公开(公告)号：US08724192B2

公开(公告)日：2014-05-13

申请号：US12731584

申请日：2010-03-25

申请人： Takashi Sugiyama

发明人： Takashi Sugiyama

IPC分类号： H04N1/46 ,  G06F3/12 ,  H04N1/40 ,  H04N1/60

CPC分类号： G06K15/02 ,  G06K15/1803

摘要： An image forming apparatus and an image forming system are provided. An image forming apparatus or system includes a reception unit configured to receive a print job; a print unit configured to execute the print job received by the reception unit to print an image; an adjustment unit configured to execute an image quality adjustment for the printing; a determination unit configured to determine whether an adjustment execution condition is to be met during the execution of the print job; and a control unit configured to execute a priority process which, when the determination unit determines that the adjustment execution condition is to be met, causes the adjustment unit to execute the image quality adjustment before a start of the execution of a condition meeting print job, for which the determination unit determines that the adjustment execution condition is to be met.

摘要翻译： 提供了图像形成装置和图像形成系统。 图像形成装置或系统包括被配置为接收打印作业的接收单元; 打印单元，被配置为执行由所述接收单元接收的打印作业以打印图像; 调整单元，被配置为执行用于打印的图像质量调整; 确定单元，被配置为在执行所述打印作业期间确定是否满足调整执行条件; 以及控制单元，被配置为执行优先处理，所述优先处理当所述确定单元确定要满足调整执行条件时，使所述调整单元在开始执行满足打印作业的条件之前执行所述图像质量调整， 确定单元确定要满足调整执行条件。

公开(公告)号：US08684560B2

公开(公告)日：2014-04-01

申请号：US12949776

申请日：2010-11-18

申请人： Takashi Sugiyama

发明人： Takashi Sugiyama

IPC分类号： F21V9/00 ,  F21V9/16 ,  F21V19/02 ,  F21V5/00

CPC分类号： F21S10/007 ,  F21S10/02 ,  F21V5/008 ,  F21V5/048 ,  F21V9/40 ,  F21Y2115/10 ,  G02B26/007 ,  G03B11/00 ,  G03B21/005 ,  G03B21/204 ,  G03B33/08

摘要： A semiconductor light source apparatus can adjust a color tone of white light. The semiconductor light source apparatus can include a phosphor wheel, a motor rotating the phosphor wheel, a light source and a moving module. The phosphor wheel can include at least one phosphor layer configured to emit excited light. The phosphor wheel can vary a mixing ration of white light that is created by light emitted from the light source and the light excited by the at least one phosphor layer in accordance with a position of the phosphor wheel emitted by the light source. The moving module that is connected to the motor can adjust the position of light emitted from the light source. Thus, the disclosed subject matter can provide a semiconductor light source apparatus that can adjust a color tone of white light and a lighting unit using the light source apparatus, which can be used for a projector, lamp, etc.

摘要翻译： 半导体光源装置可以调节白光的色调。 半导体光源装置可以包括磷光体轮，旋转荧光轮的电动机，光源和移动模块。 磷光体轮可以包括配置成发射激发光的至少一个磷光体层。 磷光体轮可以根据由光源发射的荧光轮的位置，改变由光源发射的光产生的白光和由至少一个荧光体层激发的光的混合比例。 连接到电机的移动模块可以调节从光源发出的光的位置。 因此，所公开的主题可以提供可以使用可用于投影仪，灯等的光源装置来调节白光的色调的照明单元和照明单元的半导体光源装置。

公开(公告)号：US08384962B2

公开(公告)日：2013-02-26

申请号：US12604938

申请日：2009-10-23

申请人： Takashi Sugiyama

发明人： Takashi Sugiyama

IPC分类号： H04N1/50 ,  H04N1/56

CPC分类号： H04N1/40012

摘要： An image processing system includes a preference designating unit and a printer. The preference designating unit is configured to designate one or more preferential print pages from pages included in a print job so as to be color printed preferentially to non-designated pages included in the print job. The printer performs color printing of the one or more preferential print pages.

摘要翻译： 图像处理系统包括偏好指定单元和打印机。 偏好设计单元被配置为从包括在打印作业中的页面指定一个或多个优先打印页面，以便优先地打印到包括在打印作业中的非指定页面。 打印机执行一个或多个优先打印页面的彩色打印。

公开(公告)号：US08167806B2

公开(公告)日：2012-05-01

申请号：US11882895

申请日：2007-08-07

申请人： Shin-ichiro Umemura ,  Yuichi Miwa ,  Takashi Azuma ,  Takashi Sugiyama ,  Hiroshi Kuribara

发明人： Shin-ichiro Umemura ,  Yuichi Miwa ,  Takashi Azuma ,  Takashi Sugiyama ,  Hiroshi Kuribara

IPC分类号： A61B8/00

CPC分类号： G01S7/52047 ,  A61B8/481 ,  G01S7/5202 ,  G01S7/52026 ,  G01S7/52038 ,  G01S15/8963 ,  G10K11/346

摘要： An ultrasonograph capable of generating a transmission beam having a uniform width over a wide range in an ultrasonic wave propagation direction is provided. A weighted mean value of a plurality of transmission delay time values corresponding to focal lengths of transmission pulse waves set in the ultrasonic wave propagation direction is calculated for each element constituting a transmission aperture and used as the delay time for the element when waves are transmitted. As the weight used for obtaining the weighted mean value, a transmission effective aperture width according to each transmission focal length is selected, and a weight in the direction of the transmit aperture realizing the width is calculated and is used in a focal length direction.

摘要翻译： 提供能够在超声波传播方向上在宽范围内产生均匀宽度的透射光束的超声波检查仪。 对于构成传输孔径的每个元件计算与设置在超声波传播方向上的传输脉冲波的焦距对应的多个传输延迟时间值的加权平均值，并将其用作当传输波时的元件的延迟时间。 作为用于获得加权平均值的重量，选择根据每个透射焦距的透射有效孔径宽度，并且计算实现宽度的透射孔的方向上的重量，并在焦距方向上使用。

公开(公告)号：US08040480B2

公开(公告)日：2011-10-18

申请号：US12398032

申请日：2009-03-04

申请人： Takashi Sugiyama ,  Masatoshi Horii

发明人： Takashi Sugiyama ,  Masatoshi Horii

IPC分类号： G02F1/1343

CPC分类号： G02F1/133707 ,  G02F1/13439 ,  G02F1/1393 ,  G02F2001/133742

摘要： A liquid crystal display apparatus includes a vertical alignment type liquid crystal cell including a first substrate formed with a first electrode, a second substrate formed with a second electrode, and a liquid crystal layer containing liquid crystal molecules given a pretilt angle. A pair of polarizer plates sandwiches the cell, and a driver device applies a voltage of a multiplex driving waveform across the first and second electrodes. In a display in-plane parallel to a surface of the first or second substrate, at least one of the first and second electrodes has a zigzag border alternately coupling a first border perpendicular to display in-plane components of directors of liquid crystal molecules in a middle area along a thickness direction of the liquid crystal layer in the absence of applied voltage and a second border extending along a direction crossing the first border.

摘要翻译： 液晶显示装置包括：垂直取向型液晶单元，包括形成有第一电极的第一基板，形成有第二电极的第二基板和包含预倾角的液晶分子的液晶层。 一对偏光板夹着电池，驱动装置在第一和第二电极上施加多路驱动波形的电压。 在平行于第一或第二基板的表面的平面内的显示器中，第一和第二电极中的至少一个具有交替地耦合垂直于第一和第二电极的液晶分子的导向器的面内分量的第一边界的之字形边界 在没有施加电压的情况下沿着液晶层的厚度方向的中间区域和沿着与第一边界交叉的方向延伸的第二边界。

公开(公告)号：US07901843B2

公开(公告)日：2011-03-08

申请号：US12122407

申请日：2008-05-16

申请人： Takashi Sugiyama ,  Yoshiaki Ikuta ,  Masabumi Ito

发明人： Takashi Sugiyama ,  Yoshiaki Ikuta ,  Masabumi Ito

IPC分类号： G03F1/00

CPC分类号： G03F1/72 ,  B82Y10/00 ,  B82Y40/00 ,  C03C17/00 ,  C03C17/3665 ,  C03C23/007 ,  C03C2218/32 ,  G03F1/24

摘要： There is provided a process for smoothing a substrate surface having a concave defect, such as a pit or a scratch. A process for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography, comprising disposing a thin film on a glass substrate; detecting a concave defect existing on the glass substrate; and locally heating or locally anodizing a portion of the thin film just above the detected concave defect to perform a chemical reaction accompanied by a volume increase in a material forming the thin film.

摘要翻译： 提供了用于平滑具有凹陷缺陷（如凹坑或划痕）的衬底表面的工艺。 一种用于平滑用于EUV光刻中的反射掩模板的玻璃基板的表面的方法，包括在玻璃基板上设置薄膜; 检测存在于玻璃基板上的凹陷缺陷; 并且局部加热或局部阳极氧化正好在检测到的凹陷缺陷上方的薄膜的一部分，以进行伴随着形成薄膜的材料体积增加的化学反应。

公开(公告)号：US07855036B2

公开(公告)日：2010-12-21

申请号：US12353284

申请日：2009-01-14

申请人： Kazuyuki Hayashi ,  Takashi Sugiyama

发明人： Kazuyuki Hayashi ,  Takashi Sugiyama

IPC分类号： G03F1/00 ,  C23C14/24

CPC分类号： C23C14/3414 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G21K2201/067

摘要： To provide a sputtering target to be used for production of an EUV mask blank, capable of preventing particles by film peeling even when formation of a reflective multilayer film as a reflective layer and a Ru layer as a protective layer is carried out at a production level using actual machines for a large number of cycles. A sputtering target for forming a ruthenium (Ru) layer in a reflective layer for reflecting EUV light on a substrate, which contains Ru and at least one element selected from the group consisting of boron (B) and zirconium (Zr) in a total content of B and Zr of from 5 at % to 50 at %.

摘要翻译： 为了提供用于生产EUV掩模坯料的溅射靶，即使在形成作为反射层的反射性多层膜和作为保护层的Ru层作为保护层的情况下也能够防止膜剥离的粒子， 使用实际的机器进行大量的循环。 一种用于在反射层中形成钌（Ru）层的溅射靶，其用于在基底上反射EUV光，其含有Ru和选自硼（B）和锆（Zr）中的至少一种元素，总含量 的B和Zr为5原子％至50原子％。

公开(公告)号：US20100219186A1

公开(公告)日：2010-09-02

申请号：US12670961

申请日：2008-08-08

申请人： Denmi Kuwagaki ,  Yasunori Yamazaki ,  Osamu Ishii ,  Seiji Fukushi ,  Takashi Sugiyama

发明人： Denmi Kuwagaki ,  Yasunori Yamazaki ,  Osamu Ishii ,  Seiji Fukushi ,  Takashi Sugiyama

IPC分类号： B65D51/18

CPC分类号： B65D47/0838 ,  B65D47/36 ,  B65D2251/0025 ,  B65D2251/0093

摘要： [Problems] To provide a plastic cap having a pouring cylinder capable of pouring the content liquid smoothly maintaining a constant liquid width even in case the degree of inclination of a container is varied to some extent at the time of pouring the content liquid, and of easily adjusting the liquid quantity.[Means for Solution] A bill 20 is formed at an upper end portion of the pouring cylinder 11 provided in a top panel 5 of a cap body 1, the bill 20 protruding outward in an inclined manner, a lower end of the pouring cylinder 11 is forming a seal surface 17 of nearly a cylindrical shape, a groove 30 is formed in the inner surface of the bill 20 in the pouring cylinder 11 and is extending from an upper end portion of the seal surface 17 up to an upper end of the bill 20, and a seal ring 29 is formed on the inner surface of the upper lid 2 so as to come into close contact with the seal surface 17 which is the inner surface of the pouring cylinder 11 when the upper lid 2 is closed.

摘要翻译： [问题]提供一种塑料盖，其具有能够平稳地注入内容液的倾倒缸，即使在倾倒内容液时容器的倾斜程度有一定程度的变化的情况下也能保持恒定的液体宽度，以及 容易调节液量。 解决方案纸币20形成在设置在盖体1的顶板5中的倾倒缸11的上端部，纸币20以倾斜的方式向外突出，倾倒筒11的下端 正在形成几乎圆筒形状的密封表面17，在倒出桶11中的纸币20的内表面上形成有槽30，并且从密封表面17的上端部延伸到上端 并且当上盖2关闭时，在上盖2的内表面上形成密封环29，以便与作为浇注缸11的内表面的密封表面17紧密接触。

公开(公告)号：US20090268225A1

公开(公告)日：2009-10-29

申请号：US12399252

申请日：2009-03-06

申请人： Takashi SUGIYAMA

发明人： Takashi SUGIYAMA

IPC分类号： G06K15/00 ,  G06F3/12

CPC分类号： G06F3/1239 ,  G06F3/1203 ,  G06F3/1258 ,  G06K15/1806 ,  H04N1/00915 ,  H04N2201/0094

摘要： An image forming system includes an information processing unit, an image forming apparatus that communicates with the information processing unit, a first memory unit that stores setting information of printing restriction on the image forming apparatus, a printing unit that executes a printing process of a print job in accordance with the setting information, a detection unit that detects a change request of the setting information, a job judging unit that judges whether there exists a print job in processing when the detection unit detects the change request, and a first permitting unit that permits change of the setting information in accordance with the change request when the job judging unit judges that there exists no print job in processing.

摘要翻译： 图像形成系统包括信息处理单元，与信息处理单元通信的图像形成装置，存储图像形成装置的打印限制的设定信息的第一存储单元，执行打印处理的打印单元 根据设定信息进行作业的检测单元，检测设定信息的变更请求的检测单元，在检测单元检测出变更请求时判断处理中是否存在打印作业的作业判断单元;以及第一许可单元， 当作业判断单元判定在处理中不存在打印作业时，允许根据改变请求来更改设置信息。

公开(公告)号：US20090253055A1

公开(公告)日：2009-10-08

申请号：US12483785

申请日：2009-06-12

申请人： Kazuyuki Hayashi ,  Kazuo Kadowaki ,  Takashi Sugiyama

发明人： Kazuyuki Hayashi ,  Kazuo Kadowaki ,  Takashi Sugiyama

IPC分类号： G03F1/00 ,  B32B3/10

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/38 ,  G21K1/062 ,  Y10T428/24355

摘要： Provided are a substrate with a conductive film for an EUV mask blank in which the generation of particles due to abrasion between an electrostatic chuck and the substrate is prevented; and a substrate with a multilayer reflective film and an EUV mask blank each employing such a substrate with a conductive film.A substrate with a conductive film to be used for producing a reflective mask blank for EUV lithography, the conductive film containing chromium (Cr) and nitrogen (N), the average concentration of N in the conductive film being at least 0.1 atomic % and less than 40 atomic %, the crystal state of at least a surface of the conductive film being amorphous, the sheet resistance of the conductive film being at most 27 Ω/□, and the surface roughness (rms) of the conductive film being at most 0.5 nm.

摘要翻译： 提供一种具有用于EUV掩模坯料的导电膜的基板，其中防止了由于静电卡盘和基板之间的磨损而产生的颗粒; 以及具有多层反射膜的基板和使用这种具有导电膜的基板的EUV掩模板。 具有用于制造用于EUV光刻的反射掩模板的导电膜的基板，含有铬（Cr）和氮（N）的导电膜，导电膜中的N的平均浓度为至少0.1原子％以下 导电膜的至少表面的晶体状态为非晶态，导电膜的薄层电阻为至多27Ω/□，导电膜的表面粗糙度（rms）为0.5以下 nm。