公开(公告)号：US20080053487A1

公开(公告)日：2008-03-06

申请号：US11846890

申请日：2007-08-29

申请人： Tomohiro Goto ,  Masakazu Sanada ,  Kazuhito Shigemori ,  Osamu Tamada ,  Shuichi Yasuda

发明人： Tomohiro Goto ,  Masakazu Sanada ,  Kazuhito Shigemori ,  Osamu Tamada ,  Shuichi Yasuda

IPC分类号： B08B1/02

CPC分类号： B08B3/024 ,  F26B5/08 ,  H01L21/02057 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051

摘要： A method capable of eliminating occurrence of a development failure when a DI water discharge nozzle 20 is scanned to dry a substrate by spinning is provided. A substrate W is held in a horizontal posture by a spin chuck 10 and rotated about a vertical axis by a rotation motor 14, and when an outlet of the nozzle 20 is scanned from a position opposed to a center of the substrate W to a position opposed to a circumferential edge while a cleaning solution being discharged, immediately after the nozzle 20 has started to move, only one dried core is produced in the vicinity of the center of the substrate W, and thus production of not less than two dried cores in the vicinity of the center of the substrate W is prevented. The dried region is spread all over the surface of the substrate W.

摘要翻译： 提供了当去除去离子水喷嘴20被扫描以通过纺丝干燥基板时能够消除显影破坏的发生的方法。 基板W由旋转卡盘10保持在水平姿态，并通过旋转马达14绕垂直轴旋转，并且当喷嘴20的出口从与基板W的中心相对的位置扫描到位置 在喷嘴20开始移动之后立即排出清洗液时，与圆周边缘相对，在基板W的中心附近仅产生一个干燥的芯，从而在基板W的中心生成不少于2个的干燥芯 防止了基板W的中心附近。 干燥的区域遍布衬底W的整个表面。

公开(公告)号：US20070172234A1

公开(公告)日：2007-07-26

申请号：US11626593

申请日：2007-01-24

申请人： Kazuhito Shigemori ,  Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Shuichi Yasuda

发明人： Kazuhito Shigemori ,  Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Shuichi Yasuda

IPC分类号： G03D5/00

CPC分类号： G03D3/00 ,  H01L21/67028 ,  H01L21/67225

摘要： A stage cleaning substrate for use in the operation of cleaning a substrate stage within an exposure unit compatible with immersion exposure and a dummy substrate for use during the adjustment of an exposure position of a pattern image are held in a cleaning substrate housing part and a dummy substrate housing part, respectively, provided in a substrate processing apparatus. For the operation of cleaning the substrate stage or an alignment operation within the exposure unit, the stage cleaning substrate or the dummy substrate is transported from the substrate processing apparatus to the exposure unit. The process of cleaning the stage cleaning substrate or the dummy substrate is performed in a cleaning processing unit of the substrate processing apparatus immediately before or immediately after the operation of cleaning the substrate stage or the alignment operation.

摘要翻译： 用于在与浸没曝光相容的曝光单元内的基板台的清洗操作中使用的平台清洁基板和在调整图案图像的曝光位置期间使用的虚设基板被保持在清洁基板收纳部分和虚拟 基板壳体部分，分别设置在基板处理装置中。 为了清洁基板台或曝光单元内的对准操作，将台架清洁基板或虚设基板从基板处理装置输送到曝光单元。 在清洗基板台或对准操作之前或之后，在基板处理装置的清洗处理单元中执行清洁载物台清洁基板或虚设基板的过程。

公开(公告)号：US20070147831A1

公开(公告)日：2007-06-28

申请号：US11615404

申请日：2006-12-22

申请人： Koji Kaneyama ,  Kazuhito Shigemori ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Shuichi Yasuda

发明人： Koji Kaneyama ,  Kazuhito Shigemori ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Shuichi Yasuda

IPC分类号： G03D5/00

CPC分类号： H01L21/67028 ,  G03F7/70341 ,  G03F7/70925 ,  G03F7/70991 ,  H01L21/67051 ,  H01L21/67225

摘要： A substrate processing apparatus for performing an exposure process by printing a pattern on a substrate coated with a photosensitive material includes an exposure part for performing an immersion exposure process, a cleaning part and a transport mechanism which are provided within an exposure chamber. After the exposure part performs the immersion exposure process on the substrate, the substrate is transported to the cleaning part and is cleaned therein. If the liquid used during the immersion exposure process remains on the substrate after the exposure process, the substrate is cleaned in the cleaning part immediately after the exposure process. This prevents the remaining liquid from adhering to and contaminating mechanisms within the substrate processing apparatus. Also, the cleaning part is able to clean a dummy substrate for use in an alignment process in the exposure part.

摘要翻译： 用于通过在涂覆有感光材料的基板上印刷图案来进行曝光处理的基板处理装置包括设置在曝光室内的用于进行浸没曝光处理的曝光部分，清洁部分和传送机构。 在曝光部分对基板进行浸渍曝光处理之后，将基板输送到清洁部件并将其清洁。 如果在浸渍曝光过程中使用的液体在曝光处理之后保留在基板上，则在曝光处理之后立即在清洁部分中清洁基板。 这防止了剩余的液体粘附到衬底处理设备内的污染机构。 此外，清洁部件能够清洁用于曝光部分中的对准处理的虚拟基板。

公开(公告)号：US20070071439A1

公开(公告)日：2007-03-29

申请号：US11534293

申请日：2006-09-22

申请人： Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Shuichi Yasuda

发明人： Koji Kaneyama ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Shuichi Yasuda

IPC分类号： G03D5/00

CPC分类号： G03F7/70991 ,  H01L21/67051 ,  H01L21/67173 ,  H01L21/67178

摘要： The transporting process from cleaning and drying processing of a substrate in a cleaning/drying processing unit in a cleaning/drying processing group to post-exposure bake (PEB) of the substrate in a thermal processing group for post-exposure bake in a cleaning/drying processing block is described below. First, after the substrate after exposure processing is subjected to the cleaning and drying processing in the cleaning/drying processing group, a sixth central robot takes out the substrate from the cleaning/drying processing group and carries that substrate into the thermal processing group for post-exposure bake in the cleaning/drying processing block.

摘要翻译： 在清洁/干燥处理组中的清洁/干燥处理单元中的基板的清洁和干燥处理到在热处理组中的曝光后烘烤（PEB）的后处理组中的曝光后烘烤处理的传送过程， 干燥处理块如下所述。 首先，在清洗/干燥处理组中对曝光处理后的基板进行清洗干燥处理后，第六中央机器人从清洗/干燥处理组中取出基板，将该基板搬送到热处理组中 - 在清洁/干燥处理块中进行曝光烘烤。

公开(公告)号：US20060291855A1

公开(公告)日：2006-12-28

申请号：US11472780

申请日：2006-06-22

申请人： Kazuhito Shigemori ,  Koji Kaneyama ,  Akiko Harumoto ,  Tadashi Miyagi ,  Masashi Kanaoka ,  Shuichi Yasuda

发明人： Kazuhito Shigemori ,  Koji Kaneyama ,  Akiko Harumoto ,  Tadashi Miyagi ,  Masashi Kanaoka ,  Shuichi Yasuda

IPC分类号： G03D5/00

CPC分类号： H01L21/02087 ,  G03F7/00 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2041 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67742 ,  Y10S134/902

摘要： A substrate processing apparatus comprises an indexer block, an edge-cleaning processing block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. An exposure device is arranged adjacent to the interface block of the substrate processing apparatus. In the exposure device, exposure processing is applied to a substrate by a liquid immersion method. In the edge-cleaning processing group in the edge-cleaning processing block, an edge of the substrate before exposure processing is cleaned.

公开(公告)号：US20060147202A1

公开(公告)日：2006-07-06

申请号：US11295240

申请日：2005-12-06

申请人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

发明人： Shuichi Yasuda ,  Masashi Kanaoka ,  Koji Kaneyama ,  Tadashi Miyagi ,  Kazuhito Shigemori ,  Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Tsuyoshi Okumura

IPC分类号： G03D5/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a washing/development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate by the resist film processing block. The substrate is washed and dried by the washing processing unit in the washing/development processing block before the substrate is subjected to the exposure processing by the exposure device.

摘要翻译： 基板处理装置包括分度器块，防反射膜处理块，抗蚀剂膜处理块，洗涤/显影处理块和界面块。 曝光装置设置在接口块附近。 通过抗蚀剂膜处理块在基板上形成抗蚀剂膜。 在通过曝光装置对基板进行曝光处理之前，通过洗涤处理单元在洗涤/显影处理块中洗涤和干燥基板。

公开(公告)号：US20060108068A1

公开(公告)日：2006-05-25

申请号：US11273440

申请日：2005-11-10

申请人： Koji Kaneyama ,  Shuji Shibata ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

发明人： Koji Kaneyama ,  Shuji Shibata ,  Tsuyoshi Okumura ,  Shuichi Yasuda ,  Masashi Kanaoka ,  Tadashi Miyagi ,  Kazuhito Shigemori

IPC分类号： C23F1/00 ,  B08B7/00 ,  C23C16/00 ,  H01L21/677

CPC分类号： H01L21/67051 ,  G03F7/70341 ,  G03F7/70991 ,  H01L21/67028 ,  H01L21/67034 ,  Y10S414/135

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a drying/development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The drying/development processing block comprises a drying processing group. The interface block comprises an interface transport mechanism. A substrate is subjected to exposure processing by the exposure device, and subsequently transported to the drying processing group by the interface transport mechanism. The substrate is cleaned and dried by the drying processing group.