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公开(公告)号：US20090296056A1
公开(公告)日：2009-12-03
申请号：US12476089
申请日：2009-06-01
Applicant: Eva Mondt , Noud Jan Gilissen , Hernes Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen
Inventor： Eva Mondt , Noud Jan Gilissen , Hernes Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen
IPC: G03B27/52
CPC classification number: G03F7/70341 , G03F7/707
Abstract: A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.
Abstract translation: 公开了一种表格，其中采取措施来将工作台和使用中的物体的边缘密封在桌子上。 特别地，在桌子上的物体和桌子本身之间形成毛细管通道。 在毛细管通道的径向向内的弯液面钉扎特征和/或超压存在使通道中的液体保持在通道中并有助于防止其进一步向内径向前进。 执行该功能的特征可以与围绕对象的构件相关联或形成在其中。 该构件可以与桌子的一部分热分离。
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公开(公告)号：US20090225289A1
公开(公告)日：2009-09-10
申请号：US12388230
申请日：2009-02-18
Applicant: Johannes Petrus Martinus Bernardus Vermeulen , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Lucas Henricus Johannes Stevens
Inventor： Johannes Petrus Martinus Bernardus Vermeulen , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Lucas Henricus Johannes Stevens
IPC: G03B27/52
CPC classification number: G03F7/70341 , G03F7/70733
Abstract: An immersion lithographic apparatus is described in which a member is provided above the surface of the substrate and the substrate table. Immersion liquid is provided between the substrate table and the substrate and the member. In an embodiment, a beam of radiation passes through the plate. In an embodiment, the member has a through hole in it through which the beam passes.
Abstract translation: 描述了一种浸没式光刻设备，其中元件设置在基板表面和基板台的上方。 浸没液体设置在基板台与基板和构件之间。 在一个实施例中，辐射束穿过板。 在一个实施例中，构件在其中具有通孔，梁通过该通孔。
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公开(公告)号：US20090168037A1
公开(公告)日：2009-07-02
申请号：US12292963
申请日：2008-12-01
Applicant: Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Ronald Van Der Ham , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Michel Riepen , Gerardus Arnoldus Hendricus Fanciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
Inventor： Roger Johannes Maria Hubertus Kroonen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Ronald Van Der Ham , Niek Jacobus Johannes Roset , Fransiscus Mathijs Jacobs , Michel Riepen , Gerardus Arnoldus Hendricus Fanciscus Janssen , Reinder Wietse Roos , Mattijs Hogeland
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface.
Abstract translation: 公开了一种浸没式光刻投影装置。 该装置包括用于保持基板的基板台和用于向基板供应液体的液体供应系统。 该装置被构造和布置成允许液体从衬底流出并且在衬底台的顶表面的至少两个边缘之上。 可优化边缘的几何形状以减少顶表面上的液体层的静态厚度。
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44.发明授权Liquid immersion lithography system having a tilted showerhead relative to a substrate 有权液浸光刻系统相对于基底具有倾斜的喷头公开(公告)号：US07256864B2
公开(公告)日：2007-08-14
申请号：US11403196
申请日：2006-04-13
Applicant: Nicolaas Ten Kate , Erik Roelof Loopstra , Aleksandr Khmelichek , Louis J. Markoya , Harry Sewell
Inventor： Nicolaas Ten Kate , Erik Roelof Loopstra , Aleksandr Khmelichek , Louis J. Markoya , Harry Sewell
CPC classification number: G03F7/70341
Abstract: A liquid immersion lithography system includes projection optics and a showerhead. The projection optics are configured to expose a substrate with a patterned beam. The showerhead includes a first nozzle and a second nozzle that are configured to be at different distances from a surface of the substrate during an exposure operation.
Abstract translation: 液浸光刻系统包括投影光学元件和喷头。 投影光学器件被配置为用图案化的光束曝光衬底。 喷头包括第一喷嘴和第二喷嘴，其被配置为在曝光操作期间与基板的表面不同的距离。
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45.发明公开公开(公告)号：US20230251579A1
公开(公告)日：2023-08-10
申请号：US18299534
申请日：2023-04-12
Applicant: Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
Inventor： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC: G03F7/00 , B23K26/354 , B23K26/342 , B22F10/00 , B22F10/20 , B23Q3/18 , G03F7/20 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00 , B22F7/06
CPC classification number: G03F7/70341 , B23K26/354 , B23K26/342 , G03F7/70416 , G03F7/707 , G03F7/70708 , B22F10/00 , B22F10/20 , B23Q3/18 , G03F7/20 , G03F7/70716 , B05D3/06 , B05D5/00 , G03F7/70733 , B33Y10/00 , B33Y80/00 , B22F7/062 , G03F7/708 , B22F10/25
Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
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Patent Agency Ranking
公开(公告)号：US10197927B2
公开(公告)日：2019-02-05
申请号：US12628531
申请日：2009-12-01
Applicant: Johannes Catharinus Hubertus Mulkens , Nicolaas Ten Kate
Abstract: A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.
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公开(公告)号：US09625828B2
公开(公告)日：2017-04-18
申请号：US13022319
申请日：2011-02-07
Applicant: Michel Riepen , Erik Henricus Egidius Catharina Eummelen , Sandra Van Der Graaf , Rogier Hendrikus Magdalena Cortie , Takeshi Kaneko , Nina Vladimirovna Dziomkina , Laurentius Johannes Adrianus Van Bokhoven , Fabrizio Evangelista , David Bessems , Cornelius Maria Rops , Adrianus Marinus Verdonck , Nicolaas Ten Kate
Inventor： Michel Riepen , Erik Henricus Egidius Catharina Eummelen , Sandra Van Der Graaf , Rogier Hendrikus Magdalena Cortie , Takeshi Kaneko , Nina Vladimirovna Dziomkina , Laurentius Johannes Adrianus Van Bokhoven , Fabrizio Evangelista , David Bessems , Cornelius Maria Rops , Adrianus Marinus Verdonck , Nicolaas Ten Kate
IPC: G03F7/20
CPC classification number: G03F7/70341
Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.
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公开(公告)号：US09176393B2
公开(公告)日：2015-11-03
申请号：US12472099
申请日：2009-05-26
Applicant: Christian Gerardus Norbertus Hendricus Marie Cloin , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Marco Koert Stavenga , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Olga Vladimirovna Elisseeva , Tijmen Wilfred Mathijs Gunther , Michaël Christiaan Van Der Wekken
Inventor： Christian Gerardus Norbertus Hendricus Marie Cloin , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Marco Koert Stavenga , Erik Henricus Egidius Catharina Eummelen , Michel Riepen , Olga Vladimirovna Elisseeva , Tijmen Wilfred Mathijs Gunther , Michaël Christiaan Van Der Wekken
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70733
Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
Abstract translation: 公开了一种光刻投影装置，其包括工作台，活门构件，流体处理结构和流体抽出系统。 流体处理结构可以被配置为在投影系统和（i）基板之间供应和限制液体，或者（ii）工作台，或（iii）活门构件的表面，或者（iv）选自（ i） - （iii）。 活门构件的表面可以与桌子的表面邻接并且共面。 活门构件和桌子的表面可以间隔开间隙。 流体提取系统可以构造成从间隙去除液体。
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49.发明授权公开(公告)号：US09013683B2
公开(公告)日：2015-04-21
申请号：US13329971
申请日：2011-12-19
Applicant: Nicolaas Ten Kate , Raymond Wilhelmus Louis LaFarre
Inventor： Nicolaas Ten Kate , Raymond Wilhelmus Louis LaFarre
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
Abstract translation: 一种用于光刻设备的工作台，该工作台具有形成在工作台的上表面中的集水开口，该容器开口通过工作台与桌子的环境流体连通，在桌子的表面的排水开口处，除了 上表面。
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公开(公告)号：US08988651B2
公开(公告)日：2015-03-24
申请号：US13242125
申请日：2011-09-23
Applicant: Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
Inventor： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
Abstract translation: 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。
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