公开(公告)号：US20090080136A1

公开(公告)日：2009-03-26

申请号：US12238635

申请日：2008-09-26

申请人： Nobuyuki Nagayama ,  Yoshio Harada ,  Junichi Takeuchi

发明人： Nobuyuki Nagayama ,  Yoshio Harada ,  Junichi Takeuchi

IPC分类号： H01L21/683

CPC分类号： H01L21/68757 ,  H01L21/6831 ,  H02N13/00

摘要： An electrostatic chuck member comprises an electrode layer and an electric insulating layer, wherein a spray coating layer of an oxide of a Group 3A element in the Periodic Table is formed as an outermost layer of the member and a surface of the spray coating layer is rendered into a densified re-melting layer having an average surface roughness (Ra) Of 0.8-3.0 μm.

摘要翻译： 静电吸盘构件包括电极层和电绝缘层，其中周期表中的3A族元素的氧化物的喷涂层形成为该构件的最外层，并且使喷涂层的表面成为 成为平均表面粗糙度（Ra）为0.8-3.0μm的致密化再熔融层。

公开(公告)号：US20080066647A1

公开(公告)日：2008-03-20

申请号：US11882461

申请日：2007-08-01

申请人： Yoshio Harada ,  Junichi Takeuchi ,  Nobuyuki Nagayama ,  Kouji Mitsuhashi

发明人： Yoshio Harada ,  Junichi Takeuchi ,  Nobuyuki Nagayama ,  Kouji Mitsuhashi

IPC分类号： C09D1/00

CPC分类号： H01J37/32477 ,  B01J19/02 ,  B01J2219/0218 ,  B01J2219/0236 ,  B01J2219/024 ,  B01J2219/0263 ,  B01J2219/0286 ,  B01J2219/0894 ,  C09D1/00 ,  C23C4/00 ,  C23C4/02 ,  C23C4/11 ,  Y10T428/12458 ,  Y10T428/12479 ,  Y10T428/12549 ,  Y10T428/12618 ,  Y10T428/24999

摘要： It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by covering a surface of a substrate with a multilayer composite layer consisting of a metal coating formed as an undercoat, Al2O3 film formed on the undercoat as a middle layer and Y2O3 sprayed coating formed on the middle layer as a top coat.

摘要翻译： 本发明提供一种等离子体处理容器的内部构件，该等离子体处理容器在含有卤素气体的环境下具有优异的耐化学腐蚀和等离子体侵蚀性，并且其制造方法是通过将基材的表面覆盖而形成的构件 由作为底层形成的金属涂层，形成在作为中间层的底涂层上的Al 2 O 3 O 3膜和Y 2 N 2 O 3组成的多层复合层 > O 3喷涂涂层形成在中间层上作为顶涂层。

公开(公告)号：US20060217939A1

公开(公告)日：2006-09-28

申请号：US11389086

申请日：2006-03-27

申请人： Takayuki Nakata ,  Junichi Takeuchi

发明人： Takayuki Nakata ,  Junichi Takeuchi

IPC分类号： G06F15/00

CPC分类号： G06F17/18

摘要： A time series analysis system can perform computation with a less amount of computation than before when a long-term trend component and a long-term cyclic component are handled, or when a plurality of cyclic components is handled. From input time series data including a plurality of cyclic components, long-term time series data of a different series using a plurality of time spans is prepared for each of the time spans. Then, the long-term time series data for each of the time spans is removed from the original time series data, thereby preparing short-term time series data. Then, by learning through probability statistic processing that uses the long-term time series data and the short-term time series data, a model having a time span optimal for prediction of the time series data is selected as an optimal model, and is used for prediction of the time series data.

摘要翻译： 当处理长期趋势分量和长期循环分量时，或者当处理多个循环分量时，时间序列分析系统可以以比以前更少的计算量执行计算。 从包括多个循环分量的输入时间序列数据，为每个时间跨度准备使用多个时间跨度的不同系列的长期时间序列数据。 然后，从原始时间序列数据中除去每个时间跨度的长期时间序列数据，由此制作短期时间序列数据。 然后，通过使用长期时间序列数据和短期时间序列数据的概率统计处理进行学习，选择具有用于预测时间序列数据的最佳时间范围的模型作为最优模型，并且被使用 用于预测时间序列数据。

公开(公告)号：US07092403B2

公开(公告)日：2006-08-15

申请号：US09854123

申请日：2001-05-11

申请人： Junichi Takeuchi ,  Koichiro Suzuki

发明人： Junichi Takeuchi ,  Koichiro Suzuki

IPC分类号： H04J3/22

CPC分类号： H04L5/1438

摘要： First, two subsystems are connected with each other via a communication cable and then recognize physical connection between the two subsystems. Next, each one of the two subsystems ignores signals from the other subsystem for a predetermined time period after recognition of the physical connection. Then, the two subsystems execute the connection procedure and after that, establish data communication between the two subsystems.

摘要翻译： 首先，两个子系统通过通信电缆相互连接，然后识别两个子系统之间的物理连接。 接下来，两个子系统中的每一个在识别物理连接之后的预定时间段内忽略来自另一个子系统的信号。 然后，两个子系统执行连接过程，之后建立两个子系统之间的数据通信。

公开(公告)号：US20050147852A1

公开(公告)日：2005-07-07

申请号：US11072448

申请日：2005-03-07

申请人： Yoshio Harada ,  Junichi Takeuchi ,  Tatsuya Hamaguchi ,  Nobuyuki Nagayama ,  Kouji Mitsuhashi

发明人： Yoshio Harada ,  Junichi Takeuchi ,  Tatsuya Hamaguchi ,  Nobuyuki Nagayama ,  Kouji Mitsuhashi

IPC分类号： H01L21/302 ,  B01J19/02 ,  C23C4/00 ,  C23C4/02 ,  C23C4/10 ,  C23C14/00 ,  C23C16/06 ,  H01J37/32 ,  H01L21/3065 ,  H01L21/31 ,  B32B9/00 ,  B05D1/08 ,  B32B15/04 ,  H05H1/26

CPC分类号： H01J37/32477 ,  B01J19/02 ,  B01J2219/0218 ,  B01J2219/0236 ,  B01J2219/024 ,  B01J2219/0263 ,  B01J2219/0286 ,  B01J2219/0894 ,  C09D1/00 ,  C23C4/00 ,  C23C4/02 ,  C23C4/11 ,  Y10T428/12458 ,  Y10T428/12479 ,  Y10T428/12549 ,  Y10T428/12618 ,  Y10T428/24999

摘要： It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by covering a surface of a substrate with a multilayer composite layer consisting of a metal coating formed as an undercoat, Al2O3 film formed on the undercoat as a middle layer and Y2O3 sprayed coating formed on the middle layer as a top coat.

公开(公告)号：US06879884B2

公开(公告)日：2005-04-12

申请号：US10797590

申请日：2004-03-10

申请人： Takeshi Miyashita ,  Yoshitake Kobayashi ,  Junichi Takeuchi

发明人： Takeshi Miyashita ,  Yoshitake Kobayashi ,  Junichi Takeuchi

IPC分类号： G05D11/00 ,  G06F19/00 ,  G06Q50/00 ,  G06Q50/04 ,  H02J3/00

CPC分类号： H02J3/00 ,  H02J2003/003 ,  Y02P90/845 ,  Y04S10/54

摘要： To provide an energy evaluation support system and the like which can more efficiently and precisely compute electric power consumption for each of predetermined processing units such as production steps and the like, the energy evaluation support system includes a receiving section which receives a factory design request including a production condition instruction indicating a production condition from the user, a storage section which stores a production device database containing data relating to production devices and a requisite-power supply device database containing data relating to requisite-power supply devices, a processing section which computes energy consumption for each of the production devices and the requisite-power supply devices and for each requisite power type, based on the production device database and requisite-power supply device database according to the factory design request from the user, and an output section which presents the energy consumption computed by the processing section to the user in a predetermined form.

摘要翻译： 为了提供能够更精确地计算各个诸如生产步骤等的预定处理单元的电力消耗的能量评估支持系统等，能量评估支持系统包括：接收部，其接收工厂设计请求，包括 指示来自用户的生产条件的生产条件指令，存储包含与生产设备相关的数据的生产设备数据库的存储部分和包含与所需供电设备有关的数据的必需电源设备数据库， 根据来自用户的工厂设计请求，基于生产装置数据库和必需供电装置数据库，以及输出部分，每个生产装置和必需电源装置的能量消耗以及每种所需电力类型的输出部分 提出计算能耗 通过处理部分以预定的形式提供给用户。

公开(公告)号：US06771483B2

公开(公告)日：2004-08-03

申请号：US10169755

申请日：2002-07-19

申请人： Yoshio Harada ,  Junichi Takeuchi ,  Kenichiro Togoe

发明人： Yoshio Harada ,  Junichi Takeuchi ,  Kenichiro Togoe

IPC分类号： H02N1300

CPC分类号： B23Q3/154 ,  H01L21/6833

摘要： It is to provide an electrostatic chuck member having a strong adsorption force and an excellent responsibility (release property) in the stop of voltage application and is an electrostatic chuck member comprising a substrate, an undercoat of a metallic layer formed on at least one surface thereof, a lower insulating layer of Al2O3 ceramic formed on the undercoat, a metallic electrode layer formed on the lower insulating layer and an upper insulating layer of Al2O3 ceramic formed on the electrode layer as a topcoat.

摘要翻译： 本发明提供一种静电卡盘部件，其具有强的吸附力和在施加电压停止时的优异的责任（释放特性），并且是静电卡盘部件，其包括基板，在其至少一个表面上形成的金属层的底涂层 形成在底涂层上的Al 2 O 3陶瓷的下绝缘层，形成在下绝缘层上的金属电极层和形成在作为顶涂层的电极层上的Al 2 O 3陶瓷的上绝缘层。

公开(公告)号：US06107182A

公开(公告)日：2000-08-22

申请号：US161920

申请日：1998-09-29

申请人： Michio Asahina ,  Junichi Takeuchi ,  Naohiro Moriya ,  Kazuki Matsumoto

发明人： Michio Asahina ,  Junichi Takeuchi ,  Naohiro Moriya ,  Kazuki Matsumoto

IPC分类号： H01L21/203 ,  H01L21/285 ,  H01L21/768 ,  H01L21/28

CPC分类号： H01L21/76814 ,  H01L21/28518 ,  H01L21/76801 ,  H01L21/76828 ,  H01L21/76829 ,  H01L21/76834 ,  H01L21/76837 ,  H01L21/76843 ,  H01L21/76856 ,  H01L21/76876 ,  H01L21/76877

摘要： A semiconductor device having a contact structure that can exhibit superlative step coverage without causing voids or wiring discontinuities, using aluminum or aluminum alloys as a conductive substance for via-holes. A method of fabricating the semiconductor device comprises, for at least one layer of wiring regions above the first wiring region on a semiconductor substrate, the following steps (a) to (f): (a) a step of forming a via-hole in a second interlayer dielectric formed above the first wiring region on a semiconductor substrate; (b) a degassing step for removing gaseous components included within the interlayer dielectric by a heat treatment under reduced pressure and at the substrate temperature of 300.degree. C. to 550.degree. C.; (c) a step of forming a wetting layer on the surface of the interlayer dielectric and the via-hole; (d) a step of cooling the substrate to a temperature of no more than 100.degree. C.; (e) a step of forming a first aluminum layer comprising one of aluminum and an alloy in which aluminum is the main component on the wetting layer at a temperature of no more than 200.degree. C.; and (f) a step of forming a second aluminum layer comprising one of aluminum and an alloy in which aluminum is the main component on the first aluminum layer at a temperature of at least 300.degree. C.

摘要翻译： 一种具有接触结构的半导体器件，其可以显示出最高级的覆盖范围，而不引起空隙或接线不连续性，使用铝或铝合金作为通孔的导电物质。 制造半导体器件的方法包括：对于在半导体衬底上的第一布线区域上方的至少一层布线区域，以下步骤（a）至（f）：（a）形成通孔的步骤 形成在半导体衬底上的第一布线区域上方的第二层间电介质; （b）通过减压热处理和基板温度在300℃至550℃除去层间电介质中包含的气体组分的脱气步骤。 （c）在层间电介质和通孔的表面上形成润湿层的步骤; （d）将基板冷却至不超过100℃的温度; （e）在不超过200℃的温度下形成包含铝和合金中的铝的第一铝层的步骤，其中铝是润湿层上的主要成分。 和（f）在至少300℃的温度下形成第一铝层的步骤，所述第二铝层包括铝和合金中的一种，其中铝是第一铝层上的主要成分。

公开(公告)号：US08897018B2

公开(公告)日：2014-11-25

申请号：US13885336

申请日：2011-11-29

申请人： Kenichi Suwa ,  Daisaku Kiguchi ,  Takeshi Nishii ,  Junichi Takeuchi ,  Yuhsuke Ebata ,  Hitoshi Hasegawa

发明人： Kenichi Suwa ,  Daisaku Kiguchi ,  Takeshi Nishii ,  Junichi Takeuchi ,  Yuhsuke Ebata ,  Hitoshi Hasegawa

IPC分类号： H05K7/00 ,  H05K5/02 ,  G02F1/1333 ,  H04N5/64 ,  G02F1/13

CPC分类号： H05K5/0221 ,  G02F1/1309 ,  G02F1/133308 ,  G02F2201/465 ,  H04N5/64

摘要： Provided is a display device in which a panel module can be fixed to a front cabinet without using screws, and when performing maintenance, the panel module can be easily removed from the front cabinet.The display device including a panel module having a display surface on the front side thereof, a front cabinet surrounding a peripheral edge part of the panel module, and a back cabinet covering a back side of the panel module includes a flexible hook part protruded toward the back cabinet from the inner surface of the front cabinet, and an L-shaped fixing member which has an L shape and includes a latch plate having a hole part in which the flexible hook part is latched and a contact plate which contacts with a back surface of the panel module so as to fix the front cabinet to the panel module.

摘要翻译： 提供了一种显示装置，其中面板模块可以在不使用螺钉的情况下固定到前机柜，​​并且当进行维护时，面板模块可以容易地从前机柜移除。 所述显示装置包括具有在其前侧的显示面的面板模块，围绕所述面板模块的周缘部的前机壳和覆盖所述面板模块的背面的后机壳，所述后壳体具有朝向所述面板模块突出的柔性钩部 并且具有L形的L形固定构件，所述L形固定构件具有闩锁板，所述闩锁板具有锁定所述柔性钩部的孔部和与后表面接触的接触板 以将前机柜固定在面板模块上。

公开(公告)号：US08821737B2

公开(公告)日：2014-09-02

申请号：US13357893

申请日：2012-01-25

申请人： Tomohiro Jiromaru ,  Junichi Takeuchi

发明人： Tomohiro Jiromaru ,  Junichi Takeuchi

IPC分类号： C03C15/00 ,  B44C1/22

CPC分类号： B41J2/162 ,  B41J2/1623 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1635

摘要： A processing method of a substrate which includes: a first bonding step which bonds a ring-shaped first support member to a first surface of the substrate along the outer periphery of the substrate; a first processing step which processes the substrate; and a first separating step which separates the first support member from the substrate by separation at the bonded position.

摘要翻译： 一种基板的加工方法，其特征在于，包括：第一接合工序，其将环状的第一支撑部件沿着所述基板的外周键合到所述基板的第一表面; 处理所述基板的第一处理步骤; 以及第一分离步骤，通过在粘合位置处的分离将第一支撑构件与基板分离。