Liquid crystal display with color units having different width
    401.
    发明申请
    Liquid crystal display with color units having different width 有权
    具有不同宽度的彩色单元的液晶显示器

    公开(公告)号:US20080143936A1

    公开(公告)日:2008-06-19

    申请号:US12002385

    申请日:2007-12-17

    Applicant: Hua-Bin Wang

    Inventor: Hua-Bin Wang

    CPC classification number: G02F1/133514 G02B5/201 G02F2201/52

    Abstract: An exemplary liquid crystal display (2) includes a liquid crystal panel (20), and a backlight module (22) located adjacent to the liquid crystal panel. The liquid crystal panel includes a first substrate assembly (24) and a second substrate assembly (26) parallel to the first substrate assembly. The second substrate assembly includes a color filter layer (262). The color filter layer includes red units, green units, and blue units. The red, green and blue units are approximately strip-shaped. A ratio of a width of each red unit to a width of each green unit is in direct proportion to a ratio of the wavelength of red light to the wavelength of green light. A ratio of the width of each green unit to a width of each blue unit is in inverse proportion to a ratio of the wavelength of green light to the wavelength of blue light.

    Abstract translation: 示例性液晶显示器(2)包括液晶面板(20)和位于液晶面板附近的背光模块(22)。 液晶面板包括第一衬底组件(24)和平行于第一衬底组件的第二衬底组件(26)。 第二基板组件包括滤色器层(262)。 滤色器层包括红色单元,绿色单元和蓝色单元。 红色,绿色和蓝色单元大致为条形。 每个红色单元的宽度与每个绿色单元的宽度的比率与红色光的波长与绿色光的波长的比率成正比。 每个绿色单元的宽度与每个蓝色单元的宽度的比率与绿色光的波长与蓝色光的波长的比率成反比。

    Inorganic, Dielectric Grid Polarizer
    403.
    发明申请
    Inorganic, Dielectric Grid Polarizer 审中-公开
    无机,电介质网格偏振器

    公开(公告)号:US20080055719A1

    公开(公告)日:2008-03-06

    申请号:US11469210

    申请日:2006-08-31

    CPC classification number: G02B5/3058

    Abstract: An inorganic, dielectric grid polarizer device includes a stack of film layers disposed over a substrate. Each film layer is formed of a material that is both inorganic and dielectric. Adjacent film layers each have different refractive indices. At least one of the film layers is discontinuous to form a form birefringent layer with an array of parallel ribs having a period less than 400 nm.

    Abstract translation: 无机介电栅极偏振器装置包括设置在基板上方的一层薄膜层。 每个膜层由无机和电介质的材料形成。 相邻的膜层各自具有不同的折射率。 至少一个膜层是不连续的以形成具有周期小于400nm的平行肋阵列的形式双折射层。

    Native high-voltage n-channel LDMOSFET in standard logic CMOS
    404.
    发明授权
    Native high-voltage n-channel LDMOSFET in standard logic CMOS 有权
    标准逻辑CMOS中的原生高压n沟道LDMOSFET

    公开(公告)号:US07315067B2

    公开(公告)日:2008-01-01

    申请号:US10884236

    申请日:2004-07-02

    Applicant: Bin Wang

    Inventor: Bin Wang

    CPC classification number: H01L29/4983 H01L29/4916 H01L29/7835

    Abstract: A native high-voltage n-channel LDMOSFET includes a p− doped substrate, a first n+ doped region disposed in the p− doped substrate, a source terminal coupled to the first n+ doped region, an n− well disposed in the substrate, a second n+ doped region disposed in the n− well, a drain terminal coupled to the second n+ doped region, a p+ doped region disposed in the substrate, a body terminal coupled to the p+ doped region, a dielectric layer disposed over the p− doped substrate and a portion of the n− well, a first trench disposed in the n− well, the trench filled with a dielectric material that is in contact with the dielectric layer, a second trench disposed at least partially in the n− well, the second trench filled with a dielectric material and isolating the second n+ region from the p+ region, and a gate partially or fully reversely doped with p+ implant (or an equivalent technique) and disposed over the dielectric layer and a portion of the first trench.

    Abstract translation: 原生高压n沟道LDMOSFET包括p掺杂衬底,设置在p掺杂衬底中的第一n +掺杂区,耦合到第一n +掺杂区的源极,设置在衬底中的n阱, 设置在n阱中的第二n +掺杂区域,耦合到第二n +掺杂区域的漏极端子,设置在衬底中的p +掺杂区域,耦合到p +掺杂区域的主体端子,设置在p掺杂区域上的介电层 衬底和n阱的一部分,设置在n阱中的第一沟槽,填充有与介电层接触的电介质材料的沟槽,至少部分地设置在n阱中的第二沟槽, 填充有电介质材料并且将第二n +区域与p +区域隔离的第二沟槽,以及部分地或完全地反向掺杂p +注入(或等效技术)的栅极并设置在电介质层和第一沟槽的一部分上的栅极。

    Projection display with a cube wire-grid polarizing beam splitter
    405.
    发明申请
    Projection display with a cube wire-grid polarizing beam splitter 审中-公开
    投影显示与立方体线栅偏振分束器

    公开(公告)号:US20070296921A1

    公开(公告)日:2007-12-27

    申请号:US11475857

    申请日:2006-06-26

    Abstract: A display apparatus includes a cube wire-grid polarizing beam splitter with a plate wire-grid polarizer disposed between a pair of prisms secured together to form a cube. A reflective spatial light modulator produces an image bearing color light beam. The cube wire-grid polarizing beam splitter is disposable in the image bearing color light beam to separate the image information and to produce a polarized image bearing color light beam. A pair of continuous film layers is disposed between the plate wire-grid polarizer and a forward prism with a forward layer adjacent the forward prism having a refractive index greater than both i) a refractive index of a rear layer adjacent the plate wire grid polarizer, and ii) a refractive index of the forward prism. A layer of ribs is disposed between the wires and a rear prism, and the ribs being aligned with and supporting the wires.

    Abstract translation: 显示装置包括立方体线栅偏振分束器,其中板状线栅偏振器设置在固定在一起的一对棱镜之间以形成立方体。 反射空间光调制器产生图像承载彩色光束。 立体线栅偏振分束器在图像承载色光束中是一次性的,以分离图像信息并产生带有彩色光束的偏振图像。 一对连续膜层设置在板状线栅偏振器和前向棱镜之间,其中与正向棱镜相邻的正向层的折射率大于以下两者:i)邻近板状线栅极偏振器的后层的折射率, 和ii)前向棱镜的折射率。 一排肋设置在导线和后棱镜之间,并且肋与导线对准并支撑。

    Plasma processing method, detecting method of completion of seasoning, plasma processing apparatus and storage medium
    406.
    发明授权
    Plasma processing method, detecting method of completion of seasoning, plasma processing apparatus and storage medium 有权
    等离子体处理方法,完成调味料的检测方法,等离子体处理装置和储存介质

    公开(公告)号:US07313451B2

    公开(公告)日:2007-12-25

    申请号:US10937905

    申请日:2004-09-10

    CPC classification number: H01L21/67253

    Abstract: With analysis data in the prior art, it is difficult to find out if a change regarded as a judgmental standard of the completion of seasoning has come from a change due to the seasoning, namely, change in condition of the interior of a processing container or come from another change based on a temperature change among respective dummy wafers and furthermore, it is difficult to judge whether the seasoning has been completed or not. Therefore, a plasma processing method of the present invention, which is a method for detecting the completion of seasoning in performing the seasoning by loading dummy wafers W into a processing container 2 of a plasma processing apparatus 1, includes a process of creating a predictive formula for predicting the completion of seasoning and another process of detecting the completion of seasoning in performing the seasoning, based on the predictive formula. The creation of the predictive formula is accomplished by performing a multivariate analysis against a plurality of measured data that can be obtained by first supplying dummy wafers W into the processing container 2, cooling down the interior of the processing container 2 and supplying a plurality of dummy wafers W into the processing container 2 again.

    Abstract translation: 通过现有技术的分析数据,难以确定作为调味品完成的判断标准的变化是否来自调味品的变化,即处理容器的内部状况的变化或 来自基于各个虚拟晶片之间的温度变化的另一变化,此外,难以判断调味是否已经完成。 因此,本发明的等离子体处理方法是通过将虚拟晶片W装载到等离子体处理装置1的处理容器2中来进行调味的完成调查的方法,包括:生成预测式 根据预测公式预测调味料的完成情况和进行调味料调查完成情况的另一个过程。 通过对多个测量数据执行多变量分析来实现预测公式的创建,该多个测量数据可以通过首先将虚拟晶片W提供到处理容器2中,冷却处理容器2的内部并提供多个虚拟 晶片W再次进入处理容器2。

    INVERTER NON-VOLATILE MEMORY CELL AND ARRAY SYSTEM
    407.
    发明申请
    INVERTER NON-VOLATILE MEMORY CELL AND ARRAY SYSTEM 有权
    逆变器非易失性存储器单元和阵列系统

    公开(公告)号:US20070263456A1

    公开(公告)日:2007-11-15

    申请号:US11748541

    申请日:2007-05-15

    CPC classification number: G11C16/10

    Abstract: NVM arrays include rows and columns of NVM cells comprising a floating gate and a four transistor storage element. Supply voltage for selected storage elements is turned off during a programming and an erase mode. Isolation transistors for each NVM cell or for each row of NVM cells may be used to control the supply voltage.

    Abstract translation: NVM阵列包括包括浮动栅极和四晶体管存储元件的NVM单元的行和列。 在编程和擦除模式期间,所选存储元件的电源电压关闭。 可以使用每个NVM单元或每行NVM单元的隔离晶体管来控制电源电压。

    Compact non-volatile memory cell and array system
    409.
    发明授权
    Compact non-volatile memory cell and array system 有权
    紧凑型非易失性存储单元和阵列系统

    公开(公告)号:US07263001B2

    公开(公告)日:2007-08-28

    申请号:US11084213

    申请日:2005-03-17

    CPC classification number: G11C16/24

    Abstract: NVM arrays include rows and columns of NVM cells comprising a floating gate, a programming element, and a logic storage element. During a programming or erase mode, the floating gate of each cell is charged to a predetermined level. At the beginning of a read mode, all storage elements are pre-charged to a high supply voltage level. Following the pre-charge, selected cells are read to determine stored bit values. A charge status of the floating gate of each cell determines whether the storage element is turned on and the pre-charge voltage is pulled down corresponding to a bit value.

    Abstract translation: NVM阵列包括包括浮动栅极,编程元件和逻辑存储元件的NVM单元的行和列。 在编程或擦除模式期间,每个单元的浮置栅极被充电到预定的电平。 在读取模式开始时,所有存储元件都被预先充电到高电源电压。 在预充电之后,读取所选择的单元以确定存储的位值。 每个单元的浮动栅极的充电状态确定存储元件是否导通,并且预充电电压相应于位值被下拉。

    Method to form shallow trench isolations
    410.
    发明授权
    Method to form shallow trench isolations 有权
    形成浅沟槽隔离的方法

    公开(公告)号:US06649486B1

    公开(公告)日:2003-11-18

    申请号:US09679510

    申请日:2000-10-06

    CPC classification number: H01L21/76229

    Abstract: A new method of fabricating shallow trench isolations has been achieved. A pad oxide layer is formed overlying a semiconductor substrate. A silicon nitride layer is deposited overlying the pad oxide layer. A protective layer is deposited overlying the silicon nitride layer. The protective layer, the silicon nitride layer, and the pad oxide layer are patterned to expose the semiconductor substrate where shallow trench isolations are planned. The semiconductor substrate is etched to form trenches for the planned shallow trench isolations. A large trench etching angle is used. The presence of the protective layer prevents loss of the silicon nitride layer during the etching. A trench filling layer is deposited overlying the protective layer and filling the trenches. The trench filling layer and the protective layer are polished down to complete the shallow trench isolations in the manufacture of the integrated circuit device.

    Abstract translation: 已经实现了制造浅沟槽隔离的新方法。 在半导体衬底上形成焊盘氧化物层。 在衬垫氧化物层上沉积氮化硅层。 覆盖氮化硅层的保护层被沉积。 对保护层,氮化硅层和焊盘氧化物层进行图案化以暴露其中规划浅沟槽隔离的半导体衬底。 蚀刻半导体衬底以形成用于规划的浅沟槽隔离的沟槽。 使用大的沟槽蚀刻角度。 保护层的存在防止在蚀刻期间氮化硅层的损失。 沉积沟槽填充层,覆盖保护层并填充沟槽。 在集成电路器件的制造中,沟槽填充层和保护层被抛光以完成浅沟槽隔离。

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