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    Method for improved remote microwave plasma source for use with substrate processing system
    2.
    发明授权
    Method for improved remote microwave plasma source for use with substrate processing system 失效
    用于改善用于衬底处理系统的远程微波等离子体源的方法

    公开(公告)号：US06271148B1

    公开(公告)日：2001-08-07

    申请号：US09416861

    申请日：1999-10-13

    申请人： Chien-Teh Kao ,  Kenneth Tsai ,  Quyen Pham ,  Ronald L. Rose ,  Calvin R. Augason ,  Joseph Yudovsky

    发明人： Chien-Teh Kao ,  Kenneth Tsai ,  Quyen Pham ,  Ronald L. Rose ,  Calvin R. Augason ,  Joseph Yudovsky

    IPC分类号： H01L21302

    CPC分类号： C23C16/52 ,  C23C16/4405 ,  C23C16/452 ,  H01J37/32192 ,  H01J37/32357 ,  H01J37/32862 ,  H01L21/67028

    摘要： An apparatus and methods for an upgraded CVD system providing a remote plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides apparatus for an easily removable, conveniently handled, and relatively inexpensive, robust microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. The present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a remote plasma for efficiently cleaning the chamber.

    摘要翻译： 根据具体实施例的用于提供用于有效清洁腔室的远程等离子体的升级CVD系统的装置和方法。 使用本发明的升级的CVD系统也可以实现在基板上的蚀刻或沉积层。 在具体实施例中，本发明提供了一种用于易于移除，方便处理且相对便宜的鲁棒微波等离子体源的装置，作为对现有CVD设备的改进或可移除的添加。 本发明提供了一种改进的CVD装置或改进现有CVD装置，其能够产生用于有效清洁腔室的远程等离子体。

    Integrated facility and process chamber for substrate processing
    6.
    发明申请
    Integrated facility and process chamber for substrate processing 审中-公开
    用于基板加工的集成设备和处理室

    公开(公告)号：US20100162954A1

    公开(公告)日：2010-07-01

    申请号：US12319224

    申请日：2008-12-31

    申请人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Tzy-Chung Terry Wu ,  Ronald L. Rose

    发明人： Lawrence Chung-Lai Lei ,  Alfred Mak ,  Rex Liu ,  Kon Park ,  Tzy-Chung Terry Wu ,  Ronald L. Rose

    IPC分类号： C23C16/00

    CPC分类号： C23C16/54 ,  C23C14/568 ,  H01L21/67161 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67727 ,  H01L21/67736 ,  H01L21/67742 ,  H01L21/67748 ,  H01L21/67754

    摘要： In accordance with some embodiments described herein, a process module facility is provided, comprising: at least one process chamber carried in frame, a subfloor adjacent the process module, a stationary pump and electrical box positioned atop the subfloor; and gas control lines and vacuum exhaust lines housed within the subfloor and coupled the process chamber. The process module facility may be integrated with a larger system for processing substrates which includes two or more process module facilities, a substrate handling robot, a load lock chamber, and a transverse substrate handler. The transverse substrate handler includes mobile transverse chambers configured to convey substrates to process modules, wherein each mobile transverse chamber is configured to maintain a specified gas condition during the conveyance of the substrates. The transverse substrate handler further includes a rail for supporting the mobile transverse chambers, wherein the rail is positioned adjacent to entry of the process modules, and drive systems for moving the mobile transverse chambers on the rail.

    摘要翻译： 根据本文所述的一些实施例，提供了一种处理模块设施，包括：至少一个框架承载的处理室，邻近处理模块的底层地板，定位在底层地板顶部的固定泵和电箱; 以及气体控制管线和真空排气管线，其容纳在底层地板内并且连接处理室。 过程模块设备可以与更大的系统集成，用于处理基板，其包括两个或更多个处理模块设施，基板处理机器人，负载锁定室和横向基板处理器。 横向基板处理器包括被配置为将基板输送到处理模块的移动横向室，其中每个移动横向室被构造成在输送基板期间保持特定的气体状态。 横向基板处理器还包括用于支撑移动横向室的轨道，其中轨道邻近进程模块的进入定位，以及用于将移动横向室移动到轨道上的驱动系统。

    Welded susceptor assembly
    7.
    发明授权
    Welded susceptor assembly 失效
    焊接基座组件

    公开(公告)号：US5522937A

    公开(公告)日：1996-06-04

    申请号：US237084

    申请日：1994-05-03

    申请人： Sandy M. Chew ,  Dale R. DuBois ,  Ronald L. Rose ,  Manus Wong

    发明人： Sandy M. Chew ,  Dale R. DuBois ,  Ronald L. Rose ,  Manus Wong

    IPC分类号： C23C16/44 ,  C23C16/458 ,  C23C16/50 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/683 ,  H01L21/687 ,  C23C16/00

    CPC分类号： H01L21/68764 ,  C23C16/458 ,  H01L21/68707 ,  H01L21/68785 ,  H01L21/68792

    摘要： A susceptor support arm assembly in a substrate processing chamber includes a secure ground connection between the susceptor and ground. An aluminum wire rope is welded to a winged terminal lug which is tightly inserted into a hole in a susceptor hub. The wings of the lug are then welded to the hub. The wire rope, now permanently attached to the susceptor hub, is routed through an opening in the susceptor end of a ceramic susceptor support arm, able to pass the ground end lug of the wire rope, through a channel in the support arm back to the susceptor arm support device, and to ground. The channel in the susceptor arm has grooves in its sides to receive a paddle shaped ceramic cover to enclose the channel and the bottom of the hub end of the susceptor arm. The cover insulates, isolates, and shields the grounding wire and thermocouple leads being routed from the susceptor hub back to the support end of the susceptor arm from exposure to the high intensity radiant energy directed at the back of the susceptor. Conical spring washers and shoulder screws, attach the metallic pieces (e.g. the susceptor hub) to the ceramic susceptor hub arm allowing for the differential thermal expansion between pieces without overstressing the ceramic material clamped. Surface treatment of the metallic pieces enhances their corrosion resistance.

    摘要翻译： 衬底处理室中的感受器支撑臂组件包括在基座和地面之间的牢固接地连接。 铝丝绳焊接到紧密插入基座毂孔中的翼形端子凸耳上。 接头的翼部然后焊接到轮毂。 现在永久地连接到基座轮毂上的钢丝绳穿过陶瓷基座支撑臂的基座端部的开口，该开口能够使钢丝索的接地端部凸起通过支撑臂中的通道回到 感受器臂支撑装置，并接地。 基座臂中的通道在其侧面具有凹槽，以容纳桨形陶瓷盖以封闭通道和基座臂的毂端的底部。 盖子将接地线和热电偶引线绝缘，隔离和屏蔽，从接受器轮毂回到基座臂的支撑端，暴露于指向基座背面的高强度辐射能。 圆锥形弹簧垫圈和肩螺钉，将金属片（例如，基座毂）连接到陶瓷基座轮毂臂上，允许片之间的不同热膨胀，而不会对夹持的陶瓷材料施加过大的应力。 金属片的表面处理提高了其耐腐蚀性。

    Clamping ring and susceptor therefor
    8.
    发明授权
    Clamping ring and susceptor therefor 失效
    夹环和感受器

    公开(公告)号：US5326725A

    公开(公告)日：1994-07-05

    申请号：US31259

    申请日：1993-03-11

    申请人： Semyon Sherstinsky ,  Charles C. Harris ,  Mei Chang ,  Dale R. Du Bois ,  James F. Roberts ,  Susan Telford ,  Ronald L. Rose ,  Meng C. Tseng ,  Karl A. Littau

    发明人： Semyon Sherstinsky ,  Charles C. Harris ,  Mei Chang ,  Dale R. Du Bois ,  James F. Roberts ,  Susan Telford ,  Ronald L. Rose ,  Meng C. Tseng ,  Karl A. Littau

    IPC分类号： C23C16/04 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  H01L21/687 ,  C23C16/00

    CPC分类号： C23C16/45521 ,  C23C16/042 ,  C23C16/4585 ,  H01L21/68721 ,  H01L21/68735

    摘要： A clamping ring having a downwardly extending finger that mates with a pocket in the periphery of a susceptor for supporting a wafer in a chemical vapor deposition chamber, provides alignment of the clamping ring, the wafer and the susceptor. A source of inert gas connected to the pocket provides a positive pressure in the pocket that prevents reactive gas in the chamber from reaching the edge and backside of the wafer. A source of vacuum connected to the susceptor support surface ensures good contact between the wafer and the susceptor.The clamping ring also has a lip extending over the top surface of the wafer having a rear surface that has a negative angle with respect to the upper surface of the clamping ring, providing a knife edge seal to the wafer, reducing the area of contact between the clamping ring and the wafer and providing a reduced area of thermal contact between the clamping ring and the wafer.

    摘要翻译： 具有向下延伸的指状物的夹紧环，其与基座的周边中的口相配合，用于在化学气相沉积室中支撑晶片，提供夹紧环，晶片和基座的对准。 连接到口袋的惰性气体源在口袋中提供正压力，防止腔室中的反应性气体到达晶片的边缘和背面。 连接到基座支撑表面的真空源确保了晶片和基座之间良好的接触。 夹紧环还具有在晶片的顶表面上延伸的唇缘，其具有相对于夹紧环的上表面具有负角度的后表面，为晶片提供刀刃密封，从而减小了 夹紧环和晶片，并且在夹紧环和晶片之间提供减小的热接触面积。

    Integrated temperature controlled exhaust and cold trap assembly
    10.
    发明授权
    Integrated temperature controlled exhaust and cold trap assembly 有权
    集成温度控制排气和冷阱组件

    公开(公告)号：US06206971B1

    公开(公告)日：2001-03-27

    申请号：US09281998

    申请日：1999-03-29

    申请人： Salvador P. Umotoy ,  Lawrence Chung-Lai Lei ,  Russell C. Ellwanger ,  Ronald L. Rose ,  Joel Huston ,  James Jin-Long Chen

    发明人： Salvador P. Umotoy ,  Lawrence Chung-Lai Lei ,  Russell C. Ellwanger ,  Ronald L. Rose ,  Joel Huston ,  James Jin-Long Chen

    IPC分类号： C23C1600

    CPC分类号： B01D8/00 ,  C23C16/4412 ,  Y10S55/15 ,  Y10S55/30

    摘要： A temperature-controlled exhaust assembly with cold trap capability. One embodiment of the exhaust assembly comprises a multi-heater design which allows for independent multi-zone closed-loop temperature control. Another embodiment comprises a compact multi-valve uni-body design incorporating a single heater for simplified closed-loop temperature control. The cold trap incorporates a heater for temperature control at the inlet of the trap to minimize undesirable deposits. One embodiment also comprises a multi-stage cold trap and a particle trap. As a removable unit, this cold trap provides additional safety in the handling and disposal of the adsorbed condensables.

    摘要翻译： 具有冷阱能力的温度控制排气组件。 排气组件的一个实施例包括允许独立的多区域闭环温度控制的多加热器设计。 另一个实施例包括紧凑的多阀单体设计，其包括用于简化闭环温度控制的单个加热器。 冷阱包含一个加热器，用于在陷阱入口进行温度控制，以尽量减少不必要的沉积物。 一个实施例还包括多级冷阱和颗粒捕集器。 作为可拆卸单元，该冷阱在吸附的可冷凝物的处理和处理中提供了额外的安全性。