公开(公告)号：US5326725A

公开(公告)日：1994-07-05

申请号：US31259

申请日：1993-03-11

申请人： Semyon Sherstinsky ,  Charles C. Harris ,  Mei Chang ,  Dale R. Du Bois ,  James F. Roberts ,  Susan Telford ,  Ronald L. Rose ,  Meng C. Tseng ,  Karl A. Littau

发明人： Semyon Sherstinsky ,  Charles C. Harris ,  Mei Chang ,  Dale R. Du Bois ,  James F. Roberts ,  Susan Telford ,  Ronald L. Rose ,  Meng C. Tseng ,  Karl A. Littau

IPC分类号： C23C16/04 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  H01L21/687 ,  C23C16/00

CPC分类号： C23C16/45521 ,  C23C16/042 ,  C23C16/4585 ,  H01L21/68721 ,  H01L21/68735

摘要： A clamping ring having a downwardly extending finger that mates with a pocket in the periphery of a susceptor for supporting a wafer in a chemical vapor deposition chamber, provides alignment of the clamping ring, the wafer and the susceptor. A source of inert gas connected to the pocket provides a positive pressure in the pocket that prevents reactive gas in the chamber from reaching the edge and backside of the wafer. A source of vacuum connected to the susceptor support surface ensures good contact between the wafer and the susceptor.The clamping ring also has a lip extending over the top surface of the wafer having a rear surface that has a negative angle with respect to the upper surface of the clamping ring, providing a knife edge seal to the wafer, reducing the area of contact between the clamping ring and the wafer and providing a reduced area of thermal contact between the clamping ring and the wafer.

摘要翻译： 具有向下延伸的指状物的夹紧环，其与基座的周边中的口相配合，用于在化学气相沉积室中支撑晶片，提供夹紧环，晶片和基座的对准。 连接到口袋的惰性气体源在口袋中提供正压力，防止腔室中的反应性气体到达晶片的边缘和背面。 连接到基座支撑表面的真空源确保了晶片和基座之间良好的接触。 夹紧环还具有在晶片的顶表面上延伸的唇缘，其具有相对于夹紧环的上表面具有负角度的后表面，为晶片提供刀刃密封，从而减小了 夹紧环和晶片，并且在夹紧环和晶片之间提供减小的热接触面积。

公开(公告)号：US08778156B2

公开(公告)日：2014-07-15

申请号：US12969485

申请日：2010-12-15

申请人： Matthew D. Eisaman ,  Karl A. Littau

发明人： Matthew D. Eisaman ,  Karl A. Littau

IPC分类号： B01D61/46

CPC分类号： B01D61/422 ,  B01D53/1425 ,  B01D53/1475 ,  B01D61/44 ,  B01D61/445 ,  B01D2257/504 ,  B01D2313/24 ,  C01B17/501 ,  C01B32/05 ,  C01C1/02 ,  Y02P20/152 ,  Y02P20/544

摘要： A process for producing a gas using an electrodialysis apparatus includes flowing at least two solutions and an electrode solution into the apparatus, pressurizing the apparatus at a stack pressure, applying a voltage to the apparatus's electrodialysis stack so a dissolved gas is generated in the second solution, flowing the second solution out of the apparatus, regenerating the gas out of the second solution, and collecting the gas. A process for generating a product, like a gas, liquid, or supercritical fluid, using an electrodialysis apparatus includes flowing at least two solutions and an electrode solution into the apparatus, adjusting the temperature and pressure so the product will be generated from the second solution, applying a voltage to the electrodialysis stack of the apparatus so that the product is generated in the second solution, flowing the second solution out of the apparatus, and regenerating the product from the second solution.

摘要翻译： 使用电渗析装置制造气体的方法包括将至少两种溶液和电极溶液流入设备中，以叠层压力对设备加压，向设备的电渗析堆叠施加电压，使得在第二溶液中产生溶解的气体 使第二溶液流出设备，将气体从第二溶液中再生出来并收集气体。 使用电渗析装置产生诸如气体，液体或超临界流体的产品的方法包括将至少两种溶液和电极溶液流入设备中，调节温度和压力，使得产物将从第二溶液产生 向设备的电渗析堆施加电压，使得产物在第二溶液中产生，使第二溶液流出设备，并从第二溶液再生产物。

公开(公告)号：US08535502B2

公开(公告)日：2013-09-17

申请号：US12206424

申请日：2008-09-08

申请人： Karl A. Littau ,  Francisco E. Torres

发明人： Karl A. Littau ,  Francisco E. Torres

IPC分类号： B01D61/54 ,  B01D61/46

CPC分类号： B01D61/445 ,  B01D53/62 ,  B01D53/77 ,  B01D53/96 ,  B01D2251/306 ,  B01D2251/606 ,  B01D2257/504 ,  C02F1/4693 ,  Y02C10/04

摘要： A system and method for recovery of CO2 includes an aqueous capture device having a capture solution. The aqueous capture device is arranged to receive gas and to capture components from the gas including at least CO2. An electrodialysis unit in operative connection with the capture device performs an electrodialysis operation on the capture solution including at least the CO2, wherein a CO2 rich process stream and a regenerated capture solution are generated from the capture solution including at least the CO2. The CO2 rich process stream is a pressurized process stream at a pressure which maintains the CO2 substantially within the CO2 rich process stream, while in the electrodialysis unit. In another alternative, at least the pH of the capture stream is controlled.

摘要翻译： 用于回收CO 2的系统和方法包括具有捕获溶液的水性捕获装置。 水性捕获装置被布置成接收气体并从包括至少CO 2的气体中捕获组分。 与采集装置可操作地连接的电渗析装置对包括至少二氧化碳的捕获溶液进行电渗析操作，其中从包含至少二氧化碳的捕获溶液产生富CO 2的工艺流和再生的捕获溶液。 富CO2过程流是在电渗析单元中将CO 2基本维持在富CO2过程流内的压力下的加压工艺流。 在另一个替代方案中，至少捕获流的pH被控制。

公开(公告)号：US20120152744A1

公开(公告)日：2012-06-21

申请号：US12969485

申请日：2010-12-15

申请人： Matthew D. Eisaman ,  Karl A. Littau

发明人： Matthew D. Eisaman ,  Karl A. Littau

IPC分类号： B01D61/42

CPC分类号： B01D61/422 ,  B01D53/1425 ,  B01D53/1475 ,  B01D61/44 ,  B01D61/445 ,  B01D2257/504 ,  B01D2313/24 ,  C01B17/501 ,  C01B32/05 ,  C01C1/02 ,  Y02P20/152 ,  Y02P20/544

摘要： A process for producing a gas using an electrodialysis apparatus includes flowing at least two solutions and an electrode solution into the apparatus, pressurizing the apparatus at a stack pressure, applying a voltage to the apparatus's electrodialysis stack so a dissolved gas is generated in the second solution, flowing the second solution out of the apparatus, regenerating the gas out of the second solution, and collecting the gas. A process for generating a product, like a gas, liquid, or supercritical fluid, using an electrodialysis apparatus includes flowing at least two solutions and an electrode solution into the apparatus, adjusting the temperature and pressure so the product will be generated from the second solution, applying a voltage to the electrodialysis stack of the apparatus so that the product is generated in the second solution, flowing the second solution out of the apparatus, and regenerating the product from the second solution.

摘要翻译： 使用电渗析装置制造气体的方法包括将至少两种溶液和电极溶液流入设备中，以叠层压力对设备加压，向设备的电渗析堆叠施加电压，使得在第二溶液中产生溶解的气体 使第二溶液流出设备，将气体从第二溶液中再生出来并收集气体。 使用电渗析装置产生诸如气体，液体或超临界流体的产品的方法包括将至少两种溶液和电极溶液流入设备中，调节温度和压力，使得产物将从第二溶液产生 向设备的电渗析堆施加电压，使得产物在第二溶液中产生，使第二溶液流出设备，并从第二溶液再生产物。

公开(公告)号：US20100206379A1

公开(公告)日：2010-08-19

申请号：US12611842

申请日：2009-11-03

申请人： Karl A. Littau ,  Patrick Y. Maeda ,  Patrick C. Cheung

发明人： Karl A. Littau ,  Patrick Y. Maeda ,  Patrick C. Cheung

IPC分类号： H01L31/00 ,  F24J2/10

CPC分类号： H01L31/0547 ,  F24S23/00 ,  F24S23/74 ,  F24S23/82 ,  F24S30/422 ,  F24S50/20 ,  H02S20/23 ,  H02S20/32 ,  H02S40/22 ,  Y02B10/12 ,  Y02B10/20 ,  Y02E10/44 ,  Y02E10/45 ,  Y02E10/47 ,  Y02E10/52

摘要： A rotational trough reflector solar-electricity generation device includes a trough reflector that rotates around a substantially vertical axis and includes a solid optical element having a linear parabolic convex surface that serves as a base for automatically positioning a mirror to focus sunlight onto a focal line, and a flat aperture surface that serves to support a strip-type photovoltaic (PV) receiver on the focal line. A tracking system rotates the trough reflector such that the trough reflector is aligned generally parallel to the incident sunlight (e.g., in a generally east-west direction at sunrise, turning to generally north-south at noon, and turning generally west-east at sunset). A disc-shaped support structure is used to distribute the reflector's weight over a larger area and to minimize the tracking system motor size. Multiple trough reflectors are mounted on the disc-shaped support to maximize power generation.

摘要翻译： 旋转槽反射器太阳能发电装置包括：谷底反射器，其围绕基本上垂直的轴线旋转，并且包括具有线性抛物面凸面的固体光学元件，其用作用于自动定位反射镜以将太阳聚焦到焦线上的基座， 以及用于支撑焦线上的带状光伏（PV）接收器的平坦孔径表面。 跟踪系统使槽反射器旋转，使得槽反射器大致平行于入射的阳光对准（例如，在日出时大致向东 - 西方向，中午一般向南 - 南转，并在日落时一般向西东转 ）。 使用盘形支撑结构将反射器的重量分布在更大的面积上并且使跟踪系统电动机尺寸最小化。 多个槽反射器安装在盘形支撑件上以最大限度地发电。

公开(公告)号：US20090262776A1

公开(公告)日：2009-10-22

申请号：US12497993

申请日：2009-07-06

申请人： Scott Jong Ho Limb ,  Michael Yu Tak Young ,  Karl A. Littau

发明人： Scott Jong Ho Limb ,  Michael Yu Tak Young ,  Karl A. Littau

IPC分类号： G01K15/00

CPC分类号： G01K7/223 ,  G01K15/00 ,  Y10T29/49085

摘要： The presently described embodiments are directed to a calibration method and system for thin film thermistors that are locally heated with integrated thin film heaters. Initially, print head temperature is either measured or referenced. Then, transient thermistor resistances are measured and used to determine the thermistor resistance at a higher temperature. Notably, this calibration method is advantageously implemented as a step of an existing process without having to expose the print heads to operating temperatures. In some implementations of the presently described embodiments, trimming of the thermistors may be required once calibrated.

摘要翻译： 目前描述的实施例涉及用集成薄膜加热器局部加热的薄膜热敏电阻的校准方法和系统。 最初，打印头温度是测量或参考。 然后，测量瞬态热敏电阻电阻并用于确定较高温度下的热敏电阻电阻。 值得注意的是，该校准方法有利地被实现为现有工艺的步骤，而不必将打印头暴露于工作温度。 在目前描述的实施例的一些实施方案中，一旦校准就可能需要修整热敏电阻。

公开(公告)号：US07572051B2

公开(公告)日：2009-08-11

申请号：US10989711

申请日：2004-11-15

申请人： Scott Jong Ho Limb ,  Michael Yu Tak Young ,  Karl A. Littau

发明人： Scott Jong Ho Limb ,  Michael Yu Tak Young ,  Karl A. Littau

IPC分类号： G01K15/00 ,  G01K7/00 ,  H01C10/00

CPC分类号： G01K7/223 ,  G01K15/00 ,  Y10T29/49085

摘要： The presently described embodiments are directed to a calibration method and system for thin film thermistors that are locally heated with integrated thin film heaters. Initially, print head temperature is either measured or referenced. Then, transient thermistor resistances are measured and used to determine the thermistor resistance at a higher temperature. Notably, this calibration method is advantageously implemented as a step of an existing process without having to expose the print heads to operating temperatures. In some implementations of the presently described embodiments, trimming of the thermistors may be required once calibrated.

摘要翻译： 目前描述的实施例涉及用集成薄膜加热器局部加热的薄膜热敏电阻的校准方法和系统。 最初，打印头温度是测量或参考。 然后，测量瞬态热敏电阻电阻并用于确定较高温度下的热敏电阻电阻。 值得注意的是，该校准方法有利地被实现为现有工艺的步骤，而不必将打印头暴露于工作温度。 在目前描述的实施例的一些实施方案中，一旦校准就可能需要修整热敏电阻。

公开(公告)号：US06231674B1

公开(公告)日：2001-05-15

申请号：US09481124

申请日：2000-01-11

申请人： Aihua Chen ,  Karl A. Littau ,  Dashun S. Zhou

发明人： Aihua Chen ,  Karl A. Littau ,  Dashun S. Zhou

IPC分类号： C23C1600

CPC分类号： C23C16/458 ,  C23C16/45521 ,  C23C16/4583 ,  C23C16/4585 ,  C23C16/46 ,  Y10S156/916

摘要： This invention provides a method and apparatus for substantially eliminating deposition on the edge of a wafer supported on a pedestal in a processing chamber. Process gas flow onto the wafer surface is inhibited from reaching the wafer edge and backside, by means of a shadow ring placed over the wafer without touching it. Deposition on the edge and backside of the wafer are therefore substantially eliminated. The shadow ring defines a cavity which circumscribes the wafer edge, into which purge gas is flowed. This purge gas flows out from the cavity through the gap between the shadow ring and the upper surface of the wafer. Alignment pins are placed on the wafer supporting surface of the pedestal. These pins have sloping surfaces and are arranged to guide the wafer to a centered position on the pedestal when the wafer is placed on the pedestal. These pins also serve to align the shadow ring to the pedestal and thence to the wafer. The shadow ring has a plurality of keyed formations which mate to the pins, and as the shadow ring and pedestal are brought together, the pins serve to align the shadow ring. This precise rotational alignment and centering of the shadow ring results in substantial elimination of edge deposition. The keyed formations have elliptical cross-sections to provide for radial movement of the pins with respect to the keyed formations due to thermal expansion.

摘要翻译： 本发明提供一种用于基本上消除在处理室中的基座上支撑的晶片的边缘上的沉积的方法和装置。 通过放置在晶片上的阴影环而不接触晶片表面的工艺气体流被抑制到达晶片边缘和背面。 因此，基本上消除了在晶片的边缘和背面上的沉积。 阴影环限定了围绕晶片边缘的空腔，吹扫气体流入该空腔。 该清洗气体通过阴影环和晶片的上表面之间的间隙从腔体流出。 对准销被放置在基座的晶片支撑表面上。 这些销具有倾斜表面并且被布置成当晶片被放置在基座上时将晶片引导到基座上的居中位置。 这些引脚还用于将阴影环对准基座，从而将其对准晶片。 阴影环具有与销相配合的多个键状结构，并且当阴影环和基座被聚集在一起时，销用于对准阴影环。 阴影环的这种精确的旋转对准和定心导致边缘沉积的显着消除。 键合结构具有椭圆形横截面，以提供由于热膨胀而使销相对于键合地层的径向移动。

公开(公告)号：US08156725B2

公开(公告)日：2012-04-17

申请号：US11962959

申请日：2007-12-21

申请人： Karl A. Littau ,  Raphael Stumpp

发明人： Karl A. Littau ,  Raphael Stumpp

IPC分类号： F02C7/08

CPC分类号： F02C6/16 ,  Y02E60/15

摘要： A compressed air energy storage system and method of capturing CO2 during compressed air energy storage the system and method including a gas inlet pipe, at least one air compressor stage attached to the gas inlet pipe and adapted for compression of a gas, a heat transfer system to cool the gas during or after compression, the heat being recycled throughout the system, at least one absorption bed for separating CO2 from the compressed gas attached to the heat transfer system, at least one compressed gas reservoir having an inlet and an outlet, the reservoir attached at its inlet to the absorption bed, at least one preheater stage attached to the outlet of the compressed gas reservoir for heating a compressed gas after storage in the compressed gas reservoir, and at least one gas expander attached to the preheater stage and adapted for the expansion of the compressed gas.

摘要翻译： 一种在压缩空气能量储存期间捕获CO 2的压缩空气能量存储系统和方法，该系统和方法包括气体入口管，至少一个连接到气体入口管并适于压缩气体的空气压缩机级， 在压缩期间或之后冷却气体，热量在整个系统中循环，至少一个吸收床，用于将CO 2与附着到传热系统的压缩气体分离，至少一个具有入口和出口的压缩气体储存器， 在其吸入床的入口处附接的储存器，附接到压缩气体储存器的出口的至少一个预热器级，用于在压缩气体储存器中储存之后加热压缩气体;以及至少一个气体膨胀器，其连接到预热器级并适应 用于膨胀压缩气体。

公开(公告)号：US20100206357A1

公开(公告)日：2010-08-19

申请号：US12611873

申请日：2009-11-03

申请人： Karl A. Littau ,  Patrick Y. Maeda ,  Patrick C. Cheung

发明人： Karl A. Littau ,  Patrick Y. Maeda ,  Patrick C. Cheung

IPC分类号： H01L31/052

CPC分类号： H01L31/0547 ,  F24S23/74 ,  F24S30/422 ,  F24S2020/10 ,  H02S20/23 ,  H02S20/32 ,  H02S40/22 ,  Y02B10/12 ,  Y02B10/20 ,  Y02E10/45 ,  Y02E10/47 ,  Y02E10/52

摘要： A two-part solar energy collection system for installation on a planar support surface (e.g., a rooftop) includes a permanent positioning component including a base structure and a replaceable solar collector component including solar energy collection elements fixedly mounted on a support frame. Each collection element includes an optical element arranged to focus solar radiation onto a focal line, and a linearly-arranged solar energy collector (e.g., PV cells) fixedly maintained on the focal line. The replaceable solar collector component is secured to a rotating platform of the base structure such that the focal lines of the solar energy collection elements are maintained in a plane that is substantially parallel to the support surface, and the rotating platform and replaceable solar collector component are collectively pivoted by a positioning system around a rotational axis to align the PV cells) parallel to the received sunlight beams.

摘要翻译： 用于安装在平面支撑表面（例如，屋顶）上的两部分太阳能收集系统包括永久定位部件，其包括基座结构和可替换的太阳能收集器部件，其包括固定地安装在支撑框架上的太阳能收集元件。 每个收集元件包括被布置成将太阳辐射聚焦到焦线上的光学元件和固定地保持在焦线上的线性排列的太阳能收集器（例如，PV电池）。 可替换的太阳能收集器部件被固定到基部结构的旋转平台，使得太阳能收集元件的焦线保持在基本上平行于支撑表面的平面中，并且旋转平台和可更换的太阳能收集器部件 通过围绕旋转轴线的定位系统共同枢转以使PV电池对准）平行于所接收的太阳光束。