利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

83 条记录 (耗时 0.029 秒)

    Exposure apparatus and device manufacturing method
    41.
    发明授权
    Exposure apparatus and device manufacturing method 有权
    曝光装置和装置制造方法

    公开(公告)号：US07236231B2

    公开(公告)日：2007-06-26

    申请号：US11090519

    申请日：2005-03-24

    申请人： Takashi Nakamura ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi ,  Toshinobu Tokita

    发明人： Takashi Nakamura ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi ,  Toshinobu Tokita

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70275

    摘要： An exposure apparatus for scanning an exposure spot in an exposure allocated area and for exposing a desired pattern by controlling power of the exposure spot in accordance with an exposure pattern, includes an exposure unit for arranging plural fine exposure elements, for forming plural exposure spots F1 to F9 on an object to be exposed, and for previously defining the exposure allocated areas SA11 to SA19 respectively corresponding to the plural exposure spots F1 to F9, an exposure allocated area adjuster for adjusting the exposure allocated areas SA12 and SA15 in accordance with directions and sizes of offsets (offset amount vectors V2 and V5) of the exposure spots F2 and F5 from a reference position, and an exposure spot controller for controlling the power of the exposure spot in accordance with the exposure pattern corresponding to actual positions of the exposure spots F1 to F9.

    摘要翻译： 一种曝光装置，用于通过根据曝光图案控制曝光点的电源来对曝光分配区域中的曝光点进行扫描和曝光所期望的图案，包括用于配置多个细微曝光元件的曝光单元，用于形成多个曝光点F 1到F 9，并且为了预先分别对应于多个曝光点F 1至F 9的曝光分配区域SA11至SA19分别设置曝光分配区域调整器SA 12 和SA 15，根据曝光点F 2和F 5从基准位置的偏移量（偏移量向量V 2和V 5）的方向和大小，以及根据曝光点控制曝光点的功率的曝光点控制器 曝光图案对应于曝光点F 1至F 9的实际位置。

    Exposure apparatus and method
    42.
    发明授权
    Exposure apparatus and method 失效
    曝光装置和方法

    公开(公告)号：US07177006B2

    公开(公告)日：2007-02-13

    申请号：US11022033

    申请日：2004-12-23

    申请人： Toshinobu Tokita

    发明人： Toshinobu Tokita

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/72 ,  G03B27/32

    CPC分类号： G03F7/70341

    摘要： An exposure method includes the steps of introducing fluid to a space between a surface of an object to be exposed, and a final surface of a projection optical system, projecting a pattern on a mask onto the object via the projection optical system and the fluid, wherein the introducing step includes the steps of filling the fluid in the space between the surface of the object and the final surface of the projection optical system, and wherein the filling step changes a capillary attraction of the fluid different from the capillary attraction that operates during the projection step.

    摘要翻译： 曝光方法包括以下步骤：将待曝光物体的表面和投影光学系统的最终表面之间的空间引入到通过投影光学系统和流体将掩模上的图案投射到物体上的步骤; 其中所述引入步骤包括以下步骤：将所述流体填充在所述物体的表面与所述投影光学系统的最终表面之间的空间中，并且其中所述填充步骤改变与所述流体不同的毛细管吸引力的毛细吸引力 投影步骤。

    Microprocessing apparatus, semiconductor device manufacturing apparatus, and device manufacturing method
    44.
    发明授权
    Microprocessing apparatus, semiconductor device manufacturing apparatus, and device manufacturing method 有权
    微处理装置，半导体装置制造装置及装置的制造方法

    公开(公告)号：US06972844B2

    公开(公告)日：2005-12-06

    申请号：US10951957

    申请日：2004-09-28

    申请人： Toshinobu Tokita

    发明人： Toshinobu Tokita

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00 ,  B29C59/16 ,  B44C1/22 ,  G01B15/00

    CPC分类号： G03F9/7038 ,  G03F7/70216 ,  G03F9/7015 ,  G03F9/703 ,  G03F9/7034

    摘要： An illustrative object of the present invention is to provide a microprocessing apparatus by which an original and a substrate to be processed can be aligned with each other with a higher precision. Disclosed in this connection is an apparatus for transferring a pattern of an original onto a substrate while maintaining the original and the substrate in contact with each other or in close proximity to each other, wherein the apparatus includes an original holding device for holding the original, a substrate holding device for holding the substrate, a reference mark, and a position measuring system for measuring a relative positional relationship between the reference mark and a mark formed on at least one of the original and the substrate.

    摘要翻译： 本发明的一个说明性的目的是提供一种微处理装置，通过该微处理装置可以使原件和待处理基板以更高的精度相互对准。 在这方面公开了一种用于将原稿的图案转移到基板上同时保持原稿和基板彼此接触或彼此靠近的装置，其中该装置包括用于保持原稿的原始保持装置， 用于保持基板的基板保持装置，基准标记和位置测量系统，用于测量基准标记与形成在原稿和基板中的至少一个上的标记之间的相对位置关系。

    Exposure apparatus and device manufacturing method
    46.
    发明申请
    Exposure apparatus and device manufacturing method 有权
    曝光装置和装置制造方法

    公开(公告)号：US20050219485A1

    公开(公告)日：2005-10-06

    申请号：US11090519

    申请日：2005-03-24

    申请人： Takashi Nakamura ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi ,  Toshinobu Tokita

    发明人： Takashi Nakamura ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi ,  Toshinobu Tokita

    IPC分类号： G03B27/42 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G03F7/70275

    摘要： An exposure apparatus for scanning an exposure spot in an exposure allocated area and for exposing a desired pattern by controlling power of the exposure spot in accordance with an exposure pattern, includes an exposure unit for arranging plural fine exposure elements, for forming plural exposure spots F1 to F9 on an object to be exposed, and for previously defining the exposure allocated areas SA11 to SA19 respectively corresponding to the plural exposure spots F1 to F9, an exposure allocated area adjuster for adjusting the exposure allocated areas SA12 and SA15 in accordance with directions and sizes of offsets (offset amount vectors V2 and V5) of the exposure spots F2 and F5 from a reference position, and an exposure spot controller for controlling the power of the exposure spot in accordance with the exposure pattern corresponding to actual positions of the exposure spots F1 to F9.

    摘要翻译： 一种曝光装置，用于通过根据曝光图案控制曝光点的电源来对曝光分配区域中的曝光点进行扫描和曝光所期望的图案，包括用于配置多个细微曝光元件的曝光单元，用于形成多个曝光点F 1到F 9，并且为了预先分别对应于多个曝光点F 1至F 9的曝光分配区域SA11至SA19分别设置曝光分配区域调整器SA 12 和SA 15，根据曝光点F 2和F 5从基准位置的偏移量（偏移量向量V 2和V 5）的方向和大小，以及根据曝光点控制曝光点的功率的曝光点控制器 曝光图案对应于曝光点F 1至F 9的实际位置。

    Subject information acquisition apparatus and subject information acquisition method
    49.
    发明授权
    Subject information acquisition apparatus and subject information acquisition method 有权
    主题信息获取装置和主题信息获取方法

    公开(公告)号：US09043167B2

    公开(公告)日：2015-05-26

    申请号：US13419762

    申请日：2012-03-14

    申请人： Toshinobu Tokita

    发明人： Toshinobu Tokita

    IPC分类号： A61B5/00 ,  A61B8/08 ,  A61B8/00

    CPC分类号： A61B8/485 ,  A61B5/0091 ,  A61B5/0095 ,  A61B8/0825 ,  A61B8/403 ,  A61B8/5223

    摘要： A subject information acquisition apparatus includes a first holding member that holds a subject, a probe that receives an elastic wave from the subject through the first holding member, a first holding member deformation amount measuring unit that measures an amount of deformation of the first holding member, and a processing unit that creates an area for generating subject information by using the amount of deformation of the first holding member and position information of the first holding member deformation amount measuring unit and generates an information value of subject information corresponding to the area for generating subject information by using a signal outputted by the probe.

    摘要翻译： 被摄体信息获取装置包括：第一保持部件，其保持被检体，通过第一保持部件从受检者接受弹性波的探针;第一保持部件变形量测量部，其测量第一保持部件的变形量; 以及处理单元，其通过使用第一保持构件的变形量和第一保持构件变形量测量单元的位置信息来创建用于生成对象信息的区域，并且生成与用于生成的区域相对应的对象信息的信息值 通过使用由探头输出的信号的主题信息。