的压力来调节光源的调制幅度。 还描述了相关系统，装置，方法和/或制品。
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